公开(公告)号：US5117254A

公开(公告)日：1992-05-26

申请号：US700060

申请日：1991-05-08

Applicant: Haruna Kawashima ,  Akiyoshi Suzuki ,  Masato Muraki

Inventor： Haruna Kawashima ,  Akiyoshi Suzuki ,  Masato Muraki

IPC: G03F7/207 ,  G03F9/00

CPC classification number: G03F9/7026

Abstract: A projection exposure apparatus including a mask stage for supporting a mask, a wafer stage for supporting a wafer, and a projection optical system for projecting, on the wafer, an image of a circuit pattern of the mask, is disclosed. There are provided a surface position detecting system for detecting position of a surface of the water with respect to a direction of an optical axis of the projection optical system, an adjusting device for adjusting an interval between the wafer and the projection optical system, to position the wafer surface at a focus position of the projection optical system, and an outputting portion operable to direct a light beam to a reflection surface, provided at a predetermined site on the wafer stage, and to receive reflection light coming from the reflection surface through the projection optical system, the outputting portion producing a signal corresponding to a positional relationship between the reflection surface and the focus position of the projection optical system. A focus position detecting system detects the focus position of the projecting optical system, on the basis of the signal from the outputting portion, and a control system controls to the adjusting device on the basis of an output of the focus position detecting system and an output of the surface position detecting system.

Abstract translation: 公开了一种投影曝光装置，其包括用于支撑掩模的掩模台，用于支撑晶片的晶片台，以及用于在晶片上投影掩模的电路图案的图像的投影光学系统。 提供了一种用于检测水面相对于投影光学系统的光轴方向的位置的表面位置检测系统，用于调节晶片与投影光学系统之间的间隔的调节装置， 在投影光学系统的聚焦位置处的晶片表面，以及可操作以将光束引导到设置在晶片台上的预定位置处的反射表面的输出部分，并且通过所述反射表面接收来自所述反射表面的反射光 投影光学系统，输出部分产生与投影光学系统的反射表面和焦点位置之间的位置关系相对应的信号。 焦点位置检测系统基于来自输出部分的信号来检测投影光学系统的聚焦位置，并且控制系统基于聚焦位置检测系统的输出和输出来控制调节装置 的表面位置检测系统。

公开(公告)号：US4947047A

公开(公告)日：1990-08-07

申请号：US151550

申请日：1988-02-02

Applicant: Masato Muraki

Inventor： Masato Muraki

IPC: G02F1/11 ,  G03F7/20

CPC classification number: G03F7/70558 ,  G02F1/113

Abstract: An exposure system is disclosed which uses a pulsed laser, such as an excimer, as the light source for exposure. For exposure control, an acoustooptic element is used. More specifically, the acoustooptic element is used to modulate the intensity of a pulsed laser beam emitted from the excimer laser, to thereby allow precise control of the exposure with respect to a wafer having a resist coating.

Abstract translation: 公开了一种使用脉冲激光（例如准分子）作为曝光光源的曝光系统。 对于曝光控制，使用声光元件。 更具体地，声光元件用于调制从准分子激光器发射的脉冲激光束的强度，从而允许相对于具有抗蚀剂涂层的晶片的曝光的精确控制。

公开(公告)号：US20120219914A1

公开(公告)日：2012-08-30

申请号：US13402071

申请日：2012-02-22

Applicant: Masato Muraki

Inventor： Masato Muraki

IPC: G03F7/20 ,  H01J3/26

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/31764 ,  H01J2237/31766

Abstract: A drawing apparatus for drawing on a substrate by a plurality of charged particle beams includes: an aperture array, a blanker array, a scanning mechanism, and a controller. The aperture array specifies the dimension of each of the plurality of charged particle beams on the substrate. The blanker array carries out blanking of the plurality of charged particle beams independently. The scanning mechanism performs a relative scanning between the plurality of charged particle beams and the substrate in each of the first direction and a second direction which cross each other. The controller controls the blanker array at a predetermined pitch on the substrate. The dimension and the pitch are smaller in one of the first direction and the second direction than in the other.

Abstract translation: 用于通过多个带电粒子束在基板上绘制的绘图装置包括：孔径阵列，遮罩阵列，扫描机构和控制器。 孔径阵列指定基板上的多个带电粒子束中的每一个的尺寸。 消隐器阵列独立地执行多个带电粒子束的消隐。 扫描机构在彼此交叉的第一方向和第二方向中的每一个中执行多个带电粒子束和基板之间的相对扫描。 控制器以基板上的预定间距控制消隐器阵列。 尺寸和间距在第一方向和第二方向之一上比在另一方向上小。

公开(公告)号：US08075361B2

公开(公告)日：2011-12-13

申请号：US12544824

申请日：2009-08-20

Applicant: Masato Muraki

Inventor： Masato Muraki

IPC: H01J9/12

CPC classification number: H01J9/025 ,  H01J1/3046

Abstract: A constitution that conductive members respectively having micropatterns are arranged in high density is manufactured in high accuracy. A conductive film is formed on a substrate, a negative photosensitive resin is applied, the applied resin is exposed by using a first mask having plural fine-width apertures extending in Y direction, and the resin is then exposed and developed by using a second mask having plural apertures extending in X direction perpendicular to Y direction, thereby forming a first resist. After the conductive film is etched by using the first resist as a mask, a negative photosensitive resin is again applied, and exposure and development are performed as shifting the second mask in Y direction, thereby forming a second resist. The conductive film is etched by using the second resist as a mask to eliminate unnecessary areas, thereby forming the conductive film having minute-lines extending in Y direction.

Abstract translation: 以高精度制造分别具有微图案的导电构件以高密度布置的构造。 在基板上形成导电膜，施加负型感光性树脂，通过使用具有在Y方向延伸的多个细孔宽度的第一掩模曝光所施加的树脂，然后通过使用第二掩模使树脂曝光和显影 具有沿X方向垂直于Y方向延伸的多个孔，从而形成第一抗蚀剂。 在通过使用第一抗蚀剂作为掩模蚀刻导电膜之后，再次施加负性感光性树脂，并且在Y方向上移动第二掩模时进行曝光和显影，从而形成第二抗蚀剂。 通过使用第二抗蚀剂作为掩模来蚀刻导电膜以消除不必要的区域，从而形成具有在Y方向上延伸的细线的导电膜。

公开(公告)号：US20100062674A1

公开(公告)日：2010-03-11

申请号：US12544824

申请日：2009-08-20

Applicant: Masato Muraki

Inventor： Masato Muraki

IPC: H01J9/02

CPC classification number: H01J9/025 ,  H01J1/3046

Abstract: A constitution that conductive members respectively having micropatterns are arranged in high density is manufactured in high accuracy. A conductive film is formed on a substrate, a negative photosensitive resin is applied, the applied resin is exposed by using a first mask having plural fine-width apertures extending in Y direction, and the resin is then exposed and developed by using a second mask having plural apertures extending in X direction perpendicular to Y direction, thereby forming a first resist. After the conductive film is etched by using the first resist as a mask, a negative photosensitive resin is again applied, and exposure and development are performed as shifting the second mask in Y direction, thereby forming a second resist. The conductive film is etched by using the second resist as a mask to eliminate unnecessary areas, thereby forming the conductive film having minute-lines extending in Y direction.

Abstract translation: 以高精度制造分别具有微图案的导电构件以高密度布置的构造。 在基板上形成导电膜，施加负型感光性树脂，通过使用具有在Y方向延伸的多个细孔宽度的第一掩模曝光所施加的树脂，然后通过使用第二掩模使树脂曝光和显影 具有沿X方向垂直于Y方向延伸的多个孔，从而形成第一抗蚀剂。 在通过使用第一抗蚀剂作为掩模蚀刻导电膜之后，再次施加负性感光性树脂，并且在Y方向上移动第二掩模时进行曝光和显影，从而形成第二抗蚀剂。 通过使用第二抗蚀剂作为掩模来蚀刻导电膜以消除不必要的区域，从而形成具有在Y方向上延伸的细线的导电膜。

公开(公告)号：US07341393B2

公开(公告)日：2008-03-11

申请号：US11155633

申请日：2005-06-20

Applicant: Masaki Hosoda ,  Masato Muraki ,  Yasuhiro Someda ,  Mahito Negishi ,  Koichi Wakizaka ,  Masakazu Sugaya

Inventor： Masaki Hosoda ,  Masato Muraki ,  Yasuhiro Someda ,  Mahito Negishi ,  Koichi Wakizaka ,  Masakazu Sugaya

IPC: F16C11/00 ,  F16D1/12

CPC classification number: H01J37/3007 ,  H01J9/18 ,  H01J37/04 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/166 ,  H01J2237/31774 ,  Y10T403/32713

Abstract: A mechanism for connecting first and second members through a sealing member sandwiched therebetween includes a position adjustment portion which adjusts a position of the first member in a direction substantially perpendicular to a surface of the second member with respect to the sealing member arranged on the second member, a reference portion which is provided to the second member and has a reference surface substantially perpendicular to the surface of the second member, and a pressing portion which presses the first member in a direction substantially parallel to the surface of the second member against the reference surface of the reference portion. A positioning member is provided to the first member and comes into contact with the reference surface of the reference portion, with the positioning member being position-adjustable with respect to a reference position of the first member. The first member, while being separated from the sealing member by the position adjustment portion, is positioned by the reference portion and pressing portion in the direction substantially parallel to the surface of the second member, and is thereafter moved by the position adjustment portion in the direction substantially perpendicular to the surface of the second member to deform the sealing member.

Abstract translation: 用于通过夹在其间的密封构件连接第一和第二构件的机构包括位置调整部分，其相对于布置在第二构件上的密封构件调节第一构件在基本上垂直于第二构件的表面的方向上的位置 设置在第二构件上并且具有基本上垂直于第二构件的表面的基准表面的参考部分，以及按照基本平行于第二构件的表面的方向按压第一构件的按压部分， 参考部分的表面。 定位构件设置到第一构件并与基准部分的基准表面接触，定位构件相对于第一构件的基准位置可位置调节。 第一构件在通过位置调节部分与密封构件分离的同时，通过基准部分和按压部分在基本上平行于第二构件的表面的方向上定位，然后通过位置调整部分 方向基本上垂直于第二构件的表面以使密封构件变形。

公开(公告)号：US07173262B2

公开(公告)日：2007-02-06

申请号：US11159356

申请日：2005-06-23

Applicant: Masaki Hosoda ,  Masato Muraki ,  Osamu Kamimura

Inventor： Masaki Hosoda ,  Masato Muraki ,  Osamu Kamimura

IPC: G21K5/10 ,  H01K1/62 ,  H01J37/302

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/31774

Abstract: A charged particle beam exposure apparatus for writing a desired pattern on a substrate using a charged particle beam. The apparatus includes a blanking unit, having a deflector capable of deflecting the charged particle beam in at least two directions, configured to control beam passage to the substrate by deflecting the charged particle beam, and a setting unit configured to set a deflection direction of the charged particle beam by the deflector.

Abstract translation: 一种带电粒子束曝光装置，用于使用带电粒子束将所需图案写入基板。 该设备包括一个消隐单元，其具有能够使至少两个方向上的带电粒子束偏转的偏转器，该偏转器被配置成通过偏转带电粒子束来控制光束通向基板;以及设置单元，被配置为设置偏转方向 带电粒子束由偏转器。

公开(公告)号：US07098464B2

公开(公告)日：2006-08-29

申请号：US10957695

申请日：2004-10-05

Applicant: Yasunari Sohda ,  Osamu Kamimura ,  Yoshinori Nakayama ,  Sayaka Tanimoto ,  Masato Muraki

Inventor： Yasunari Sohda ,  Osamu Kamimura ,  Yoshinori Nakayama ,  Sayaka Tanimoto ,  Masato Muraki

IPC: H01J37/304

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J2237/2482

Abstract: The present invention provides a writing technique which can perform high-accuracy overlay writing in electron beam writing equipment performing mark detection by light.Electron beam writing equipment has an electron source; an electron optical system illuminating an electron beam emitted from the electron source onto a sample for scanning to form a desired pattern on the sample; a stage mounting the sample; a mark substrate provided on the stage; means beaming a light beam for position detection which is on the same side as the illumination direction of the electron beam for illuminating the mark substrate; light detection means which is on the same side as the means beaming a light beam for detecting reflected light reflected on the mark substrate; and electron detection means which is on the side opposite the light detection means with respect to the mark substrate for detecting a transmitted electron obtained by illumination of the electron beam onto the mark substrate, wherein relative position information of the light beam and the electron beam is obtained based on the signals of the detected reflected light and transmitted electron.

Abstract translation: 本发明提供了一种写入技术，其能够通过光执行标记检测的电子束写入设备中执行高精度重叠写入。 电子束写入设备具有电子源; 电子光学系统将从电子源发射的电子束照射到样品上以进行扫描以在样品上形成所需图案; 安装样品的阶段; 设置在台上的标记基板; 意味着将用于位置检测的光束照射在与用于照射标记基板的电子束的照射方向相同的一侧; 光检测装置与发出用于检测在标记基板上反射的反射光的光束相同的一侧; 以及电子检测装置，其相对于用于检测通过将电子束照射到标记基板上而获得的透射电子的标记基板在与光检测装置相反的一侧，其中光束和电子束的相对位置信息为 基于检测到的反射光和透射电子的信号获得。

公开(公告)号：US07005659B2

公开(公告)日：2006-02-28

申请号：US10885666

申请日：2004-07-08

Applicant: Masato Muraki ,  Hiroya Ohta ,  Osamu Kamimura

Inventor： Masato Muraki ,  Hiroya Ohta ,  Osamu Kamimura

IPC: H01J3/26 ,  H01J37/28 ,  G21K5/10

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3174

Abstract: A charged particle beam exposure apparatus has a beam shaping optical system which forms an image of a charged particle source that emits charged particle beams, an aperture array and electrostatic lens which form a plurality of images of the charged particle source from the image of the charged particle source, a reduction electron optical system which reduces and projects the plurality of images of the charged particle source onto a wafer, and the first stigmator which generates astigmatism when the beam shaping optical system forms the image of the charged particle source in order to correct astigmatism generated in the reduction electron optical system. A charged particle beam exposure method of exposing a substrate by scanning with charged particle beams includes an adjustment step of making the size in the scanning direction of charged particle beams on the substrate smaller than the size in a direction perpendicular to the direction.

Abstract translation: 带电粒子束曝光装置具有光束整形光学系统，其形成发射带电粒子束的带电粒子源的图像，孔径阵列和静电透镜，其从带电粒子源的图像形成带电粒子源的多个图像 粒子源，还原电子光学系统，其将带电粒子源的多个图像减少并投影到晶片上;以及当束整形光学系统形成带电粒子源的图像以产生像散的第一标示器，以便校正 在还原电子光学系统中产生散光。 通过用带电粒子束扫描使基板曝光的带电粒子束曝光方法包括使基板上的带电粒子束的扫描方向的尺寸小于垂直于该方向的方向上的尺寸的调整步骤。

公开(公告)号：US07005658B2

公开(公告)日：2006-02-28

申请号：US10152687

申请日：2002-05-23

Applicant: Masato Muraki

Inventor： Masato Muraki

IPC: G21K5/10 ,  H01J37/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J37/3177 ,  H01J2237/30461

Abstract: A multi-charged-particle beam drawing apparatus and method that can correct a change in positional relationship, caused by the Coulomb effect, among charged particle beams are provided. The focal lengths of two electron lenses (21, 22) that form a condenser lens (2) are adjusted individually to change a relative positional relationship between the front focal position of the condenser lens (2) and an electron source (ES). Electron beams becoming incident on an aperture array (AA) can diverge, or be focused or collimated. Therefore, positions where intermediate images (img1-img3) are to be formed can be changed, and the change in positional relationship, caused by the Coulomb effect, among the charged particle beams can be corrected.

Abstract translation: 提供了一种能够校正由库仑效应引起的带电粒子束之间的位置关系变化的多带电粒子束描绘装置和方法。 分别调整形成聚光透镜（2）的两个电子透镜（21,22）的焦距，以改变聚光透镜（2）的前焦点与电子源（ES）之间的相对位置关系。 入射到孔径阵列（AA）上的电子束可能发散或聚焦或准直。 因此，可以改变要形成中间图像（img 1-img 3）的位置，并且可以校正带电粒子束之间由库仑效应引起的位置关系的变化。