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    Optical gratings, lithography tools including such optical gratings and methods for using same for alignment
    34.
    发明申请
    Optical gratings, lithography tools including such optical gratings and methods for using same for alignment 失效
    光栅，包括这种光栅的光刻工具和用于对准的方法

    公开(公告)号：US20080094629A1

    公开(公告)日：2008-04-24

    申请号：US11584461

    申请日：2006-10-20

    申请人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

    发明人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

    IPC分类号： G01B11/00

    CPC分类号： G03F9/7049 ,  G03F9/7003

    摘要： Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the relative position between a substrate and lithography tool is adjusted to cause at least one geometric shape to have a predetermined size or shape representing acceptable alignment. In additional embodiments, Moiré patterns that exhibit varying sensitivity are used to align substrates and lithography tools. Furthermore, lithography tools and substrates are aligned by causing radiation to interact with optical gratings positioned between the lithography tools and substrates. Lithography tools include an optical grating configured to generate a portion of an interference pattern that exhibits a sensitivity that increases as the relative position between the tools and a substrate moves towards a predetermined alignment position.

    摘要翻译： 通过使用与光刻工具和衬底相关的光栅产生几何干涉图案来对准平版印刷工具和衬底。 在一些实施例中，调整衬底和光刻工具之间的相对位置以使得至少一个几何形状具有表示可接受对准的预定尺寸或形状。 在另外的实施例中，使用呈现不同灵敏度的莫尔图案来对准衬底和光刻工具。 此外，光刻工具和衬底通过使辐射与位于光刻工具和衬底之间的光栅相互作用来对准。 平版印刷工具包括光栅，其被配置为产生表现出灵敏度的一部分干涉图案，该灵敏度随着工具和基板之间的相对位置朝向预定对准位置移动而增加。

    Raman signal-enhancing structures and devices
    36.
    发明申请
    Raman signal-enhancing structures and devices 有权
    拉曼信号增强结构和器件

    公开(公告)号：US20070252982A1

    公开(公告)日：2007-11-01

    申请号：US11413910

    申请日：2006-04-28

    申请人： Shih-Yuan Wang ,  R. Williams ,  Raymond Beausoleil ,  Theodore Kamins ,  Zhiyong Li ,  Wei Wu

    发明人： Shih-Yuan Wang ,  R. Williams ,  Raymond Beausoleil ,  Theodore Kamins ,  Zhiyong Li ,  Wei Wu

    IPC分类号： G01J3/44 ,  G01N21/65

    CPC分类号： G01N21/658 ,  G01J3/44

    摘要： Raman systems include a radiation source, a radiation detector, and a Raman device or signal-enhancing structure. Raman devices include a tunable resonant cavity and a Raman signal-enhancing structure coupled to the cavity. The cavity includes a first reflective member, a second reflective member, and an electro-optic material disposed between the reflective members. The electro-optic material exhibits a refractive index that varies in response to an applied electrical field. Raman signal-enhancing structures include a substantially planar layer of Raman signal-enhancing material having a major surface, a support structure extending from the major surface, and a substantially planar member comprising a Raman signal-enhancing material disposed on an end of the support structure opposite the layer of Raman signal-enhancing material. The support structure separates at least a portion of the planar member from the layer of Raman signal-enhancing material by a selected distance of less than about fifty nanometers.

    摘要翻译： 拉曼系统包括辐射源，辐射检测器和拉曼器件或信号增强结构。 拉曼器件包括耦合到空腔的可调谐谐振腔和拉曼信号增强结构。 空腔包括第一反射构件，第二反射构件和设置在反射构件之间的电光材料。 电光材料表现出响应于所施加的电场而变化的折射率。 拉曼信号增强结构包括具有主表面的基本平坦的拉曼信号增强材料层，从主表面延伸的支撑结构和包括设置在支撑结构的端部上的拉曼信号增强材料的基本上平面的构件 与拉曼信号增强材料层相对。 支撑结构将平面构件的至少一部分与拉曼信号增强材料层分开小于约五十纳米的选定距离。

    Contact lithography apparatus, system and method
    37.
    发明申请
    Contact lithography apparatus, system and method 审中-公开
    接触光刻设备，系统和方法

    公开(公告)号：US20070035717A1

    公开(公告)日：2007-02-15

    申请号：US11580621

    申请日：2006-10-13

    申请人： Wei Wu ,  Shih-Yuan Wang ,  Zhiyong Li ,  Robert Walmsley

    发明人： Wei Wu ,  Shih-Yuan Wang ,  Zhiyong Li ,  Robert Walmsley

    IPC分类号： G03B27/02

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/7035

    摘要： A contact lithography system includes a patterning tool bearing a pattern; a substrate chuck for chucking a substrate to receive the pattern from the patterning tool; where the system deflects a portion of either the patterning tool or the substrate to bring the patterning tool and a portion of the substrate into contact; and a stepper for repositioning either or both of the patterning tool and substrate to align the pattern with an additional portion of the substrate to also receive the pattern. A method of performing contact lithography comprising: deflecting a portion of either a patterning tool or a substrate to bring the patterning tool and a portion of the substrate into contact; and repositioning either or both of the patterning tool and substrate to align a pattern on the patterning tool with an additional portion of the substrate to also receive the pattern.

    摘要翻译： 接触光刻系统包括具有图案的图案形成工具; 用于夹持基板以从图案形成工具接收图案的基板卡盘; 其中所述系统使所述图案化工具或所述衬底的一部分偏转以使所述图案形成工具和所述衬底的一部分接触; 以及步进器，用于重新定位图案形成工具和衬底中的一个或两个，以使图案与衬底的附加部分对准以也接收图案。 一种执行接触光刻的方法，包括：使图案形成工具或衬底的一部分偏转以使所述图案化工具和所述衬底的一部分接触; 以及重新定位所述图案形成工具和衬底中的一个或两个，以将所述图案形成工具上的图案与所述衬底的附加部分对准以也接收所述图案。

    Integrated modular system and method for enhanced Raman spectroscopy
    38.
    发明申请
    Integrated modular system and method for enhanced Raman spectroscopy 有权
    用于增强拉曼光谱的集成模块化系统和方法

    公开(公告)号：US20060164636A1

    公开(公告)日：2006-07-27

    申请号：US11044676

    申请日：2005-01-27

    申请人： M. Islam ,  Shih-Yuan Wang ,  Wei Wu ,  Zhiyong Li ,  R. Williams

    发明人： M. Islam ,  Shih-Yuan Wang ,  Wei Wu ,  Zhiyong Li ,  R. Williams

    IPC分类号： G01J3/44 ,  G01N21/65

    CPC分类号： G01N21/658 ,  G01J3/44 ,  H01L31/02325 ,  H01L31/105

    摘要： Devices, systems, and methods for enhancing Raman spectroscopy and hyper-Raman are disclosed. A molecular analysis device for performing Raman spectroscopy comprises a substrate and a laser source disposed on the substrate. The laser source may be configured for emanating a laser radiation, which may irradiate an analyte disposed on a Raman enhancement structure. The Raman enhancement structure may be disposed on the substrate or apart from the substrate. The molecular analysis device also include a radiation receiver disposed on the substrate and configured for receiving a Raman scattered radiation, which may be generated by the irradiation of the analyte and Raman enhancement structure.

    摘要翻译： 公开了用于增强拉曼光谱和超拉曼的装置，系统和方法。 用于执行拉曼光谱的分子分析装置包括设置在基板上的基板和激光源。 激光源可以被配置为发射激光辐射，其可照射设置在拉曼增强结构上的分析物。 拉曼增强结构可以设置在基板上或者离开基板。 分子分析装置还包括设置在基板上并被配置为用于接收可以通过分析物的照射和拉曼增强结构产生的拉曼散射辐射的辐射接收器。

    Composite material with powered resonant cells
    39.
    发明申请
    Composite material with powered resonant cells 失效
    具有电源谐振电池的复合材料

    公开(公告)号：US20060044212A1

    公开(公告)日：2006-03-02

    申请号：US10931148

    申请日：2004-08-30

    申请人： Shih-Yuan Wang ,  Philip Kuekes ,  Wei Wu ,  Joseph Straznicky ,  M. Islam

    发明人： Shih-Yuan Wang ,  Philip Kuekes ,  Wei Wu ,  Joseph Straznicky ,  M. Islam

    IPC分类号： H01Q15/08

    CPC分类号： H01Q3/44 ,  H01Q15/0086

    摘要： A composite material and related methods are described, the composite material being configured to exhibit a negative effective permittivity and/or a negative effective permeability for incident radiation at an operating wavelength, the composite material comprising an arrangement of electromagnetically reactive cells of small dimension relative to the operating wavelength. Each cell includes an externally powered gain element for enhancing a resonant response of that cell to the incident radiation at the operating wavelength.

    摘要翻译： 描述了复合材料和相关方法，所述复合材料被配置为对于在工作波长处的入射辐射呈现负的有效介电常数和/或负的有效磁导率，所述复合材料包括相对于 工作波长。 每个单元包括外部供电的增益元件，用于增强该单元在工作波长处的入射辐射的谐振响应。