公开(公告)号：US20130017636A1

公开(公告)日：2013-01-17

申请号：US13439418

申请日：2012-04-04

申请人： Bong-Kyun KIM ,  Shin-Il CHOI ,  Hong-Sick PARK ,  Wang-Woo LEE ,  Seok-Jun JANG ,  Byung-Uk KIM ,  Sun-Joo PARK ,  Suk-Il YOON ,  Jong-Hyun JEONG ,  Soon-Beom HUR

发明人： Bong-Kyun KIM ,  Shin-Il CHOI ,  Hong-Sick PARK ,  Wang-Woo LEE ,  Seok-Jun JANG ,  Byung-Uk KIM ,  Sun-Joo PARK ,  Suk-Il YOON ,  Jong-Hyun JEONG ,  Soon-Beom HUR

IPC分类号： H01L33/08 ,  G03F7/42

CPC分类号： G03F7/425 ,  H01L21/31133 ,  H01L27/1288 ,  H01L29/66765

摘要： A composition for removing a photoresist, the composition including about 1% by weight to about 10% by weight of tetramethyl ammonium hydroxide (“TMAH”), about 1% by weight to about 10% by weight of an alkanol amine, about 50% by weight to about 70% by weight of a glycol ether compound, about 0.01% by weight to about 1% by weight of a triazole compound, about 20% by weight to about 40% by weight of a polar solvent, and water, each based on a total weight of the composition.

摘要翻译： 用于除去光致抗蚀剂的组合物，该组合物包含约1重量％至约10重量％的四甲基氢氧化铵（TMAH），约1重量％至约10重量％的烷醇胺，约50重量％ 至约70重量％的二醇醚化合物，约0.01重量％至约1重量％的三唑化合物，约20重量％至约40重量％的极性溶剂，以及基于 组合物的总重量。

公开(公告)号：US08012921B2

公开(公告)日：2011-09-06

申请号：US11865795

申请日：2007-10-02

申请人： Hong-Sick Park ,  Jong-Hyun Jeong ,  Suk-Il Yoon ,  Seong-Bae Kim ,  Wy-Yong Kim ,  Soon-Beom Huh ,  Byung-Uk Kim

发明人： Hong-Sick Park ,  Jong-Hyun Jeong ,  Suk-Il Yoon ,  Seong-Bae Kim ,  Wy-Yong Kim ,  Soon-Beom Huh ,  Byung-Uk Kim

IPC分类号： C11D7/50

CPC分类号： G03F7/425 ,  H01L21/31133 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/458

摘要： The present invention provides a photoresist stripper including about 5 wt % to about 20 wt % alcohol amine, about 40 wt % to about 70 wt % glycol ether, about 20 wt % to about 40 wt % N-methyl pyrrolidone, and about 0.2 wt % to about 6 wt % chelating agent.

摘要翻译： 本发明提供了一种光致抗蚀剂剥离器，其包括约5重量％至约20重量％的醇胺，约40重量％至约70重量％的二醇醚，约20重量％至约40重量％的N-甲基吡咯烷酮，以及约0.2重量％ ％至约6重量％的螯合剂。

公开(公告)号：US20100203449A1

公开(公告)日：2010-08-12

申请号：US12685545

申请日：2010-01-11

申请人： Yeong-Beom Lee ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

发明人： Yeong-Beom Lee ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： H01L27/1288 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/40 ,  H01L27/1214

摘要： A method of fabricating a thin film transistor substrate and a negative photoresist composition used therein are provided, which can reduce pattern inferiority. The method of fabricating a thin film transistor substrate includes forming a conductive film composed of a conductive material on a substrate, forming an etch pattern composed of a negative photoresist composition on the conductive film, and forming a conductive pattern by etching the conductive film using the etch pattern as an etching mask, wherein the negative photoresist composition includes 10-50 parts by weight of novolak resin including a hydroxyl group that is soluble in an alkali developing solution, 0.5-10 parts by weight of a first photo acid generator represented by the following formula (1), 0.5-10 parts by weight of a second photo acid generator represented by the following formula (2), 1-20 parts by weight of a cross-linking agent, and 10-90 parts by weight of a solvent:

摘要翻译： 提供了制造其中使用的薄膜晶体管基板和负型光致抗蚀剂组合物的方法，其可以降低图案劣化。 制造薄膜晶体管基板的方法包括在基板上形成由导电材料构成的导电膜，在导电膜上形成由负性光致抗蚀剂组合物构成的蚀刻图案，并使用该导电膜蚀刻导电膜形成导电图案 蚀刻图案作为蚀刻掩模，其中负性光致抗蚀剂组合物包含10-50重量份的包含可溶于碱显影液的羟基的酚醛清漆树脂，0.5-10重量份由 按照下式（1），将0.5-10重量份由下式（2）表示的第二光酸反应产物，1-20重量份的交联剂和10-90重量份的溶剂 ：

公开(公告)号：US20100120181A1

公开(公告)日：2010-05-13

申请号：US12613961

申请日：2009-11-06

申请人： Sung-Hee KIM ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Youg Song ,  Myoung-Soo Lee

发明人： Sung-Hee KIM ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Youg Song ,  Myoung-Soo Lee

IPC分类号： H01L21/50 ,  C09D11/10

CPC分类号： C09D11/02 ,  B82Y10/00 ,  B82Y40/00 ,  C09D11/033 ,  G03F7/0002

摘要： Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.

摘要翻译： 公开了一种使用其制造液晶显示（LCD）装置的油墨组合物和方法，其中在使用压印光刻和辊印刷形成LCD装置的图案时，具有由聚合物组成的高耐热性的油墨组合物 即使在高温下也能耐久的树脂和添加剂被用于形成精细图案，并且不断地保持图案线宽和线间隔，油墨组合物由5-45重量％的聚合物树脂组成，5-45重量％的添加剂添加到 保持热稳定性和50-90重量％的有机溶剂，其中油墨组合物即使在90-250℃的高温下也是耐久的。

公开(公告)号：US07662763B2

公开(公告)日：2010-02-16

申请号：US11185856

申请日：2005-07-21

申请人： Gee-Sung Chae ,  Yong-Sup Hwang ,  Cyoo-Chul Jo ,  Oh-Nam Kwon ,  Kyoung-Mook Lee ,  Byung-Uk Kim ,  Sang-Dai Lee ,  Jong-Soon Yoo

发明人： Gee-Sung Chae ,  Yong-Sup Hwang ,  Cyoo-Chul Jo ,  Oh-Nam Kwon ,  Kyoung-Mook Lee ,  Byung-Uk Kim ,  Sang-Dai Lee ,  Jong-Soon Yoo

IPC分类号： C11D7/50

CPC分类号： C11D11/0047 ,  C11D7/263 ,  C11D7/3218 ,  C11D7/3263 ,  C11D7/3281 ,  C11D7/5013 ,  G03F7/425 ,  Y10S134/902

摘要： A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.

摘要翻译： 用于除去铜相容抗蚀剂的组合物包括约10％至约30％重量的胺化合物，约10％至约80％重量的乙二醇醚化合物和约10％至约80％重量的 极性溶剂。

公开(公告)号：US20070184293A1

公开(公告)日：2007-08-09

申请号：US11670700

申请日：2007-02-02

申请人： Dong-Ki LEE ,  Byung-Uk KIM ,  Hyoc-Min YOUN

发明人： Dong-Ki LEE ,  Byung-Uk KIM ,  Hyoc-Min YOUN

IPC分类号： B32B27/30 ,  C08F24/00 ,  C08F36/22

CPC分类号： C08F220/06 ,  C08F212/08 ,  C08F220/18 ,  C08F220/28 ,  C08F220/32 ,  C08F220/40 ,  G02F1/136227 ,  H01L27/3244 ,  Y10T428/31855

摘要： Disclosed herein is a resin composition for an organic insulating layer, a method of manufacturing the same, and a display panel including an insulating layer formed using the resin composition. The resin composition for an organic insulating layer is produced by polymerizing about 5 to about 35 wt % of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture of the unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride, about 5 to about 40 wt % of a styrene compound, about 5 to about 40 wt % of an epoxy compound, about 0.1 to about 10 wt % of an isobornyl compound, and about 20 to about 40 wt % of a dicyclopentadiene compound, based on the total weight of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, styrene compound, isobornyl compound, and dicyclopentadiene compound.

摘要翻译： 本发明公开了一种有机绝缘层用树脂组合物及其制造方法以及使用该树脂组合物形成的绝缘层的显示面板。 用于有机绝缘层的树脂组合物通过将约5至约35重量％的不饱和羧酸，不饱和羧酸酐或不饱和羧酸和不饱和羧酸酐的混合物聚合为约5至约 40重量％的苯乙烯化合物，约5至约40重量％的环氧化合物，约0.1至约10重量％的异冰片基化合物和约20至约40重量％的二环戊二烯化合物，基于总重量 的不饱和羧酸，不饱和羧酸酐，苯乙烯化合物，异冰片基化合物和二环戊二烯化合物。

公开(公告)号：US07195854B2

公开(公告)日：2007-03-27

申请号：US11174872

申请日：2005-07-05

申请人： Hoon Kang ,  Seung-uk Lee ,  Woo-sik Jun ,  Dae-youn Park ,  Ju-hyuk Kim ,  Byung-uk Kim

发明人： Hoon Kang ,  Seung-uk Lee ,  Woo-sik Jun ,  Dae-youn Park ,  Ju-hyuk Kim ,  Byung-uk Kim

IPC分类号： G03F7/023

CPC分类号： G03F7/0048 ,  G03F7/0007 ,  G03F7/022

摘要： The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.

摘要翻译： 本发明提供一种光致抗蚀剂组合物，更具体地说，涉及一种光致抗蚀剂组合物，其包含a）一种酚醛清漆树脂，b）一种重氮化合物，和c）含有丙二醇甲基醚乙酸酯（PGMEA）和2,2,4-三甲基 - 1,3-戊二醇单异丁酸酯（TMPMB）。 根据本发明的光致抗蚀剂组合物在涂布后具有优异的涂布均匀性和防污性，使得其可以容易地应用于实际工业领域，并且可以由于减少待消耗的量而减少工作环境，减少时间 制造时需要大规模制造。

公开(公告)号：US08936744B2

公开(公告)日：2015-01-20

申请号：US13381151

申请日：2010-07-07

申请人： Jae-won Yoo ,  Byung-uk Kim ,  Un-yong Kim ,  Eun-jin Kwak

发明人： Jae-won Yoo ,  Byung-uk Kim ,  Un-yong Kim ,  Eun-jin Kwak

IPC分类号： B29C33/00 ,  B29C39/00 ,  B29C59/14 ,  B29C33/38 ,  B29C33/40 ,  B29C33/42 ,  B29C33/56 ,  C08G18/67 ,  C08L75/16

CPC分类号： B29C39/006 ,  B29C33/3857 ,  B29C33/40 ,  B29C33/424 ,  B29C33/56 ,  B29C59/14 ,  B29C59/142 ,  C08G18/672 ,  C08G18/6775 ,  C08L75/16 ,  Y10T428/24479 ,  C08G18/61

摘要： There are provided a fluorine-containing photocurable resin composition and a method of preparing a mold comprising the same and more particularly, a photocurable resin composition having chemical resistance, mechanical properties and high transmittance, etc. as well as being easily wetted with and released from thermosetting or photocurable resins for pattern formation regardless of additional surface treatment, as opposed to the existing polymer resin materials used for resin molds, and a method of preparing a resin mold using the same.

摘要翻译： 提供含氟光固化性树脂组合物及其制备方法，特别是具有耐化学性，机械性能，高透光性等的光固化性树脂组合物，并且易于润湿和脱离 与用于树脂模具的现有聚合物树脂材料相反的用于图案形成的热固性或光固化树脂，而不管附加的表面处理，以及使用其制备树脂模具的方法。

公开(公告)号：US20120262777A1

公开(公告)日：2012-10-18

申请号：US13503937

申请日：2010-10-29

申请人： Chun-Hyuk Lee ,  Byung-Uk Kim ,  Mun-Pyo Hong ,  Hong Choi ,  Byung-Seong Bae

发明人： Chun-Hyuk Lee ,  Byung-Uk Kim ,  Mun-Pyo Hong ,  Hong Choi ,  Byung-Seong Bae

IPC分类号： G02F1/167 ,  H05K13/00

CPC分类号： G02F1/167 ,  G02F1/133512 ,  G02F2001/1676

摘要： The present invention relates to an electric-field drive display device. According to one embodiment of the present invention, the electric-field drive display device comprises: a first substrate; a first electrode which is formed on the first substrate; a second electrode which is formed on the first substrate and is disposed in parallel with the first electrode; a drive partition wall which is formed on the first electrode and the second electrode and has a plurality of opening and closing holes; and a plurality of drive bodies which are disposed inside each of the opening and closing holes. Consequently, the electric-field drive display device according to one embodiment of the present invention can adjust the amount of light transmitted and so display the desired image by adjusting the positions of the drive bodies in the horizontal direction through the use of electrical force.

摘要翻译： 电场驱动显示装置技术领域本发明涉及电场驱动显示装置。 根据本发明的一个实施例，电场驱动显示装置包括：第一基板; 形成在第一基板上的第一电极; 第二电极，形成在第一基板上并与第一电极平行设置; 驱动分隔壁，其形成在所述第一电极和所述第二电极上，并且具有多个开闭孔; 以及设置在每个所述开闭孔内的多个驱动体。 因此，根据本发明的一个实施例的电场驱动显示装置可以通过使用电力调节驱动体在水平方向上的位置来调节透光量并从而显示所需图像。

公开(公告)号：US20110294243A1

公开(公告)日：2011-12-01

申请号：US13092629

申请日：2011-04-22

申请人： Woo-Seok Jeon ,  Jeong-Min Park ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Su-Youn Choi ,  Jin-Sun Kim

发明人： Woo-Seok Jeon ,  Jeong-Min Park ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Su-Youn Choi ,  Jin-Sun Kim

IPC分类号： H01L33/08 ,  G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0007 ,  G02F1/13439 ,  G03F7/0236 ,  G03F7/0382

摘要： A photoresist composition suitable for forming a high-resolution pattern, and a method of forming a photoresist pattern using the same. The photoresist composition includes about 10 to about 45 parts by weight of an alkali soluble binder resin including a hydroxyl group, about 0.1 to about 5 parts by weight of a photo-acid generator, about 1 to about 5 parts by weight of a cross-linker that cross-links the alkali-soluble binder resin including the hydroxyl group, about 0.3 to about 3 parts by weight of a quinone diazide compound, and a remainder of a solvent.

摘要翻译： 适合于形成高分辨率图案的光致抗蚀剂组合物和使用其形成光致抗蚀剂图案的方法。 光致抗蚀剂组合物包括约10至约45重量份的包含羟基的碱溶性粘合剂树脂，约0.1至约5重量份的光酸发生剂，约1至约5重量份的交联剂， 使包含羟基的碱溶性粘合剂树脂交联的接头，约0.3至约3重量份的醌二叠氮化合物和剩余的溶剂。