公开(公告)号：US20070259275A1

公开(公告)日：2007-11-08

申请号：US11418465

申请日：2006-05-05

申请人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Koen Schenau ,  Derk Klunder

发明人： Maarten Marinus Johannes Van Herpen ,  Vadim Banine ,  Koen Schenau ,  Derk Klunder

IPC分类号： G03B27/42 ,  G21K5/00 ,  G03F1/00

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G03F7/70575 ,  G21K1/062

摘要： An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

摘要翻译： EUV掩模在多层反射镜之上包括光谱纯度增强层，用于EUV光刻设备中。 在光谱纯度增强层的顶部，提供了图案化的吸收层。 光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可以存在中间层或第二光谱纯度增强层和中间层。 图案化的吸收层本身也可以用作抗反射（AR）涂层。 该吸收层的AR效应是图案中孔径尺寸的函数。 可以增强掩模的光谱纯度，使得DUV辐射比EUV辐射相对更强。

公开(公告)号：US20070158579A1

公开(公告)日：2007-07-12

申请号：US11643955

申请日：2006-12-22

申请人： Johannes Moors ,  Vadim Banine ,  Bastiaan Wolschrijn ,  Carolus Antonius Spee ,  Rik Jansen

发明人： Johannes Moors ,  Vadim Banine ,  Bastiaan Wolschrijn ,  Carolus Antonius Spee ,  Rik Jansen

IPC分类号： H01J27/00

CPC分类号： G03F7/2043 ,  G03F7/70041 ,  G03F7/70925

摘要： An optical apparatus includes an illumination system configured to form a pulsed radiation beam, an optical element with a surface on which the radiation beam is incident in operation, and a gas source arranged to supply a mixture of a first type of gas and a second type of gas to a space adjacent the surface. Particles of the first and second types of gas are capable of reacting with the surface, when activated by the radiation beam. The gas source is configured to generate a combination of surface occupation numbers of molecules of the first and second types of gas on the surface under operating conditions, at least prior to pulses of the radiation beam, the combination of surface occupation numbers lying in a range in which reactions of particles with the surface during pulses of the radiation beam are in majority reversed.

摘要翻译： 光学装置包括被配置为形成脉冲辐射束的照明系统，具有辐射束在其中入射的表面的光学元件，以及设置成供应第一类型气体和第二类型的混合物的气体源 的气体到邻近表面的空间。 当由辐射束激活时，第一和第二类气体的颗粒能够与表面反应。 气源被配置成至少在辐射束的脉冲之前，在工作条件下，在表面上产生第一和第二类气体的分子的表面占有数量的组合，表面占有数的组合在一个范围内 其中在辐射束的脉冲期间颗粒与表面的反应多数反转。

公开(公告)号：US20070085984A1

公开(公告)日：2007-04-19

申请号：US11252240

申请日：2005-10-18

申请人： Vadim Banine ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Hubertus Moors ,  Bastiaan Wolschrijn

发明人： Vadim Banine ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Hubertus Moors ,  Bastiaan Wolschrijn

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70841 ,  G03F7/70908

摘要： A lithographic projection apparatus includes a radiation system configured to supply a beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system configured to image an irradiated portion of the mask onto a target portion of the substrate, wherein the projection system is separated from the substrate table by an intervening space that is at least partially evacuated and is delimited at the location of the projection system by a solid surface from which the employed radiation is directed toward the substrate table; the intervening space contains a hollow tube located between the solid surface and the substrate table and situated around the path of the beam of radiation, the tube being configured such that beam of radiation focused by the projection system onto the substrate table does not intercept a wall of the hollow tube; a flushing system is configure to continually flush the inside of the hollow tube with a flow of gas, wherein the gas is hydrogen, the flow of the gas is opposed to the flow of contaminants from the substrate and/or the hollow tube is in fluid communication with the intervening space.

摘要翻译： 光刻投影设备包括被配置为提供辐射束的辐射系统; 设置有用于保持面罩的面罩座的面罩台; 设置有用于保持基板的基板保持器的基板台; 投影系统，被配置为将所述掩模的照射部分成像到所述基板的目标部分上，其中所述投影系统通过至少部分抽真空并且在所述投影系统的位置处界定的中间空间与所述基板台分离 通过使用的辐射从该表面朝向衬底台的固体表面; 中间空间包含位于固体表面和基底台之间的中空管，并且位于辐射束的路径周围，该管被配置成使得由投影系统聚焦到衬底台上的辐射束不会拦截壁 的中空管; 冲洗系统被配置为以气流连续冲洗中空管的内部，其中气体是氢气，气体的流动与来自基底和/或中空管的污染物的流动相对流体 与中间空间的沟通。

公开(公告)号：US20070069160A1

公开(公告)日：2007-03-29

申请号：US11235547

申请日：2005-09-27

申请人： Vadim Banine ,  Lambertus Wildenberg ,  Vladimir Krivtsun ,  Alexander Struycken ,  Johannes Ridder ,  Vladimir Ivanov ,  Josephus Smits

发明人： Vadim Banine ,  Lambertus Wildenberg ,  Vladimir Krivtsun ,  Alexander Struycken ,  Johannes Ridder ,  Vladimir Ivanov ,  Josephus Smits

IPC分类号： G01J3/10

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

公开(公告)号：US20070069159A1

公开(公告)日：2007-03-29

申请号：US11525224

申请日：2006-09-22

申请人： Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Robert Gayazov ,  Vladimir Krivtsun

发明人： Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Robert Gayazov ,  Vladimir Krivtsun

IPC分类号： G21G4/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.

摘要翻译： 基于放电产生辐射源的装置包括阴极和阳极。 在包含两种或更多种物质的合金的材料中产生放电。

公开(公告)号：US20070062557A1

公开(公告)日：2007-03-22

申请号：US11367693

申请日：2006-03-06

申请人： Tatyana Rakhimova ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Johannes Moors ,  Aleksander Kovalev ,  Dmitriy Lopaev

发明人： Tatyana Rakhimova ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Johannes Moors ,  Aleksander Kovalev ,  Dmitriy Lopaev

IPC分类号： B08B6/00 ,  C25F5/00 ,  C25F3/30 ,  C25F1/00

CPC分类号： G03F7/70925 ,  G03F7/70933 ,  G21K2201/06

摘要： A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.

摘要翻译： 用于清洁光刻设备的元件的方法，例如诸如集光镜的光学元件，包括提供含氮的气体; 从至少部分气体产生氮自由基，从而形成含有自由基的气体; 以及将至少部分含自由基的气体提供给所述装置的一个或多个元件。 光刻设备包括源和光学元件，以及布置成产生射频放电的放电发生器。

公开(公告)号：US20070023706A1

公开(公告)日：2007-02-01

申请号：US11175036

申请日：2005-07-06

申请人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Van De Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Louis Verpalen ,  Antonius Van De Pas

发明人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Van De Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Louis Verpalen ,  Antonius Van De Pas

IPC分类号： G01J3/10

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

摘要翻译： 光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。 污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。 箔或板相对于辐射束的光轴基本上径向定向。 污染物陷阱设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。

公开(公告)号：US20060278833A1

公开(公告)日：2006-12-14

申请号：US11150466

申请日：2005-06-13

申请人： Maarten Marinus Wilhelmus Van Herpen ,  Vadim Banine ,  Derk Klunder

发明人： Maarten Marinus Wilhelmus Van Herpen ,  Vadim Banine ,  Derk Klunder

IPC分类号： G21K5/10

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

公开(公告)号：US20060245058A1

公开(公告)日：2006-11-02

申请号：US11337807

申请日：2006-01-24

申请人： Maarten Marinus Johannes Van Herpen ,  Levinus Bakker ,  Vadim Banine ,  Derk Jan Klunder

发明人： Maarten Marinus Johannes Van Herpen ,  Levinus Bakker ,  Vadim Banine ,  Derk Jan Klunder

IPC分类号： G02B1/10

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

摘要翻译： 多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。 该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。 因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。 可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。

公开(公告)号：US20060061740A1

公开(公告)日：2006-03-23

申请号：US10944422

申请日：2004-09-20

申请人： Levinus Bakker ,  Vadim Banine ,  Arnoud Wassink

发明人： Levinus Bakker ,  Vadim Banine ,  Arnoud Wassink

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70058

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam substantially from a light emitting point. The illumination system includes a contaminant trapping system. The trapping system includes a contaminant trap having a central zone and a peripheral zone. The trap includes a plurality of platelets that extend substantially outwards through the peripheral zone. The light emitting point is in a plane with which the platelets coincide. Each of the platelets has a normal with a component directed towards the central zone.

摘要翻译： 光刻设备包括被配置为基本上从发光点调节辐射束的照明系统。 照明系统包括污染物捕集系统。 捕集系统包括具有中心区域和周边区域的污染物阱。 捕获器包括多个基本上向外延伸通过周边区域的血小板。 发光点在与血小板重合的平面中。 每个血小板具有正常的，部件指向中心区。