公开(公告)号：US06614535B1

公开(公告)日：2003-09-02

申请号：US09533376

申请日：2000-03-22

申请人： Osamu Kakuchi ,  Eiichi Murakami

发明人： Osamu Kakuchi ,  Eiichi Murakami

IPC分类号： G01B902

CPC分类号： G03F7/706 ,  G01B9/02098

摘要： A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting the pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

摘要翻译： 投影曝光装置包括曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光并通过照明系统，用于投影图案的投影光学系统，如 将光照射到用于与图案一起曝光的第二物体和用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光源的光进行测量 。

公开(公告)号：US5083329A

公开(公告)日：1992-01-28

申请号：US607397

申请日：1990-10-31

申请人： Eiichi Murakami

发明人： Eiichi Murakami

IPC分类号： A61H33/00 ,  A63B69/12

CPC分类号： A61H33/0091 ,  A61H2201/1207 ,  A61H33/0087 ,  A61H33/02 ,  A63B69/125

摘要： A water massaging apparatus including an inner tub is arranged an outer tub to form upper and lower spaces and first and second side spaces. The side walls of the inner tub have a number of holes. A propeller is arranged in the first side space for providing a water stream which respectively circulates through the first side space, upper space, second side space and lower space. An air pump is arranged outside the outer tube, and one end of a pipe is connected to the air pump and the other end of the pipe is exposed underneath a bottom wall of the inner tube to form an air stream which flows underneath the bottom wall of inner tub in the same direction as that of the water stream. The presence of the air stream underneath the bottom wall of inner tub significantly reduces resistance against the water stream flowing through the lower space.

摘要翻译： 包括内桶的水按摩装置设置有外桶，以形成上下空间和第一和第二侧空间。 内桶的侧壁有许多孔。 螺旋桨设置在第一侧空间中，用于提供分别在第一侧空间，上空间，第二侧空间和下空间中循环的水流。 一个空气泵布置在外管的外面，管的一端连接到空气泵，管的另一端暴露在内管的底壁的下面，形成一个在底壁下方流动的空气流 内桶的方向与水流相同。 在内桶底壁下方的空气流的存在显着降低了抵抗流经下部空间的水流的阻力。

公开(公告)号：US4903352A

公开(公告)日：1990-02-27

申请号：US299375

申请日：1989-01-23

申请人： Eiichi Murakami

发明人： Eiichi Murakami

IPC分类号： A61H23/04 ,  A61H33/00

CPC分类号： A61H33/6063 ,  A61H33/0087 ,  A61H33/6047 ,  A61H2033/0037

摘要： A fluid jet flow massaging apparatus adapted for use within a bathtub unit comprises a first bathtub and a second bathtub which is accommodated within the first bathtub with a space defined therebetween and which has an inner volume sufficient for accommodating a person. The second bathtub is provided with opposed side walls within which a plurality of fluid circulation holes are formed and a fluid jet circulation flow generating device is disposed within at least one hole of at least one wall of the second bathtub. The fluid jet flow caused by the device is circulated through the holes and the space defined between the first and second bathtubs and the fluid jet flow achieves the massaging operation upon the person disposed within the second bathtub as a result of the circulation of the fluid. The fluid flow direction and the fluid flow rate may be regulated by altering the number of fluid flow generating devices.

摘要翻译： 适于在浴缸单元内使用的流体喷射流按摩设备包括第一浴缸和第二浴缸，第一浴缸和第二浴缸容纳在第一浴缸内，其间限定有空间，并且具有足以容纳人的内部容积。 第二浴缸设置有相对的侧壁，多个流体循环孔形成在其中，流体喷射循环流产生装置设置在第二浴缸的至少一个壁的至少一个孔中。 由装置引起的流体喷射流通过孔循环，并且限定在第一和第二浴缸之间的空间和流体喷射流由于流体的循环而实现对设置在第二浴缸内的人的按摩操作。 可以通过改变流体流产生装置的数量来调节流体流动方向和流体流速。

公开(公告)号：US4780205A

公开(公告)日：1988-10-25

申请号：US887161

申请日：1986-06-30

申请人： Eiichi Murakami ,  Kimihiko Matsuzawa ,  Eiji Masunaga

发明人： Eiichi Murakami ,  Kimihiko Matsuzawa ,  Eiji Masunaga

IPC分类号： B01D67/00 ,  B01D69/02 ,  B01D69/08

CPC分类号： B01D67/0088 ,  B01D69/02 ,  B01D69/08

摘要： A permselective hollow fiber membrane which is a hollow fiber membrane, made from a wet spinnable organic high polymer, having a dense skin layer of gelated structure made to a thickness of 1.mu. or less on at least one surface of the membrane and the rest being made up into a porous layer, a process for the preparation thereof, a method and an apparatus of plasma components separation in which said hollow fiber membrane is used.

摘要翻译： PCT No.PCT / JP85 / 00602 Sec。 371日期1986年6月30日第 102（e）日期1986年6月30日PCT提交1985年10月30日PCT公布。 出版物WO86 / 02575 日期：1986年5月9日。一种透湿中空纤维膜，其是由湿式可纺性有机高分子制成的中空纤维膜，其具有在至少一个表面上具有1μm以下厚度的凝胶化结构的致密表皮层 膜和其余部分被制成多孔层，其制备方法，使用所述中空纤维膜的等离子体组分分离的方法和装置。

公开(公告)号：US4683838A

公开(公告)日：1987-08-04

申请号：US750474

申请日：1985-07-01

申请人： Shin-Ichiro Kimura ,  Eiichi Murakami ,  Terunori Warabisako ,  Kiyoshi Miyake ,  Hideo Sunami

发明人： Shin-Ichiro Kimura ,  Eiichi Murakami ,  Terunori Warabisako ,  Kiyoshi Miyake ,  Hideo Sunami

IPC分类号： H01L21/302 ,  C23C14/22 ,  C23C14/32 ,  H01J37/32 ,  H01L21/3065 ,  C23C16/00

CPC分类号： H01J37/32623 ,  C23C14/22 ,  C23C14/32 ,  H01J37/3266

摘要： An insulator film can be formed at a low temperature without any damage to a substrate to be treated by a plasma in a plasma treatment system which comprises a magnetron for generating a microwave, an isolator for isolating a wave guide from the magnetron, a discharge tube for generating a plasma, the wave guide for leading the microwave from the magnetron to the discharge tube, a vacuum chamber integrally formed together with the discharge tube, an evaporation source provided in the vacuum chamber, a substrate to be treated and provided at a position to sandwich a stream of the plasma between the substrate and the evaporation source, electromagnets provided around the discharge tube and the vacuum chamber, and a manipulator for manipulating the substrate, the electromagnets generating a magnetic field to confine the stream of the plasma.

摘要翻译： 可以在低温下形成绝缘膜，而不会对包括用于产生微波的磁控管的等离子体处理系统中的等离子体处理的基板造成任何损坏，用于将波导从磁控管隔离的隔离器，放电管 用于产生等离子体，用于将微波从磁控管引导到放电管的波导，与放电管一体形成的真空室，设置在真空室中的蒸发源，待处理的基板，并设置在位置 在基板和蒸发源之间夹着等离子体流，设置在放电管和真空室周围的电磁体以及用于操纵基板的操纵器，电磁体产生磁场以限制等离子体的流。

公开(公告)号：US08997581B2

公开(公告)日：2015-04-07

申请号：US13511622

申请日：2010-11-05

申请人： Harumichi Sato ,  Jun Akedo ,  Eiichi Murakami

发明人： Harumichi Sato ,  Jun Akedo ,  Eiichi Murakami

IPC分类号： G01F1/20 ,  G01F1/66

CPC分类号： G01F1/667

摘要： [Problem] A flow rate measuring device in which guided waves are used, wherein the frequency of ultrasound is optimized; and energy injected from ultrasound transmission/reception elements is increased and the flow velocity sensitivity is raised; whereby the measurement accuracy is improved.[Solution] A frequency of an isolated peak of group velocities of guided waves, from among a plurality of peaks of group velocities of guided waves, and a resonance frequency of the ultrasound transmission element/reception element are set to agree; and the semi-amplitude of a power spectrum of ultrasound excited/received by the ultrasound transmission element/reception element is set to a value that does not overlap with another peak of group velocities.

摘要翻译： [问题]使用导波的流量测量装置，其中超声频率被优化; 并且从超声波发送/接收元件注入的能量增加并且提高流速灵敏度; 从而提高了测量精度。 [解决方案]设定从导波组速度的多个峰值和超声波发送元件/接收元件的共振频率之间的导波组速度的孤立峰值的频率一致; 将由超声波发送元件/接收元件激发/接收的超声波的功率谱的半幅度设定为与组速度的另一个峰值不重叠的值。

公开(公告)号：US20120272747A1

公开(公告)日：2012-11-01

申请号：US13511622

申请日：2010-11-05

申请人： Harumichi Sato ,  Jun Akedo ,  Eiichi Murakami

发明人： Harumichi Sato ,  Jun Akedo ,  Eiichi Murakami

IPC分类号： G01F1/20

CPC分类号： G01F1/667

摘要： [Problem] A flow rate measuring device in which guided waves are used, wherein the frequency of ultrasound is optimized; and energy injected from ultrasound transmission/reception elements is increased and the flow velocity sensitivity is raised; whereby the measurement accuracy is improved.[Solution] A frequency of an isolated peak of group velocities of guided waves, from among a plurality of peaks of group velocities of guided waves, and a resonance frequency of the ultrasound transmission element/reception element are set to agree; and the semi-amplitude of a power spectrum of ultrasound excited/received by the ultrasound transmission element/reception element is set to a value that does not overlap with another peak of group velocities.

摘要翻译： [问题]使用导波的流量测量装置，其中超声频率被优化; 并且从超声波发送/接收元件注入的能量增加并且提高流速灵敏度; 从而提高了测量精度。 [解决方案]设定从导波组速度的多个峰值和超声波发送元件/接收元件的共振频率之间的导波组速度的孤立峰值的频率一致; 将由超声波发送元件/接收元件激发/接收的超声波的功率谱的半幅度设定为与组速度的另一个峰值不重叠的值。

公开(公告)号：US07786585B2

公开(公告)日：2010-08-31

申请号：US12188591

申请日：2008-08-08

申请人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

发明人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

IPC分类号： H01L23/48 ,  H01L23/52

CPC分类号： H01L23/53238 ,  H01L21/823871 ,  H01L23/5286 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a semiconductor integrated circuit device having plural layers of buried wirings, it is intended to prevent the occurrence of a discontinuity caused by stress migration at an interface between a plug connected at a bottom thereof to a buried wiring and the buried wiring. For example, in the case where the width of a first Cu wiring is not smaller than about 0.9 μm and is smaller than about 1.44 μm, and the width of a second Cu wiring and the diameter of a plug are about 0.18 μm, there are arranged two or more plugs which connect the first wirings and the second Cu wirings electrically with each other.

摘要翻译： 在具有多层埋地布线的半导体集成电路装置中，旨在防止在其底部连接到埋地布线的插头与埋地布线之间的界面处的应力迁移引起的不连续性的发生。 例如，在第一Cu布线的宽度不小于约0.9μm且小于约1.44μm的情况下，并且第二Cu布线的宽度和塞子的直径为约0.18μm的情况下，存在 布置两个或更多个将第一布线和第二铜布线彼此电连接的插头。

公开(公告)号：US07603194B2

公开(公告)日：2009-10-13

申请号：US12153926

申请日：2008-05-28

申请人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

发明人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

IPC分类号： G06F19/00

CPC分类号： C23C14/568 ,  C23C16/54 ,  G05B19/41865 ,  G05B2219/45031 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67276 ,  H01L21/67727 ,  H01L21/67745 ,  Y02P90/14 ,  Y02P90/20 ,  Y02P90/28 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S438/908 ,  Y10T29/41

摘要： A fabricating method for a system that includes a plurality of processing apparatuses connected to each other by an inter-apparatus transporter and a computer storing managing information of processing and transporting of semiconductor wafers. The processing apparatuses have an interface for loading and unloading a plurality of the semiconductor wafers that are contained in a carrier. The semiconductor waters are processed in processing chambers of the processing apparatuses and the result of processing is monitored. In the processing, a first carrier containing the plurality of the semiconductor wafers having been processed in the first processing apparatus is transported toward the second processing apparatus by the inter-apparatus transporter prior to unloading of a second carrier containing semiconductor wafers processed in the second processing apparatus, according to the managing information.

摘要翻译： 一种系统的制造方法，其包括通过机器间运输机彼此连接的多个处理装置和存储管理半导体晶片的处理和传输信息的计算机。 处理装置具有用于装载和卸载容纳在载体中的多个半导体晶片的界面。 在处理装置的处理室中处理半导体水，并监视处理结果。 在处理中，在卸载包含在第二处理中处理的半导体晶片的第二载体之前，将包含在第一处理装置中处理的多个半导体晶片的第一载体通过装置间传送器传送到第二处理装置 装置，根据管理信息。

公开(公告)号：US20060114476A1

公开(公告)日：2006-06-01

申请号：US11335473

申请日：2006-01-20

申请人： Osamu Kakuchi ,  Eiichi Murakami

发明人： Osamu Kakuchi ,  Eiichi Murakami

IPC分类号： G01B11/02

CPC分类号： G03F7/706 ,  G01B9/02098

摘要： A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

摘要翻译： 投影曝光装置包括曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光并通过照明系统，用于投影图案的投影光学系统，如 将光照射到与图案相同的第二物体上，以及用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光的光进行测量 资源。