Surface buckling method and articles formed thereby
    31.
    发明授权
    Surface buckling method and articles formed thereby 有权
    表面屈曲方法和由此形成的制品

    公开(公告)号:US07858156B2

    公开(公告)日:2010-12-28

    申请号:US11944895

    申请日:2007-11-26

    摘要: A method for generating spontaneously aligned surface wrinkles utilizes control of local moduli-mismatch and osmotic pressure. The method includes modifying the surface of an elastomeric layer to form a superlayer that is stiffer and/or less absorbent than the elastomeric layer. The elastomeric layer is then swollen with a polymerizable monomer, which causes buckling of the superlayer. The monomer is then polymerized, dimensionally stabilizing the surface buckling. The budded surfaces generated by the method are useful in a wide variety of end-use applications, including microlenses, microlens arrays, compound microlenses, diffraction gratings, photonic crystals, smart adhesives, mechanical strain sensors, microfluidic devices, and cell culture surfaces.

    摘要翻译: 用于产生自发排列的表面皱纹的方法利用局部模量失配和渗透压的控制。 该方法包括改变弹性体层的表面以形成比弹性体层更硬和/或更少吸收性的超级层。 弹性体层然后用可聚合单体溶胀,这导致超层的翘曲。 然后将单体聚合,使表面屈曲的尺寸稳定。 通过该方法产生的发芽表面可用于各种最终用途应用,包括微透镜,微透镜阵列,复合微透镜,衍射光栅,光子晶体,智能粘合剂,机械应变传感器,微流体装置和细胞培养表面。

    Microlens, method of manufacturing microlens, and photomask used for manufacturing method
    32.
    发明授权
    Microlens, method of manufacturing microlens, and photomask used for manufacturing method 有权
    微透镜,微透镜的制造方法以及用于制造方法的光掩模

    公开(公告)号:US07843649B2

    公开(公告)日:2010-11-30

    申请号:US11790546

    申请日:2007-04-26

    申请人: Yoshinori Maeno

    发明人: Yoshinori Maeno

    IPC分类号: G02B3/08 G02B7/02

    摘要: A method of fabricating a microlens that serves to prevent damage thereto in the fabrication process is provided. First, a lens body of which the maximum height housed within a recess is lower than the height of the side wall of the recess is formed in the lens formation region by performing patterning that transfers the shape of a first resist pattern to a substrate by using the first resist pattern as an etching mask. Thereafter, a partial region of the substrate which is outside the lens formation region is removed to form an outline by using a second resist pattern as a mask.

    摘要翻译: 提供一种制造用于在制造过程中防止损坏的微透镜的方法。 首先,通过进行图案化,通过使用将第一抗蚀剂图案的形状转移到基板的图案形成在凹部中容纳在凹部内的最大高度低于凹部的侧壁的高度的透镜体, 作为蚀刻掩模的第一抗蚀剂图案。 此后,通过使用第二抗蚀剂图案作为掩模,去除透镜形成区域外部的基板的局部区域以形成轮廓。

    Method of fabricating tridimensional micro- and nanostructures as well as optical element assembly having a tridimensional convex structure obtained by the method
    33.
    发明授权
    Method of fabricating tridimensional micro- and nanostructures as well as optical element assembly having a tridimensional convex structure obtained by the method 失效
    制造立体微结构和纳米结构的方法以及通过该方法获得的具有三维凸结构的光学元件组件

    公开(公告)号:US07760435B2

    公开(公告)日:2010-07-20

    申请号:US11816804

    申请日:2005-02-21

    IPC分类号: G02B27/10 B29D11/00 C03C15/00

    摘要: A method is for forming three-dimensional micro- and nanostructures, based on the structuring of a body of material by a mould having an impression area which reproduces the three-dimensional structure in negative form. This method includes providing a mould having a substrate of a material which can undergo isotropic chemical etching, in which the impression area is to be formed. An etching pattern is defined on (in) the substrate, having etching areas having zero-, uni- or bidimensional extension, which can be reached by an etching agent. A process of isotropic chemical etching of the substrate from the etching areas is carried out for a corresponding predetermined time, so as to produce cavities which in combination make up the impression area. The method is advantageously used in the fabrication of sets of microlenses with a convex three-dimensional structure, of the refractive or hybrid refractive/diffractive type, for forming images on different focal planes.

    摘要翻译: 一种用于形成三维微结构和纳米结构的方法,其基于通过具有以负形式再现三维结构的印模区域的模具构造材料体。 该方法包括提供具有能够进行各向同性化学蚀刻的材料的基材的模具,其中将形成印模区域。 蚀刻图案被定义在衬底的(在)中,其蚀刻区域具有零,一维或二维延伸,这可由蚀刻剂达到。 从蚀刻区域对基板进行各向同性化学蚀刻的过程进行相应的预定时间,以产生组合构成印模区域的空腔。 该方法有利地用于制造具有折射或混合折射/衍射类型的凸立体结构的微透镜组,用于在不同焦平面上形成图像。

    Method for forming micro lenses
    35.
    发明授权
    Method for forming micro lenses 有权
    微透镜形成方法

    公开(公告)号:US07708899B2

    公开(公告)日:2010-05-04

    申请号:US10944004

    申请日:2004-09-20

    申请人: Hiroki Amemiya

    发明人: Hiroki Amemiya

    IPC分类号: H01L27/14 G02B3/00

    CPC分类号: G02B3/0012 H01L27/14627

    摘要: A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF6 gas and CHF3 gas, an etching gas including SF6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.

    摘要翻译: 一种形成微透镜的方法包括以下步骤:使用包括SF 6气体的蚀刻气体和在透镜材料层上形成透镜材料层和掩模层的被处理物体进行蚀刻处理, CHF 3气体,包括SF 6气体和CO气体的蚀刻气体,包括其中具有碳和氟的气体的CO气体的蚀刻气体,或包括来自碳和氟的第一气体的两种或更多种气体的蚀刻气体,以及 其中具有碳和氟的第二气体,以蚀刻透镜材料层和掩模层,并将掩模层的透镜形状转移到透镜材料层,从而形成微透镜。

    METHOD FOR PRODUCTION OF DISTRIBUTED REFRACTIVE INDEX-TYPE OPTICAL ELEMENT HAVING ULTRAVIOLET RAY-ABSORBING ABILITY
    36.
    发明申请
    METHOD FOR PRODUCTION OF DISTRIBUTED REFRACTIVE INDEX-TYPE OPTICAL ELEMENT HAVING ULTRAVIOLET RAY-ABSORBING ABILITY 审中-公开
    具有超紫外线吸收能力的分布式折射率指数型光学元件的生产方法

    公开(公告)号:US20100067101A1

    公开(公告)日:2010-03-18

    申请号:US12531801

    申请日:2008-03-27

    IPC分类号: F21V9/06 B05D5/06 G02B3/00

    摘要: The present invention provides a method for producing a distributed refractive index-type optical element which can be optically designed readily, enables to provide a desired optical element in a simple manner and has an ultraviolet ray-absorbing ability.The present invention provides a method for producing a distributed refractive index-type optical element having an ultraviolet ray-absorbing ability, which comprises of the steps of: applying a paste comprising at least one compound selected from the group consisting of a lithium compound, a potassium compound, a rubidium compound, a cesium compound, a silver compound, a copper compound and a thallium compound, an organic resin and an organic solvent onto a glass substrate comprising an alkali metal component and an ultraviolet ray-absorbing component as glass constituent components; and heat-treating the resulting substrate at a temperature lower than the softening point of the glass substrate.

    摘要翻译: 本发明提供一种可以容易地光学设计的分布式折射率型光学元件的制造方法,能够以简单的方式提供期望的光学元件并具有紫外线吸收能力。 本发明提供了一种具有紫外线吸收能力的分布式折射率型光学元件的制造方法,其特征在于,包括以下工序:将含有选自锂化合物, 钾化合物,铷化合物,铯化合物,银化合物,铜化合物和铊化合物,有机树脂和有机溶剂加入到包含碱金属组分和紫外线吸收组分作为玻璃构成成分的玻璃基板上 ; 并在低于玻璃基板的软化点的温度下对所得的基材进行热处理。

    METHOD FOR PRODUCING SURFACE CONVEXES AND CONCAVES
    37.
    发明申请
    METHOD FOR PRODUCING SURFACE CONVEXES AND CONCAVES 失效
    生产表面腐蚀和腐蚀的方法

    公开(公告)号:US20100044913A1

    公开(公告)日:2010-02-25

    申请号:US12530992

    申请日:2008-03-19

    申请人: Hideki Etori

    发明人: Hideki Etori

    IPC分类号: B29C33/42 G03F7/20

    摘要: A method for producing surface convexes or concaves enabling easy and highly precise formation of desired convex/concave shapes using a photomask is provided.A mask member 20 having light transmitting sections and non-light transmitting sections is disposed over one side of a photosensitive film 10 consisting of a photosensitive resin composition with an interval with respect to the photosensitive film 10, and a light diffusing member 30 is disposed on the opposite side of the photosensitive film 10 across the mask member 20. Light is irradiated from a light source disposed on the opposite side of the mask member 20 across the light diffusing member 30 to subject the photosensitive film 10 to light exposure through the light diffusing member 30 and the light transmitting sections of the mask member 20. Exposed portions or unexposed portions of the photosensitive film 10 are removed by development to produce convexes or concaves on the photosensitive film 10 in shapes determined by shapes of the exposed portions or unexposed portions. In the light exposure, light exposure conditions such as haze of the light diffusing member 30 are controlled to control the shapes of the exposed portions or unexposed portions.

    摘要翻译: 提供一种用于制造表面凸起或凹陷的方法,其能够使用光掩模容易且高度精确地形成所需的凸/凹形状。 具有透光部和非透光部的荫罩构件20配置在由感光性树脂组合物构成的感光性膜10的与感光性膜10间隔的一侧,光扩散构件30配置在 感光膜10的相对侧面对掩模构件20.光从设置在掩模构件20的相对侧的光源穿过光漫射构件30照射,以使感光膜10通过光扩散 构件30和掩模构件20的透光部分。通过显影除去感光膜10的暴露部分或未曝光部分,以由曝光部分或未曝光部分的形状确定的形状在感光膜10上产生凸起或凹陷。 在曝光中,控制光扩散构件30的雾度等曝光条件,以控制曝光部分或未曝光部分的形状。

    Embedded lens for achromatic wafer-level optical module and methods of forming the same
    39.
    发明申请
    Embedded lens for achromatic wafer-level optical module and methods of forming the same 有权
    用于消色差晶片级光模块的嵌入式透镜及其形成方法

    公开(公告)号:US20090316273A1

    公开(公告)日:2009-12-24

    申请号:US12213562

    申请日:2008-06-20

    申请人: Jeff Viens

    发明人: Jeff Viens

    IPC分类号: G02B27/00 B29D11/00

    摘要: A wafer-level optical lens module including one or more embedded lenses and two outer lenses on an outer side of two outermost glass wafers. The embedded lenses may be formed of air or of any material with desired refractive index and dispersion characteristics. The outer lenses may be formed of any material with desired refractive index and dispersion characteristics. This arrangement, with various lenses of the optical module having different refractive indices and dispersions, allows for the formation of a wafer-level optical lens system which corrects for chromatic aberration and astigmatism.

    摘要翻译: 晶片级光学透镜模块,其包括一个或多个嵌入式透镜和两个外部透镜在两个最外侧玻璃晶片的外侧。 嵌入式透镜可以由具有所需折射率和分散特性的空气或任何材料形成。 外透镜可以由具有期望的折射率和分散特性的任何材料形成。 具有不同折射率和分散度的光学模块的各种透镜的这种布置允许形成校正色像差和像散的晶片级光学透镜系统。

    Lens array apparatus and manufacturing method thereof
    40.
    发明申请
    Lens array apparatus and manufacturing method thereof 有权
    透镜阵列装置及其制造方法

    公开(公告)号:US20090244904A1

    公开(公告)日:2009-10-01

    申请号:US12383409

    申请日:2009-03-24

    申请人: Shimpei Morioka

    发明人: Shimpei Morioka

    IPC分类号: F21V3/00 B29D11/00 G02B27/10

    摘要: A lens array apparatus and a manufacturing method thereof are provided in which the lens array apparatus can achieve appropriate optical performance regardless of changes in ambient temperature.As a predetermined angle of gradient in relation to a thickness direction for each of a plurality of lenses 11, an exiting direction of light emitted from each lens 11 is at an angle of gradient allowing respective converging points of the light emitted from each lens 11 to be positioned on a predetermined straight line 23 that corresponds to each lens 11 and is parallel with the thickness direction, under a plurality of different ambient temperatures.

    摘要翻译: 提供了一种透镜阵列装置及其制造方法,其中透镜阵列装置可以实现适当的光学性能,而不管环境温度的变化。 作为对于多个透镜11的厚度方向的规定的倾斜角度,从各透镜11射出的光的出射方向成为使从各透镜11射出的光的各会聚点的倾斜角度 在多个不同的环境温度下,定位在与每个透镜11相对应并且与厚度方向平行的预定直线23上。