公开(公告)号：US07763871B2

公开(公告)日：2010-07-27

申请号：US12078663

申请日：2008-04-02

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov

IPC分类号： A61N5/06

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/008

摘要： A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with the substance at the interaction point, and a conduit constructed and arranged to deliver a buffer gas into the chamber. The conduit has an outlet located adjacent to the interaction point.

摘要翻译： 辐射源包括腔室，构造和布置成在物体通过腔室内的相互作用点的位置处将物质供应到腔室的供应源，构造和布置成将激光束提供到相互作用点的激光器 使得当激光束在相互作用点处与物质相互作用时产生辐射发射等离子体，以及构造并布置成将缓冲气体输送到室中的导管。 导管具有邻近相互作用点的出口。

公开(公告)号：US20100151394A1

公开(公告)日：2010-06-17

申请号：US12567383

申请日：2009-09-25

申请人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Norbertus Benedictus Koster ,  Johannes Hubertus Josephina Moors ,  Maarten Van Kampen ,  Ramasamy Raju ,  Wayne Mathew Lytle ,  David Neil Ruzic ,  Martin John Neumann

发明人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Norbertus Benedictus Koster ,  Johannes Hubertus Josephina Moors ,  Maarten Van Kampen ,  Ramasamy Raju ,  Wayne Mathew Lytle ,  David Neil Ruzic ,  Martin John Neumann

IPC分类号： G03F7/20 ,  G03B27/52 ,  B08B13/00

CPC分类号： G03F7/70925

摘要： Embodiments of the invention relate to a system for contactless cleaning of an object surface, a lithographic apparatus including the system, and a method of manufacturing a device. The system may include a He plasma source contained in a chamber and a control unit constructed to modify plasma parameters in use, such as the electron energy distribution of the plasma for causing an increase in formation of He metastables without modifying operational parameters of the plasma source. The control unit may include an electrical biasing unit constructed to apply a positive bias voltage to the object, for attracting free electrons from the plasma. The system may include a supplementary gas source, which may be either pre-mixed with He or be supplied from a further gas source. The supplementary gas may be selected based on a pre-knowledge on a type of particles to be expected on the surface of the object.

摘要翻译： 本发明的实施例涉及一种用于物体表面的非接触式清洁的系统，包括该系统的光刻设备以及一种制造设备的方法。 该系统可以包括包含在腔室中的He等离子体源和构造为修改使用中的等离子体参数的控制单元，例如等离子体的电子能量分布，以引起He亚稳态的形成增加而不改变等离子体源的操作参数 。 控制单元可以包括电偏置单元，其构造成向对象施加正偏置电压，用于从等离子体吸引自由电子。 该系统可以包括辅助气体源，其可以与He预先混合或者从另外的气体源供应。 可以基于对物体表面上预期的颗粒类型的预先知识来选择补充气体。

公开(公告)号：US20100020304A1

公开(公告)日：2010-01-28

申请号：US12500198

申请日：2009-07-09

申请人： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G03B27/72 ,  G02B27/42 ,  G02B5/28

CPC分类号： G03F7/702 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10

摘要： According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.

摘要翻译： 根据本发明的一个方面，光谱纯度滤光器包括孔径，孔被布置成衍射第一波长的辐射并且允许第二波长的辐射的至少一部分透射通过孔，第二 辐射的波长比辐射的第一波长短，其中孔的直径大于20μm。

公开(公告)号：US07598503B2

公开(公告)日：2009-10-06

申请号：US11451601

申请日：2006-06-13

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Johannes Hubertus Josephina Moors

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Johannes Hubertus Josephina Moors

IPC分类号： G01J3/10 ,  G21K5/10 ,  H05G2/00

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

摘要翻译： 公开了一种光刻设备。 该装置包括用于供应氢自由基的源，与源结合使用的引导件，用于将氢自由基引导到由氢自由基靶向的施加表面。 引导件具有氢自由基复合常数小于0.2的涂层。 以这种方式，可以以较少的损失运输自由基，并且能够更好地与应用表面（例如镜面）上的剩余污染物相互作用。

公开(公告)号：US07528395B2

公开(公告)日：2009-05-05

申请号：US10664065

申请日：2003-09-17

申请人： Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine ,  Vladimir Vital'Evitch Ivanov ,  Erik René Kieft ,  Erik Roelof Loopstra ,  Lucas Henricus Johannes Stevens ,  Yurii Victorovitch Sidelkov ,  Vsevolod Grigorevitch Koloshnikov ,  Vladimir Mihailovitch Krivtsun ,  Robert Rafilevitch Gayazov ,  Olav Waldemar Vladimir Frijns

发明人： Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine ,  Vladimir Vital'Evitch Ivanov ,  Erik René Kieft ,  Erik Roelof Loopstra ,  Lucas Henricus Johannes Stevens ,  Yurii Victorovitch Sidelkov ,  Vsevolod Grigorevitch Koloshnikov ,  Vladimir Mihailovitch Krivtsun ,  Robert Rafilevitch Gayazov ,  Olav Waldemar Vladimir Frijns

IPC分类号： G03B27/42 ,  G21K5/10 ,  H01J37/08

CPC分类号： H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

摘要： A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.

摘要翻译： 辐射源包括阳极和阴极，其被构造和布置成在阳极和阴极之间的空间中的气体或蒸气中产生放电并且形成等离子体夹点以产生电磁辐射。 气体或蒸汽可以包括氙，铟，锂和/或锡。 辐射源可以包括多个放电元件，每个放电元件仅用于短间隔，之后选择另一个放电元件。 辐射源还可以包括触发装置，该装置可以有助于改善夹紧形成的精确定时并因此改善EUV辐射的脉冲。 辐射源也可以被构造为具有低电感，并以自触发方式操作。

公开(公告)号：US20090040491A1

公开(公告)日：2009-02-12

申请号：US11882853

申请日：2007-08-06

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/54 ,  H05G2/00

CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/003

摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.

摘要翻译： 光刻系统包括被配置为产生辐射的源，所述源包括阴极和阳极，所述阴极和阳极被配置为在位于放电空间中的燃料中产生放电以产生等离子体，所述放电空间包括 在使用中，配置成调整等离子体的辐射发射以控制由等离子体限定的体积的物质; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置为对所述辐射进行图案化以形成图案化的辐射束; 衬底支撑件，其构造成支撑衬底; 以及投影系统，被配置为将所述图案化的辐射束投射到所述基板上。

公开(公告)号：US20090038636A1

公开(公告)日：2009-02-12

申请号：US11889213

申请日：2007-08-09

申请人： Sander Frederik Wuister ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Van Herpen

发明人： Sander Frederik Wuister ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Van Herpen

IPC分类号： B08B5/00 ,  B08B3/00

CPC分类号： B08B7/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A method of cleaning an imprint template is disclosed. The method includes exposing the imprint template to a reductive fluid.

摘要翻译： 公开了一种清洁压印模板的方法。 该方法包括将印模模板暴露于还原液中。

公开(公告)号：US07405417B2

公开(公告)日：2008-07-29

申请号：US11311624

申请日：2005-12-20

申请人： Lucas Henricus Johannes Stevens ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn

发明人： Lucas Henricus Johannes Stevens ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn

IPC分类号： G01J3/10 ,  G01N21/88 ,  G03B27/72

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.

摘要翻译： 公开了一种光刻设备。 该装置包括被配置为将第一辐射束投射到基板的目标部分上的投影系统，以及用于检测内部空间中的污染的至少一个监视装置。 监测装置包括至少一个具有至少一个污染物接收表面的虚拟元件。 在本发明的一个方面中，提供了至少一个虚拟元件，其不参与将辐射束传送到基板的目标部分上，其中监视虚设元件的污染物接收表面是否已被污染。

公开(公告)号：US20080148978A1

公开(公告)日：2008-06-26

申请号：US11643954

申请日：2006-12-22

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/52 ,  B41M5/00

CPC分类号： G03F7/70291 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70558

摘要： An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.

摘要翻译： 提供用于阻挡辐射束的组件。 组件具有布置成透射辐射束的至少一部分的管。 管道具有设置有消融材料并包围体积的内表面。 组件还具有消融产生装置。 消融产生装置被布置成在接收到阻塞信号时烧蚀消融材料的至少一部分。 组件具有控制单元，其被布置成控制消融产生装置。

公开(公告)号：US20080137050A1

公开(公告)日：2008-06-12

申请号：US11634386

申请日：2006-12-06

申请人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/42 ,  G21K5/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.

摘要翻译： 公开了一种辐射源，其包括阳极和阴极，其构造和布置成在阳极和阴极之间的放电空间中的物质中产生放电并形成等离子体以产生电磁辐射，阳极和 阴极围绕旋转轴线可旋转地安装，阴极被布置成保持液态金属。 辐射源还包括激活源，其被布置成将能量束引导到液态金属上，以便使部分液态金属蒸发，并且液态金属提供器被布置成提供附加的液态金属，以便补偿液态金属的汽化部分 。