Abstract:
Transistors that include multilayered dielectric films on a channel region are provided. The multilayered dielectric comprises a lower dielectric film that may have a thickness that is at least 50% the thickness of the multilayered dielectric film and that comprises a metal oxide, a metal silicate, an aluminate, or a mixture thereof, and an upper dielectric film on the lower dielectric film, the upper dielectric film comprising a Group III metal oxide, Group III metal nitride, Group XIII metal oxide or Group XIII metal nitride. A gate electrode is provided on the multilayered dielectric film.
Abstract:
A micro cell fuel cell using a nano porous structure according to a thin film process and an anodizing process as a template for implementing a porous structure of an electrode, its fabrication method, and a micro fuel cell stack using the same are disclosed. The micro-fuel cell includes a solid electrolyte and first and second electrodes separately formed on the electrolyte, wherein at least one of the first and second electrodes is supported by a template having a plurality of nano pores formed by depositing, anodizing and etching a thin film, and is a porous electrode with nano pores formed at positions corresponding to the entirety or a portion of the plurality of nano pores formed on the template. The micro-fuel cell can be fabricated based on the thin film process, and unit cells can be highly integrated to implement a micro-fuel cell system generating a high voltage and a high current.
Abstract:
A semiconductor device may include a semiconductor substrate having a first region and a second region. The nitrogen-incorporated active region may be formed within the first region. A first gate electrode may be formed on the nitrogen-incorporated active region. A first gate dielectric layer may be interposed between the nitrogen-incorporated active region and the first gate electrode. The first gate dielectric layer may include a first dielectric layer and a second dielectric layer. The second dielectric layer may be a nitrogen contained dielectric layer. A second gate electrode may be formed on the second region. A second gate dielectric layer may be interposed between the second region and the second gate electrode. The first gate dielectric layer may have the same or substantially the same thickness as the second gate dielectric layer, and the nitrogen contained dielectric layer may contact with the nitrogen-incorporated active region.
Abstract:
The present invention relates to a nano-scale MOS device having a saddle structure. Particularly, the invention relates to a high-density, high-performance MOS device having a novel structure capable of improving the scaling-down characteristic and performance of the MOS device, in which a channel and gate structure is formed in the shape of a saddle. The inventive MOS device is mainly characterized in that a channel region is recessed, a gate insulating film and a gate electrode are formed on the surface and sides of the recessed channel, and the gate electrode is self-aligned with the recessed channel. Namely, in the disclosed MOS device, a portion of the insulating film around the recessed channel is selectively removed to expose the surface and sides of the recessed channel. According to the present invention, the scaling-down characteristic of the device is excellent and current drive capability is greatly increased since a channel through which an electric current can flow is formed on the surface and sides of the recessed channel. Also, the ability of the gate electrode to control the channel is enhanced. Accordingly, the invention can improve device characteristics.
Abstract:
A apparatus and method for estimating a sequence of transmitted quadrature amplitude modulation (QAM)-modulated signals and space-time block coded signals using an optimal expectation-maximization (EM)-based iterative estimation algorithm in a multiple-input and multiple-output (MIMO)-orthogonal frequency division multiplexing (OFDM) mobile communication system. An initial sequence estimation value is produced on the basis of a predetermined initial value using a pilot sub-carrier contained in each of OFDM signals received by a receiving side. A normalized value of a received signal on a channel-by-channel basis is produced by a predetermined equation using orthogonality between the OFDM signals received by the receiving side. At least one subsequent sequence estimation value is produced using the initial sequence estimation value and the normalized value of the received signal on the channel-by-channel basis. If the subsequent sequence estimation value converges to a constant value after an operation of producing the subsequent sequence estimation value is iterated the predetermined number of times, the converged subsequent sequence estimation value is designated as a final sequence estimation value.
Abstract:
A system and method are presented for discovering mobile collaborators on a peer-to-peer (P2P) network. Each collaborator is identified on the P2P network by a unique ID. Each collaborator may also be identified by an identity file posted on the P2P network. Collaboration applications may include any of a variety of applications involving the exchange of information between 2 or more collaborators, such as voice over IP (VoIP). Dynamic file querying can be performed to filter the identity files most relevant to a particular peer partner. Web services are used end-to-end between P2P mobile devices and also between devices and third party service providers. Search engines use self-provisioning concepts for searches and WEB services querying. End-user devices register their personal information on P2P networks using identity self-provisioning and WEB services templates for a variety of uses, such as personal, gaming or business
Abstract:
The present invention relates to a method of detecting a chromosome abnormality and a microarray chip for detecting a chromosome abnormality. More specifically, the present invention is directed to a method of detection for chromosome abnormality in order to easily diagnosing the health condition and disease of the subject by detecting of the chromosome abnormality rapidly and precisely, and to providing a probe for diagnosis of disease by identifying chromosome abnormality specific to the disease.
Abstract:
Transistors that include multilayered dielectric films on a channel region are provided. The multilayered dielectric comprises a lower dielectric film that may have a thickness that is at least 50% the thickness of the multilayered dielectric film and that comprises a metal oxide, a metal silicate, an aluminate, or a mixture thereof, and an upper dielectric film on the lower dielectric film, the upper dielectric film comprising a Group III metal oxide, Group III metal nitride, Group XIII metal oxide or Group XIII metal nitride. A gate electrode is provided on the multilayered dielectric film.
Abstract:
An electrical device including a PTC conductive polymer sheet, and first and second electrodes physically contacted with opposite surfaces of the conductive polymer sheet is disclosed. The first and second electrodes have a plurality of protrusions protruded from surfaces thereof, respectively. The protrusions have an surface roughness (Rz) of 1 to 20 μm and an average width ({overscore (Rw)}) which is 0.5 to 2 times of the surface roughness (Rz), and an average gap ({overscore (Rg)}) between adjacent protrusions is 0.5 and 2 times of the surface roughness (Rz). The conductive polymer sheet has a thickness which is more than 5 times of the surface roughness (Rz).
Abstract:
Methods of fabricating high-k dielectric layers having reduced impurities for use in semiconductor applications are disclosed. The methods include the steps of: forming a stacked dielectric layer having a first dielectric layer and a second dielectric layer formed on a semiconductor substrate using an ALD method, in combination with a post-treatment step performed to the stacked dielectric layer. The steps of forming the stacked dielectric layer and performing the post-treatment are repeated at least once, thereby fabricating the high-k dielectric layer.