公开(公告)号：US20120097330A1

公开(公告)日：2012-04-26

申请号：US12908617

申请日：2010-10-20

申请人： Prahallad Iyengar ,  Sanjeev Baluja ,  Dale R. DuBois ,  Juan Carlos Rocha-Alverez ,  Thomas Nowak ,  Scott A. Hendrickson ,  Yong-Won Lee ,  Mei-Yee Shek ,  Li-Qun Xia ,  Derek R. Witty

发明人： Prahallad Iyengar ,  Sanjeev Baluja ,  Dale R. DuBois ,  Juan Carlos Rocha-Alverez ,  Thomas Nowak ,  Scott A. Hendrickson ,  Yong-Won Lee ,  Mei-Yee Shek ,  Li-Qun Xia ,  Derek R. Witty

IPC分类号： H01L21/465 ,  H01L21/46

CPC分类号： H01L21/02164 ,  C23C16/45565 ,  C23C16/4557 ,  C23C16/45574 ,  C23C16/463 ,  C23C16/5096 ,  H01L21/02274

摘要： A substrate processing system includes a thermal processor or a plasma generator adjacent to a processing chamber. A first processing gas enters the thermal processor or plasma generator. The first processing gas then flows directly through a showerhead into the processing chamber. A second processing gas flows through a second flow path through the showerhead. The first and second processing gases are mixed below the showerhead and a layer of material is deposited on a substrate under the showerhead.

摘要翻译： 衬底处理系统包括与处理室相邻的热处理器或等离子体发生器。 第一处理气体进入热处理器或等离子体发生器。 然后，第一处理气体直接通过喷头流入处理室。 第二处理气体流过穿过喷头的第二流路。 第一和第二处理气体混合在喷淋头下面，并且一层材料沉积在喷头下方的基底上。

公开(公告)号：US20070286963A1

公开(公告)日：2007-12-13

申请号：US11686881

申请日：2007-03-15

申请人： Juan Rocha-Alvarez ,  Thomas Nowak ,  Dale Du Bois ,  Sanjeev Baluja ,  Scott Hendrickson ,  Dustin Ho ,  Andrzei Kaszuba ,  Tom Cho

发明人： Juan Rocha-Alvarez ,  Thomas Nowak ,  Dale Du Bois ,  Sanjeev Baluja ,  Scott Hendrickson ,  Dustin Ho ,  Andrzei Kaszuba ,  Tom Cho

IPC分类号： C08F2/48 ,  B01J19/08

CPC分类号： B05D3/0209 ,  B05D3/0493 ,  B05D3/067 ,  H01L21/31058 ,  H01L21/67115

摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.

摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。

公开(公告)号：US20070257205A1

公开(公告)日：2007-11-08

申请号：US11686878

申请日：2007-03-15

申请人： Juan Rocha-Alvarez ,  Thomas Nowak ,  Dale Du Bois ,  Sanjeev Baluja ,  Scott Hendrickson ,  Dustin Ho ,  Andrzei Kaszuba ,  Tom Cho

发明人： Juan Rocha-Alvarez ,  Thomas Nowak ,  Dale Du Bois ,  Sanjeev Baluja ,  Scott Hendrickson ,  Dustin Ho ,  Andrzei Kaszuba ,  Tom Cho

IPC分类号： B01J19/08

CPC分类号： B05D3/067

摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.

摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。

公开(公告)号：US08841629B2

公开(公告)日：2014-09-23

申请号：US13534575

申请日：2012-06-27

申请人： Scott A. Hendrickson ,  Liliya Krivulina ,  Juan Carlos Rocha ,  Sanjeev Baluja

发明人： Scott A. Hendrickson ,  Liliya Krivulina ,  Juan Carlos Rocha ,  Sanjeev Baluja

IPC分类号： G01J1/42

CPC分类号： H05B3/0047

摘要： Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.

摘要翻译： 提供的装置和方法用于监测来自UV固化系统的低水平微波偏移，以确定设备是否损坏，如屏幕撕裂或UV灯头的组装不当。 可以使用射频（RF）检测器来检测约0.2-5mW / cm 2范围内的微波，其中RF检测器包括具有环形部分的天线，具有二极管检测器和放大器电路的电路板， 壳体和联接到壳体的支架，其适于将RF检测器耦合到UV固化系统。 还可以设置警报阈值，其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。 还提供了包括RF检测器的衬底处理系统。

公开(公告)号：US20140000515A1

公开(公告)日：2014-01-02

申请号：US13534575

申请日：2012-06-27

申请人： SCOTT A. HENDRICKSON ,  Liliya Krivulina ,  Juan Carlos Rocha ,  Sanjeev Baluja

发明人： SCOTT A. HENDRICKSON ,  Liliya Krivulina ,  Juan Carlos Rocha ,  Sanjeev Baluja

IPC分类号： C23C16/52 ,  G01T1/00

CPC分类号： H05B3/0047

摘要： Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.

摘要翻译： 提供的装置和方法用于监测来自UV固化系统的低水平微波偏移，以确定设备是否损坏，如屏幕撕裂或UV灯头的组装不当。 可以使用射频（RF）检测器来检测约0.2-5mW / cm 2范围内的微波，其中RF检测器包括具有环形部分的天线，具有二极管检测器和放大器电路的电路板， 壳体和联接到壳体的支架，其适于将RF检测器耦合到UV固化系统。 还可以设置警报阈值，其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。 还提供了包括RF检测器的衬底处理系统。

公开(公告)号：US20070228618A1

公开(公告)日：2007-10-04

申请号：US11686901

申请日：2007-03-15

申请人： Andrzei Kaszuba ,  Juan Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Ashish Shah ,  Inna Shmurun

发明人： Andrzei Kaszuba ,  Juan Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Ashish Shah ,  Inna Shmurun

IPC分类号： B29C35/08

CPC分类号： B05D3/067 ,  B29C71/04 ,  B29C2035/0827 ,  F26B3/28 ,  H01L21/67115

摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.

摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。

公开(公告)号：US20070228289A1

公开(公告)日：2007-10-04

申请号：US11686897

申请日：2007-03-15

申请人： Andrzei Kaszuba ,  Juan Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Ndanka Mukuti

发明人： Andrzei Kaszuba ,  Juan Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Ndanka Mukuti

IPC分类号： G21G5/00

CPC分类号： B05D3/067 ,  B29C71/04 ,  B29C2035/0827 ,  F26B3/28 ,  H01L21/67115

摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.

摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。

公开(公告)号：US07226269B2

公开(公告)日：2007-06-05

申请号：US10758753

申请日：2004-01-15

申请人： Satish Sundar ,  Sanjeev Baluja

发明人： Satish Sundar ,  Sanjeev Baluja

IPC分类号： B65G49/07

CPC分类号： H01L21/68707 ,  Y10S414/141

摘要： In one embodiment, the invention is a substrate edge gripper assembly for positioning a semiconductor substrate upon a transfer robot. In one embodiment, a modular assembly comprises spring loaded jaws that are mounted on either side of a robot end effector. The jaws are adapted to be actuated by a feature remote from the robot end effector to release the substrate for delivery.

摘要翻译： 在一个实施例中，本发明是用于将半导体衬底定位在传送机器人上的衬底边缘夹持器组件。 在一个实施例中，模块化组件包括安装在机器人端部执行器的任一侧上的弹簧加载的夹爪。 钳口适于由远离机器人末端执行器的特征致动以释放用于输送的基底。

公开(公告)号：US20050158153A1

公开(公告)日：2005-07-21

申请号：US10758753

申请日：2004-01-15

申请人： Satish Sundar ,  Sanjeev Baluja

发明人： Satish Sundar ,  Sanjeev Baluja

IPC分类号： B65G1/00 ,  H01L21/687

CPC分类号： H01L21/68707 ,  Y10S414/141

摘要： In one embodiment, the invention is a substrate edge gripper assembly for positioning a semiconductor substrate upon a transfer robot. In one embodiment, a modular assembly comprises spring loaded jaws that are mounted on either side of a robot end effector. The jaws are adapted to be actuated by a feature remote from the robot end effector to release the substrate for delivery.

摘要翻译： 在一个实施例中，本发明是用于将半导体衬底定位在传送机器人上的衬底边缘夹持器组件。 在一个实施例中，模块化组件包括安装在机器人端部执行器的任一侧上的弹簧加载的夹爪。 钳口适于由远离机器人末端执行器的特征致动以释放用于输送的基底。

公开(公告)号：US20060245856A1

公开(公告)日：2006-11-02

申请号：US11423970

申请日：2006-06-14

申请人： Satish Sundar ,  Sanjeev Baluja

发明人： Satish Sundar ,  Sanjeev Baluja

IPC分类号： H01L21/677

CPC分类号： H01L21/68707 ,  Y10S414/141

摘要： In one embodiment, the invention is a substrate edge gripper assembly for positioning a semiconductor substrate upon a transfer robot. In one embodiment, a modular assembly comprises spring loaded jaws that are mounted on either side of a robot end effector. The jaws are adapted to be actuated by a feature remote from the robot end effector to release the substrate for delivery.

摘要翻译： 在一个实施例中，本发明是用于将半导体衬底定位在传送机器人上的衬底边缘夹持器组件。 在一个实施例中，模块化组件包括安装在机器人端部执行器的任一侧上的弹簧加载的夹爪。 钳口适于由远离机器人末端执行器的特征致动以释放用于输送的基底。