公开(公告)号：US08232920B2

公开(公告)日：2012-07-31

申请号：US12187442

申请日：2008-08-07

申请人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Zhenrong Jin ,  Xuefeng Liu

发明人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Zhenrong Jin ,  Xuefeng Liu

IPC分类号： H01Q1/38 ,  H01Q1/40

CPC分类号： H01Q1/2283 ,  H01Q1/40 ,  H01Q9/26 ,  H01Q9/285 ,  H01Q19/108 ,  H01Q19/30

摘要： A semiconductor chip integrating a transceiver, an antenna, and a receiver is provided. The transceiver is located on a front side of a semiconductor substrate. A through substrate via provides electrical connection between the transceiver and the receiver located on a backside of the semiconductor substrate. The antenna connected to the transceiver is located in a dielectric layer located on the front side of the substrate. The separation between the reflector plate and the antenna is about the quarter wavelength of millimeter waves, which enhances radiation efficiency of the antenna. An array of through substrate dielectric vias may be employed to reduce the effective dielectric constant of the material between the antenna and the reflector plate, thereby reducing the wavelength of the millimeter wave and enhance the radiation efficiency. A design structure for designing, manufacturing, or testing a design for such a semiconductor chip is also provided.

摘要翻译： 提供集成收发器，天线和接收器的半导体芯片。 收发器位于半导体衬底的前侧。 通过基底通孔提供收发器和位于半导体衬底背面的接收器之间的电连接。 连接到收发器的天线位于位于基板正面的电介质层中。 反射板与天线之间的间隔大约是毫米波的四分之一波长，这提高了天线的辐射效率。 可以采用贯穿衬底电介质通孔的阵列来降低天线和反射板之间材料的有效介电常数，由此减小毫米波的波长并提高辐射效率。 还提供了用于设计，制造或测试这种半导体芯片的设计的设计结构。

公开(公告)号：US08120110B2

公开(公告)日：2012-02-21

申请号：US12188381

申请日：2008-08-08

申请人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Zhenrong Jin ,  Xuefeng Liu ,  Yun Shi

发明人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Zhenrong Jin ,  Xuefeng Liu ,  Yun Shi

IPC分类号： H01L27/12

CPC分类号： H01L27/088 ,  H01L21/823462 ,  H01L21/823481 ,  H01L27/1207

摘要： A first field effect transistor includes a gate dielectric and a gate electrode located over a first portion of a top semiconductor layer in a semiconductor-on-insulator (SOI) substrate. A second field effect transistor includes a portion of a buried insulator layer and a source region and a drain region located underneath the buried insulator layer. In one embodiment, the gate electrode of the second field effect transistor is a remaining portion of the top semiconductor layer. In another embodiment, the gate electrode of the second field effect transistor is formed concurrently with the gate electrode of the first field effect transistor by deposition and patterning of a gate electrode layer. The first field effect transistor may be a high performance device and the second field effect transistor may be a high voltage device. A design structure for the semiconductor structure is also provided.

摘要翻译： 第一场效应晶体管包括栅极电介质和位于绝缘体上半导体（SOI））衬底中顶部半导体层的第一部分上方的栅电极。 第二场效应晶体管包括掩埋绝缘体层的一部分和位于掩埋绝缘体层下方的源区和漏区。 在一个实施例中，第二场效应晶体管的栅电极是顶部半导体层的剩余部分。 在另一个实施例中，第二场效应晶体管的栅极通过栅极电极层的沉积和图案化与第一场效应晶体管的栅电极同时形成。 第一场效应晶体管可以是高性能器件，第二场效应晶体管可以是高电压器件。 还提供了用于半导体结构的设计结构。

公开(公告)号：US07915158B2

公开(公告)日：2011-03-29

申请号：US12144071

申请日：2008-06-23

申请人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Xuefeng Liu ,  Anthony K. Stamper

发明人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Xuefeng Liu ,  Anthony K. Stamper

IPC分类号： H01L21/4763

CPC分类号： H01L21/7682 ,  H01L21/3148 ,  H01L21/318 ,  H01L21/3185 ,  H01L27/0248

摘要： A method for forming an on-chip high frequency electro-static discharge device is described. In one embodiment, a wafer with a multi-metal level wiring is provided. The wafer includes a first dielectric layer with more than one electrode formed therein, a second dielectric layer disposed over the first dielectric layer with more than one electrode formed therein and more than one via connecting the more than one electrode in the first dielectric layer to a respective more than one electrode in the second dielectric layer. The more than one via is misaligned a predetermined amount with the more than one electrodes in the first dielectric layer and the second dielectric layer. The at least one of the misaligned vias forms a narrow gap with another misaligned via. A cavity trench is formed through the second dielectric layer between the narrow gap that separates the misaligned vias.

摘要翻译： 描述形成片上高频静电放电装置的方法。 在一个实施例中，提供具有多金属层布线的晶片。 该晶片包括：第一电介质层，其中形成有多于一个电极;第二电介质层，设置在第一电介质层上，其中形成有多于一个电极，多个通孔将第一介电层中的多于一个的电极连接到 在第二介电层中分别有一个以上的电极。 多于一个通孔与第一介电层和第二介电层中的多于一个的电极不对准预定量。 至少一个不对齐的通孔与另一个不对齐的通孔形成了狭窄的间隙。 在分隔未对准的通孔的窄间隙之间通过第二介电层形成腔沟槽。

公开(公告)号：US20090316313A1

公开(公告)日：2009-12-24

申请号：US12144084

申请日：2008-06-23

申请人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Xuefeng Liu ,  Anthony K. Stamper

发明人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Xuefeng Liu ,  Anthony K. Stamper

IPC分类号： H02H9/00 ,  G06F17/50

CPC分类号： G06F17/5068 ,  H01L23/60 ,  H01L2924/0002 ,  H01L2924/00

摘要： A design structure for an on-chip high frequency electro-static discharge device is described. In one embodiment, the electro-static discharge device comprises a substrate and multiple metal level layers disposed on the substrate. Each metal level comprises more than one electrode formed therein and more than one via connecting with some of the electrodes in adjacent metal levels. The device further includes a gap formed about one of the metal level layers, wherein the gap is hermetically sealed to provide electro-static discharge protection for the integrated circuit.

摘要翻译： 描述了片上高频静电放电装置的设计结构。 在一个实施例中，静电放电装置包括衬底和设置在衬底上的多个金属层。 每个金属层包括多于一个电极，其中形成有多个电极，并且多个通孔与相邻金属层中的一些电极连接。 所述装置还包括围绕所述金属层之一形成的间隙，其中所述间隙被气密密封以为所述集成电路提供静电放电保护。

公开(公告)号：US07323948B2

公开(公告)日：2008-01-29

申请号：US11161929

申请日：2005-08-23

申请人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Xuefeng Liu

发明人： Hanyi Ding ,  Kai D. Feng ,  Zhong-Xiang He ,  Xuefeng Liu

IPC分类号： H03B5/18 ,  H01L29/00

CPC分类号： H03L7/099 ,  H01L23/5223 ,  H01L23/5225 ,  H01L23/5227 ,  H01L27/0617 ,  H01L27/0641 ,  H01L27/08 ,  H01L27/0811 ,  H01L28/10 ,  H01L2924/0002 ,  H03J3/20 ,  H01L2924/00

摘要： An LC tank structure. The structure, including a set of wiring levels on top of a semiconductor substrate, the wiring levels stacked on top of each other from a lowest wiring level nearest the substrate to a highest wiring level furthest from the substrate; an inductor in the highest wiring level, the inductor confined within a perimeter of a region of the highest wiring level; and a varactor formed in the substrate, the varactor aligned completely under the perimeter of the region of the highest wiring level. The structure may additionally include an electric shield in a wiring level of the set of wiring levels between the lowest wiring level and the highest wiring level. Alternatively, the inductor includes a magnetic core and alternating electrically non-magnetic conductive metal coils and magnetic coils around the core.

摘要翻译： LC液箱结构。 该结构包括在半导体衬底顶部的一组布线级别，从最靠近衬底的最低配线水平到离衬底最远的最高配线电平彼此堆叠的布线电平; 电感处于最高布线水平，电感器限制在最高布线水平的区域的周边内; 以及形成在基板中的变容二极管，变容二极管完全对准在最高布线水平的区域的周边。 该结构可以另外包括在最低布线电平和最高布线电平之间的布线级别的布线级中的电屏蔽。 或者，电感器包括磁芯和交替的非磁性导电金属线圈和围绕磁芯的磁性线圈。

公开(公告)号：US20070052062A1

公开(公告)日：2007-03-08

申请号：US11161929

申请日：2005-08-23

申请人： Hanyi Ding ,  Kai Feng ,  Zhong-Xiang He ,  Xuefeng Liu

发明人： Hanyi Ding ,  Kai Feng ,  Zhong-Xiang He ,  Xuefeng Liu

IPC分类号： H01L29/00

CPC分类号： H03L7/099 ,  H01L23/5223 ,  H01L23/5225 ,  H01L23/5227 ,  H01L27/0617 ,  H01L27/0641 ,  H01L27/08 ,  H01L27/0811 ,  H01L28/10 ,  H01L2924/0002 ,  H03J3/20 ,  H01L2924/00

摘要： An LC tank structure. The structure, including a set of wiring levels on top of a semiconductor substrate, the wiring levels stacked on top of each other from a lowest wiring level nearest the substrate to a highest wiring level furthest from the substrate; an inductor in the highest wiring level, the inductor confined within a perimeter of a region of the highest wiring level; and a varactor formed in the substrate, the varactor aligned completely under the perimeter of the region of the highest wiring level. The structure may additionally include an electric shield in a wiring level of the set of wiring levels between the lowest wiring level and the highest wiring level. Alternatively, the inductor includes a magnetic core and alternating electrically non-magnetic conductive metal coils and magnetic coils around the core.

摘要翻译： LC液箱结构。 该结构包括在半导体衬底顶部的一组布线级别，从最靠近衬底的最低配线水平到离衬底最远的最高配线电平彼此堆叠的布线电平; 电感处于最高布线水平，电感器限制在最高布线水平的区域的周边内; 以及形成在基板中的变容二极管，变容二极管完全对准在最高布线水平的区域的周边。 该结构可以另外包括在最低布线电平和最高布线电平之间的布线级别的布线级中的电屏蔽。 或者，电感器包括磁芯和交替的非磁性导电金属线圈和围绕磁芯的磁性线圈。

公开(公告)号：US20060163688A1

公开(公告)日：2006-07-27

申请号：US10905934

申请日：2005-01-27

申请人： Hanyi Ding ,  Kai Feng ,  Zhong-Xiang He ,  Xuefeng Liu

发明人： Hanyi Ding ,  Kai Feng ,  Zhong-Xiang He ,  Xuefeng Liu

IPC分类号： H01L21/76 ,  H01L29/00 ,  H01L23/58 ,  H01L23/552

CPC分类号： H01L21/76264 ,  H01L23/552 ,  H01L23/585 ,  H01L2924/0002 ,  H01L2924/3011 ,  H01L2924/00

摘要： A method of forming a semiconductor structure, comprising: providing a substrate having a buried insulative layer and a heavily doped layer; forming a first trench within the substrate around a protected area; filling the first trench with an insulative material, wherein the first trench filled with the insulative material and the buried insulative layer combine to form a high impedance noise isolation that surrounds the protected area on all sides except one side of the protected area to isolate noise from the protected area; forming a second trench within the substrate around the first trench; and filling the second trench with a conductive material, wherein the second trench filled with the conductive material and the heavily doped layer combine to form a low impedance ground path that surrounds the high impedance noise isolation on all sides except one side of the high impedance noise isolation to isolate noise from the protected area.

摘要翻译： 一种形成半导体结构的方法，包括：提供具有掩埋绝缘层和重掺杂层的衬底; 在保护区域周围形成衬底内的第一沟槽; 用绝缘材料填充第一沟槽，其中填充有绝缘材料的第一沟槽和埋入绝缘层组合形成高阻抗噪声隔离，围绕保护区域的保护区域，除了保护区域的一侧以隔离噪声 保护区; 在所述衬底内围绕所述第一沟槽形成第二沟槽; 以及用导电材料填充所述第二沟槽，其中填充有所述导电材料和所述重掺杂层的所述第二沟槽组合以形成低阻抗接地路径，所述低阻抗接地路径围绕除所述高阻抗噪声的一侧之外的所有侧面上的高阻抗噪声隔离 隔离隔离来自保护区的噪音。

公开(公告)号：US20070190760A1

公开(公告)日：2007-08-16

申请号：US11275544

申请日：2006-01-13

申请人： Douglas Coolbaugh ,  Hanyi Ding ,  Ebenezer Eshun ,  Michael Gordon ,  Zhong-Xiang He ,  Anthony Stamper

发明人： Douglas Coolbaugh ,  Hanyi Ding ,  Ebenezer Eshun ,  Michael Gordon ,  Zhong-Xiang He ,  Anthony Stamper

IPC分类号： H01L21/425

CPC分类号： H01L23/5223 ,  H01L28/60 ,  H01L2924/0002 ,  H01L2924/00

摘要： A parallel plate capacitor formed in the back end of an integrated circuit employs conductive capacitor plates that are formed simultaneously with the other interconnects on that level of the back end (having the same material, thickness, etc). The capacitor plates are set into the interlevel dielectric using the same process as the other interconnects on that level of the back end (preferably dual damascene). Some versions of the capacitors have perforations in the plates and vertical conductive members connecting all plates of the same polarity, thereby increasing reliability, saving space and increasing the capacitive density compared with solid plates.

摘要翻译： 形成在集成电路的后端的平行电容器采用与后端（具有相同材料，厚度等）的该级别上的其它互连件同时形成的导电电容器板。 使用与后端（优选双镶嵌）级别上的其它互连件相同的工艺将电容器板设置在层间电介质中。 一些版本的电容器在板中具有穿孔，并且垂直导电构件连接相同极性的所有板，从而与实心板相比增加了可靠性，节省了空间并增加了电容密度。

公开(公告)号：US20130200521A1

公开(公告)日：2013-08-08

申请号：US13367895

申请日：2012-02-07

申请人： Hanyi Ding ,  Jeffrey P. Gambino ,  Zhong-Xiang He ,  Alvin J. Joseph ,  Anthony K. Stamper ,  Timothy D. Sullivan

发明人： Hanyi Ding ,  Jeffrey P. Gambino ,  Zhong-Xiang He ,  Alvin J. Joseph ,  Anthony K. Stamper ,  Timothy D. Sullivan

IPC分类号： H01L23/485 ,  H01L21/768

CPC分类号： H01L23/5227 ,  H01L23/5283 ,  H01L23/53223 ,  H01L23/645 ,  H01L23/66 ,  H01L2223/6627 ,  H01L2924/0002 ,  H01L2924/00

摘要： Back-end-of-line (BEOL) wiring structures and inductors, methods for fabricating BEOL wiring structures and inductors, and design structures for a BEOL wiring structure or an inductor. A feature, which may be a trench or a wire, is formed that includes a sidewall intersecting a top surface of a dielectric layer. A surface layer is formed on the sidewall of the feature. The surface layer is comprised of a conductor and has a thickness selected to provide a low resistance path for the conduction of a high frequency signal.

摘要翻译： 后端（BEOL）布线结构和电感器，BEOL布线结构和电感器的制造方法以及BEOL布线结构或电感器的设计结构。 形成可以是沟槽或导线的特征，其包括与电介质层的顶表面相交的侧壁。 表面层形成在特征的侧壁上。 表面层由导体构成，其厚度被选择为提供用于传导高频信号的低电阻路径。

公开(公告)号：US08232173B2

公开(公告)日：2012-07-31

申请号：US12917029

申请日：2010-11-01

申请人： Hanyi Ding ,  Mete Erturk ,  Robert A. Groves ,  Zhong-Xiang He ,  Peter J. Lindgren ,  Anthony K. Stamper

发明人： Hanyi Ding ,  Mete Erturk ,  Robert A. Groves ,  Zhong-Xiang He ,  Peter J. Lindgren ,  Anthony K. Stamper

IPC分类号： H01L21/20

CPC分类号： H01L28/10 ,  H01L21/76898 ,  H01L23/5227 ,  H01L2924/0002 ,  H01L2924/0001 ,  H01L2924/00

摘要： Structures with high-Q value inductors, design structure for high-Q value inductors and methods of fabricating such structures is disclosed herein. A method in a computer-aided design system for generating a functional design model of an inductor is also provided. The method includes: generating a functional representation of a plurality of vertical openings simultaneously formed in a substrate, wherein a first of the plurality of vertical openings is used as through silicon vias and is etched deeper than a second of the plurality of vertical openings used for high-Q inductors; generating a functional representation of a dielectric layer formed in the plurality of vertical openings; and generating a functional representation of a metal layer deposited on the dielectric layer in the plurality of vertical.

摘要翻译： 具有高Q值电感器的结构，高Q值电感器的设计结构和制造这种结构的方法在本文中公开。 还提供了一种用于产生电感器的功能设计模型的计算机辅助设计系统中的方法。 该方法包括：产生同时形成在衬底中的多个垂直开口的功能性表示，其中多个垂直开口中的第一个用作通过硅通孔，并且被蚀刻比用于多个垂直开口的多个垂直开口中的第二个 高Q电感; 产生形成在所述多个垂直开口中的电介质层的功能性表示; 以及生成沉积在所述多个垂直方向上的所述电介质层上的金属层的功能表示。