公开(公告)号：US20170057867A1

公开(公告)日：2017-03-02

申请号：US15351782

申请日：2016-11-15

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Tetsuya HARUNA ,  Masaaki HIRANO ,  Yoshiaki TAMURA ,  Tetsuya NAKANISHI

IPC: C03C13/04 ,  C03B37/027

CPC classification number: C03C13/046 ,  C03B37/02727 ,  C03B2201/50 ,  C03B2205/55 ,  C03B2205/56 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/54 ,  G02B6/02395 ,  Y02P40/57

Abstract: There is provided a method for producing a low-loss alkali metal-doped silica core optical fiber having excellent hydrogen resistance. The method for producing the optical fiber according to the present invention includes a drawing step of drawing an optical fiber preform in a drawing furnace to produce a silica glass-based optical fiber including a core region containing an alkali metal with an average concentration of 0.5 atomic ppm or more and a cladding region that surrounds the core region and a heating step of heating the optical fiber in a heating furnace through which the optical fiber drawn from the drawing furnace passes.

Abstract translation: 提供了具有优异的耐氢性的低损耗碱金属掺杂的硅芯光纤的制造方法。 根据本发明的光纤的制造方法包括在拉拔炉中拉制光纤预制件的拉拔工序，制造出含有平均浓度为0.5原子的碱金属的核心区域的石英玻璃基光纤 ppm以上的包层区域和包围芯区域的包层区域以及在从拉拔炉抽出的光纤通过的加热炉中加热光纤的加热工序。

公开(公告)号：US09025922B2

公开(公告)日：2015-05-05

申请号：US13403983

申请日：2012-02-24

Applicant: Hiroshi Oyamada

Inventor： Hiroshi Oyamada

IPC: G02B6/02 ,  C03C25/60

CPC classification number: C03C25/607 ,  C03C2201/21 ,  C03C2201/22

Abstract: A method for manufacturing deuterium-treated silica glass includes exposing silica glass to a deuterium-containing atmosphere for a predetermined period of time to diffuse deuterium molecules within the silica glass, maintaining the silica glass at 40° C. or higher, and cooling the silica glass to room temperature. The silica glass is a silica glass-based optical fiber having a core made of silica glass, where the core is positioned at a center of the optical fiber and contains at least germanium, and a clad made of silica glass, where the clad surrounds the core and has a lower refractive index than the core. A surface of the silica glass is covered with a resin coating.

Abstract translation: 制备氘处理石英玻璃的方法包括将二氧化硅玻璃暴露于含氘气氛中一段预定的时间以将氘分子扩散到二氧化硅玻璃内，保持二氧化硅玻璃在40℃或更高，并冷却二氧化硅 玻璃到室温。 石英玻璃是具有由石英玻璃制成的芯的二氧化硅玻璃基光纤，其中芯位于光纤的中心并且至少包含锗，并且由石英玻璃制成的包层，其中包层围绕 并具有比芯更低的折射率。 石英玻璃的表面被树脂涂层覆盖。

公开(公告)号：US08402786B2

公开(公告)日：2013-03-26

申请号：US10283055

申请日：2002-10-30

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa ,  Akio Masui ,  Noriaki Shimodaira ,  Shuhei Yoshizawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Akio Masui ,  Noriaki Shimodaira ,  Shuhei Yoshizawa

IPC: C03B25/00

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C23/00 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  Y02P40/57

Abstract: A process for producing a synthetic silica glass optical component which contains at least 1×1017 molecules/cm3 and has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1×1017 molecules/cm3 at a temperature of from 300 to 600° C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.

Abstract translation: 一种合成石英玻璃光学部件的制造方法，其通过处理氢分子含量少的合成二氧化硅玻璃，其含有至少1×10 17分子/ cm 3，OH浓度为200ppm以下，基本上无还原型缺陷 在含有氢气的气氛中，在2-30atms的压力下，在300-600℃的温度下，比1×1017分子/ cm 3。

公开(公告)号：US20120058419A1

公开(公告)日：2012-03-08

申请号：US13223808

申请日：2011-09-01

Applicant: Shigeru Maida ,  Hisatoshi Otsuka ,  Osamu Sekizawa ,  Naoki Yanagisawa

Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Osamu Sekizawa ,  Naoki Yanagisawa

IPC: C03C14/00 ,  G03F1/00 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/62 ,  C03B2207/64 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/42

Abstract: A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.

Abstract translation: 通过将供氧反应气体和提供钛的反应气体与氢气和氧气一起通过燃烧器进行供给，使反应物气体进行氧化或火焰水解以形成合成物，制备适合作为EUV光刻元件的二氧化钛掺杂石英玻璃 二氧化硅 - 二氧化钛细颗粒，将颗粒沉积在旋转靶上，并同时熔化和玻璃化沉积的颗粒以生长掺杂二氧化钛的石英玻璃的锭。 目标被缩回，使得锭的生长前部可以与燃烧器尖端间隔至少250mm的距离。

公开(公告)号：US07980098B2

公开(公告)日：2011-07-19

申请号：US12148338

申请日：2008-04-18

Applicant: Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

Inventor： Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

IPC: C03B25/00 ,  C03B27/00 ,  C03B27/012

CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/52 ,  Y02P40/57

Abstract: To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b).

Abstract translation: 为了优化合成石英玻璃的光学部件，在石英玻璃坯料进行多段退火处理的情况下，关于压实和中心双折射，本发明提出了一种方法，包括以下步骤：（a） 第一处理阶段，其中在1130℃和1240℃之间的较高温度范围内处理石英玻璃坯料，（b）以第一高平均冷却速率将石英玻璃坯料冷却至低于1100℃的淬火温度 在石英玻璃中达到1100℃或更高平均值的假想温度，（c）第二处理阶段，其包括以第二低平均冷却速度冷却石英玻璃坯料 ，其中在950℃至1100℃的较低温度范围内处理石英玻璃坯料，使得石英玻璃中具有低至少50℃的低平均值的假想温度降低 比平均值高 根据方法步骤（b）的假想温度。

公开(公告)号：US20090252947A1

公开(公告)日：2009-10-08

申请号：US12080952

申请日：2008-04-08

Applicant: William Rogers Rosch

Inventor： William Rogers Rosch

IPC: B32B3/26 ,  C03C17/00

CPC classification number: C03B19/12 ,  C03B19/1453 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/21 ,  Y10T428/249954

Abstract: A method of loading at least one fused silica article with hydrogen. At least one fused silica article is first loaded with an amount of hydrogen so that the hydrogen concentration at the center of the article exceeds a minimum concentration upon completion of loading. An amount of hydrogen is the removed from the fused silica article so that the fused silica article has an average hydrogen concentration that is less than the maximum average concentration limit. The surface region of the fused silica article is then reloaded to ensure that the hydrogen concentration throughout the article is within a predetermined pressure range. A fused silica article comprising hydrogen is also described.

Abstract translation: 一种用氢气加载至少一种熔融二氧化硅制品的方法。 首先将至少一个熔融二氧化硅制品装载一定量的氢气，使得在装载完成时制品中心处的氢浓度超过最小浓度。 从熔融二氧化硅制品中除去一定量的氢，使得熔融二氧化硅制品的平均氢浓度小于最大平均浓度极限。 然后重新加载熔融二氧化硅制品的表面区域，以确保整个制品中的氢浓度在预定压力范围内。 还描述了包含氢的熔融二氧化硅制品。

公开(公告)号：US20090239732A1

公开(公告)日：2009-09-24

申请号：US12455164

申请日：2009-05-29

Applicant: Bodo Kuhn ,  Stephan Thomas ,  Steffen Kaiser

Inventor： Bodo Kuhn ,  Stephan Thomas ,  Steffen Kaiser

IPC: C03C3/23 ,  C03C3/12

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/00 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

Abstract: Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1×1016 molecules/cm3 to 5.0×1016 molecules/cm3, and with a content of SiH groups of less than 5×1016 molecules/cm3, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000° C.

Abstract translation: 从用于透射波长在190nm和250nm之间的紫外线辐射的石英玻璃的光学部件开始，具有基本上没有氧缺陷的玻璃结构，氢含量范围为0.1×10 16分/ cm 3至5.0×10 16分/ cm 3，以及与 SiH基团的含量小于5×10 16分子/ cm 3，以提供特别适合用于线性偏振UV激光辐射的这种组分，本发明提出该组分的羟基含量范围为10〜 250重量ppm，假想温度高于1000℃

公开(公告)号：US20090203511A1

公开(公告)日：2009-08-13

申请号：US12420443

申请日：2009-04-08

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Susan Lee Schiefelbein

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Susan Lee Schiefelbein

IPC: C03C3/04 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3′ and preferably less than about 2.0×1017 molecules/cm3.

Abstract translation: 公开了一种合成石英玻璃光学材料，其特征在于波长小于约250nm，特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤， 具体地，在经受约193nm处的激光器操作的100亿脉冲和大约70μJ/ cm 2的能量密度下，在633nm处测量的激光感应波前失真在约-1.0和1.0nm / cm之间。 本发明的合成石英玻璃光学材料包含小于约600ppm，优选小于200ppm的OH浓度水平和小于约5.0×10 17分子/ cm 3'，优选小于约2.0×10 17分子/ cm 3的H 2浓度水平 。

公开(公告)号：US07552601B2

公开(公告)日：2009-06-30

申请号：US11093318

申请日：2005-03-30

Applicant: Bodo Kühn ,  Stephan Thomas ,  Steffen Kaiser

Inventor： Bodo Kühn ,  Stephan Thomas ,  Steffen Kaiser

IPC: C03B31/018 ,  C03B15/00 ,  C03B37/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/00 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

Abstract: Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1×1016 molecules/cm3 to 5.0×1016 molecules/cm3, and with a content of SiH groups of less than 5×1016 molecules/cm3, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000° C.

Abstract translation: 从用于透射波长在190nm和250nm之间的紫外线辐射的石英玻璃的光学部件开始，具有基本上没有氧缺陷的玻璃结构，氢含量范围为0.1×10 16分/ cm 3至5.0×10 16分/ cm 3，以及与 SiH基团的含量小于5×10 16分子/ cm 3，以提供特别适合用于线性偏振UV激光辐射的这种组分，本发明提出该组分的羟基含量范围为10〜 250重量ppm，假想温度高于1000℃

公开(公告)号：US07506522B2

公开(公告)日：2009-03-24

申请号：US11148764

申请日：2005-06-08

Applicant: Daniel Joseph Bleaking ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kenneth E. Hrdina ,  Pushkar Tandon ,  John E. Maxon ,  Kimberly Ann Wilbert

Inventor： Daniel Joseph Bleaking ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kenneth E. Hrdina ,  Pushkar Tandon ,  John E. Maxon ,  Kimberly Ann Wilbert

IPC: C03B20/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.

Abstract translation: 公开了在垂直于光轴的平面中具有高OH浓度均匀性的高纯度合成石英玻璃材料及其制备方法。 玻璃具有高折射率均匀性。 该玻璃在193nm处可以具有至少99.65％/ cm的高内部透射率。 该方法不需要后烧结均质化步骤。 组合均匀性高，因此具有高折射率均匀性的控制因素包括烟灰预制件中的初始局部烟灰密度均匀性和缓慢烧结，特别是固结期间的等温处理。