Abstract:
In an examining apparatus, an electron gun irradiates an intended position of an information recording medium with an electron beam. A stage holds the information recording medium such that the information recording medium can be moved along a rotation direction and a radial direction. A detector detects electrons which have acquired information of a surface of the information recording medium by irradiating the information recording medium with the electron beam. An image producing unit acquires an image of the surface of the information recording medium based on the electrons detected by the detector. The examining apparatus can examine as to whether or not a defect of an information recording medium such as a CD and a DVD is present, but also can examine a shape of the defect thereof. The examining apparatus can also examine an information recording medium having a large storage capacity.
Abstract:
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.
Abstract:
An image collating center has a communication unit, a processing unit, and a memory unit. The processing unit accesses a geographic information database through a communication network, extracts appropriate geographic information from the geographic information database based on a picked-up image and additional information transmitted from an image provider, and generates a simulated image assumed to be viewed from the image provider. Further, the image collating center estimates the image pickup position and the image pickup attitude of the image provider through collating the simulated image with the picked-up image and returns the estimated image pickup position and image pickup attitude of the image provider to the image provider through the communication network.
Abstract:
The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc.. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.
Abstract:
The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection apparatus comprises: an electron beam apparatus including a charged particle beam source for emitting a charged particle beam, a primary optical system for irradiating the charged particle beam onto the substrate, a secondary optical system into which a secondary charged particle beam is introduced, the secondary charged particle beam being emitted from the substrate by an irradiation of the charged particle beam, a detection system for detecting the secondary charged particle beam introduced into said secondary optical system and outputting as an electric signal, and a process control system for processing and evaluating the electric signal; a stage unit for holding the substrate and moving the substrate relatively to said electron beam apparatus; a working chamber capable of shielding at least an upper region of the stage unit form outside to control under desired atmosphere; and a substrate load-unload mechanism for transferring the substrate into or out of the stage.
Abstract:
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.
Abstract:
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1 maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.
Abstract:
A global positioning system (GPS) receiving system which achieves an equivalent synchronization in time measurement of GPS signals utilizing software without requiring highly accurate synchronization for receiver clocks with time information embedded in the GPS signals. The GPS receiving system performs a relative navigation process after correcting a pseudorange with a time tag error which is attributable to inaccuracy of receiver clocks of first and second moving objects. A relative navigation process correcting an absolute error of a time tag with a clock bias is also described. A differential computation unit calculates a difference between the first pseudorange and the second pseudorange commonized by the time tag commonizing unit. Correction in a time tag error correction unit is performed for the selected GPS data with a common GPS satellite identification number.
Abstract:
For an output signal of an error signal generating circuit generating a focus error signal and/or track error signal, it is materialized that a highly precise servo system can sufficiently deal with the case in which the change of the light intensity by switching recording and reproducing or the like and the dispersion of offset and sensitivity by an optical system exist, by providing with a compensating operational circuit generating a normalized focus and/or track error signal being independent of the reflected light intensity from a recording medium and/or the light intensity distribution and also the difference of sensitivity, and by providing with a bias applying circuit applying a bias component for deleting offset and so forth in the signal of this compensating operational circuit.
Abstract:
A light beam for recording, reproducing, and erasing information is divided by a half mirror into a transmitted light beam directed to a recording medium and a light beam for detecting a position of a reflected movable optical pickup. Since no additional light source is necessary for detecting the position of the optical pickup the apparatus is small in size, low in cost and reduces the number of adjustments required when the optical pickup is replaced.