公开(公告)号：US20050117139A1

公开(公告)日：2005-06-02

申请号：US11019215

申请日：2004-12-23

申请人： Arno Bleeker ,  Vadim Banine

发明人： Arno Bleeker ,  Vadim Banine

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G03F7/70283 ,  G03F7/70291 ,  G21K1/062

摘要： A programmable patterning structure for use with a lithographic projection apparatus according to one embodiment of the invention includes a plurality of reflective elements A, B, C, each reflective element having two distributed Bragg reflectors 51, 52. A separation D1 between the two distributed Bragg reflectors is adjustable between a first relation, at which destructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in substantially zero reflectivity, and a second relation, in which constructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in high reflectivity.

摘要翻译： 与根据本发明的一个实施例的光刻投影设备一起使用的可编程图案化结构包括多个反射元件A，B，C，每个反射元件具有两个分布式布拉格反射器51,52。两个分布式 布拉格反射器可以在第一关系之间调节，在第一关系处，来自第一和第二分布布拉格反射器51,52的反射之间的相消干涉导致基本上为零的反射率，以及第二关系，其中来自第一和第二分布布拉格 反射器51,52导致高反射率。

公开(公告)号：US20070145296A1

公开(公告)日：2007-06-28

申请号：US11314099

申请日：2005-12-22

申请人： Johannes Freriks ,  Vadim Banine ,  Vladimir Ivanov

发明人： Johannes Freriks ,  Vadim Banine ,  Vladimir Ivanov

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166

摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa).

摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积， 以及配置成在0.001mbar（0.1Pa）和1mbar（100Pa）之间的缓冲体积中提供气体压力的泵。

公开(公告)号：US20060268246A1

公开(公告)日：2006-11-30

申请号：US11391731

申请日：2006-03-29

申请人： Johannes Jacobs ,  Vadim Banine ,  Barrie Brewster ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Moors ,  Robert Livesey ,  Baastiaan Wolschrijn

发明人： Johannes Jacobs ,  Vadim Banine ,  Barrie Brewster ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Moors ,  Robert Livesey ,  Baastiaan Wolschrijn

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.

摘要翻译： 光刻设备被配置为将图案从图案形成装置投影到基板上。 该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和 氩和氢的混合物。

公开(公告)号：US20060221440A1

公开(公告)日：2006-10-05

申请号：US11091923

申请日：2005-03-29

申请人： Vadim Banine ,  Johannes Moors ,  Leonid Shmaenok ,  Nikolay Salashchenko

发明人： Vadim Banine ,  Johannes Moors ,  Leonid Shmaenok ,  Nikolay Salashchenko

IPC分类号： F21V9/04 ,  G02B1/10

CPC分类号： G03F7/70916 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G03F7/70941

摘要： A multi-layered spectral purity filters improveS the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam and also collect debris emitted from a radiation source.

摘要翻译： 多层光谱纯度滤光片提高极紫外（EUV）辐射束的光谱纯度，并且还收集从辐射源发射的碎片。

公开(公告)号：US20060127811A1

公开(公告)日：2006-06-15

申请号：US11007579

申请日：2004-12-09

申请人： Johannes Josephina Moors ,  Robertus Jacobus Van Ballegoij ,  Vadim Banine ,  Gert-Jan Heerens ,  Frederik Elisabeth Heuts ,  Johannes Wilhelmus Jacobs ,  Paulus Liebregts ,  Hendrik Johannes Neerhof

发明人： Johannes Josephina Moors ,  Robertus Jacobus Van Ballegoij ,  Vadim Banine ,  Gert-Jan Heerens ,  Frederik Elisabeth Heuts ,  Johannes Wilhelmus Jacobs ,  Paulus Liebregts ,  Hendrik Johannes Neerhof

IPC分类号： G03F7/00

CPC分类号： G03F7/70916 ,  G03F7/70883 ,  G03F7/70908

摘要： A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.

摘要翻译： 一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放的连接到衬底上，保持电离冲洗气体在通道中的压力高于在 衬底隔室和在光电隔室中，在用电离冲洗气体从衬底发射的颗粒中突出，截留颗粒时，使用耦合到与至少一个 隔室，并且在通道的壁与出口和/或泵的转子之间建立电势差，使得泵的出口和/或转子吸引来自于冲洗气体的带正电荷的离子 渠道。

公开(公告)号：US20060072084A1

公开(公告)日：2006-04-06

申请号：US10956344

申请日：2004-10-04

申请人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Johannes Hubertus Moors ,  Carolus Ida Spee ,  Derk Jan Klunder

发明人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Johannes Hubertus Moors ,  Carolus Ida Spee ,  Derk Jan Klunder

IPC分类号： G03B27/52

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

摘要翻译： 在包括光学元件的设备的光学元件上去除沉积的方法包括在至少部分设备中提供含H 2的气体，包括从H 2 来自含H 2气体; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的设备的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。

公开(公告)号：US20050274897A1

公开(公告)日：2005-12-15

申请号：US11091238

申请日：2005-03-28

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

IPC分类号： G03F7/20 ,  G01J1/42

CPC分类号： G03F7/7085 ,  G03F7/70141 ,  G03F7/70558

摘要： There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

摘要翻译： 提供了一种照明系统，其包括（a）发射波长<= 193nm的光的光源，其中所述光在远离光源的平面中提供预定照明并且在平面中限定使用区域，以及 （b）位于或靠近平面的传感器，用于检测使用区域外的光。

公开(公告)号：US20050024609A1

公开(公告)日：2005-02-03

申请号：US10860662

申请日：2004-06-04

申请人： Joannes De Smit ,  Vadim Banine ,  Theodorus Josephus Bisschops ,  Marcel Mathijs Dierichs ,  Theodorus Modderman

发明人： Joannes De Smit ,  Vadim Banine ,  Theodorus Josephus Bisschops ,  Marcel Mathijs Dierichs ,  Theodorus Modderman

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/00 ,  G03F7/00

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。

公开(公告)号：US20120147350A1

公开(公告)日：2012-06-14

申请号：US13381312

申请日：2010-05-11

申请人： Andrei Yakunin ,  Vadim Banine ,  Denis Glushkov

发明人： Andrei Yakunin ,  Vadim Banine ,  Denis Glushkov

IPC分类号： G03B27/72 ,  H01L21/302 ,  G02B5/22

CPC分类号： G03F7/70925 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70983 ,  G21K1/06 ,  G21K1/10 ,  G21K2201/067

摘要： A transmissive spectral purity filter configured to transmit extreme ultraviolet radiation includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in semiconductor material such as silicon by an anisotropic etching process. The semiconductor material is provided with a hydrogen-resistant layer, such as silicon nitride Si3N4, silicon dioxide SiO2, or silicon carbide SiC.

摘要翻译： 配置为透射极紫外线辐射的透射光谱纯度滤光器包括具有多个孔以过滤极紫外辐射并抑制第二类辐射的透射的滤光器部分。 可以通过各向异性蚀刻工艺在诸如硅的半导体材料中制造孔。 半导体材料设置有耐氮层，例如氮化硅Si 3 N 4，二氧化硅SiO 2或碳化硅SiC。

公开(公告)号：US20070258086A1

公开(公告)日：2007-11-08

申请号：US11418454

申请日：2006-05-05

申请人： Arno Bleeker ,  Vadim Banine ,  Johannes Onvlee ,  Jacques Van Der Donck ,  Michiel Oderwald

发明人： Arno Bleeker ,  Vadim Banine ,  Johannes Onvlee ,  Jacques Van Der Donck ,  Michiel Oderwald

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F1/86

摘要： The invention relates to a method and device of inspecting contamination particles on an object comprising a patterned structure. The device includes a radiation system for directing a radiation beam to the object. The object is configured to scatter the beam. The device also includes an optical system arranged to receive scattered radiation from the object, and a filter provided in the optical system. The filter is associated with the patterned structure so as to filter out radiation from the scattered radiation. The device also includes a detector arranged to detect a fraction of radiation that is transmitted by the filter. Accordingly, contamination particles may be detected quickly and accurately.

摘要翻译： 本发明涉及一种在包含图案化结构的物体上检查污染颗粒的方法和装置。 该装置包括用于将辐射束引导到物体的辐射系统。 物体被配置为散射光束。 该装置还包括被配置为接收来自物体的散射辐射的光学系统和设置在光学系统中的滤光器。 滤波器与图案化结构相关联，以便滤出散射辐射的辐射。 该装置还包括检测器，其被布置成检测由滤波器传输的辐射的一部分。 因此，可以快速且准确地检测污染颗粒。