公开(公告)号：US08399867B2

公开(公告)日：2013-03-19

申请号：US12566170

申请日：2009-09-24

申请人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

发明人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

IPC分类号： H04H1/04

CPC分类号： H05G2/003 ,  H05G2/001 ,  H05G2/008

摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.

摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

公开(公告)号：US08300819B2

公开(公告)日：2012-10-30

申请号：US10374680

申请日：2003-02-25

申请人： Haruhiko Sakaguchi ,  Tomihiko Nakajima ,  Yoshifumi Ueno ,  Tetsuo Sasaki ,  Osamu Aoki ,  Akinori Iida ,  Masayuki Kobuna ,  Shinichiro Taya ,  Kazuhiro Gotoh ,  Toshiyuki Gotoh, legal representative ,  Motohiro Ohama

发明人： Haruhiko Sakaguchi ,  Tomihiko Nakajima ,  Yoshifumi Ueno ,  Tetsuo Sasaki ,  Osamu Aoki ,  Akinori Iida ,  Masayuki Kobuna ,  Shinichiro Taya ,  Kazuhiro Gotoh ,  Motohiro Ohama

IPC分类号： H04N7/167

CPC分类号： G06F21/31 ,  G06F2221/2129

摘要： In service providing apparatus and method, system identification data for specifying a service target device and the user of the device concerned are issued to the device concerned, and authentication processing is carried out on the basis of the system identification data to provide a service to the device concerned.

摘要翻译： 在服务提供装置和方法中，向所涉及的装置发布用于指定服务对象装置和相关装置的用户的系统识别数据，并且基于系统识别数据进行认证处理，以向 相关设备

公开(公告)号：US20120097869A1

公开(公告)日：2012-04-26

申请号：US13274991

申请日：2011-10-17

申请人： Yoshifumi Ueno ,  Georg Soumagne ,  Shiniji Nagai ,  Akira Endo ,  Tatsuya Yanagida

发明人： Yoshifumi Ueno ,  Georg Soumagne ,  Shiniji Nagai ,  Akira Endo ,  Tatsuya Yanagida

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  H05G2/008

摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.

摘要翻译： 在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向 通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率 相对于离子小于一个原子/离子。

公开(公告)号：US08129700B2

公开(公告)日：2012-03-06

申请号：US12150077

申请日：2008-04-24

申请人： Yoshifumi Ueno ,  Masato Moriya ,  Masaki Nakano ,  Hiroshi Komori

发明人： Yoshifumi Ueno ,  Masato Moriya ,  Masaki Nakano ,  Hiroshi Komori

IPC分类号： H05G2/00

CPC分类号： B08B17/02 ,  H05G2/003 ,  H05G2/008

摘要： Solid tin (Sn) is used as a target, a CO2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by exciting the solid tin by a laser beam outputted from the CO2 laser, the emitted debris of a nanometer or smaller size is acted upon so as not to reach the optical element. In accordance with the present invention, in the EUV light source apparatus, the debris emitted together with EUV light from plasma generated by exciting a target within a chamber by a laser beam is prevented from adhering to an optical element provided within the chamber and forming a metal film. As a result, the service life of the optical element can be extended.

摘要翻译： 使用固体锡（Sn）作为目标，使用CO 2激光作为靶的激发源，并且在通过激光束激发固体锡后，从等离子体发射的碎片的尺寸减小到纳米或更小的尺寸之后 从CO 2激光器输出的纳米尺寸或更小尺寸的发射碎片被作用到不会到达光学元件。 根据本发明，在EUV光源装置中，防止了通过用激光束激发室内的目标物而产生的来自等离子体的EUV光一起发射的碎片附着在设置在室内的光学元件，并形成 金属膜。 结果，可以延长光学元件的使用寿命。

公开(公告)号：US20110284775A1

公开(公告)日：2011-11-24

申请号：US13196311

申请日：2011-08-02

申请人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

发明人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

IPC分类号： G01J3/10 ,  G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.

摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，从激光装置输出的激光束通过该入口进入室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 用于在预定区域中产生磁场的磁场产生单元; 以及带电粒子收集单元，其设置在所述磁场的磁通方向上，用于收集带电粒子，所述带电粒子是当所述靶材料被所述腔室内的所述激光束照射并且沿着所述磁通量行进时产生的。

公开(公告)号：US20080267816A1

公开(公告)日：2008-10-30

申请号：US12150077

申请日：2008-04-24

申请人： Yoshifumi Ueno ,  Masato Moriya ,  Masaki Nakano ,  Hiroshi Komori

发明人： Yoshifumi Ueno ,  Masato Moriya ,  Masaki Nakano ,  Hiroshi Komori

IPC分类号： A61L2/00

CPC分类号： B08B17/02 ,  H05G2/003 ,  H05G2/008

摘要： Solid tin (Sn) is used as a target, a CO2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by exciting the solid tin by a laser beam outputted from the CO2 laser, the emitted debris of a nanometer or smaller size is acted upon so as not to reach the optical element. In accordance with the present invention, in the EUV light source apparatus, the debris emitted together with EUV light from plasma generated by exciting a target within a chamber by a laser beam is prevented from adhering to an optical element provided within the chamber and forming a metal film. As a result, the service life of the optical element can be extended.

摘要翻译： 使用固体锡（Sn）作为目标，使用CO 2激光作为靶的激发源，并且在从等离子体发射的碎片的尺寸通过以下方式减小到纳米或更小的尺寸之后 通过从CO 2激光器输出的激光束激发固体锡，发射的纳米或更小尺寸的碎片被作用到不会到达光学元件。 根据本发明，在EUV光源装置中，防止了通过用激光束激发室内的目标物而产生的来自等离子体的EUV光一起发射的碎片附着在设置在室内的光学元件，并形成 金属膜。 结果，可以延长光学元件的使用寿命。

公开(公告)号：US20070228298A1

公开(公告)日：2007-10-04

申请号：US11730139

申请日：2007-03-29

申请人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

发明人： Hiroshi Komori ,  Yoshifumi Ueno ,  Georg Soumagne

IPC分类号： G21G4/00

CPC分类号： G21K5/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.

摘要翻译： 激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。 极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。

公开(公告)号：US20070193770A1

公开(公告)日：2007-08-23

申请号：US11569490

申请日：2005-04-21

申请人： Yoshifumi Ueno ,  Hiroshi Takamatsu ,  Noriaki Kudo

发明人： Yoshifumi Ueno ,  Hiroshi Takamatsu ,  Noriaki Kudo

IPC分类号： H01B7/08

CPC分类号： H01B7/0861

摘要： The FFC (50) comprises multiple conductors (51) with widths of 0.3 (±0.03)mm arranged in a parallel manner with a pitch of 0.5 (±0.05)mm, the first insular material (52) and the second insular material (53) sandwiching these conductors (51) from both sides, shield material (54), and the reinforcement board (55). The first insular material (52) is porous PET possessing a 34 μm thick porous layer (62) and the shield material (54) is a polymer-based shield material possessing a shield layer made of a polymer-based conductive layer (69) equal to or less than 20 μm thick that is a prescribed resin formed including air with uniformly dispersed conductive particles. Due to this, the FFC (50) maintains the shield effect without damaging the electrical characteristics and also, along with being compatible with existing connecters, can combine with the electrical traits by existing processes and furthermore is capable of being established with any number of wires, any length of cable, and any alignment of wiring.

摘要翻译： FFC（50）包括宽度为0.3（±0.03）mm的多个导体（51），平行方式以0.5（±0.05）mm的间距布置，第一岛状材料（52）和第二岛状材料（53） ）从两侧夹持这些导体（51），屏蔽材料（54）和加强板（55）。 第一岛状材料（52）是具有34μm厚的多孔层（62）的多孔PET，并且屏蔽材料（54）是具有由聚合物基导电层（69）制成的屏蔽层的聚合物基屏蔽材料 至少为20μm的厚度，其是形成包括具有均匀分散的导电颗粒的空气的规定树脂。 因此，FFC（50）保护屏蔽效果而不损害电气特性，并且与现有连接器兼容，可以通过现有工艺与电气特性相结合，并且还可以建立任何数量的电线 ，任何长度的电缆，以及任何布线对齐。

公开(公告)号：US07095773B2

公开(公告)日：2006-08-22

申请号：US10094889

申请日：2002-03-12

申请人： Kiyoharu Nakao ,  Yoshifumi Ueno

发明人： Kiyoharu Nakao ,  Yoshifumi Ueno

IPC分类号： H01S3/223

CPC分类号： H01S3/10092 ,  H01S3/0818 ,  H01S3/09702 ,  H01S3/1301 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/223 ,  H01S3/225

摘要： An injection locking type or MOPA type of laser device capable of always providing stable output energy and wavelength is provided. For this purpose, the laser device includes an oscillator for exciting laser gas by oscillator discharge and oscillating seed laser light with band-narrowed wavelength, an amplifier for amplifying the seed laser light by amplification discharge to emit amplified laser light, a delay circuit for setting at least one of a delay time from light emission of the seed laser light to light emission of the amplified laser light, and a delay time from start of the oscillator discharge to start of the aforementioned amplification discharge, and a delay time compensation circuit for performing compensation of the delay circuit so that the delay time becomes an optimal delay time.

公开(公告)号：US20050281306A1

公开(公告)日：2005-12-22

申请号：US11212874

申请日：2005-08-29

申请人： Kiyoharu Nakao ,  Yoshifumi Ueno

发明人： Kiyoharu Nakao ,  Yoshifumi Ueno

IPC分类号： H01S3/134 ,  H01S3/223 ,  H01S3/23 ,  H01S3/22

CPC分类号： H01S3/10092 ,  H01S3/0818 ,  H01S3/09702 ,  H01S3/1301 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/223 ,  H01S3/225

摘要： An injection locking type or MOPA type of laser device capable of always providing stable output energy and wavelength is provided. For this purpose, the laser device includes an oscillator for exciting laser gas by oscillator discharge and oscillating seed laser light with band-narrowed wavelength, an amplifier for amplifying the seed laser light by amplification discharge to emit amplified laser light, a delay circuit for setting at least one of a delay time from light emission of the seed laser light to light emission of the amplified laser light, and a delay time from start of the oscillator discharge to start of the aforementioned amplification discharge, and a delay time compensation circuit for performing compensation of the delay circuit so that the delay time becomes an optimal delay time.

摘要翻译： 提供了能够始终提供稳定的输出能量和波长的注入锁定型或MOPA型激光器件。 为此，激光装置包括通过振荡器放电激发激光气体的振荡器和具有带窄波长的振荡种子激光器，用于通过放大放大来放大种子激光以发射放大激光的放大器，用于设置的延迟电路 从种子激光的发光到放大的激光的发光的延迟时间以及从振荡器放电开始到上述放大放电的开始的延迟时间中的至少一个，以及延迟时间补偿电路，用于执行 延迟电路的补偿，使得延迟时间成为最佳的延迟时间。