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公开(公告)号：US10394141B2
公开(公告)日：2019-08-27
申请号：US15661888
申请日：2017-07-27
Applicant: ASML Netherlands B.V.
Inventor： Michel Riepen , Dzmitry Labetski , Wilbert Jan Mestrom , Wim Ronald Kampinga , Jan Okke Nieuwenkamp , Jacob Brinkert , Henricus Jozef Castelijns , Nicolaas Ten Kate , Hendrikus Gijsbertus Schimmel , Hans Jansen , Dennis Jozef Maria Paulussen , Brian Vernon Virgo , Reinier Theodorus Martinus Jilisen , Ramin Badie , Albert Pieter Rijpma , Johannes Christiaan Leonardus Franken , Peter Van Putten , Gerrit Van Der Straaten
Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
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42.发明授权公开(公告)号：US10018925B2
公开(公告)日：2018-07-10
申请号：US15452445
申请日：2017-03-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC classification number: G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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公开(公告)号：US09983482B2
公开(公告)日：2018-05-29
申请号：US14775263
申请日：2014-02-26
Applicant: ASML Netherlands B.V. , Carl Zeiss SMT GmbH
Inventor： Erik Roelof Loopstra , Olav Waldemar Vladimir Frijns , Stig Bieling , Antonius Theodorus Wilhelmus Kempen , Ivo Vanderhallen , Nicolaas Ten Kate , Ruud Antonius Catharina Maria Beerens , Richard Henricus Adrianus Van Lieshout , Theodorus Petrus Maria Cadee , Sjoerd Nicolaas Lambertus Donders , Alexander Matthijs Struycken , Marcus Petrus Scheepers
CPC classification number: G03F7/70033 , G02B5/0891 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983 , G21K1/067 , H05G2/003 , H05G2/008
Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
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公开(公告)号：US09857696B2
公开(公告)日：2018-01-02
申请号：US15273416
申请日：2016-09-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
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公开(公告)号：US09678445B2
公开(公告)日：2017-06-13
申请号：US15233775
申请日：2016-08-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
IPC: G03B27/52 , G03B27/42 , G03F7/20 , H01L21/687 , C23C16/44
CPC classification number: G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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Patent Agency Ranking
公开(公告)号：US20170090304A1
公开(公告)日：2017-03-30
申请号：US15297001
申请日：2016-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johanne De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/70733
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US09429853B2
公开(公告)日：2016-08-30
申请号：US14664360
申请日：2015-03-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.
Abstract translation: 一种光刻设备，包括可移动台，配置成将图案化辐射束投影到基板上的投影系统以及被配置为向投影系统的最终元件和台之间的空间提供液体的液体供应系统，液体供应 系统，其包括被配置为向该空间提供液体的入口，入口包括位于最终元件的底表面下方的入口孔阵列，并被配置为从其提供基本上水平的液体流，沿着一侧延伸的入口孔阵列 所述图案化辐射束的曝光区域以及被配置为从所述空间移除液体的提取器，所述提取器包括至少部分地沿水平方向延伸的出口孔的二维阵列，通过所述出口孔可以从 空间。
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公开(公告)号：US20160011522A1
公开(公告)日：2016-01-14
申请号：US14858885
申请日：2015-09-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michaël Christiaan Van Der Wekken
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70733
Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
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公开(公告)号：US12204255B2
公开(公告)日：2025-01-21
申请号：US18300094
申请日：2023-04-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/00
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US12072635B2
公开(公告)日：2024-08-27
申请号：US17531953
申请日：2021-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Christian Gerardus Norbertus Hendricus Marie Cloin , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michael Christiaan Van Der Wekken
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70733
Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
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