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    Lithographic apparatus and device manufacturing method
    41.
    发明申请
    Lithographic apparatus and device manufacturing method 有权

    公开(公告)号：US20060132750A1

    公开(公告)日：2006-06-22

    申请号：US11018927

    申请日：2004-12-22

    申请人： Cheng-Qun Gui ,  Pieter De Jager ,  Robert-Han Munnig Schmidt

    发明人： Cheng-Qun Gui ,  Pieter De Jager ,  Robert-Han Munnig Schmidt

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70291 ,  G03F7/70275 ,  G03F7/70308

    摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.

    Lithographic apparatus and device manufacturing method
    42.
    发明授权
    Lithographic apparatus and device manufacturing method 有权

    公开(公告)号：US06967711B2

    公开(公告)日：2005-11-22

    申请号：US10795802

    申请日：2004-03-09

    申请人： Cheng-Qun Gui

    发明人： Cheng-Qun Gui

    IPC分类号： G03F7/20 ,  G02B3/00 ,  G03B27/42 ,  G03B27/54 ,  H01L21/027

    CPC分类号： G03F7/70291 ,  G03F7/70275

    摘要： A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.

    Large field of view 2X magnification projection optical system for FPD manufacture
    43.
    发明申请
    Large field of view 2X magnification projection optical system for FPD manufacture 有权
    大视野2倍放大投影光学系统用于FPD制造

    公开(公告)号：US20050237505A1

    公开(公告)日：2005-10-27

    申请号：US10921097

    申请日：2004-08-19

    申请人： Robert Harned ,  Lev Sakin ,  Patrick de Jager ,  Cheng-Qun Gui ,  Irina Pozhinskaya ,  Noreen Harned

    发明人： Robert Harned ,  Lev Sakin ,  Patrick de Jager ,  Cheng-Qun Gui ,  Irina Pozhinskaya ,  Noreen Harned

    IPC分类号： G02B17/00 ,  G02B17/06 ,  G03B27/52 ,  G03F7/20 ,  G09F9/00 ,  H01L21/027

    CPC分类号： G03B27/52 ,  G02B17/061 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/706 ,  G03F7/70791

    摘要： An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification ringfield reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2× optical system can be used to expose FPDs. The designs for the 1.5× and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface. The corrector may be a flat glass plate, or a lens having concave-convex, concave-concave or convex-convex surfaces.

    摘要翻译： 用于制造平板显示器（FPD）的曝光系统包括光罩台和基板台。 放大倍数环形反射光学系统将掩模版图像到基板上。 该系统可以是2x放大系统，或与当前可用的掩模尺寸兼容的另一倍率。 通过写入具有FPD所需尺寸的一半的电路图形尺寸的光罩，可以使用2x光学系统来曝光FPD。 用于1.5倍和更大倍率的光学系统的设计通常至少有三个电动镜。 位于掩模版附近或基板附近的校正器可以被添加到三反射镜设计中以改善系统的光学性能。 校正器可以是反射或折射设计。 校正器可以具有非球面表面，并且可选地具有动力表面。 校正器可以是平板玻璃板或具有凹凸，凹入或凸凸表面的透镜。

    Lithographic apparatus and device manufacturing method
    44.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20050213067A1

    公开(公告)日：2005-09-29

    申请号：US10811070

    申请日：2004-03-29

    申请人： Gustaaf Van Der Feltz ,  Cheng-Qun Gui ,  Johan Hoefnagels

    发明人： Gustaaf Van Der Feltz ,  Cheng-Qun Gui ,  Johan Hoefnagels

    IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/54

    CPC分类号： G03F7/70875 ,  G03F7/705

    摘要： A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.

    摘要翻译： 一种光刻设备和方法，其中使用图案化系统以在其横截面中将投影光束赋予图案。 光束由投影系统从照明系统引导到支撑在基板支撑件上的基板的表面的目标部分上。 目标部分相对于衬底台具有适合于衬底表面上的期望曝光图案的预定空间特性。 测量衬底的温度，并计算衬底对测量温度的尺寸响应。 调整目标部分相对于衬底台的空间特性以补偿所计算的尺寸响应。

    Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method
    46.
    发明申请
    Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method 失效
    光刻设备的校准方法，校准方法，计算机程序，数据存储介质，光刻设备和器件制造方法

    公开(公告)号：US20050018159A1

    公开(公告)日：2005-01-27

    申请号：US10845521

    申请日：2004-05-14

    申请人： Henricus Van Buel ,  Cheng-Qun Gui ,  Alex De Vries

    发明人： Henricus Van Buel ,  Cheng-Qun Gui ,  Alex De Vries

    IPC分类号： G03F9/00 ,  H01L21/027 ,  G03B27/68

    CPC分类号： G03F9/7019 ,  G03F9/7003 ,  G03F9/7011 ,  G03F9/7084

    摘要： In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array may then be used to accurately calculate the position of further substrates.

    摘要翻译： 在补偿前后对准光学元件的失真的一种方法中，计算衬底标记的估计位置与衬底标记的实际位置之间的位移矢量。 还通过将参考基板移动固定量并且比较参考基板的背面上的点的图像移动到基板的正面上的对应点移动多远的距离来计算光学校正阵列。 然后可以使用位移矢量和光学校正阵列来精确地计算另外的衬底的位置。

    Lithographic apparatus and device manufacturing method
    49.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US08502954B2

    公开(公告)日：2013-08-06

    申请号：US12469953

    申请日：2009-05-21

    申请人： Gustaaf Willem Van Der Feltz ,  Cheng-Qun Gui ,  Johan Christiaan Gerard Hoefnagels

    发明人： Gustaaf Willem Van Der Feltz ,  Cheng-Qun Gui ,  Johan Christiaan Gerard Hoefnagels

    IPC分类号： G03B27/52 ,  G03B27/54 ,  G03B27/42

    CPC分类号： G03F7/70875 ,  G03F7/705

    摘要： A lithographic apparatus and method in which a system is used to emit a patterned beam. The patterned beam is projected onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.

    摘要翻译： 一种光刻设备和方法，其中使用系统来发射图案化的光束。 图案化的光束被投影到支撑在基板支撑件上的基板的表面的目标部分上。 目标部分相对于衬底台具有适合于衬底表面上的期望曝光图案的预定空间特性。 测量衬底的温度，并计算衬底对测量温度的尺寸响应。 调整目标部分相对于衬底台的空间特性以补偿所计算的尺寸响应。