公开(公告)号：US20060154179A1

公开(公告)日：2006-07-13

申请号：US11030326

申请日：2005-01-07

Applicant: Helmar Van Santen ,  Aleksey Kolesnychenko ,  Jacobus Neijzen ,  Emile Verstegen

Inventor： Helmar Van Santen ,  Aleksey Kolesnychenko ,  Jacobus Neijzen ,  Emile Verstegen

IPC: G03C5/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.

Abstract translation: 公开了一种压印方法，其包括在辐射下以可流动状态在基板上照射可光固化的可印刷介质以引发介质的固化，在照射之后，使介质与模板接触以在介质中形成印记， 介质基本上固化，使得介质处于基本不可流动的状态，同时介质与模板接触，并且当介质处于基本上不可流动的状态时将模板与介质分离。

公开(公告)号：US20050033463A1

公开(公告)日：2005-02-10

申请号：US10633307

申请日：2003-08-04

Applicant: Wim Tel ,  Harm Rossing ,  Suzan Auer-Jongepier

Inventor： Wim Tel ,  Harm Rossing ,  Suzan Auer-Jongepier

IPC: H01L21/027 ,  G05B23/02 ,  H01L21/00 ,  G06F19/00

CPC classification number: G05B23/0283 ,  G05B2219/32233 ,  H01L21/67276

Abstract: A method of scheduling one or more maintenance actions in at least a part of a substrate processing system is provided. According to an embodiment, the method includes determining a gap in the flow of substrates in a part of the substrate processing system and scheduling one or more maintenance actions to be performed in another part of the substrate processing during a period associated with the gap. An increase of productivity of substrate processing can be achieved through a reduction in downtime in a substrate processing system by appropriate scheduling of maintenance actions.

Abstract translation: 提供了一种在衬底处理系统的至少一部分中调度一个或多个维护动作的方法。 根据一个实施例，该方法包括确定衬底处理系统的一部分中的衬底流动中的间隙，并且调度在与间隙相关联的周期期间在衬底处理的另一部分中执行的一个或多个维护动作。 可以通过适当调整维护动作来减少基板处理系统中的停机时间来提高基板处理的生产率。

公开(公告)号：US20050031975A1

公开(公告)日：2005-02-10

申请号：US10844572

申请日：2004-05-13

Applicant: Maria Reuhman-Huisken ,  Christianus De Mol ,  Hoite Tolsma

Inventor： Maria Reuhman-Huisken ,  Christianus De Mol ,  Hoite Tolsma

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  G03F7/00

CPC classification number: G03F7/70616 ,  G03F7/70633 ,  G03F9/7003

Abstract: A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database.

Abstract translation: 公开了在晶片的处理期间监测基板晶片的变形的系统。 在一个实施例中，通过将多个参考标记的位置与数据库中的值进行比较，在每次曝光和处理操作之后测量衬底晶片中的失真。

公开(公告)号：US20050018155A1

公开(公告)日：2005-01-27

申请号：US10873647

申请日：2004-06-23

Applicant: Henrikus Herman Cox ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Helmar Santen

Inventor： Henrikus Herman Cox ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Helmar Santen

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/709 ,  G03F7/70341

Abstract: A lithographic projection apparatus wherein a liquid supply system provides a space between a projection system and a substrate with liquid. The liquid supply system comprises a member. A liquid seal is formed between the member and the substrate by a flow of liquid. In an embodiment, the liquid seal is formed by a flow of liquid from an inlet to an outlet of the member.

Abstract translation: 一种光刻投影装置，其中液体供应系统在投影系统和具有液体的基板之间提供空间。 液体供应系统包括一个构件。 通过液体流在构件和基板之间形成液体密封。 在一个实施例中，液体密封由液体从构件的入口到出口形成。

公开(公告)号：US12007693B2

公开(公告)日：2024-06-11

申请号：US17600763

申请日：2020-04-03

Applicant: ASML Netherlands B.V. ,  Trumpf Lasersystems For Semiconductor Manufacturing GmbH

Inventor： Ruud Antonius Catharina Maria Beerens ,  Nico Johannes Antonius Hubertus Boonen ,  Stefan Michael Bruno Bäumer ,  Tolga Mehmet Ergin ,  Andreas Kristian Hopf ,  Derk Jan Wilfred Klunder ,  Martin Anton Lambert ,  Stefan Piehler ,  Manisha Ranjan ,  Frank Bernhard Sperling ,  Andrey Sergeevich Tychkov ,  Jasper Witte ,  Jiayue Yuan

IPC: G03F7/00 ,  H01S3/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  H01S3/0071 ,  H05G2/008

Abstract: A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).

公开(公告)号：US20230333462A1

公开(公告)日：2023-10-19

申请号：US18022508

申请日：2021-08-05

Applicant: ASML NETHERLANDS B. V.

Inventor： Ties Wouter VAN DER WOORD ,  Alexander Ludwig KLEIN ,  Zomer Silvester HOUWELING ,  Inci DONMEZ NOYAN ,  Volker Dirk HILDENBRAND ,  Adrianus Johannes Maria HILDENBRAND ,  Johan Hendrik GIESBERS

IPC: G03F1/62 ,  G03F1/80

CPC classification number: G03F1/62 ,  G03F1/80

Abstract: A pellicle membrane for use in a lithographic apparatus, the pellicle membrane characterized by in plane variation in composition is described. A method of manufacturing a pellicle membrane, the method including: providing a first material layer on a sacrificial layer on a substrate; providing a photoresist layer on the first material layer; patterning the photoresist layer; etching the first material layer to form a patterned surface; and either i) depositing a layer of a second material on the patterned surface and subsequently lifting off the portion of the second material deposited on the patterned photoresist layer, or ii) removing the remaining photoresist layer, depositing a layer of a second material on the patterned surface, and subsequently planarizing the surface.

公开(公告)号：US20230288818A1

公开(公告)日：2023-09-14

申请号：US18017178

申请日：2021-06-14

Applicant: ASML Netherlands B,V.

Inventor： Wenjie JIN ,  Petrus Wilhelmus SMORENBURG ,  Nan LIN ,  Christina Lynn PORTER ,  David O'DWYER ,  Cord Louis ARNOLD ,  Sjoerd Nicolaas,Lambertus DONDERS

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70008

Abstract: Disclosed is an illumination source comprising a gas delivery system being configured to provide a gas target for generating an emitted radiation at an interaction region of the gas target, and an interferometer for illuminating at least part of the gas target with an interferometer radiation to measure a property of the gas target.

公开(公告)号：US20230221659A1

公开(公告)日：2023-07-13

申请号：US18116218

申请日：2023-03-01

Applicant: ASML NETHERLANDS B. V.

Inventor： Yongfeng NI ,  Ronald Franciscus Herman HUGERS ,  Andreas Johannes Antonius BROUNS

IPC: G02B3/00 ,  G02B27/30 ,  G03F7/20

CPC classification number: G02B3/00 ,  G02B27/30 ,  G03F7/7015 ,  G02B7/026

Abstract: An assembly for collimating broadband radiation, the assembly including: a convex refractive singlet lens having a first spherical surface for coupling the broadband radiation into the lens and a second spherical surface for coupling the broadband radiation out of the lens, wherein the first and second spherical surfaces have a common center; and a mount for holding the convex refractive singlet lens at a plurality of contact points having a centroid coinciding with the common center.

公开(公告)号：US20220252990A1

公开(公告)日：2022-08-11

申请号：US17625640

申请日：2020-07-07

Applicant: ASML Netherlands B,V.

Inventor： Narjes JAVAHERI ,  Maurits VAN DER SCHAAR ,  Tieh-Ming CHANG ,  Hilko Dirk BOS ,  Patrick WARNNAR ,  Samira BAHRAMI ,  Mohammadreza HAJIAHMADI ,  Sergey TARABRIN ,  Mykhailo SEMKIV

IPC: G03F7/20

Abstract: Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.

公开(公告)号：US11204239B2

公开(公告)日：2021-12-21

申请号：US16931832

申请日：2020-07-17

Applicant: ASML NETHERLANDS B. V.

Inventor： Kaustuve Bhattacharyya ,  Henricus Wilhelmus Maria Van Buel ,  Christophe David Fouquet ,  Hendrik Jan Hidde Smilde ,  Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Richard Johannes Franciscus Van Haren ,  Xing Lan Liu ,  Johannes Marcus Maria Beltman ,  Andreas Fuchs ,  Omer Abubaker Omer Adam ,  Michael Kubis ,  Martin Jacobus Johan Jak

IPC: G01B11/14 ,  G03F7/20

Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.