Thin film transistor array having a stacked multi-layer metal oxide channel formation region

    公开(公告)号:US12278291B2

    公开(公告)日:2025-04-15

    申请号:US17296358

    申请日:2019-11-21

    Abstract: A semiconductor device having favorable electrical characteristics is provided. The semiconductor device includes a plurality of transistors; each of the plurality of transistors includes a first insulator, a first oxide, a second oxide, a first conductor, a second conductor, a third oxide, a second insulator, and a third conductor; the third oxide included in one of the plurality of transistors and the third oxide included in another of the plurality of transistors, which is adjacent to the one of the plurality of transistors, are provided to be apart from each other in the channel width direction of the plurality of transistors; the second insulator included in one of the plurality of transistors includes a region continuous with the second insulator included in another of the plurality of transistors, which is adjacent to the one of the plurality of transistors; and the third conductor included in one of the plurality of transistors includes a region continuous with the third conductor included in another of the plurality of transistors, which is adjacent to the one of the plurality of transistors.

    Memory device comprising first through fourth transistors

    公开(公告)号:US11205461B2

    公开(公告)日:2021-12-21

    申请号:US16625826

    申请日:2018-06-19

    Abstract: A memory device that operates at high speed is provided.
    The memory device includes first and second memory cells, first and second bit lines, first and second switches, and a sense amplifier. The sense amplifier comprises a first node and a second node. The first memory cell is electrically connected to the first node through the first bit line and the first switch, and the second memory cell is electrically connected to the second node through the second bit line and the second switch. The sense amplifier amplifies the potential difference between the first node and the second node. The first memory cell and the second memory cell include an oxide semiconductor in a channel formation region.

    Storage device, semiconductor device, electronic component, and electronic device

    公开(公告)号:US10860080B2

    公开(公告)日:2020-12-08

    申请号:US16476642

    申请日:2018-01-09

    Abstract: To reduce the area of a memory cell having a backup function. A storage device includes a cell array, and a row circuit and a column circuit that drive the cell array. The cell array includes a first power supply line, a second power supply line, a word line, a pair of bit lines, a memory cell, and a backup circuit. The cell array is located in a power domain where power gating can be performed. In the power gating sequence of the cell array, data in the memory cell is backed up to the backup circuit. The backup circuit is stacked over a region where the memory cell is formed. A plurality of wiring layers are provided between the backup circuit and the memory cell. The first power supply line, the second power supply line, the word line, and the pair of bit lines are located in different wiring layers.

    Electric power charge and discharge system

    公开(公告)号:US10658877B2

    公开(公告)日:2020-05-19

    申请号:US15822483

    申请日:2017-11-27

    Abstract: An electric power charge and discharge system for an electronic device having a battery, by which the electronic device can be used for a long period of time. In a wireless communication device including a wireless driving portion including a first battery and a wireless charging portion including a second battery, the first battery is charged by electric power from a fixed power supply and the second battery is charged by using electromagnetic waves existing in an external space. Further, the first battery and the second battery are discharged alternately, and during a period in which the first battery is discharged, the second battery is charged.

    Semiconductor device
    36.
    发明授权

    公开(公告)号:US10453846B2

    公开(公告)日:2019-10-22

    申请号:US14287285

    申请日:2014-05-27

    Abstract: A semiconductor device in which stored data can be held even when power is not supplied and there is no limitation on the number of writing operations is provided. A semiconductor device is formed using a material which can sufficiently reduce the off-state current of a transistor, such as an oxide semiconductor material that is a wide-gap semiconductor. When a semiconductor material which can sufficiently reduce the off-state current of a transistor is used, the semiconductor device can hold data for a long period. In addition, by providing a capacitor or a noise removal circuit electrically connected to a write word line, a signal such as a short pulse or a noise input to a memory cell can be reduced or removed. Accordingly, a malfunction in which data written into the memory cell is erased when a transistor in the memory cell is instantaneously turned on can be prevented.

    Semiconductor device
    38.
    发明授权

    公开(公告)号:US10217752B2

    公开(公告)日:2019-02-26

    申请号:US15591150

    申请日:2017-05-10

    Abstract: [Problem] To provide a semiconductor device suitable for miniaturization. To provide a highly reliable semiconductor device. To provide a semiconductor device with improved operating speed.[Solving Means] A semiconductor device including a memory cell including first to cth (c is a natural number of 2 or more) sub memory cells, wherein: the jth sub memory cell includes a first transistor, a second transistor, and a capacitor; a first semiconductor layer included in the first transistor and a second semiconductor layer included in the second transistor include an oxide semiconductor; one of terminals of the capacitor is electrically connected to a gate electrode included in the second transistor; the gate electrode included in the second transistor is electrically connected to one of a source electrode and a drain electrode which are included in the first transistor; and when j≥2, the jth sub memory cell is arranged over the j−1th sub memory cell.

    Semiconductor device including transistor and capacitor

    公开(公告)号:US10217736B2

    公开(公告)日:2019-02-26

    申请号:US14492412

    申请日:2014-09-22

    Abstract: A highly integrated semiconductor device including a transistor and a capacitor which occupies a small area for the required on-state current and required capacitance is provided. The semiconductor device includes a semiconductor, first and second conductive films each in contact with top and side surfaces of the semiconductor, a first insulating film in contact with the top and side surfaces of the semiconductor, a third conductive film facing the top and side surfaces of the semiconductor with the first insulating film therebetween, a second insulating film which is in contact with the first conductive film and comprises an opening, a fourth conductive film in contact with the opening, a third insulating film facing the opening with the fourth conductive film therebetween, and a fifth conductive film facing the fourth conductive film with the third insulating film therebetween.

Patent Agency Ranking