公开(公告)号：US10410836B2

公开(公告)日：2019-09-10

申请号：US15878222

申请日：2018-01-23

Applicant: Lam Research Corporation

Inventor： Jon McChesney ,  Alexander Paterson

IPC: H03H7/38 ,  H03H7/40 ,  H01J37/32 ,  H01J37/244

Abstract: Systems and methods for tuning to reduce reflected power in multiple states are described. The methods include determining values of one or more parameters of an impedance matching circuit so that reflected power is reduced for multiple states. Such a reduction in the reflected power increases a life of a radio frequency generator coupled to the impedance matching circuit while simultaneously processing a substrate using the multiple states.

公开(公告)号：US20190252234A1

公开(公告)日：2019-08-15

申请号：US16398107

申请日：2019-04-29

Applicant: Lam Research Corporation

Inventor： Damon Tyrone Genetti ,  Jon McChesney ,  Alex Paterson ,  Derek John Witkowicki ,  Austin Ngo

IPC: H01L21/687 ,  H01L21/673 ,  H01L21/677 ,  H01L21/67

Abstract: A cluster tool assembly includes a vacuum transfer module, a process module having a first side connected to the vacuum transfer module. An isolation valve having a first side and a second side, the first side of the isolation valve coupled to a second side of the process module. A replacement station is coupled to the second side of the isolation valve. The replacement station includes an exchange handler and a part buffer. The part buffer includes a plurality of compartments to hold new or used consumable parts. The process module includes a lift mechanism to enable placement of a consumable part installed in the process module to a raised position. The raised position provides access to the exchange handler to enable removal of the consumable part from the process module and store in a compartment of the part buffer. The exchange handler of the replacement station is configured to provide a replacement for the consumable part from the part buffer back to the process module. The lift mechanism is configured to receive the consumable part provided for replacement by the exchange handler and lower the consumable part to an installed position. The replacement by the exchange handler and the process module is conducted while the process module and the replacement station are maintained in a vacuum state.

公开(公告)号：US09885493B2

公开(公告)日：2018-02-06

申请号：US13974324

申请日：2013-08-23

Applicant: Lam Research Corporation

Inventor： Saravanapriyan Sriraman ,  John Drewery ,  Jon McChesney ,  Alex Paterson

IPC: C23C16/00 ,  H01L21/306 ,  F24F13/00 ,  H01J37/32

CPC classification number: F24F13/00 ,  H01J37/321 ,  H01J37/32522 ,  H01J37/32651 ,  H01J37/32963

Abstract: A processing chamber and a Faraday shield system for use in a plasma processing chambers are provided. One system includes a disk structure defining a Faraday shield, and the disk structure has a process side and a back side. The disk structure extends between a center region to a periphery region. The disk structure resides within the processing volume. The system also includes a hub having an internal plenum for passing a flow of air received from an input conduit and removing the flow of air from an output conduit. The hub has an interface surface that is coupled to the back side of the disk structure at the center region. A fluid delivery control is coupled to the input conduit of the hub. The fluid delivery control is configured with a flow rate regulator. The regulated air can be amplified or compressed dry air (CDA).

公开(公告)号：US20170330786A1

公开(公告)日：2017-11-16

申请号：US15668673

申请日：2017-08-03

Applicant: Lam Research Corporation

Inventor： Damon Tyrone Genetti ,  Jon McChesney ,  Alex Paterson ,  Derek John Witkowicki ,  Austin Ngo

IPC: H01L21/687 ,  H01L21/67 ,  H01L21/677 ,  H01L21/673 ,  H01L21/683

CPC classification number: H01L21/6875 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67386 ,  H01L21/67742 ,  H01L21/6838 ,  H01L21/68707 ,  H01L21/68735 ,  H01L21/68785

Abstract: A cluster tool assembly includes a vacuum transfer module, a process module having a first side connected to the vacuum transfer module. An isolation valve having a first side and a second side, the first side of the isolation valve coupled to a second side of the process module. A replacement station is coupled to the second side of the isolation valve. The replacement station includes an exchange handler and a part buffer. The part buffer includes a plurality of compartments to hold new or used consumable parts. The process module includes a lift mechanism to enable placement of a consumable part installed in the process module to a raised position. The raised position provides access to the exchange handler to enable removal of the consumable part from the process module and store in a compartment of the part buffer. The exchange handler of the replacement station is configured to provide a replacement for the consumable part from the part buffer back to the process module. The lift mechanism is configured to receive the consumable part provided for replacement by the exchange handler and lower the consumable part to an installed position. The replacement by the exchange handler and the process module is conducted while the process module and the replacement station are maintained in a vacuum state.

公开(公告)号：US20170113355A1

公开(公告)日：2017-04-27

申请号：US15048940

申请日：2016-02-19

Applicant: Lam Research Corporation

Inventor： Damon Tyrone Genetti ,  Jon McChesney ,  Alex Paterson ,  Derek John Witkowicki ,  Austin Ngo

IPC: B25J15/00

CPC classification number: B25J15/0014 ,  B25J11/0095 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67383 ,  H01L21/67742 ,  H01L21/68707

Abstract: A cluster tool assembly includes a vacuum transfer module, a process module having a first side connected to the vacuum transfer module. An isolation valve having a first side and a second side, the first side of the isolation valve coupled to a second side of the process module. A replacement station is coupled to the second side of the isolation valve. The replacement station includes an exchange handler and a part buffer. The part buffer includes a plurality of compartments to hold new or used consumable parts. The process module includes a lift mechanism to enable placement of a consumable part installed in the process module to a raised position. The raised position provides access to the exchange handler to enable removal of the consumable part from the process module and store in a compartment of the part buffer. The exchange handler of the replacement station is configured to provide a replacement for the consumable part from the part buffer back to the process module. The lift mechanism is configured to receive the consumable part provided for replacement by the exchange handler and lower the consumable part to an installed position. The replacement by the exchange handler and the process module is conducted while the process module and the replacement station are maintained in a vacuum state.

公开(公告)号：US09530656B2

公开(公告)日：2016-12-27

申请号：US13851793

申请日：2013-03-27

Applicant: Lam Research Corporation

Inventor： Jon McChesney ,  Alex Paterson

IPC: H01L21/306 ,  C23C16/00 ,  H01L21/3065 ,  H01J37/32

CPC classification number: H01J37/32522 ,  H01J37/32082 ,  H01J37/3211 ,  H01J37/32119 ,  H01J37/32238 ,  H01J2237/002 ,  H01J2237/334 ,  H01L21/3065

Abstract: Systems, methods, and computer programs are presented for controlling the temperature of a window in a semiconductor manufacturing chamber. One apparatus includes an air amplifier, a plenum, a heater, a temperature sensor, and a controller. The air amplifier is coupled to pressurized gas and generates, when activated, a flow of air. The air amplifier is also coupled to the plenum and the heater. The plenum receives the flow of air and distributes the flow of air over a window of the plasma chamber. When the heater is activated, the flow of air is heated during processing, and when the heater is not activated, the flow of air cools the window. The temperature sensor is situated about the window of the plasma chamber, and the controller is defined to activate both the air amplifier and the heater based on a temperature measured by the temperature sensor.

Abstract translation: 提出了用于控制半导体制造室中的窗口的温度的系统，方法和计算机程序。 一种装置包括空气放大器，增压室，加热器，温度传感器和控制器。 空气放大器耦合到加压气体，并在被激活时产生空气流。 空气放大器还连接到增压室和加热器。 增压室接收空气流并将空气流分配在等离子体室的窗口上。 当加热器被激活时，在加工期间空气的流动被加热，并且当加热器未被激活时，空气的流动冷却窗口。 温度传感器位于等离子体室的窗口周围，并且控制器被定义为基于由温度传感器测量的温度来激活空气放大器和加热器。

公开(公告)号：US20160211166A1

公开(公告)日：2016-07-21

申请号：US14705430

申请日：2015-05-06

Applicant: Lam Research Corporation

Inventor： Haoquan Yan ,  Robert Griffith O'Neill ,  Raphael Casaes ,  Jon McChesney ,  Alex Paterson

IPC: H01L21/687 ,  H01L21/66 ,  H01L21/67

CPC classification number: H01L21/68742 ,  H01J37/023 ,  H01J37/20 ,  H01J37/32623 ,  H01J37/32642 ,  H01J37/32715 ,  H01L21/67069 ,  H01L21/68735

Abstract: A substrate processing system includes a processing chamber and a pedestal arranged in the processing chamber. An edge coupling ring is arranged adjacent to a radially outer edge of the pedestal. A first actuator is configured to selectively move the edge coupling ring to a raised position, relative to the pedestal to provide clearance between the edge coupling ring and the pedestal to allow a robot arm to remove the edge coupling ring from the processing chamber.

Abstract translation: 基板处理系统包括处理室和布置在处理室中的基座。 边缘联接环布置成邻近基座的径向外边缘。 第一致动器构造成相对于基座选择性地将边缘联接环移动到升高位置，以在边缘联接环和基座之间提供间隙，以允许机器人臂从处理室移除边缘联接环。

公开(公告)号：US20150020969A1

公开(公告)日：2015-01-22

申请号：US13974324

申请日：2013-08-23

Applicant: Lam Research Corporation

Inventor： Saravanapriyan Sriraman ,  John Drewery ,  Jon McChesney ,  Alex Paterson

IPC: H01J37/32 ,  F24F13/00

CPC classification number: F24F13/00 ,  H01J37/321 ,  H01J37/32522 ,  H01J37/32651 ,  H01J37/32963

Abstract: A processing chamber and a Faraday shield system for use in a plasma processing chambers are provided. One system includes a disk structure defining a Faraday shield, and the disk structure has a process side and a back side. The disk structure extends between a center region to a periphery region. The disk structure resides within the processing volume. The system also includes a hub having an internal plenum for passing a flow of air received from an input conduit and removing the flow of air from an output conduit. The hub has an interface surface that is coupled to the back side of the disk structure at the center region. A fluid delivery control is coupled to the input conduit of the hub. The fluid delivery control is configured with a flow rate regulator. The regulated air can be amplified or compressed dry air (CDA).

Abstract translation: 提供了一种用于等离子体处理室的处理室和法拉第屏蔽系统。 一个系统包括限定法拉第屏蔽的盘结构，并且盘结构具有处理侧和后侧。 盘结构在中心区域到外围区域之间延伸。 磁盘结构位于处理卷内。 该系统还包括具有用于使从输入导管接收的空气流通过的内部增压室的毂，并且从输出导管除去空气流。 轮毂具有在中心区域连接到盘结构的后侧的界面。 流体输送控制器联接到轮毂的输入管道。 流体输送控制器配置有流量调节器。 调节空气可以放大或压缩干燥空气（CDA）。