公开(公告)号：US06753943B2

公开(公告)日：2004-06-22

申请号：US09986302

申请日：2001-11-08

申请人： Toshihiko Tsuji ,  Akiyoshi Suzuki

发明人： Toshihiko Tsuji ,  Akiyoshi Suzuki

IPC分类号： G03B2742

CPC分类号： G03F7/70075 ,  G03F7/70241 ,  G03F7/70358 ,  G03F7/70566 ,  G03F7/70575 ,  G03F7/70958

摘要： A scanning exposure apparatus includes an illumination optical system for defining an illumination region, having a slit-like section, on an original with use of laser light from a continuous emission type excimer laser, and a driving device for relatively, scanningly moving an original and a substrate relative to the illumination region. The illumination optical system includes a scanning optical system for scanning a pupil plane of the illumination system with the laser light to produce a secondary light source thereon, such that the illumination region is defined by light from the secondary light source. When the width of the illumination region is W (mm), the scan speed of at least one of the original and the substrate is V (mm/sec/), and the time necessary for defining the secondary light source once is T (sec), a relation W/V=nT is satisfied, in which n is an integer.

摘要翻译： 扫描曝光装置包括：照明光学系统，用于使用来自连续发射型准分子激光器的激光在原稿上定义具有狭缝状部分的照明区域;以及驱动装置，用于相对地，扫描地移动原稿和 相对于照明区域的基板。 照明光学系统包括扫描光学系统，用于利用激光扫描照明系统的光瞳平面，以在其上产生二次光源，使得照明区域由来自次光源的光限定。 当照明区域的宽度为W（mm）时，原稿和基板中的至少一个的扫描速度为V（mm / sec /），并且限定二次光源一次所需的时间为T（秒 ），满足关系W / V = nT，其中n是整数。

公开(公告)号：US06473160B2

公开(公告)日：2002-10-29

申请号：US09768335

申请日：2001-01-25

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03B2742

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70558

摘要： A projection exposure apparatus includes a light source for emitting light, a condensing optical system for receiving the light from the light source, for condensing the received light and for impinging the condensed light on a mask having a circuit pattern, a projection lens system for projecting the light passed through the mask onto a surface of a wafer, and an aperture member provided between the light source and the condensing optical system. The aperture member has a circular light transmitting portion for transmitting the light from the light source and a light blocking member extending across the circular light transmitting portion.

摘要翻译： 投影曝光装置包括用于发光的光源，用于接收来自光源的光的会聚光学系统，用于聚光接收的光并将会聚的光照射在具有电路图案的掩模上;投影透镜系统，用于突出 光通过掩模到晶片的表面，以及设置在光源和聚光系统之间的孔部件。 光圈构件具有用于透射来自光源的光的圆形光透射部分和延伸穿过圆形透光部分的遮光构件。

公开(公告)号：US06403291B1

公开(公告)日：2002-06-11

申请号：US09340134

申请日：1999-06-28

申请人： Miyoko Kawashima ,  Akiyoshi Suzuki ,  Kenji Saitoh

发明人： Miyoko Kawashima ,  Akiyoshi Suzuki ,  Kenji Saitoh

IPC分类号： G03C500

CPC分类号： G03F7/70575 ,  G03F7/2022 ,  G03F7/70333 ,  G03F7/70408 ,  G03F7/70425 ,  G03F7/7045 ,  G03F7/70466

摘要： A multiple exposure method includes a step of exposing a photosensitive material with a first pattern having a periodic pattern, and a step of exposing the photosensitive material with a second pattern different from the first pattern by using a projection optical system, wherein the step of exposing the photosensitive material with the second pattern is performed in each of a plurality of positions of the photosensitive material in an optical axis direction of the projection optical system relative to a focus position of an image of the second pattern, and wherein a desired pattern is formed in the photosensitive material by a multiple exposure including the step of exposing the photosensitive material with the first pattern and the step of exposing the photosensitive material with the second pattern.

摘要翻译： 多重曝光方法包括以具有周期性图案的第一图案曝光感光材料的步骤，以及通过使用投影光学系统以与第一图案不同的第二图案曝光感光材料的步骤，其中曝光步骤 具有第二图案的感光材料相对于第二图案的图像的焦点位置在投影光学系统的光轴方向上的感光材料的多个位置中的每一个中进行，并且其中形成期望的图案 在感光材料中通过多次曝光，包括用第一图案曝光感光材料的步骤和用第二图案曝光感光材料的步骤。

公开(公告)号：US06271909B1

公开(公告)日：2001-08-07

申请号：US08427709

申请日：1995-04-24

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03B2742

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70558

摘要： An exposure apparatus and a device manufacturing method for transferring a device pattern on a substrate by illuminating the device pattern with light from a light source include features of changing a photointensity distribution of the light source and adjusting an illuminance distribution on the substrate in accordance with a change of the photointensity distribution.

摘要翻译： 通过用来自光源的光照射装置图案来将装置图案转印到基板上的曝光装置和装置制造方法包括改变光源的光密度分布和根据照相机调整基板上的照度分布的特征 光密度分布的变化。

公开(公告)号：US6128068A

公开(公告)日：2000-10-03

申请号：US467149

申请日：1995-06-06

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70241 ,  G03F7/70558

摘要： An exposure apparatus for forming an image of a fine pattern having linear features extending in orthogonal first and second directions. The apparatus includes an illumination optical system for illuminating the pattern, the illumination optical system including a device for forming a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively, wherein the secondary light source includes four sections being distributed in four quadrants defined by the center and the first and second axes, a projection optical system for projecting, on an image plane, an image of the pattern illuminated with light from the secondary light source, and a quartered detector, having four detector sections, for detecting a light quantity distribution of the secondary light source. Each of the four detector sections of the quartered detector independently detects a light quantity of a corresponding one of the four sections of the secondary light source.

摘要翻译： 一种用于形成具有在正交的第一和第二方向上延伸的线性特征的精细图案的图像的曝光装置。 该装置包括用于照亮图案的照明光学系统，该照明光学系统包括用于形成在其中心处具有降低的强度部分的第二光源的装置，以及限定为在中心彼此相交并限定的第一和第二轴线的装置 分别沿着第一和第二方向，其中二次光源包括分布在由中心和第一和第二轴限定的四个象限中的四个部分，投影光学系统，用于在图像平面上投影图案的图像 用来自二次光源的光照射，四分之一检测器具有四个检测器部分，用于检测二次光源的光量分布。 四分之一检测器的四个检测器部分中的每一个独立地检测次级光源的四个部分中的相应一个的光量。

公开(公告)号：US5905569A

公开(公告)日：1999-05-18

申请号：US824797

申请日：1997-03-26

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G01N21/01 ,  G01J1/02 ,  G03F7/20 ,  H01L21/027 ,  G01J1/00

CPC分类号： G03F7/70058

摘要： An illuminance measuring method and apparatus measures the illuminance on a wafer in an exposure apparatus for projecting a pattern formed on a mask onto a wafer. The illuminance of the mask causes the formation of ghost light on the mask. The apparatus and method use a first technique to measure the illuminance on the wafer while a mask used for actual exposure is mounted in the exposure apparatus and the mask is illuminated. The apparatus and method also use a second technique, different form the first technique, to measure the illuminance on the wafer while the mask used for actual exposure is mounted in the exposure apparatus and the mask is illuminated. The apparatus and method also find the distribution of the ghost light caused by the mask, based on the illuminance measured by these two techniques.

摘要翻译： 照度测量方法和装置测量用于将形成在掩模上的图案投影到晶片上的曝光设备中的晶片上的照度。 掩模的照度导致在掩模上形成重影。 该设备和方法使用第一技术来测量晶片上的照度，而用于实际曝光的掩模安装在曝光设备中并且掩模被照亮。 该设备和方法还使用第二种技术，不同于第一种技术来测量晶片上的照度，而用于实际曝光的掩模安装在曝光设备中并且掩模被照亮。 该装置和方法还基于通过这两种技术测量的照度，找到由掩模引起的重影光的分布。

公开(公告)号：US5754061A

公开(公告)日：1998-05-19

申请号：US718015

申请日：1996-09-03

申请人： Shinzou Satou ,  Kou Ebihara ,  Akiyoshi Suzuki ,  Keisuke Ishiwata ,  Kouji Miki ,  Hitoshi Ohmichi ,  Tamio Miyamura ,  Masamichi Kamiyama

发明人： Shinzou Satou ,  Kou Ebihara ,  Akiyoshi Suzuki ,  Keisuke Ishiwata ,  Kouji Miki ,  Hitoshi Ohmichi ,  Tamio Miyamura ,  Masamichi Kamiyama

IPC分类号： H03K19/08 ,  H03K19/00 ,  H03K19/003 ,  H03K19/013 ,  H03K19/02 ,  H03K17/04

CPC分类号： H03K19/00353 ,  H03K19/001 ,  H03K19/0136

摘要： A Bi-CMOS circuit includes a first bipolar, a second bipolar transistor and a CMOS control unit for performing switching controls of the first and second bipolar transistors on the basis of an input signal applied to an input terminal and for controlling an output signal output via the output terminal on the basis of the input signal. A turn-OFF unit temporality couples the base of the first bipolar transistor to a low-potential side power supply line on the basis of a current flowing in said control means when the first bipolar transistor is turned OFF, so that the first bipolar transistor can be rapidly turned OFF.

摘要翻译： 一种双CMOS电路包括第一双极型，第二双极晶体管和CMOS控制单元，用于根据施加到输入端的输入信号执行第一和第二双极晶体管的开关控制，并用于控制输出信号经由 输出端基于输入信号。 基于在第一双极晶体管截止时流过所述控制装置的电流，关断单元暂时性将第一双极晶体管的基极连接到低电位侧电源线，使得第一双极晶体管可 快速关闭。

公开(公告)号：US5686984A

公开(公告)日：1997-11-11

申请号：US711790

申请日：1996-09-10

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03F1/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F1/32 ,  G03F7/70433

摘要： A projection exposure method wherein a semi-transparent material effective to partially transmit exposure light and also effective to change a phase of the exposure light is used to form a circuit pattern and a light blocking zone adjacent to the circuit pattern, on a transparent substrate to provide a reticle, the light blocking zone being constituted by a pattern not resolved by a projection optical system, and wherein the reticle is illuminated with the exposure light and is projected on a member to be exposed, through the projection optical system is disclosed. The method includes detecting light quantity of an image of the light blocking zone as formed through the projection optical system, comparing the result of the detection with a predetermined value, and discriminating appropriateness of performing an exposure process with the reticle, on the basis of the comparison.

摘要翻译： 一种投影曝光方法，其中使用有效地部分透射曝光的半透明材料并且也有效地改变曝光光的相位，以在透明基板上形成与电路图案相邻的电路图案和遮光区域 提供掩模版，遮光区由未被投影光学系统分辨的图案构成，并且其中通过投影光学系统公开了通过曝光光照射掩模版并将其投影在待曝光的构件上。 该方法包括检测通过投影光学系统形成的遮光区域的图像的光量，将检测结果与预定值进行比较，以及基于掩模区分判断进行曝光处理的适当性 比较。

公开(公告)号：US5608575A

公开(公告)日：1997-03-04

申请号：US479387

申请日：1995-06-07

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G02B27/42 ,  G02B27/46 ,  G02B27/52 ,  G03F7/20 ,  H01L21/027 ,  G02B5/18 ,  G03B27/42

CPC分类号： G03F7/70591 ,  G02B27/42 ,  G02B27/46 ,  G02B27/52 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70133 ,  G03F7/70283

摘要： An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.

摘要翻译： 边缘强调型相移掩模版被倾斜地照射，并且由光栅的精细图案引起的具有基本上相同强度的零级衍射光和一级衍射光入射并分布在投影光学系统的光瞳上，与投影光学系统的光瞳对称地分布 相对于预定轴，由此利用零级衍射光和一级衍射光对精细图案进行成像。

公开(公告)号：US5305054A

公开(公告)日：1994-04-19

申请号：US836509

申请日：1992-02-18

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70558

摘要： An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions is disclosed, which method is characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.

摘要翻译： 公开了一种用于对具有沿着正交的第一和第二方向延伸的线性特征的精细图案进行成像的成像方法，该方法的特征在于：在其中心处提供具有降低的强度部分的光源以及限定为与每个方向相交的第一和第二轴线 另一个在中心并分别沿着第一和第二方向限定; 并用来自光源的光照射图案。