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    Scanning electron microscope
    31.
    发明申请
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号：US20050139773A1

    公开(公告)日：2005-06-30

    申请号：US11064819

    申请日：2005-02-25

    申请人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    发明人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    IPC分类号： G01Q30/02 ,  G21K7/00 ,  H01J37/147 ,  H01J37/28 ,  G01N23/00

    CPC分类号： H01J37/147 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1516 ,  H01J2237/244 ,  H01J2237/2817

    摘要： The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.

    摘要翻译： 本发明旨在防止由于一次电子束与扫描型电子显微镜的光轴的偏离引起的离轴像差的增加而导致的分辨率的劣化。 扫描电子显微镜设置有分别设置在上部和下部的两个偏转器的图像偏转偏转器系统。 设置在下级的偏转器是多极静电偏转电极，并且设置在物镜中。 即使图像偏移的距离大，也可以形成高分辨率的图像，并且可以高精度地测量尺寸。 当在用于处理具有大面积的晶片并且具有非常微小的电路元件的半导体器件制造工艺中进行检查时，SEM能够以高产量实现精密检查。

    Scanning electron microscope
    33.
    发明授权
    Scanning electron microscope 失效

    公开(公告)号：US06787772B2

    公开(公告)日：2004-09-07

    申请号：US09768356

    申请日：2001-01-25

    申请人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    发明人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    IPC分类号： H01J3728

    CPC分类号： H01J37/147 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1516 ,  H01J2237/244 ,  H01J2237/2817

    摘要： The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.

    Scanning electron microscope
    34.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US06646262B1

    公开(公告)日：2003-11-11

    申请号：US10069571

    申请日：2002-07-15

    申请人： Hideo Todokoro ,  Makoto Ezumi ,  Yoichi Ose ,  Naomasa Suzuki

    发明人： Hideo Todokoro ,  Makoto Ezumi ,  Yoichi Ose ,  Naomasa Suzuki

    IPC分类号： H01J3720

    CPC分类号： H01J37/26 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/05 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/26

    摘要： A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.

    摘要翻译： 具有能量过滤器的扫描电子显微镜，其能够正确地利用与网状电极碰撞而损失的二次电子和/或反射电子。 具有用于产生用于对样品施加一次电子束产生的电子能量的电场的多孔电极的扫描电子显微镜和检测通过多孔电极的电子的第一电子检测器的特征在于还具有多孔结构 设置在样品附近，偏转器从一次电子束的轴线偏转电子;以及第二电子检测器，其检测偏转器偏转的电子。

    Sample Electrification Measurement Method and Charged Particle Beam Apparatus
    35.
    发明申请
    Sample Electrification Measurement Method and Charged Particle Beam Apparatus 有权
    样品电化测量方法和带电粒子束装置

    公开(公告)号：US20100294929A1

    公开(公告)日：2010-11-25

    申请号：US12710679

    申请日：2010-02-23

    申请人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

    发明人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

    IPC分类号： G21K7/00

    CPC分类号： H01J37/265 ,  G01N23/2251 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/216 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

    摘要： The present invention has the object of providing charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.

    摘要翻译： 本发明的目的是提供一种理想的减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。 为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。 公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。 公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动 由于在指定位置处的静电电荷的波动而发生。

    Scanning electron microscope having a monochromator
    36.
    发明授权
    Scanning electron microscope having a monochromator 有权
    具有单色仪的扫描电子显微镜

    公开(公告)号：US07612336B2

    公开(公告)日：2009-11-03

    申请号：US11649882

    申请日：2007-01-05

    申请人： Wataru Mori ,  Makoto Ezumi ,  Yoichi Ose

    发明人： Wataru Mori ,  Makoto Ezumi ,  Yoichi Ose

    IPC分类号： H01J37/26

    CPC分类号： H01J37/28 ,  H01J37/05 ,  H01J37/153 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/216

    摘要： A scanning electron microscope having a monochromator that can automatically adjust an electron beam entering the monochromator and operating conditions of the monochromator. The scanning electron microscope having a monochromator is equipped with, between an electron source and the monochromator, a first focusing lens for adjusting focusing of the electron beam entering the monochromator and a first astigmatism correcting lens for correcting astigmatism of the electron beam entering the monochromator. The microscope further includes a means of obtaining an image of an electron-beam adjustment sample disposed where the electron beam in the monochromator is focused, and based on the obtained image, driving the first focusing lens and the first astigmatism correcting lens so that the focusing and astigmatism of the electron beam entering the monochromator are adjusted.

    摘要翻译： 具有可自动调节进入单色仪的电子束和单色仪的操作条件的单色仪的扫描电子显微镜。 具有单色仪的扫描电子显微镜在电子源和单色仪之间配备有用于调节进入单色仪的电子束的聚焦的第一聚焦透镜和用于校正进入单色仪的电子束的像散的第一散光校正透镜。 显微镜还包括获得设置在单色仪中的电子束被聚焦的电子束调节样本的图像的装置，并且基于获得的图像，驱动第一聚焦透镜和第一散光校正透镜，使得聚焦 并且调节进入单色仪的电子束的散光。

    Monochromator and scanning electron microscope using the same
    37.
    发明申请
    Monochromator and scanning electron microscope using the same 有权

    公开(公告)号：US20080237463A1

    公开(公告)日：2008-10-02

    申请号：US11987018

    申请日：2007-11-26

    申请人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    发明人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    IPC分类号： G01N23/00 ,  G21K1/08

    CPC分类号： H01J37/05 ,  H01J37/153 ,  H01J37/28

    摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.