Selective anisotropic reactive ion etching process for polysilicide
composite structures
    41.
    发明授权
    Selective anisotropic reactive ion etching process for polysilicide composite structures 失效
    多晶硅复合结构的选择性各向异性反应离子蚀刻工艺

    公开(公告)号:US4528066A

    公开(公告)日:1985-07-09

    申请号:US628558

    申请日:1984-07-06

    CPC分类号: H01L21/32137 H01L21/312

    摘要: A reactive ion etching technique is disclosed for etching a gate electrode out of layers of tungsten silicide and polycrystalline silicon without etching the underlying layer of silicon dioxide which serves as the gate dielectric and which covers the source and drain regions. The key feature of the invention, wherein the gate, which has been partially etched out of the tungsten silicide and polycrystalline silicon layers, is coated with poly tetra-fluoroethylene (teflon) to protect the sidewalls of the gate from being excessively etched in the lateral direction while the etching continues at the bottom on either side of the gate.The process is especially suitable for formation of tungsten silicide structures since no subsequent thermal steps are required which would otherwise cause a delamination of the tungsten silicide. In addition to eliminating undercutting, the process does not disturb the gate oxide over the source and drain areas, which would otherwise create a leaky device unsuitable for applications such as dynamic RAMs. The entire process can be carried out in a single pump down and therefore contamination levels can be minimized.

    摘要翻译: 公开了一种反应离子蚀刻技术,用于将栅极电极从硅化钨和多晶硅层之外蚀刻,而不会蚀刻用作栅极电介质并覆盖源极和漏极区域的二氧化硅的下层。 本发明的关键特征在于,已经部分地从硅化钨和多晶硅层中蚀刻出的栅极涂覆有聚四氟乙烯(聚四氟乙烯),以保护栅极的侧壁在侧面被过度蚀刻 而蚀刻在栅极的任一侧的底部继续蚀刻。 该方法特别适合于形成硅化钨结构,因为不需要随后的热步骤,否则会导致硅化钨的分层。 除了消除底切之外,该过程不会干扰源极和漏极区域上的栅极氧化物,否则将产生不适合于诸如动态RAM的应用的泄漏装置。 整个过程可以在单个泵中进行,因此污染水平可以最小化。

    MECHANISM FOR FACILITATING DYNAMIC ADJUSTMENTS TO COMPUTING DEVICE CHARACTERISTICS IN RESPONSE TO CHANGES IN USER VIEWING PATTERNS
    43.
    发明申请
    MECHANISM FOR FACILITATING DYNAMIC ADJUSTMENTS TO COMPUTING DEVICE CHARACTERISTICS IN RESPONSE TO CHANGES IN USER VIEWING PATTERNS 有权
    用于在用户查看模式中更改计算设备特性的动态调整机制

    公开(公告)号:US20150067787A1

    公开(公告)日:2015-03-05

    申请号:US14129959

    申请日:2013-08-30

    IPC分类号: G06K9/00 H04L29/06

    摘要: A mechanism is described for facilitating dynamic adjustments to features of computing devices according to one embodiment. A method of embodiments, as described herein, includes automatically monitoring usage patterns relating to a user of computing device. The usage patterns may be based on audio user characteristic or visual user characteristics relating to usage of the computing device. The method may further include automatically monitoring environment patterns relating to the usage of the computing device. The environment patterns may be based on surrounding environment having the user and the computing device. The method may further include facilitating dynamic adjustment of one or more features of the computing device based on one or more of the usage patterns, environment patterns, and user preferences.

    摘要翻译: 描述了根据一个实施例的用于促进对计算设备的特征的动态调整的机制。 如本文所述的实施例的方法包括自动监视与计算设备的用户有关的使用模式。 使用模式可以基于与计算设备的使用相关的音频用户特性或可视用户特性。 该方法还可以包括自动监视与计算设备的使用有关的环境模式。 环境模式可以基于具有用户和计算设备的周围环境。 该方法还可以包括基于一个或多个使用模式,环境模式和用户偏好来促进计算设备的一个或多个特征的动态调整。

    ADAPTIVE VISUAL OUTPUT BASED ON MOTION COMPENSATION OF A MOBILE DEVICE
    45.
    发明申请
    ADAPTIVE VISUAL OUTPUT BASED ON MOTION COMPENSATION OF A MOBILE DEVICE 审中-公开
    基于移动设备运动补偿的自适应视觉输出

    公开(公告)号:US20140055339A1

    公开(公告)日:2014-02-27

    申请号:US13592298

    申请日:2012-08-22

    IPC分类号: G09G5/00

    摘要: Systems, storage medium, and methods associated with motion compensation of visual output on a mobile device are disclosed herein. In embodiments, a storage medium may have instructions to enable the mobile device to acquire data associated with motion of an environment in which the mobile device may be situated. The instructions may also enable the mobile device to calculate motion compensation for at least a portion of visual output of an application of the mobile device. The instruction may enable the mobile device to calculate motion compensation based at least in part on the data associated with motion, for use by the application to adapt at least the portion of visual output of the application. Other embodiments may be disclosed or claimed.

    摘要翻译: 本文公开了与移动设备上的视觉输出的运动补偿相关联的系统,存储介质和方法。 在实施例中,存储介质可以具有使得移动设备能够获取与移动设备可能位于其中的环境的运动相关联的数据的指令。 所述指令还可以使所述移动设备能够针对所述移动设备的应用的视觉输出的至少一部分来计算运动补偿。 该指令可以使得移动设备能够至少部分地基于与运动相关联的数据来计算运动补偿,供应用使用以适应应用的视觉输出的至少一部分。 可以公开或要求保护其他实施例。

    METHOD, APPARATUS AND SYSTEM FOR ESTIMATING SUBSCRIPTION HEADROOM FOR A STORAGE POOL
    46.
    发明申请
    METHOD, APPARATUS AND SYSTEM FOR ESTIMATING SUBSCRIPTION HEADROOM FOR A STORAGE POOL 审中-公开
    方法,设备和系统,用于估计存储池的订阅头

    公开(公告)号:US20140032738A1

    公开(公告)日:2014-01-30

    申请号:US13557058

    申请日:2012-07-24

    IPC分类号: G06F15/173

    摘要: Techniques and mechanisms for determining that subscription headroom is available for a storage pool. In an embodiment, the storage pool is classified based on a current subscription level for the storage pool and respective levels of one or more metrics for the storage pool. A signal is generated in response to a storage pool classification indicating availability of subscription headroom. In another embodiment, a target subscription level is determined for generating the signal, where the target subscription level is based on the current subscription level, a first metric of the one or more metrics, and a high utilization threshold corresponding to the first metric.

    摘要翻译: 确定订阅余量可用于存储池的技术和机制。 在一个实施例中,基于存储池的当前订阅级别和存储池的一个或多个度量的相应级别对存储池进行分类。 响应于指示订阅余量的可用性的存储池分类而产生信号。 在另一个实施例中,确定目标订阅级别以生成信号,其中目标订阅级别基于当前订阅级别,一个或多个度量的第一度量以及对应于第一度量的高利用率阈值。

    Precise endpoint detection for etching processes
    47.
    发明授权
    Precise endpoint detection for etching processes 失效
    蚀刻工艺的精确端点检测

    公开(公告)号:US06258497B1

    公开(公告)日:2001-07-10

    申请号:US08448955

    申请日:1995-05-24

    IPC分类号: H01L21306

    摘要: A homogeneous marker is formed, possibly by the adsorption of trace amounts of an ambient material such as carbon monoxide gas, at a surface of a deposited material when the plasma in momentarily interrupted during plasma enhanced chemical vapor deposition or other deposition processes involving the presence of a plasma. When the deposited material is etched, the resulting crystal dislocations or adsorbed gas is detected as a marker by optical emission spectroscopy techniques. The accuracy of an end point determination of the etching process can be increased by providing a sequence of such markers within the bulk or volume of the deposited material. The markers, being merely an interface such as a slight crystal dislocation in otherwise homogeneous material, do not affect the electrical, chemical or optical properties of the remainder of the predetermined deposited material and thus the homogeneity of the deposited material is not significantly affected.

    摘要翻译: 当等离子体增强化学气相沉积或涉及存在的等离子体增强化学气相沉积或其他沉积过程中等离子体暂时中断时,可能通过在沉积材料的表面上吸附痕量的环境材料(例如一氧化碳气体)形成均匀的标记物 等离子体 当沉积材料被蚀刻时,通过光发射光谱技术将所得到的晶体位错或吸附气体作为标记物被检测。 可以通过在沉积材料的体积或体积内提供这样的标记的序列来增加蚀刻工艺的终点确定的精度。 仅仅是诸如在其它均匀材料中的轻微晶体位错的界面的标记物不影响剩余的预定沉积材料的电学,化学或光学性质,因此沉积材料的均匀性不会受到显着影响。

    Process of forming a dual overhang collimated lift-off stencil with
subsequent metal deposition
    48.
    发明授权
    Process of forming a dual overhang collimated lift-off stencil with subsequent metal deposition 失效
    在随后的金属沉积中形成双悬垂准直剥离模板的工艺

    公开(公告)号:US5258264A

    公开(公告)日:1993-11-02

    申请号:US926659

    申请日:1992-08-06

    CPC分类号: H01L21/7688 H01L21/31116

    摘要: A process and structure for depositing metal lines in a lift-off process is disclosed. The process comprises the deposition of a four-layer structure or lift-off stencil, comprising a first layer of a lift-off polymer etchable in oxygen plasma, a first barrier layer of hexamethyldisilizane (HMDS) resistant to an oxygenplasma, a second lift-off layer and a second barrier layer. Once these layers are deposited, a layer of photoresist is deposited and lithographically defined with the metal conductor pattern desired. The layers are then sequentially etched with oxygen and CF.sub.4, resulting in a dual overhang lift-off structure. Metal is then deposited by evaporation or sputtering through the lift-off structure. Following metal deposition, the stencil is lifted-off in a solvent such as N-methylpyrroldone (NMP).

    摘要翻译: 公开了一种用于在剥离过程中沉积金属线的工艺和结构。 该方法包括沉积四层结构或剥离模板,其包括可在氧等离子体中蚀刻的剥离聚合物的第一层,耐氧气等级的六甲基二硅烷(HMDS)的第一阻挡层,第二提升 - 剥离层和第二阻挡层。 一旦沉积这些层,就会沉积一层光致抗蚀剂,并用所需的金属导体图案光刻地限定。 然后用氧和CF 4顺序蚀刻各层,得到双悬臂剥离结构。 然后通过蒸发或溅射将金属沉积通过剥离结构。 在金属沉积之后,在诸如N-甲基吡咯酮(NMP)的溶剂中将模板剥离。

    Mechanism for facilitating dynamic adjustments to computing device characteristics in response to changes in user viewing patterns
    49.
    发明授权
    Mechanism for facilitating dynamic adjustments to computing device characteristics in response to changes in user viewing patterns 有权
    用于响应于用户观看模式的变化促进计算设备特性的动态调整的机制

    公开(公告)号:US09450961B2

    公开(公告)日:2016-09-20

    申请号:US14129959

    申请日:2013-08-30

    摘要: A mechanism is described for facilitating dynamic adjustments to features of computing devices according to one embodiment. A method of embodiments, as described herein, includes automatically monitoring usage patterns relating to a user of computing device. The usage patterns may be based on audio user characteristic or visual user characteristics relating to usage of the computing device. The method may further include automatically monitoring environment patterns relating to the usage of the computing device. The environment patterns may be based on surrounding environment having the user and the computing device. The method may further include facilitating dynamic adjustment of one or more features of the computing device based on one or more of the usage patterns, environment patterns, and user preferences.

    摘要翻译: 描述了根据一个实施例的用于促进对计算设备的特征的动态调整的机制。 如本文所述的实施例的方法包括自动监视与计算设备的用户有关的使用模式。 使用模式可以基于与计算设备的使用相关的音频用户特性或可视用户特性。 该方法还可以包括自动监视与计算设备的使用有关的环境模式。 环境模式可以基于具有用户和计算设备的周围环境。 该方法还可以包括基于一个或多个使用模式,环境模式和用户偏好来促进计算设备的一个或多个特征的动态调整。