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31.发明授权Waveguide tunable Bragg grating using compliant microelectromechanical system (MEMS) technology 失效波导可调布拉格光栅采用符合微机电系统（MEMS）技术公开(公告)号：US06529659B2
公开(公告)日：2003-03-04
申请号：US09832102
申请日：2001-04-11
IPC分类号： G02B634
CPC分类号： G02B6/124 , G02B6/02033 , G02B6/022 , G02B2006/12069
摘要： A low cost waveguide tunable Bragg grating provides a flat passband and minimal crosstalk. A compliant material forms a waveguide that is imprinted with a Bragg grating and mounted on a MEMS actuator. Entropic materials such as elastomers, aerogels or other long-chain polymers may provide the necessary compliance. The application of a drive signal to the actuator deforms (squeezes or stretches) the compliant material thereby changing the Bragg spacing and shifting the resonant wavelength. The MEMS actuator can be an electrostatically or electromagnetically actuated comb-drive.
摘要翻译： 低成本波导可调谐布拉格光栅提供平坦的通带和最小的串扰。 柔性材料形成印有布拉格光栅并安装在MEMS致动器上的波导。 诸如弹性体，气凝胶或其他长链聚合物的熵材料可提供必要的顺应性。 向致动器施加驱动信号使柔性材料变形（挤压或拉伸），从而改变布拉格间隔并移动谐振波长。 MEMS致动器可以是静电或电磁驱动的梳状驱动器。
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32.发明授权公开(公告)号：US06519074B2
公开(公告)日：2003-02-11
申请号：US09811612
申请日：2001-03-20
申请人： Michael J. Little , Ravi J. Verma
发明人： Michael J. Little , Ravi J. Verma
IPC分类号： G02B2600
CPC分类号： G01B9/0209 , G01B2290/25 , G02B26/001 , G02B26/02
摘要： A cost-effective tunable optical component uses entropic, rather than enthalpic, materials to provide a compliant member that supports the optical element and is driven by an electrostatic actuator. Entropic materials exhibit an entropic plateau region over a wide frequency range with a Young's modulus much lower than enthalpic materials, linear elastic behavior over a wide deformation range, and, in certain geometries, energy and stress behavior that tend to stabilize the optical element during deformation. The compliant member can be configured in a variety of geometries including compression, tension, tensile/compressive and shear and of a variety of materials including elastomers, aerogels or other long chained polymers.
摘要翻译： 成本有效的可调谐光学部件使用熵而不是焓材料来提供支撑光学元件并由静电致动器驱动的柔性部件。 熵材料在宽频率范围内表现出熵平坦的区域，其杨氏模量比焓材料低得多，在宽变形范围内具有线性弹性特性，并且在某些几何形状下，易于在变形期间稳定光学元件的能量和应力行为 。 顺应性构件可以被构造成各种几何形状，包括压缩，张力，拉伸/压缩和剪切以及各种材料，包括弹性体，气凝胶或其它长链聚合物。
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公开(公告)号：US06329967B1
公开(公告)日：2001-12-11
申请号：US09466886
申请日：1999-12-20
IPC分类号： G09G320
CPC分类号： G02B26/0841 , G02B26/02 , G09G3/3433
摘要： A thin low power, paper white, direct-view display includes an array of bistable micromirrors that are deflected between two stable states, a dark state in which the mirror covers a portion of the background and a white state in which the mirror uncovers the background. The drive electronics are similar to those used in multiplexed LDCs but are modified in order to drive the micromirrors to one of their two stable states. The micromirrors in the enabled row are attracted up or down with sufficient force to exceed the micromirrors' bistable threshold and deflect the micromirrors to their dark and white states, respectively. The attractive forces on the micromirrors in the remaining non-enabled rows are insufficient to exceed the micromirrors' bistable threshold so that the micromirrors remain in their current stable state.
摘要翻译： 薄的低功率纸白色直视显示器包括在两个稳定状态之间偏转的双稳态微镜阵列，其中镜子覆盖背景的一部分的暗状态和反射镜揭示背景的白色状态 。 驱动电子设备类似于多路复用最不发达国家中使用的驱动电路，但是为了将微镜驱动到它们两个稳定状态之一进行了修改。 启用行中的微镜分别以足够的力向上或向下吸引，以超过微镜的双稳态阈值，并将微镜分别偏转到其暗和白色状态。 剩余的非启用行中的微镜上的吸引力不足以超过微镜的双稳态阈值，使得微镜保持在其当前的稳定状态。
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公开(公告)号：US6034810A
公开(公告)日：2000-03-07
申请号：US172612
申请日：1998-10-15
CPC分类号： G02B26/0841 , H04N5/7458
摘要： A bright, high contrast, compact, large area, high-resolution light modulator uses a field emitter array (FEA) to address a charge controlled mirror (CCM). The FEA deposits a charge pattern onto the CCM, which in turn produces electrostatic forces that deflect the micromirrors in accordance with the amount of accumulated charge. The CCM that is used in combination with the FEA can be configured in many different ways to implement different actuation modes, e.g. attractive, repulsive, grid-actuated or membrane-actuated and different charge control modes, e.g. RC decay, RC sustain and charge control.
摘要翻译： 明亮，高对比度，紧凑，大面积的高分辨率光调制器使用场致发射阵列（FEA）来寻址电荷控制镜（CCM）。 FEA将电荷模式放置在CCM上，CCM又产生根据累积电荷的量使微镜偏转的静电力。 与FEA组合使用的CCM可以以许多不同的方式配置以实现不同的致动模式，例如， 有吸引力的，排斥的，栅格驱动的或膜致动的和不同的电荷控制模式，例如 RC衰减，RC持续和充电控制。
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公开(公告)号：US06031656A
公开(公告)日：2000-02-29
申请号：US179933
申请日：1998-10-28
CPC分类号： G02B26/0841
摘要： A flat-panel direct view display positions an array of electrostatically-actuated cantilevered micromirrors in front of a contrasting background and opposite a flat-panel electron beam source. Depending upon the display configuration, the electron beam source addresses either the array of micromirrors or a reference surface a row at a time while the other is held at a reference potential. The electron beams modulate the potential difference between each micromirror and the reference surface thereby adjusting the magnitude of the attractive electrostatic force between the two. This in turn modulates the deflection of the micromirrors between their quiescent and fully actuated states to selectively cover and uncover the background thereby producing a grey scale direct-view image.
摘要翻译： 平板直视图显示了在对比背景之前的静电驱动的悬臂微镜阵列，并且与平板电子束源相反。 根据显示结构，电子束源一次寻址微镜阵列或参考表面，而另一个保持在参考电位。 电子束调制每个微镜与参考表面之间的电位差，从而调节两者之间吸引静电力的大小。 这反过来调制微镜在其静态和完全致动状态之间的偏转，以选择性地覆盖和揭开背景，从而产生灰度直视图像。
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公开(公告)号：US5768009A
公开(公告)日：1998-06-16
申请号：US844248
申请日：1997-04-18
申请人： Michael J. Little
发明人： Michael J. Little
CPC分类号： G02B26/0841 , H04N5/7425 , H04N5/7458 , H04N9/3141
摘要： A high intensity image projection system includes a micro-mirror light valve target with micro-mirror elements repulsively pivotally-actuable. Each micro-mirror of the target array comprises a fixed base electrode joined to an overlying micro-mirror element by means of a hinge with each element formed of conductive material. As such, in operation, charge deposited upon either the base electrode or the micro-mirror element is free to migrate, in response to repulsive forces between deposited charges, to the element spaced therefrom. The resulting presence of like charge distributions upon the base electrode and micro-mirror element of a micro-mirror produces a repulsive electrostatic force for pivotally deflecting the micro-mirror element by an amount proportional to the charge deposited thereon. Capacitive charge storage elements and resistive paths are provided for storing and draining the deposited charge between applications of video frame information. In one embodiment, an array of micro-mirror light valves is formed directly upon the face plate of a vidicon tube. In another, a foil is formed that is mounted within the tube by a surrounding clip. In a third embodiment, charge is delivered through a matrix of transistors.
摘要翻译： 高强度图像投影系统包括具有微反射镜元件的微反射镜光阀，该微反射镜元件以可逆转的方式驱动。 目标阵列的每个微反射镜包括通过铰链连接到上覆微镜元件的固定基极，每个元件由导电材料形成。 因此，在操作中，沉积在基极或微镜元件上的电荷响应于沉积的电荷之间的排斥力自由迁移到与其间隔开的元件。 在微镜的基极和微镜元件上产生类似电荷分布的结果产生排斥静电力，用于使微镜元件枢转偏转与沉积在其上的电荷成比例的量。 提供电容性电荷存储元件和电阻性路径，用于在存储和排出在视频帧信息的应用之间的沉积电荷。 在一个实施例中，微镜光阀阵列直接形成在摄像管的面板上。 另一方面，通过周围的夹子形成安装在管内的箔片。 在第三实施例中，电荷通过晶体管矩阵传送。
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37.发明授权Method for fabricating resilient z-axis contacts for electrically interconnecting integrated circuits on a plurality of stacked carriers 失效用于制造用于将多个堆叠载体上的集成电路电连接的弹性z轴接触件的方法
公开(公告)号：US5744284A
公开(公告)日：1998-04-28
申请号：US835627
申请日：1997-04-09
CPC分类号： H01L25/50 , G03F7/00 , H01L21/4853 , H01L23/49811 , H01L24/01 , H05K3/4092 , H01L2224/16 , H01L2924/09701 , H01L2924/14
摘要： A method for fabricating resilient z-axis contacts to electrically interconnect IC wafers or MCMs in 3-D integrated circuits uses photolithography to provide larger carrier sizes, higher contact densities by decreasing the spacing, smaller contact footpads, and precise control of the contact's shape and position. The contacts are fabricated by forming photoresist patterns on the carrier's top and bottom surfaces that are initially rectangular, and then reflowing the photoresist materials to provide smooth surfaces suitable for forming the metal contacts, and depositing metal layers over the respective patterns. Second photoresist patterns are formed over respective metal layers to conform with the contact's shape, the metal is etched away according to the pattern, and the photoresists are removed such that the remaining metalization forms a resilient z-axis contact that is attached to the carrier and extends therefrom with a predetermined shape.
摘要翻译： 用于制造弹性z轴接触以在3-D集成电路中电连接IC晶片或MCM的方法使用光刻法通过减小间隔，较小的接触脚垫和接触件形状的精确控制来提供更大的载体尺寸，更高的接触密度， 位置。 通过在最初为矩形的载体的顶部和底部表面上形成光致抗蚀剂图案，然后回流光致抗蚀剂材料以提供适合于形成金属接触的光滑表面，以及在相应的图案上沉积金属层来制造触点。 在相应的金属层上形成第二光致抗蚀剂图案以符合接触件的形状，根据图案将金属蚀刻掉，并且除去光致抗蚀剂，使得剩余的金属化形成连接到载体的弹性z轴接触， 以预定的形状从其延伸。
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公开(公告)号：US5665648A
公开(公告)日：1997-09-09
申请号：US577680
申请日：1995-12-21
申请人： Michael J. Little
发明人： Michael J. Little
IPC分类号： H01L21/60 , H01L23/48 , H01L23/485 , H01L23/498 , H05K3/40
CPC分类号： H01L24/72 , H01L23/485 , H01L23/49811 , H01L24/11 , H05K3/4092 , H01L2224/13099 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01022 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01049 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/12042 , H01L2924/14 , H01L2924/19041 , H01L2924/19042 , H01L2924/3011
摘要： An integrated-circuit interconnect which can be formed at the wafer level is achieved by depositing an intentionally stressed contact layer over a release layer which is subsequently removed. The removal of the release layer permits a portion of the contact layer to curve away from the surface of an integrated circuit chip. The result is a spring contact having a base portion joined to a metal member of the chip and a spring portion which is available for joining to other metal members, e.g., on a substrate or another chip. The resilience of the spring portion can also be used to position and align integrated circuit elements.
摘要翻译： 可以在晶片级形成的集成电路互连通过将有意应力的接触层沉积在随后被去除的释放层上来实现。 去除释放层允许接触层的一部分曲线远离集成电路芯片的表面。 结果是具有接合到芯片的金属构件的基部的弹簧触点和可用于接合到其它金属构件的弹簧部分，例如在基板或另一芯片上。 弹簧部分的弹性也可用于定位和对准集成电路元件。
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公开(公告)号：US4807976A
公开(公告)日：1989-02-28
申请号：US33319
申请日：1987-04-01
申请人： Michael J. Little , Uzi Efron , Paul O. Braatz , Robert N. Schwartz , Yuri Owechko , Murray S. Welkowsky
发明人： Michael J. Little , Uzi Efron , Paul O. Braatz , Robert N. Schwartz , Yuri Owechko , Murray S. Welkowsky
CPC分类号： G02F1/133348 , G02F1/135
摘要： A pulsed readout technique is described for liquid crystal light valves which eliminates the problem of readout beam leakage through the light valve mirror. The readout beam is pulsed on only when the light valve's semiconductor layer is out of a depletion state. This can occur during an accumulation state or, in certain applications, during a specially inserted quiescent period in the light valve voltage cycle. The invention is applicable to light valves with various types of modulating inputs, and can be used with either dielectric or metal matrix mirrors.
摘要翻译： 对于液晶光阀描述了脉冲读出技术，其消除了通过光阀镜的读出光束泄漏的问题。 只有当光阀的半导体层处于耗尽状态时，读出光束才被脉冲。 这可能在累积状态期间或在某些应用中，在光阀电压循环中的特别插入的静止期间发生。 本发明适用于具有各种调制输入的光阀，可用于电介质或金属矩阵镜。
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公开(公告)号：US4470856A
公开(公告)日：1984-09-11
申请号：US464442
申请日：1983-02-07
IPC分类号： G01J1/02 , B21D22/10 , G01B11/26 , H01L20060101 , H01L21/302 , H01L21/66 , H01L31/02 , H01L31/0203 , H01L31/0232 , G01B11/06
CPC分类号： H01L21/0201 , G01B11/26 , H01L31/0203
摘要： A semiconductive substrate, such as a silicon wafer, is mounted on a baseplate for inclusion in an optical device such as a liquid crystal light valve. An optical flat presses the top surface of silicon wafer toward the baseplate and against an O-ring seal surrounding a fluid adhesive. The fluid adhesive hydrostatically distributes the force of compression to guarantee optical flatness and self-compensation for the amount fluid adhesive surrounded by the O-ring. The optical flatness of the semiconductor substrate is limited only by the flatness of the optical flat against which it is compressed. Parallel alignment of the optical flat, the substrate and the baseplate is achieved by reflecting a laser beam through the semiconductive substrate and observing the interference fringes therein, while adjusting the relative alignment so as to maximize the distance between fringes.
摘要翻译： 诸如硅晶片的半导体基板安装在基板上以包含在诸如液晶光阀的光学装置中。 光学平面将硅晶片的顶表面压向底板并且抵靠围绕流体粘合剂的O形圈密封件。 流体粘合剂可以流体分配压缩力，以保证由O形环包围的流体粘合剂的光学平面度和自我补偿。 半导体衬底的光学平面度仅受到被压缩的光学平面的平坦度的限制。 通过将激光束反射通过半导体基片并观察其中的干涉条纹，同时调整相对对准以使条纹之间的距离最大化，来实现光学平面，基底和基板的平行对准。
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