公开(公告)号：US06897940B2

公开(公告)日：2005-05-24

申请号：US10455254

申请日：2003-06-04

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  G03B27/52 ,  G03B27/62 ,  G03B27/32 ,  G03B27/34

CPC分类号： G03F7/70233 ,  G03F7/70258 ,  G03F7/70266 ,  G03F7/703 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/70875 ,  G03F7/70891 ,  Y10T428/24802

摘要： A system for correcting aberration and distortion in EUV lithography places a reticle on a deformable reticle chuck, and a reticle height sensor is used to measure the surface height of the reticle placed on the deformable reticle chuck. An optical system projects EUV radiation onto the reticle and collects and projects reflected EUV radiation from the reticle through its exit pupil onto a wafer placed on a wafer chuck. A deformable mirror disposed proximal to the exit pupil may also be controlled for this purpose. The deformable reticle chuck and the deformable mirror are controlled such that aberration and distortion of an image of the reticle formed on the wafer by the optical system are corrected based on the height measured by the reticle height sensor. The deformable reticle chuck includes a supporting structure, a deformable membrane disposed above and being comprised of a dielectric layer and a conductive layer, a voltage source connected to the conductive coating on the reticle and the conductive layer to generate an electrostatic attractive force between them, a plurality of actuator rods each connected to a corresponding one of actuators, and a coolant gas inside a chamber formed between the membrane and the top surface of the supporting structure. A deformable wafer chuck and wafer height sensor may be included to provide further correction of the image.

摘要翻译： 用于校正EUV光刻中的像差和畸变的系统将光罩放置在可变形的光罩卡盘上，并且使用标线高度传感器来测量放置在可变形标线盘卡盘上的掩模版的表面高度。 光学系统将EUV辐射投射到掩模版上，并将来自掩模版的反射EUV辐射通过其出射光瞳聚集并投射到放置在晶片卡盘上的晶片上。 为了此目的也可以控制靠近出射光瞳设置的可变形反射镜。 控制可变形的光罩卡盘和可变形反射镜，使得基于由光罩高度传感器测量的高度来校正通过光学系统在晶片上形成的掩模版图像的像差和畸变。 可变形标线盘卡盘包括支撑结构，设置在电介质层和导电层之上并由导电层构成的可变形膜，连接到标线片上的导电涂层和导电层的电压源，以在它们之间产生静电引力， 多个致动器杆，每个致动器杆连接到相应的一个致动器，以及在膜和支撑结构的顶表面之间形成的室内的冷却剂气体。 可以包括可变形的晶片卡盘和晶片高度传感器以提供图像的进一步校正。

公开(公告)号：US20110164343A1

公开(公告)日：2011-07-07

申请号：US12652669

申请日：2010-01-05

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： H01L21/683

CPC分类号： H01L21/6831 ,  G03F7/70708 ,  H01L21/6833

摘要： An electrostatic chuck (230) for holding a device (200) includes a chuck body (244), a Coulomb electrode assembly (246), a Johnsen-Rahbek (J-R) electrode assembly (248), and a control system (224). The chuck body (244) includes a chucking surface (250) that engages the device (200), and the chuck body (244) is made of a dielectric having a relatively high resistance. The J-R electrode assembly (248) is positioned spaced apart from the chucking surface (250). The Coulomb electrode assembly (246) is also positioned spaced apart from the chucking surface (250). The control system (224) selectively directs a first voltage to the J-R electrode assembly (248) to generate a J-R type force that attracts the device (200) towards the chucking surface (250), and selectively directs a second voltage to the Coulomb electrode assembly (246) to generate a Coulomb type force that also attracts the device (200) towards the chucking surface (250). With this design, both the J-R type force and the Coulomb type force are used to concurrently attract the device (200) against the chucking surface (2500. As a result thereof, the electrostatic chuck (230) is better able to reduce non-flatness of the device (200), and/or crush any particles positioned between the device (200) and the chucking surface (250).

摘要翻译： 用于保持装置（200）的静电卡盘（230）包括卡盘主体（244），库仑电极组件（246），约翰 - 拉贝克（J·R）电极组件（248）和控制系统（224））。 卡盘主体（244）包括与装置（200）接合的卡盘表面（250），卡盘主体（244）由具有较高阻力的电介质制成。 J-R电极组件（248）定位成与夹紧表面（250）间隔开。 库仑电极组件（246）也位于与夹紧表面（250）间隔开的位置。 所述控制系统（224）选择性地将第一电压引导到所述JR电极组件（248）以产生将所述装置（200）吸引到所述夹紧表面（250）的JR型力，并且选择性地将第二电压引导到所述库仑电极 组件（246）以产生也吸引装置（200）朝向夹紧表面（250）的库仑型力。 通过这种设计，JR型力和库仑型力均被用于同时将装置（200）吸引在卡盘表面（2500）上。因此，静电卡盘（230）能够更好地降低非平坦度 的装置（200），和/或压缩位于装置（200）和夹紧表面（250）之间的任何颗粒。

公开(公告)号：US20090021706A1

公开(公告)日：2009-01-22

申请号：US11921228

申请日：2006-05-16

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70858

摘要： A ferrofluid is provided adjacent to the immersion area between a projection optical system (PL) and substrate and receives a magnetic force so as to form a ferrofluidic seal (100) adjacent to the immersion area so as to inhibit immersion liquid from escaping from the gap between the projection optical system and substrate. The ferrofluid can be a fluid having a colloidal suspension of ferromagnetic particles in it.

摘要翻译： 在投影光学系统（PL）和基板之间的浸没区域附近提供铁磁流体，并且接收磁力以形成与浸没区域相邻的铁磁流体密封件（100），以便抑制浸没液体从间隙逸出 在投影光学系统和基板之间。 铁磁流体可以是其中具有铁磁性颗粒的胶体悬浮液的流体。

公开(公告)号：US20080309895A1

公开(公告)日：2008-12-18

申请号：US12222421

申请日：2008-08-08

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03D3/02 ,  C07K14/005 ,  C12N2740/15022 ,  G01N33/56983 ,  G01N2333/155 ,  G01N2469/20 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085 ,  G03F7/709

摘要： An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.

摘要翻译： 一种装置包括支撑基板的台，具有最后光学元件的光学系统，其将图像投影到基板上，该基板与最后的光学元件间隔开至少部分地填充有浸没液体的间隙，以及 压力控制系统具有致动器，其使用致动器来控制间隙中的浸没液体的压力。

公开(公告)号：US20080151221A1

公开(公告)日：2008-06-26

申请号：US11588643

申请日：2006-10-27

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G01J3/00

CPC分类号： G01J1/429 ,  G01J1/04 ,  G01J1/0407 ,  G01J1/0455 ,  G03F7/70558 ,  G03F7/7085

摘要： A monitoring system for an lithographic system is disclosed. In particular, the monitoring system can be utilized in an extreme ultraviolet lithographic system. In a monitoring system according to the present invention, a plurality of detectors are positioned to receive radiation from a pattern of positions on a mirror that is part of the lithographic system. In some embodiments, the plurality of detectors may be positioned on the mirror. In some embodiments, the plurality of detectors may be positioned behind the mirror and receive radiation through holes formed in the mirror. In some embodiments, radiation from the pattern of positions may be reflected by facets into the detectors.

摘要翻译： 公开了一种用于光刻系统的监视系统。 特别地，监测系统可以用于极紫外光刻系统中。 在根据本发明的监视系统中，多个检测器被定位成接收来自作为光刻系统的一部分的反射镜上的位置图案的辐射。 在一些实施例中，多个检测器可以位于反射镜上。 在一些实施例中，多个检测器可以位于反射镜后面并且接收通过形成在反射镜中的孔的辐射。 在一些实施例中，来自位置图案的辐射可以被小平面反射到检测器中。

公开(公告)号：US07355676B2

公开(公告)日：2008-04-08

申请号：US11329269

申请日：2006-01-11

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion fluid that is directly between the fluid barrier and the device. The fluid barrier can include a scavenge inlet that is positioned near the device, and the immersion fluid system can include a low pressure source that is in fluid communication with the scavenge inlet. The fluid barrier confines any vapor of the immersion fluid and prevents it from perturbing a measurement system. Additionally, the environmental system can include a bearing fluid source that directs a bearing fluid between the fluid barrier and the device to support the fluid barrier relative to the device.

公开(公告)号：US07323698B2

公开(公告)日：2008-01-29

申请号：US10967123

申请日：2004-10-19

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70916

摘要： A subsystem for an exposure apparatus has a thermophoretic plate and at least one shielding layer covering a first surface of the thermophoretic plate. The at least one shielding layer controls thermally induced distortions of the exposure apparatus by reducing heat transfer between the exposure apparatus and the thermophoretic plate. The shielding layer includes an insulation layer and a reflective layer, where the reflective layer has a surface with a low emissivity. In one implementation, the reflective surface may be a surface of the thermophoretic plate. The reflective surface should be facing the exposure apparatus, but is not a requirement. More than one shielding layer may be used, in which each outermost shielding layer will have a higher temperature.

摘要翻译： 用于曝光装置的子系统具有热泳板和覆盖热泳板的第一表面的至少一个屏蔽层。 所述至少一个屏蔽层通过减少曝光装置和热泳板之间的热传导来控制曝光装置的热诱导失真。 屏蔽层包括绝缘层和反射层，其中反射层具有低发射率的表面。 在一个实施方案中，反射表面可以是热泳板的表面。 反射面应面向曝光装置，但不是要求。 可以使用多于一个屏蔽层，其中每个最外面的屏蔽层将具有较高的温度。

公开(公告)号：US20070247603A1

公开(公告)日：2007-10-25

申请号：US11819089

申请日：2007-06-25

申请人： Andrew Hazelton ,  Michael Sogard

发明人： Andrew Hazelton ,  Michael Sogard

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion fluid that is directly between the fluid barrier and the device. The fluid barrier can include a scavenge inlet that is positioned near the device, and the immersion fluid system can include a low pressure source that is in fluid communication with the scavenge inlet. The fluid barrier confines any vapor of the immersion fluid and prevents it from perturbing a measurement system. Additionally, the environmental system can include a bearing fluid source that directs a bearing fluid between the fluid barrier and the device to support the fluid barrier relative to the device.

摘要翻译： 环境系统控制光学组件和装置之间的间隙中的环境，并且包括流体屏障和浸液系统。 流体屏障位于设备附近。 浸没流体系统提供填充间隙的浸没流体并且收集直接在流体屏障和装置之间的浸没流体。 流体屏障可以包括位于装置附近的扫气入口，并且浸没流体系统可以包括与清流入口流体连通的低压源。 流体屏障限制浸没流体的任何蒸气，并防止其扰动测量系统。 此外，环境系统可以包括轴承流体源，其将轴承流体引导在流体屏障和装置之间以相对于装置支撑流体屏障。

公开(公告)号：US20070211232A1

公开(公告)日：2007-09-13

申请号：US10578752

申请日：2004-11-10

申请人： Alton Phillips ,  Michael Sogard ,  Douglas Watson ,  Keiichi Tanaka

发明人： Alton Phillips ,  Michael Sogard ,  Douglas Watson ,  Keiichi Tanaka

IPC分类号： G03B27/52

CPC分类号： G03F7/70741 ,  G03B27/52 ,  G03F1/82 ,  G03F7/70875 ,  G03F7/70916

摘要： Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.

摘要翻译： 在光刻系统内进行热电泳以保护掩模版免受污染物（例如浮动颗粒）的影响。 通常，通过将掩模版保持在比周围环境更高的温度下来实现热保护。 在光刻系统中使用的掩模版可以保持热保护。 例如，在通过分划板处理器（也称为末端执行器）的各种运输阶段到存储期间，在将光罩保持在其使用期间，同时附着于标线盘卡盘上，可以对掩模版进行热保护。

公开(公告)号：US07250618B2

公开(公告)日：2007-07-31

申请号：US11050394

申请日：2005-02-02

申请人： Michael Sogard ,  Mark Takita

发明人： Michael Sogard ,  Mark Takita

IPC分类号： G21K5/10 ,  G01N23/04

CPC分类号： H01J37/242 ,  H01J2237/3175

摘要： A heating assembly (36) for heating a cathode (38) of an electron gun (30) of an exposure apparatus (10) includes a radiation source (42) and a beam shaper (44). The radiation source (42) generates a source beam (46). The beam shaper (44) receives the source beam (46) and selectively shapes the source beam (46) into a shaped beam (48) that is directed to the cathode (38). In certain embodiments, the beam shaper (44) can readily change the shape and intensity profile of the shaped beam (48) to achieve a desired electron beam (32) from the electron gun (30). In one embodiment, the radiation source (42) generates a pulsed source beam (46).

摘要翻译： 用于加热曝光装置（10）的电子枪（30）的阴极（38）的加热组件（36）包括辐射源（42）和光束整形器（44）。 辐射源（42）产生源光束（46）。 光束整形器（44）接收源光束（46）并且选择性地将源光束（46）成形为被引导到阴极（38）的成形光束（48）。 在某些实施例中，光束整形器（44）可以容易地改变成形光束（48）的形状和强度分布，以实现来自电子枪（30）的期望的电子束（32）。 在一个实施例中，辐射源（42）产生脉冲源光束（46）。