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公开(公告)号:US20220115077A1
公开(公告)日:2022-04-14
申请号:US17558123
申请日:2021-12-21
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet , Chama Ameziane El Hassani
Abstract: A method for writing to electrically erasable and programmable non-volatile memory and a corresponding integrated circuit are disclosed. In an embodiment a method includes operatively connecting a filter circuit belonging to a communication interface to an oscillator circuit, wherein the communication interface is physically connected to a bus, generating, by the oscillator circuit, an oscillation signal and regulating the oscillation signal by the filter circuit so as to generate a clock signal for timing a write cycle.
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公开(公告)号:US11238944B2
公开(公告)日:2022-02-01
申请号:US16824268
申请日:2020-03-19
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet , Chama Ameziane El Hassani
Abstract: A method for writing to electrically erasable and programmable non-volatile memory and a corresponding integrated circuit are disclosed. In an embodiment a method includes operatively connecting a filter circuit belonging to a communication interface to an oscillator circuit, wherein the communication interface is physically connected to a bus, generating, by the oscillator circuit, an oscillation signal and regulating the oscillation signal by the filter circuit so as to generate a clock signal for timing a write cycle.
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公开(公告)号:US11120878B2
公开(公告)日:2021-09-14
申请号:US16857937
申请日:2020-04-24
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet , Marc Battista
Abstract: A method for programming a non-volatile memory (NVM) and an integrated circuit is disclosed. In an embodiment an integrated circuit includes a memory plane organized into rows and columns of memory words, each memory word comprising memory cells and each memory cell including a state transistor having a control gate and a floating gate and write circuitry configured to program a selected memory word during a programming phase by applying a first nonzero positive voltage to control gates of the state transistors of the memory cells that do not belong to the selected memory word.
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公开(公告)号:US20210242679A1
公开(公告)日:2021-08-05
申请号:US17165557
申请日:2021-02-02
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet
IPC: H02H9/04
Abstract: The present disclosure relates to a device including a rectifying bridge including: a branch connected between first and second nodes; another branch including first and second MOS transistors series-connected between the first and second nodes and having their sources coupled together; a resistor connecting the gate of the first transistor to the second node; another resistor connecting the gate of the second transistor and the first node; and for each transistor, a circuit including first and second terminals respectively connected to the drain and to the gate of the transistor, and being configured to electrically couple its first and second terminals when a voltage between the first terminal of the circuit and the first terminal of the other circuit is greater than a threshold of the circuit.
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公开(公告)号:US20190341114A1
公开(公告)日:2019-11-07
申请号:US16511703
申请日:2019-07-15
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet , Marc Battista
Abstract: A non-volatile memory device includes a substrate, a plurality of memory words, a control block, a first electrically-conducting link, and a plurality of second electrically-conducting links. The substrate includes a substantially planar surface. The memory words include B memory words disposed at the substantially planar surface. The control block includes B control elements disposed at the substantially planar surface. The first electrically-conducting link is disposed in a first plane parallel to the substantially planar surface. The first electrically-conducting link connects one of the B control elements to a memory word of the memory words. The plurality of second electrically-conducting links includes B-1 second electrically-conducting links respectively connecting B-1 remaining control elements to B-1 corresponding memory words of the plurality of memory words. The B-1 second electrically-conducting links are disposed above the first plane and physically extend at least partially over at least two memory words of the memory words.
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公开(公告)号:US10304524B2
公开(公告)日:2019-05-28
申请号:US15630614
申请日:2017-06-22
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet , Marc Battista
IPC: H01L29/788 , G11C11/41 , G11C11/412 , G11C14/00 , G11C16/04 , H01L27/11 , H01L23/522 , H01L29/08 , H01L29/423 , H01L29/51
Abstract: A semiconductor structure includes first and second source/drain region disposed in a semiconductor body and spaced from each other by a channel region. A gate electrode overlies the channel region and a capacitor electrode is disposed between the gate electrode and the channel region. A first gate dielectric is disposed between the gate electrode and the capacitor electrode and a second gate dielectric disposed between the capacitor electrode and the channel region. A first electrically conductive contact region is in electrical contact with the gate electrode and a second electrically conductive contact region in electrical contact with the capacitor electrode. The first and second contact regions are electrically isolated from one another.
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公开(公告)号:US10186320B2
公开(公告)日:2019-01-22
申请号:US15659891
申请日:2017-07-26
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet , Marc Battista , Victorien Brecte
Abstract: A read amplifier of a memory device has two current generators, an inverter, and five transistors. The inverter is connected to the second current generator. The first transistor has a gate connected to the read amplifier, a drain connected to the first current generator, and a source connected to a reference ground. The second transistor has a gate connected to the first current generator, a drain connected to a reference voltage, and a source connected to the gate of the first transistor. The third transistor has a drain connected to the first current generator and a source connected to the reference ground. The fourth transistor has a gate connected to the first current generator, a drain connected to the second current generator, and a source connected to the reference ground. The fifth transistor has a drain connected to the second current generator and a source connected to the reference voltage.
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48.
公开(公告)号:US20180300085A1
公开(公告)日:2018-10-18
申请号:US15900481
申请日:2018-02-20
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet , Marc Battista
Abstract: A method of writing in a memory of the EEPROM type includes, in the presence of a string of new bytes to be written in the memory plane in at least one destination memory word already containing old bytes, a verification for each destination memory word whether or not the old bytes of this destination memory word must all be replaced with new bytes. The method also includes a reading of the old bytes of this destination memory word only if the old bytes must not all be replaced with new bytes.
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公开(公告)号:US20180268901A1
公开(公告)日:2018-09-20
申请号:US15984779
申请日:2018-05-21
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet
IPC: G11C16/04 , H01L27/11521 , G11C16/10 , G11C16/14 , H01L29/788 , H01L27/11526
CPC classification number: G11C16/0408 , G11C16/0441 , G11C16/10 , G11C16/14 , H01L27/11521 , H01L27/11526 , H01L29/7883
Abstract: A method can be used for writing in a memory location of the electrically-erasable and programmable memory type. The memory location includes a first memory cell with a first transistor having a first gate dielectric underlying a first floating gate and a second memory cell with a second transistor having a second gate dielectric underlying a second floating gate that is connected to the first floating gate. In a first writing phase, an identical tunnel effect is implemented through the first gate dielectric and the second gate dielectric. In a second writing phase, a voltage across the first gate dielectric but not the second gate dielectric is increased.
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公开(公告)号:US10043741B2
公开(公告)日:2018-08-07
申请号:US15380894
申请日:2016-12-15
Applicant: STMicroelectronics (Rousset) SAS
Inventor: François Tailliet , Guilhem Bouton
IPC: G01R31/26 , H01L23/522 , H01L21/768 , H01L23/528 , H01L27/02 , H01L49/02 , H01L21/66
Abstract: A method of manufacturing electronic chips containing low-dispersion components, including the steps of: mapping the average dispersion of said components according to their position in test semiconductor wafers; associating, with each component of each chip, auxiliary correction elements; activating by masking the connection of the correction elements to each component according to the initial mapping.
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