Managing cross-premises resources through integrated view
    44.
    发明授权
    Managing cross-premises resources through integrated view 有权
    通过综合视图管理跨部门资源

    公开(公告)号:US09094394B2

    公开(公告)日:2015-07-28

    申请号:US13355789

    申请日:2012-01-23

    IPC分类号: G06F15/173 H04L29/06

    CPC分类号: H04L41/145 H04L63/0815

    摘要: A communication application manages cross-premises resources through an integrated view. The application creates a single view to manage local and remote resources by modeling the single view. The application manages the local and remote resources from the single view. The application transmits and receives input/output from the local and remote resources. Output is displayed in the single view. The application also secures cross-premises messaging and signaling across the local and remote resources. The application secures messaging and signaling by implementing security requirements of the resources. In addition, the application provides a single sign on (SSO) authentication across the local and remote resources.

    摘要翻译: 通信应用程序通过集成视图管理跨部门资源。 该应用程序创建一个视图来通过对单个视图建模来管理本地和远程资源。 该应用程序从单个视图管理本地和远程资源。 应用程序从本地和远程资源发送和接收输入/输出。 输出显示在单个视图中。 该应用程序还可以跨本地和远程资源保护跨部署消息和信令。 应用程序通过实施资源的安全需求来保护消息和信令。 此外,应用程序还提供了跨本地和远程资源的单点登录(SSO)认证。

    Integration of lithography apparatus and mask optimization process with multiple patterning process
    45.
    发明授权
    Integration of lithography apparatus and mask optimization process with multiple patterning process 有权
    光刻设备和掩模优化工艺与多个图案化工艺的集成

    公开(公告)号:US08819601B2

    公开(公告)日:2014-08-26

    申请号:US13439692

    申请日:2012-04-04

    IPC分类号: G06F17/50

    摘要: The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns is disclosed, wherein the method comprises a splitting step being configured to be aware of requirements of a co-optimization between at least one of the sub-patterns and an optical setting of the lithography apparatus used for the lithographic process. Device characteristic optimization techniques, including intelligent pattern selection based on diffraction signature analysis, may be integrated into the multiple patterning process flow.

    摘要翻译: 本发明涉及光刻设备和工艺,更具体地涉及用于将目标图案打印超出光刻设备的分辨率限制的多重图形化光刻技术。 公开了一种通过光刻处理将待成像的图案图案分割成多个子图案的方法,其中该方法包括分割步骤,其被配置为意识到在以下过程中的至少一个之间的共优化的要求: 用于光刻工艺的光刻设备的子图案和光学设置。 包括基于衍射特征分析的智能图案选择的设备特征优化技术可以被集成到多个图案化工艺流程中。

    Method for performing pattern decomposition for a full chip design
    47.
    发明授权
    Method for performing pattern decomposition for a full chip design 有权
    执行全芯片设计模式分解的方法

    公开(公告)号:US08572521B2

    公开(公告)日:2013-10-29

    申请号:US12270498

    申请日:2008-11-13

    IPC分类号: G06F17/50

    CPC分类号: G03F7/70466 G03F1/70

    摘要: A method for decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of segmenting the target pattern into a plurality of patches; identifying critical features within each patch which violate minimum spacing requirements; generating a critical group graph for each of the plurality of patches having critical features, where the critical group graph of a given patch defines a coloring scheme of the critical features within the given patch, and the critical group graph identifies critical features extending into adjacent patches to the given patch; generating a global critical group graph for the target pattern, where the global critical group graph includes the critical group graphs of each of the plurality of patches, and an identification of the features extending into adjacent patches; and coloring the target pattern based on the coloring scheme defined by the global critical group graph.

    摘要翻译: 一种用于将包含要印刷在晶片上的特征的目标图案分解为多个图案的方法。 该方法包括以下步骤:将目标图案分割成多个贴片; 识别每个补丁内的违反最小间距要求的关键特征; 为具有关键特征的多个补丁中的每一个生成关键组图,其中给定补丁的关键组图定义给定补丁内的关键特征的着色方案,并且关键组图识别延伸到相邻补丁中的关键特征 给给定补丁; 为目标模式生成全局关键组图,其中全局关键组图包括多个补丁中的每一个的关键组图,以及延伸到相邻补丁中的特征的标识; 并基于由全局关键组图定义的着色方案着色目标图案。

    Selection of optimum patterns in a design layout based on diffraction signature analysis
    48.
    发明授权
    Selection of optimum patterns in a design layout based on diffraction signature analysis 有权
    基于衍射特征分析在设计布局中选择最佳图案

    公开(公告)号:US08543947B2

    公开(公告)日:2013-09-24

    申请号:US12914954

    申请日:2010-10-28

    IPC分类号: G06F17/50

    摘要: The present invention relates generally to selecting optimum patterns based on diffraction signature analysis, and more particularly to, using the optimum patterns for mask-optimization for lithographic imaging. A respective diffraction map is generated for each of a plurality of target patterns from an initial larger set of target patterns from the design layout. Diffraction signatures are identified from the various diffraction maps. The plurality of target patterns is grouped into various diffraction-signature groups, the target patterns in a specific diffraction-signature group having similar diffraction signature. A subset of target patterns is selected to cover all possible diffraction-signature groups, such that the subset of target patterns represents at least a part of the design layout for the lithographic process. The grouping of the plurality of target patterns may be governed by predefined rules based on similarity of diffraction signature. The predefined rules comprise coverage relationships existing between the various diffraction-signature groups.

    摘要翻译: 本发明一般涉及基于衍射特征分析来选择最佳图案,并且更具体地涉及使用用于光刻成像的掩模优化的最佳图案。 从来自设计布局的初始较大的目标图案集合中的多个目标图案中的每一个生成相应的衍射图。 从各种衍射图识别衍射特征。 多个目标图案被分组成各种衍射签名组,具有相似衍射特征的特定衍射签名组中的目标图案。 选择目标图案的子集以覆盖所有可能的衍射签名组,使得目标图案的子集代表光刻工艺的设计布局的至少一部分。 多个目标图案的分组可以通过基于衍射签名的相似性的预定规则来管理。 预定义的规则包括存在于各种衍射签名组之间的覆盖关系。

    Navigation system with calendar mechanism and method of operation thereof
    50.
    发明授权
    Navigation system with calendar mechanism and method of operation thereof 有权
    具有日历机制的导航系统及其操作方法

    公开(公告)号:US08457883B2

    公开(公告)日:2013-06-04

    申请号:US12763358

    申请日:2010-04-20

    申请人: Hong Chen HaiPing Jin

    发明人: Hong Chen HaiPing Jin

    IPC分类号: G01C21/00

    CPC分类号: G01C21/362

    摘要: A method of operation of a navigation system includes: sending a meeting proposal to a participant calendar with the meeting proposal having a meeting location and a meeting start time; determining a prior location from the participant calendar; calculating a participant travel time for traversing between the prior location and the meeting location; and scheduling the meeting proposal on the participant calendar based on the participant travel time not exceeding the meeting start time for displaying on a device.

    摘要翻译: 一种导航系统的操作方法,包括:将会议提议发送给会议提议具有会议位置和会议开始时间; 从所述参与者日历确定先前位置; 计算在先前位置和会议位置之间穿过的参与者行进时间; 并根据不超过会议开始时间的参与者旅行时间在会议日程上安排会议提案,以便在设备上显示。