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公开(公告)号:US20210340672A1
公开(公告)日:2021-11-04
申请号:US16863659
申请日:2020-04-30
申请人: HZO, Inc.
摘要: A method for depositing parylene onto a substrate includes utilizing a vaporization chamber and a pyrolysis chamber to crack a dimer into a monomer gas, directly ionizing the monomer gas by passing the monomer gas through a plasma generation chamber comprising plasma prior to injection of the monomer gas into a deposition chamber, and polymerizing the ionized monomer in the deposition chamber to create a polymer and a protective coating on a substrate.
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公开(公告)号:US11155913B2
公开(公告)日:2021-10-26
申请号:US15751467
申请日:2017-08-03
发明人: Hongguang Yuan , Pilgeun Chun , Yan Hu
摘要: An evaporation mask plate, a manufacturing method thereof and an evaporation method are provided. The evaporation mask plate includes a body, a plurality of evaporation cutout regions formed in the body, and a plurality of shielding members arranged on the body. Each shielding member is arranged between two adjacent evaporation cutout regions.
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公开(公告)号:US20210308725A1
公开(公告)日:2021-10-07
申请号:US16318052
申请日:2017-04-28
IPC分类号: B08B7/04 , B08B7/00 , B08B3/08 , B08B9/08 , C23C14/12 , C23C14/24 , C23C14/56 , H01L51/00 , H01L51/56
摘要: The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.
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公开(公告)号:US11130849B2
公开(公告)日:2021-09-28
申请号:US16256627
申请日:2019-01-24
IPC分类号: B05D1/00 , B05D7/04 , B05D7/00 , B05D3/06 , C08J7/043 , C23C14/08 , C23C14/34 , C08J7/04 , C08J7/046 , C23C14/10 , C23C14/12 , C23C14/24 , C23C14/54 , H01L51/52
摘要: A process for making a barrier film having a substrate, a base polymer layer applied to the substrate, an oxide layer applied to the base polymer layer, and a top coat polymer layer applied to the oxide layer is provided. An optional inorganic layer can be applied over the top coat polymer layer. The top coat polymer layer is formed by vapor depositing and curing cyclic aza-silane and acrylate monomer. The use of a silane co-deposited with an acrylate to form the top coat layer of the barrier films provide for enhanced resistance to moisture and improved peel strength adhesion of the top coat layer to the underlying barrier stack layers.
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35.
公开(公告)号:US20210273168A1
公开(公告)日:2021-09-02
申请号:US17321150
申请日:2021-05-14
发明人: Katsuhiko Kishimoto , Susumu Sakio
摘要: A rigid material whose linear expansion coefficient is small and whose relative density is small is used to provide a vapor-deposition mask using a lightweight and highly dimension-accurate frame. A frame (15) of the vapor-deposition mask disclosed in accordance with the present embodiment is formed with a carbon-fiber reinforced plastic (CFRP).
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公开(公告)号:US20210234139A1
公开(公告)日:2021-07-29
申请号:US17228745
申请日:2021-04-13
发明人: William E. QUINN , Gregory MCGRAW
IPC分类号: H01L51/56 , H01L51/50 , H01L51/00 , C23C14/22 , B41J2/04 , B41J2/155 , C23C14/04 , C23C14/12 , B41J25/316 , B41J25/308
摘要: Implementations of the disclosed subject matter provide a print bar for organic vapor jet (OVJP) deposition is provided that includes a plurality of n print head segments, where each of the plurality of print head segments may have an OVJP print head. The print bar may include a plurality of distance sensors, where each of the plurality of distance sensors may be configured to measure a distance between a substrate disposed below the print bar and a portion of at least one of the print head segments. The print bar may include a plurality of not more than n+1 actuators configured to adjust at least one of a position and an orientation of one or more of the plurality of print head segments based upon one or more distances between the substrate and the print bar measured by one or more of the plurality of distance sensors.
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公开(公告)号:US11021786B2
公开(公告)日:2021-06-01
申请号:US16209513
申请日:2018-12-04
IPC分类号: H01L21/3205 , C23C14/12 , C23F11/10 , H01L21/288 , H01L21/768
摘要: In a described example, a method for passivating a copper structure includes: passivating a surface of the copper structure with a copper corrosion inhibitor layer; and depositing a protection overcoat layer with a thickness less than 35 μm on a surface of the copper corrosion inhibitor layer.
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38.
公开(公告)号:US10954132B2
公开(公告)日:2021-03-23
申请号:US16714990
申请日:2019-12-16
发明人: Mark C. Hersam , Xiaolong Liu
IPC分类号: H01B1/06 , C23C14/00 , B05D5/12 , C01B35/04 , C23C16/04 , C23C16/22 , H01L51/00 , C23C14/04 , C23C14/12 , C23C14/24
摘要: A method of preparing a boron allotrope-organic lateral heterostructural article includes providing an article comprising a substrate comprising a portion thereof coupled to a boron allotrope comprising an elemental boron layer; generating an organic compound vapor from a solid organic compound source, said organic compound vapor having a higher enthalpy of adsorption on said substrate compared to enthalpy of adsorption on said boron allotrope; and contacting said organic compound vapor with said article to selectively deposit said organic compound on a substrate portion not coupled to said boron allotrope to provide a heterostructural article comprising said organic compound and said boron allotrope laterally adjacent one to the other and providing a lateral interface one with the other.
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公开(公告)号:US10941481B2
公开(公告)日:2021-03-09
申请号:US16683389
申请日:2019-11-14
发明人: Stephen R. Forrest , Gregory McGraw
摘要: A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.
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公开(公告)号:US10937966B2
公开(公告)日:2021-03-02
申请号:US16329018
申请日:2017-08-30
申请人: Novaled GmbH
发明人: Steffen Runge , Carsten Rothe , Julien Frey , Uwe Gölfert
摘要: The present invention relates to a method for preparing an organic semiconductor layer in a vacuum chamber at a pressure of 10−5 to 10−9 mbar comprising a step of sublimating a composition from a single vacuum thermal evaporation source arranged in the vacuum chamber, wherein the composition comprises a physical mixture of (a) a first organic aromatic matrix compound having a molecular weight ≥400 and ≤1,000: and (b) a first alkali organic complex having a molecular weight of ≥100 and ≤400.
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