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    Model-free adaptive process control
    42.
    发明授权
    Model-free adaptive process control 失效
    无模型自适应过程控制

    公开(公告)号：US6055524A

    公开(公告)日：2000-04-25

    申请号：US944450

    申请日：1997-10-06

    Applicant: George Shu-Xing Cheng

    Inventor： George Shu-Xing Cheng

    IPC: G06N3/00 ,  G05B13/02 ,  G06N3/063 ,  G06N3/04

    CPC classification number: G05B13/027 ,  G06N3/0635

    Abstract: A model-free adaptive controller is disclosed, which uses a dynamic artificial neural network with a learning algorithm to control any single-variable or multivariable open-loop stable, controllable, and consistently direct-acting or reverse-acting industrial process without requiring any manual tuning, quantitative knowledge of the process, or process identifiers. The need for process knowledge is avoided by substituting 1 for the actual sensitivity function .differential.y(t)/.differential.u(t) of the process.

    Abstract translation: 公开了一种无模型自适应控制器，其使用具有学习算法的动态人造神经网络来控制任何单变量或多变量开环稳定，可控制和一致的直接作用或反向作用的工业过程，而不需要任何手动 调整，定量知识的过程或过程标识符。 通过将1替换为过程的实际灵敏度函数DIFFERENTIAL y（t）/差分u（t）来避免对过程知识的需求。

    Arrangement and method for automatically determined time constant for a control device
    45.
    发明授权
    Arrangement and method for automatically determined time constant for a control device 有权
    用于控制装置自动确定时间常数的布置和方法

    公开(公告)号：US08316926B2

    公开(公告)日：2012-11-27

    申请号：US11590691

    申请日：2006-10-31

    Applicant: George Shu-Xing Cheng ,  Osman Ahmed ,  William Thomas Pienta

    Inventor： George Shu-Xing Cheng ,  Osman Ahmed ,  William Thomas Pienta

    IPC: F25D13/00 ,  F24F11/00 ,  F28F13/00 ,  G05D23/32 ,  F25B41/00 ,  F25B19/00

    CPC classification number: F24F11/008 ,  F24F3/0442 ,  F24F11/83 ,  Y02B30/767

    Abstract: An arrangement for use in connection with an air handling unit includes a controller and a processing circuit. The controller is configured to control a device within an air handler unit, which includes at least a first coil. The processing circuit is configured to receive first information representative of a maximum liquid flow rate through the first coil and second information representative of a maximum air flow rate of the first coil. The processing circuit is further configured to generate a time constant estimate, based on the first information and second information, for use in the controller in performing control of the device.

    Abstract translation: 与空气处理单元结合使用的装置包括控制器和处理电路。 控制器被配置为控制空气处理器单元内的装置，其包括至少第一线圈。 处理电路被配置为接收表示通过第一线圈的最大液体流速的第一信息和表示第一线圈的最大空气流量的第二信息。 处理电路还被配置为基于第一信息和第二信息生成时间常数估计，以在控制器中使用以执行设备的控制。

    Nucleic acids encoding respiratory syncytial virus subgroup B strain 9320
    46.
    发明授权
    Nucleic acids encoding respiratory syncytial virus subgroup B strain 9320 有权
    编码呼吸道合胞病毒亚组B菌株9320的核酸

    公开(公告)号：US08163530B2

    公开(公告)日：2012-04-24

    申请号：US12508075

    申请日：2009-07-23

    Applicant: Xing Cheng ,  Hyun Jung Park ,  Hong Jin

    Inventor： Xing Cheng ,  Hyun Jung Park ,  Hong Jin

    IPC: C12N7/00 ,  C12N7/01 ,  C12N7/04 ,  A61K39/155

    CPC classification number: C07K14/005 ,  A61K2039/525 ,  A61K2039/5254 ,  C07K16/1027 ,  C12N2760/18522

    Abstract: The complete polynucleotide sequence of the human respiratory syncytial virus subgroup B strain 9320 genome is provided. Proteins encoded by this polynucleotide sequence are also provided. Isolated or recombinant RSV (e.g., attenuated recombinant RSV), nucleic acids, and polypeptides, e.g., comprising mutations in the attachment protein G, are also provided, as are immunogenic compositions comprising such isolated or recombinant RSV, nucleic acids, and polypeptides. Related methods are also described.

    Abstract translation: 提供了人呼吸道合胞病毒亚组B株9320基因组的完整多核苷酸序列。 还提供了由该多核苷酸序列编码的蛋白质。 还提供了分离或重组的RSV（例如减毒的重组RSV），核酸和多肽，例如包含附着蛋白G中的突变，包含这种分离的或重组的RSV，核酸和多肽的免疫原性组合物也是如此。 还描述了相关方法。

    Combined nanoimprinting and photolithography for micro and nano devices fabrication
    50.
    发明申请
    Combined nanoimprinting and photolithography for micro and nano devices fabrication 有权
    用于微纳米器件制造的组合纳米压印和光刻

    公开(公告)号：US20060237881A1

    公开(公告)日：2006-10-26

    申请号：US10545456

    申请日：2004-02-13

    Applicant: Lingjie Guo ,  Xing Cheng

    Inventor： Lingjie Guo ,  Xing Cheng

    IPC: B29C35/08

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/50

    Abstract: A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a mask member positioned generally adjacent the resist layer. Radiation energy is then transmitted through the mold and into the resist layer; however, the mask member substantially prevents transmission of the radiation energy therethrough, thereby defining an unexposed area in the resist layer. Once the mold is removed from the substrate, which consequently forms a first feature from nanoimprinting, the unexposed area of resist layer is removed through dissolving in a developer solution.

    Abstract translation: 一种制造器件的方法，包括将具有突起的模具压印在具有抗蚀剂层的基底上，使得突起与抗蚀剂层接合。 模具还具有通常邻近抗蚀剂层定位的掩模构件。 然后将辐射能量透过模具并进入抗蚀剂层; 然而，掩模构件基本上防止辐射能量透过，从而在抗蚀剂层中限定未曝光区域。 一旦将模具从基底上移除，从而形成纳米压印的第一特征，则通过溶解在显影剂溶液中去除抗蚀剂层的未曝光区域。

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