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公开(公告)号：US07253880B2
公开(公告)日：2007-08-07
申请号：US10995536
申请日：2004-11-24
申请人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Antonius Johannes Josephus Van Dijsseldonk , Paulus Martinus Maria Liebregts
发明人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Antonius Johannes Josephus Van Dijsseldonk , Paulus Martinus Maria Liebregts
CPC分类号： G03F7/70141 , G03F7/70091
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.
摘要翻译： 光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。 照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。 提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置以控制投影系统或照明系统的数值孔径（NA）的盘定位器。 该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。
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2.发明申请RADIATION SYSTEM, RADIATION COLLECTOR, RADIATION BEAM CONDITIONING SYSTEM, SPECTRAL PURITY FILTER FOR RADIATION SYSTEM AND METHOD FOR FORMING A SPECTRAL PURITY FILTER 有权辐射系统，辐射收集器，辐射束调节系统，辐射系统的光谱滤光器和形成光谱滤光片的方法公开(公告)号：US20110223543A1
公开(公告)日：2011-09-15
申请号：US12994930
申请日：2009-05-05
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/70575
摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.
摘要翻译： 辐射系统被配置为产生辐射束。 所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。 辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。
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3.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07116399B2
公开(公告)日：2006-10-03
申请号：US10844570
申请日：2004-05-13
申请人： Wilhelmus Josephus Box , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Josephus Jacobus Smits , Marc Wilhelmus Maria Van Der Wijst
发明人： Wilhelmus Josephus Box , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Josephus Jacobus Smits , Marc Wilhelmus Maria Van Der Wijst
CPC分类号： G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70858 , G03F7/70891 , G03F7/709 , G03F7/70991
摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.
摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。
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4.发明授权Lithographic apparatus device manufacturing method and device manufactured thereby 有权由此制造的平版印刷装置的制造方法和装置公开(公告)号：US06967756B2
公开(公告)日：2005-11-22
申请号：US10834834
申请日：2004-04-30
申请人： Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken
发明人： Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken
CPC分类号： G03F7/70141 , G02B7/185 , G02B26/0825 , G03F7/70258 , G03F7/70266
摘要： A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
摘要翻译： 光刻投影设备包括在辐射系统中的有源反射器，该辐射系统提供辐射的投影光束和/或投影系统。 主动反射器包括主体构件，反射多层和至少一个可控制的致动器，用于调节反射多层的表面图形，其中致动器沿平行于所述反射多层的表面图形的方向施加显着的力分量。 致动器可操作以将扭矩施加到所述反射器。
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公开(公告)号：US06750949B2
公开(公告)日：2004-06-15
申请号：US10193688
申请日：2002-07-12
申请人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
发明人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
IPC分类号： G03B2742
CPC分类号： G03F7/70258 , G02B7/008 , G02B7/02 , G03F7/70833
摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.
摘要翻译： 根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。
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公开(公告)号：US20120147349A1
公开(公告)日：2012-06-14
申请号：US13390290
申请日：2010-07-14
CPC分类号： G03F7/70033 , H05G2/003
摘要： A lithographic projection apparatus is provided with a EUV radiation system that includes a source chamber, a supply constructed and arranged to supply a target material to a predetermined plasma formation position, an optical system formed by three or more mirrors arranged to establish a beam path extending to the target material when the target material is located at the predetermined plasma formation position, and a laser system constructed and arranged to provide a laser beam along the beam path for interaction with the target material to produce an EUV radiation-emitting plasma inside the chamber.
摘要翻译： 光刻投影装置设置有EUV辐射系统，该EUV辐射系统包括源室，构造和布置为将目标材料供应到预定等离子体形成位置的供应源，由三个或更多个反射镜形成的光学系统，其布置成建立一个光束路径延伸 当目标材料位于预定等离子体形成位置时与目标材料相连;以及激光系统，其被构造和布置成沿着光束路径提供激光束以与目标材料相互作用以在腔室内产生EUV辐射发射等离子体 。
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公开(公告)号：US09523921B2
公开(公告)日：2016-12-20
申请号：US13390290
申请日：2010-07-14
CPC分类号： G03F7/70033 , H05G2/003
摘要： A lithographic projection apparatus is provided with a EUV radiation system that includes a source chamber, a supply constructed and arranged to supply a target material to a predetermined plasma formation position, an optical system formed by three or more mirrors arranged to establish a beam path extending to the target material when the target material is located at the predetermined plasma formation position, and a laser system constructed and arranged to provide a laser beam along the beam path for interaction with the target material to produce an EUV radiation-emitting plasma inside the chamber.
摘要翻译： 光刻投影装置设置有EUV辐射系统，该EUV辐射系统包括源室，构造和布置为将目标材料供应到预定等离子体形成位置的供应源，由三个或更多个反射镜形成的光学系统，其布置成建立一个光束路径延伸 当目标材料位于预定等离子体形成位置时与目标材料相连;以及激光系统，其被构造和布置成沿着光束路径提供激光束以与目标材料相互作用以在腔室内产生EUV辐射发射等离子体 。
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8.发明授权Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter 有权辐射系统，辐射收集器，辐射束调节系统，辐射系统光谱纯度滤波器和形成光谱纯度滤光片的方法公开(公告)号：US09097982B2
公开(公告)日：2015-08-04
申请号：US12994930
申请日：2009-05-05
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/70575
摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.
摘要翻译： 辐射系统被配置为产生辐射束。 所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。 辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。
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9.发明申请Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method 有权光刻设备，光谱纯化过滤器和器件制造方法公开(公告)号：US20140085619A1
公开(公告)日：2014-03-27
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。
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10.发明授权公开(公告)号：US08570489B2
公开(公告)日：2013-10-29
申请号：US12741960
申请日：2008-11-07
申请人： Jan Bernard Plechelmus Van Schoot , Antonius Johannes Josephus Van Dijsseldonk , Hans Van Der Laan , Diederik Jan Maas
发明人： Jan Bernard Plechelmus Van Schoot , Antonius Johannes Josephus Van Dijsseldonk , Hans Van Der Laan , Diederik Jan Maas
CPC分类号： G03F7/70291 , G03F7/70208 , G03F7/70941
摘要： A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.
摘要翻译： 一种光刻投影设备，包括被配置为支撑图案形成装置的支撑结构，所述图案形成装置被配置为在其横截面中赋予图案的辐射束; 衬底保持器，其构造成保持衬底; 投影系统，被配置为将所述图案化的辐射束暴露在所述基板的目标部分上; 以及被配置为通过提供待暴露在所述基板的目标部分上的另外的辐射束来补偿一个或多个扰动因子的系统，所述附加辐射束在其横截面中被赋予附加图案，所述另外的图案基于 图案形成装置的图案和光刻投影装置的属性数据，光刻投影装置的属性数据表征不同光刻装置的一个或多个系统扰动因子的水平和性质。
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