公开(公告)号：US3734844A

公开(公告)日：1973-05-22

申请号：US3734844D

申请日：1972-09-25

申请人： UPJOHN CO

发明人： SAYIGH A ,  STUBER F ,  ULRICH H

IPC分类号： C08F8/00 ,  C08F8/34 ,  G03F1/56 ,  G03F7/012 ,  G03F7/038 ,  C08F27/00 ,  C08F47/12

CPC分类号： G03F7/038 ,  C08F8/00 ,  C08F8/34 ,  G03F1/56 ,  G03F7/012 ,  C08F20/02

摘要： Radiation (thermal and light)-sensitive polymers are provided and are characterized by (1) a recurring unit of the formula: WHEREIN R2 is lower-alkoxy or phenyl, one of X and Y is -COOR and the other is -COR1, R is an azidosulfonylcarbanilyloxy alkylene group and R1 is -O-dye, -NH-dye or hydroxyarylamino, or (2) a combination in the same polymer chain of recurring units having the formulas: WHEREIN ONE OF X1 and Z1 represents -COOH and the other represents -COOR as defined above, and WHEREIN ONE OF X2 and Z2 represents -COOH and the other represents -COR1 as defined above. The polymers can be chemically bonded to substrates, such as those containing C - H bonds only (e.g., polyolefins), which are not normally dye receptive. The bonding is effected by exposure to appropriate radiation; the exposure can be carried out imagewise to produce an appropriate image on the substrate. Accordingly, the polymers of the invention find use in the photoresist, printing and like arts.

摘要翻译： 提供辐射（热和光）敏感聚合物，其特征在于（1）下式的重复单元：

公开(公告)号：US3467523A

公开(公告)日：1969-09-16

申请号：US3467523D

申请日：1965-07-02

申请人： AGFA GEVAERT NV

发明人： SEIDEL BERNHARD ,  DANHAUSER JUSTUS

IPC分类号： C08B15/06 ,  C08F2/48 ,  C08F8/30 ,  C08F8/34 ,  C08G18/00 ,  C08G18/71 ,  C08G59/16 ,  C08G59/40 ,  C08G63/685 ,  C08G63/688 ,  C08G85/00 ,  C08L75/00 ,  G03F7/008 ,  G03F7/012 ,  G03F7/038 ,  G03C1/70 ,  C08F3/92

CPC分类号： G03F7/038 ,  C08B15/06 ,  C08F8/34 ,  C08G18/00 ,  C08G18/715 ,  C08G59/1455 ,  C08G59/4064 ,  C08G63/6854 ,  C08G63/6884 ,  C08G85/004 ,  C08L75/00 ,  G03F7/008 ,  G03F7/012 ,  C08F16/06 ,  C08F10/00

公开(公告)号：US20190250510A1

公开(公告)日：2019-08-15

申请号：US16269165

申请日：2019-02-06

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED.

发明人： Takayuki Okachi ,  Yuki Yokoi

IPC分类号： G03F7/012 ,  H01L51/05 ,  G03F7/004 ,  H01L51/00 ,  G03F7/20 ,  G03F7/38

CPC分类号： G03F7/012 ,  G03F7/0048 ,  G03F7/2012 ,  G03F7/38 ,  H01L51/0014 ,  H01L51/052

摘要： To provide a photosensitive composition excellent in a patterning property and capable of producing an organic thin-film transistor exhibiting high carrier mobility by being used in an insulation layer. A photosensitive composition comprising a polymer compound containing at least one repeating unit selected from the group consisting of a repeating unit represented by the following formula (1) and a repeating unit represented by the following formula (2) and a compound having at least two azide groups: In the formula (1), Ar1 represents a phenyl group or a naphthyl group, and in the formula (2), Ar2 represents a phenyl group or a naphthyl group. l and m are numbers satisfying that 1≥15 and l+m>90 when the total amount of all repeating units contained in the above-described polymer compound is taken as 100.

公开(公告)号：US09809713B2

公开(公告)日：2017-11-07

申请号：US13062218

申请日：2009-09-03

申请人： Timothy A. Bloomquist ,  Mark W. Josephson ,  Laurie R. Lawin ,  Kristin S. Taton ,  Jie Wen

发明人： Timothy A. Bloomquist ,  Mark W. Josephson ,  Laurie R. Lawin ,  Kristin S. Taton ,  Jie Wen

IPC分类号： B05D3/00 ,  C09D179/04 ,  C09D4/00 ,  C08L1/02 ,  C08L3/12 ,  C08L5/00 ,  C08L89/00 ,  G03F7/012

CPC分类号： C09D4/00 ,  C08L1/02 ,  C08L3/12 ,  C08L5/00 ,  C08L89/00 ,  G03F7/012

摘要： The invention describes novel compositions of crosslinkers that include at least two pendent photoactivatable groups, such as benzophenone moieties, and an initiator, such as acetophenone.

公开(公告)号：US08530269B2

公开(公告)日：2013-09-10

申请号：US10556841

申请日：2004-05-12

申请人： Lay-Lay Chua ,  Peter Kian-Hoon Ho ,  Richard H. Friend

发明人： Lay-Lay Chua ,  Peter Kian-Hoon Ho ,  Richard H. Friend

IPC分类号： H01L51/40

CPC分类号： G03F7/0046 ,  C07C247/16 ,  C07C311/37 ,  G03C1/695 ,  G03F7/008 ,  G03F7/012 ,  H01L51/0002 ,  H01L51/0003 ,  H01L51/0035 ,  H01L51/0037 ,  H01L51/0038 ,  H01L51/0039 ,  H01L51/0043 ,  H01L51/0059 ,  H01L51/052 ,  Y02E10/549 ,  Y02P70/521

摘要： A method of forming a polymer device including the steps (i) of depositing on a substrate a solution containing a polymer or oligomer and a crosslinking moiety, to form a layer, and, (ii) curing the layer formed in step (i) under conditions to form an insoluble crosslinked polymer, wherein the crosslinking moiety is present in step (i) in an amount in the range of from 0.05 mol % to 5 mol % based on the total number of moles or repeat units of the polymer or oligomer and the crosslinking moiety in the solution.

摘要翻译： 一种形成聚合物装置的方法，包括以下步骤：（i）在基底上沉积含有聚合物或低聚物和交联部分的溶液以形成层，和（ii）固化步骤（i）中形成的层， 形成不溶性交联聚合物的条件，其中所述交联部分以基于所述聚合物或低聚物的总摩尔数或重复单元的0.05摩尔％至5摩尔％的量存在于步骤（i）中，以及 溶液中的交联部分。

公开(公告)号：US06861456B2

公开(公告)日：2005-03-01

申请号：US10400844

申请日：2003-03-27

申请人： Toru Shibuya ,  Masanori Kurihara ,  Mineko Takeda ,  Kazuo Yamada

发明人： Toru Shibuya ,  Masanori Kurihara ,  Mineko Takeda ,  Kazuo Yamada

IPC分类号： C07C247/18 ,  C07D213/40 ,  C07D213/56 ,  C07D233/61 ,  C08F2/46 ,  C08F8/00 ,  C08F8/30 ,  G03F7/00 ,  G03F7/008 ,  G03F7/012 ,  C07C247/00

CPC分类号： G03F7/012 ,  C07C247/18 ,  C08F8/30 ,  C08F8/48 ,  G03F7/0007 ,  G03F7/008 ,  C08F16/06

摘要： The present invention provides a novel photosensitive compound having an azido group suitable for exposure to light of a short wavelength; a photosensitive resin containing the photosensitive compound; and a photosensitive composition containing the photosensitive compound or photosensitive resin. The photosensitive compound containing a photosensitive unit represented by formula (1): wherein R is selected from among the following groups, R: X is selected from among the following groups, X: and each of Y and Z represents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom, wherein at least one of R and X contains an azido group.

摘要翻译： 本发明提供了具有适合暴露于短波长的光的叠氮基的新型光敏化合物; 含有感光性化合物的感光性树脂; 和含有感光性化合物或感光性树脂的感光性组合物。 含有式（1）表示的光敏单元的光敏化合物：其中R选自下列基团，R：X选自下列基团X：Y和Z各自表示氢原子，烷基 基团，含缩醛基的烷基，芳基，芳烷基或含有形成碱的氮原子的取代基，其中R和X中的至少一个含有叠氮基。

公开(公告)号：US20040242023A1

公开(公告)日：2004-12-02

申请号：US10769423

申请日：2004-01-30

申请人： State Board of Higher Education on Behalf of Portland State University

发明人： Mingdi Yan ,  Michele A. Bartlett

IPC分类号： H01L021/31

CPC分类号： C40B60/14 ,  B01J2219/00432 ,  B01J2219/00443 ,  B01J2219/00531 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00619 ,  B01J2219/00626 ,  B01J2219/0063 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00711 ,  B01J2219/00722 ,  B01J2219/00725 ,  B82Y30/00 ,  C40B40/10 ,  G03F7/0035 ,  G03F7/008 ,  G03F7/012 ,  G03F7/11

摘要： Methods of adhering polymeric materials to a substrate, either directly or through linker molecules, are disclosed. Structures, for example, microstructures, including microwells and arrays of microwells, may be readily formed using the methods. In some embodiments, microstructures formed completely from polymeric materials are provided, making it possible to tailor the chemical and physical properties of the microstructures. For example, microwells having a bottom comprising a polar polymeric material and well sides/top comprising a non-polar polymeric material are provided. Biochemical reagents may be easily delivered to such nullsmart wellsnull because the intrinsic attraction of the well bottom for the reagents and the intrinsic repulsion between the well sides/top combine to direct the reagents to the wells.

摘要翻译： 公开了将聚合物材料直接或通过连接分子粘附到基底上的方法。 可以使用这些方法容易地形成结构，例如微结构，包括微孔和微孔阵列。 在一些实施方案中，提供了由聚合材料完全形成的微结构，使得可以调整微结构的化学和物理性能。 例如，提供具有包含极性聚合物材料的底部的微孔和包含非极性聚合物材料的阱侧/顶部。 生物化学试剂可以很容易地传递到这种“智能井”，因为井底对于试剂的内在吸引力和阱侧/顶部之间的固有排斥结合起来将试剂引导到井。

公开(公告)号：US20020115014A1

公开(公告)日：2002-08-22

申请号：US09845037

申请日：2001-04-27

发明人： Kyle Johnson ,  Toshifumi Komatsu ,  Jeremy William Peterson

IPC分类号： G03F007/012

CPC分类号： G03F7/012

摘要： A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at least one cross-linkable unit represented by the formula: 1 wherein X is an organic moity and Y is selected from the following group: 2 wherein Z is selected from at least one of lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, and tetraalkylammonium.

摘要翻译： 描述了包括载体层和感光层的感光层压结构。 感光层包括含有至少一个由下式表示的可交联单元的聚合物感光性树脂组合物：其中X是有机部分，Y选自下列基团：其中Z选自锂，钠， 钾，铵，单烷基铵，二烷基铵和四烷基铵。

公开(公告)号：US20010047068A1

公开(公告)日：2001-11-29

申请号：US09783056

申请日：2001-02-14

发明人： Kentaro Tada ,  Toru Shibuya

IPC分类号： C08F028/06

CPC分类号： G03F7/012 ,  G03F7/0007

摘要： The invention provides a photosensitive compound which can be used to prepare a photosensitive resin, and a photosensitive resin obtained from the compound. The compound has a moiety represented by formula (I) or (II): 1 wherein R1represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group; Y is selected from the following formula groups: 2 wherein each of R2 and R3 represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group, and 1 is an integer of 1 to 5; and Ar is selected from the following formula groups: 3 wherein X represents lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, trialkylammonium, or tetraalkylammonium.

摘要翻译： 本发明提供可用于制备感光性树脂的感光性化合物和由该化合物得到的感光性树脂。 该化合物具有由式（I）或（II）表示的部分：其中R1表示氢原子，烷基，芳基或芳烷基; Y选自下式：其中R 2和R 3各自表示氢原子，烷基，芳基或芳烷基，且1为1至5的整数; Ar选自下式：其中X表示锂，钠，钾，铵，一烷基铵，二烷基铵，三烷基铵或四烷基铵。

公开(公告)号：US5424368A

公开(公告)日：1995-06-13

申请号：US191218

申请日：1994-02-03

申请人： Tadakazu Miyazaki ,  Masahide Mizumori ,  Miki Motomura

发明人： Tadakazu Miyazaki ,  Masahide Mizumori ,  Miki Motomura

IPC分类号： G03F7/004 ,  C08F8/30 ,  G03F7/012 ,  G03F7/033 ,  G03F7/038 ,  G03F7/20 ,  H01L21/027 ,  H05K3/00 ,  C08F265/00

CPC分类号： C09D11/101 ,  C08F8/44 ,  G03F7/012 ,  C08F2800/10

摘要： A photosensitive resin having at least one group as shown below in Chemical Formula (1) in a molecule. ##STR1## wherein n represents an integer from 1 to 10. Since the photosensitive resin has an azido group in a molecule having an adsorption region higher than 300 nm, the resin is highly sensitive. Therefore, an emulsion coating photo mask or a soda glass photo mask, which allows light permeation within the abosorption region of the azido group and is cheap in industry, can be used as the photo mask for the photosensitive resin of the invention. The photosensitive resin is particularly useful as a photo resist.

摘要翻译： 在分子中具有化学式（1）所示的至少一个基团的感光性树脂。 （1）其中n表示1〜10的整数。由于感光性树脂在吸附区域高于300nm的分子中具有叠氮基，所以树脂高度敏感。 因此，作为本发明的感光性树脂的光掩模，可以使用能够使光吸收在叠氮化物的吸收区域内并且在工业上便宜的乳液涂布光掩模或钠玻璃光罩。 光敏树脂特别适用于光刻胶。