Dual mode semiconductor laser and terahertz wave apparatus using the same
    41.
    发明授权
    Dual mode semiconductor laser and terahertz wave apparatus using the same 有权
    双模半导体激光器和使用其的太赫兹波装置

    公开(公告)号:US08774243B2

    公开(公告)日:2014-07-08

    申请号:US13022985

    申请日:2011-02-08

    IPC分类号: H01S5/00

    摘要: Provided are a dual mode semiconductor laser and a terahertz wave apparatus using the same. The dual mode semiconductor laser includes a distributed feedback laser structure section including a first diffraction grating on a substrate and a distributed Bragg reflector laser structure section including a second diffraction grating on the substrate. A first wavelength oscillated by the distributed feedback laser structure section and a second wavelength oscillated by the distributed Bragg reflector laser structure section are different from each other, and the distributed feedback laser structure section and the distributed Bragg reflector laser structure section share the same gain medium with each other.

    摘要翻译: 提供了一种双模式半导体激光器和使用该双模半导体激光器的太赫兹波装置。 双模式半导体激光器包括分布反馈激光器结构部分,其包括在衬底上的第一衍射光栅和在衬底上包括第二衍射光栅的分布式布拉格反射器激光器结构部分。 由分布式反馈激光器结构部分振荡的第一波长和由分布布拉格反射器激光器结构部分振荡的第二波长彼此不同,分布反馈激光器结构部分和分布式布拉格反射器激光器结构部分共享相同的增益介质 与彼此。

    Reference voltage generating device, control device including the reference voltage generating device, and LED light emitting device using the control device
    42.
    发明授权
    Reference voltage generating device, control device including the reference voltage generating device, and LED light emitting device using the control device 有权
    参考电压产生装置,包括参考电压产生装置的控制装置和使用该控制装置的LED发光装置

    公开(公告)号:US08648545B2

    公开(公告)日:2014-02-11

    申请号:US12825445

    申请日:2010-06-29

    IPC分类号: H05B37/02

    摘要: A control device and an LED light emitting device using the same are provided and technology of providing a high contrast ratio to the LED light emitting device and allowing the LED light emitting device to perform a stable operation is disclosed. The LED light emitting device includes a DC/DC converter reference voltage generator that generates a DC/DC converter reference voltage so that a minimum level of a channel voltage having a largest LED voltage drop agrees with a predetermined minimum reference voltage by detecting a plurality of channel voltages corresponding to LED voltage drops of each of a plurality of LED channels LED and an output voltage controller that controls an output voltage of the DC/DC converter using a distribution voltage corresponding to an output voltage and the DC/DC converter reference voltage.

    摘要翻译: 提供了一种控制装置和使用其的LED发光装置,并且公开了向LED发光装置提供高对比度并允许LED发光装置执行稳定操作的技术。 LED发光装置包括DC / DC转换器参考电压发生器,其产生DC / DC转换器参考电压,使得具有最大LED电压降的通道电压的最小电平与预定的最小参考电压一致,通过检测多个 对应于多个LED通道LED中的每一个的LED电压降的通道电压以及使用对应于输出电压和DC / DC转换器参考电压的分配电压来控制DC / DC转换器的输出电压的输出电压控制器。

    Inverter driver and lamp driver thereof
    45.
    发明授权
    Inverter driver and lamp driver thereof 失效
    变频器驱动器及其驱动器

    公开(公告)号:US08184416B2

    公开(公告)日:2012-05-22

    申请号:US12220559

    申请日:2008-07-25

    IPC分类号: H02H3/20 H02H9/04

    CPC分类号: H05B41/282

    摘要: An inverter driver controls an inverter that supplies driving voltages to a plurality of discharge lamps. The inverter driver senses the abnormal operation of the plurality of discharge lamps based on a plurality of first feedback voltages corresponding to the plurality of driving voltages supplied to the discharge lamps and a plurality of second feedback voltages corresponding to the current flowing through the plurality of discharge lamps. The inverter driver is formed in a single integrated circuit.

    摘要翻译: 逆变器驱动器控制向多个放电灯提供驱动电压的逆变器。 逆变器驱动器基于对应于提供给放电灯的多个驱动电压的多个第一反馈电压和与流过多个放电的电流对应的多个第二反馈电压来感测多个放电灯的异常操作 灯具 逆变器驱动器形成在单个集成电路中。

    OPTICAL DEVICES AND METHODS OF FABRICATING THE SAME
    47.
    发明申请
    OPTICAL DEVICES AND METHODS OF FABRICATING THE SAME 有权
    光学装置及其制造方法

    公开(公告)号:US20110085760A1

    公开(公告)日:2011-04-14

    申请号:US12704512

    申请日:2010-02-11

    IPC分类号: G02B6/12 H01L21/50

    摘要: Provided is an optical device. The optical device includes a substrate having a waveguide region and a mounting region, a planar lightwave circuit (PLC) waveguide including a lower-clad layer and an upper-clad layer on the waveguide region of the substrate and a platform core between the lower-clad layer and the upper-clad layer, a terrace defined by etching the lower-clad layer on the mounting region of the substrate, the terrace including an interlocking part, an optical active chip mounted on the mounting region of the substrate, the optical active chip including a chip core therein, and a chip alignment mark disposed on a mounting surface of the optical active chip. The optical active chip is aligned by interlocking between the interlocking part of the terrace and the chip alignment mark of the optical active chip and mounted on the mounting region.

    摘要翻译: 提供了一种光学装置。 光学装置包括具有波导区域和安装区域的基板,在基板的波导区域上包括下覆盖层和上覆盖层的平面光波导路(PLC)波导和位于基板的波导区域之间的平台铁心, 包覆层和上包层,通过蚀刻衬底的安装区域上的下包覆层限定的平台,所述露台包括互锁部分,安装在衬底的安装区域上的光学有源芯片,光学活动 芯片,其中包括芯片芯片,以及设置在光学有源芯片的安装表面上的芯片对准标记。 光学有源芯片通过在平台的互锁部分和光学有源芯片的芯片对准标记之间的互锁对准并且安装在安装区域上。

    Method of correcting a design pattern for an integrated circuit and an apparatus for performing the same
    48.
    发明授权
    Method of correcting a design pattern for an integrated circuit and an apparatus for performing the same 有权
    校正集成电路的设计图案的方法及其执行装置

    公开(公告)号:US07840917B2

    公开(公告)日:2010-11-23

    申请号:US12080381

    申请日:2008-04-02

    IPC分类号: G06F17/50

    CPC分类号: G03F1/72

    摘要: In an apparatus and method for automatically correcting a design pattern in view of different process defects, defect characteristic functions that indicate frequencies of each process defect independent from one another are generated, and a normalization factor that indicates relationships between the defect characteristic functions is determined. A general defect characteristic function indicating a frequency of general defects is generated using the defect characteristic functions and the normalization factor. The general defect causes the same process failure as caused by each of the process defects. The design pattern is modified using the general defect characteristic function in such a manner that the frequency of the general defects is minimized when at least one portion of the design pattern corresponding to the model pattern is transcribed on the substrate. Accordingly, the whole design pattern may be automatically corrected based on the general defect characteristic function.

    摘要翻译: 在用于根据不同的工艺缺陷自动校正设计图案的装置和方法中,生成指示彼此独立的各过程缺陷的频率的缺陷特征函数,并且确定指示缺陷特征函数之间的关系的归一化因子。 使用缺陷特征函数和归一化因子生成表示一般缺陷频率的一般缺陷特征函数。 一般缺陷导致由每个工艺缺陷引起的相同的过程故障。 使用一般缺陷特征函数修改设计图案,使得当在衬底上转录对应于模型图案的设计图案的至少一部分时,一般缺陷的频率最小化。 因此,可以基于一般缺陷特征函数自动校正整个设计图案。

    Overlay mark for measuring and correcting alignment errors
    50.
    发明授权
    Overlay mark for measuring and correcting alignment errors 有权
    用于测量和校正对准误差的叠加标记

    公开(公告)号:US07288848B2

    公开(公告)日:2007-10-30

    申请号:US10997441

    申请日:2004-11-23

    IPC分类号: H01L23/544

    摘要: An overlay mark includes at least one hole array formed on a semiconductor substrate and at least one linear trench adjacent to the hole array. The hole array may be formed adjacent to the linear trench along a predetermined direction. When alignment errors among patterns formed at predetermined portion of the semiconductor substrate are detected, the overlay mark may provide a contrast of light with a desired width and a high level so that alignment errors of patterns formed on the semiconductor substrate may be accurately detected and corrected using the overlay mark.

    摘要翻译: 覆盖标记包括形成在半导体衬底上的至少一个孔阵列和与孔阵列相邻的至少一个线性沟槽。 孔阵列可以沿着预定方向形成为与线性沟槽相邻。 当检测到在半导体衬底的预定部分形成的图形之间的对准误差时,重叠标记可以提供具有所需宽度和高电平的光的对比度,从而可以精确地检测和校正形成在半导体衬底上的图案的对准误差 使用重叠标记。