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    Lithographic apparatus and device manufacturing method
    32.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07253880B2

    公开(公告)日：2007-08-07

    申请号：US10995536

    申请日：2004-11-24

    申请人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Antonius Johannes Josephus Van Dijsseldonk ,  Paulus Martinus Maria Liebregts

    发明人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Antonius Johannes Josephus Van Dijsseldonk ,  Paulus Martinus Maria Liebregts

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70141 ,  G03F7/70091

    摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.

    摘要翻译： 光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。 照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。 提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置以控制投影系统或照明系统的数值孔径（NA）的盘定位器。 该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。

    Lithographic apparatus and device manufacturing method
    33.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07202934B2

    公开(公告)日：2007-04-10

    申请号：US11015770

    申请日：2004-12-20

    申请人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

    发明人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/00

    CPC分类号： G03F7/70933 ,  G03F7/70908

    摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.

    摘要翻译： 公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。 该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。 该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域 表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。

    Lithographic apparatus and a device manufacturing method
    34.
    发明授权
    Lithographic apparatus and a device manufacturing method 有权
    光刻设备和器件制造方法

    公开(公告)号：US07126664B2

    公开(公告)日：2006-10-24

    申请号：US10888513

    申请日：2004-07-12

    申请人： Bernardus Antonius Johannes Luttikhuis ,  Petrus Rutgerus Bartray ,  Johannes Henricus Wilhelmus Jacobs ,  Thijs Harink ,  Paulus Martinus Maria Liebregts

    发明人： Bernardus Antonius Johannes Luttikhuis ,  Petrus Rutgerus Bartray ,  Johannes Henricus Wilhelmus Jacobs ,  Thijs Harink ,  Paulus Martinus Maria Liebregts

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/62

    CPC分类号： G03F7/70841

    摘要： A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.

    摘要翻译： 公开了一种光刻设备。 该装置包括构造成支撑图案形成装置的支撑件，该图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 第一真空环境包含投影系统，第二真空环境包含图案形成装置支撑件，分离器分离第一和第二真空环境。 分离器包括用于使投影束从第一真空环境朝向图案形成装置传递的孔，和/或反之亦然。 图案形成装置形成用于基本上密封隔膜的孔的密封件的至少一部分。