公开(公告)号：US1878249A

公开(公告)日：1932-09-20

申请号：US22787027

申请日：1927-10-21

申请人： CELANESE CORP

发明人： HENRY MOSS WILLIAM

IPC分类号： C08G8/02

CPC分类号： C08G8/02

公开(公告)号：US10011676B2

公开(公告)日：2018-07-03

申请号：US14897850

申请日：2014-02-21

申请人： DIC Corporation

发明人： Yutaka Satou ,  Ayumi Takahashi

IPC分类号： C08G8/02 ,  C07C39/15 ,  C08G61/02 ,  C08L61/16 ,  H05K1/03 ,  H05K1/09 ,  C08G59/62 ,  C07C39/14 ,  H01L23/29 ,  C08L65/00

CPC分类号： C08G8/02 ,  C07C39/15 ,  C08G59/621 ,  C08G61/02 ,  C08L61/16 ,  C08L65/00 ,  H01L23/295 ,  H01L2924/0002 ,  H05K1/0373 ,  H05K1/09 ,  H01L2924/00

摘要： There are provided a compound containing a phenolic hydroxyl group, which exhibits excellent heat resistance and excellent flame retardancy in terms of a cured product thereof, a phenolic resin including the same, a curable composition and a cured product thereof, a semiconductor sealing material, and a printed circuit board. The compound containing a phenolic hydroxyl group has a molecular structure represented by the following General Formula (I): wherein X is a structural site represented by the following Structural Formula (x1) or (x2); in Formula (x1) or (x2), k is an integer of 1 to 3, m is 1 or 2, Ar is a structural site represented by the following Structural Formula (Ar1), and in a case where when k or m is 2 or greater, a plurality of Ar's may be the same as or different from each other; wherein p is 1 or 2.

公开(公告)号：US09902798B2

公开(公告)日：2018-02-27

申请号：US14897915

申请日：2014-02-21

申请人： DIC Corporation

发明人： Yutaka Satou ,  Ayumi Takahashi ,  Gensuke Akimoto

IPC分类号： C08G8/20 ,  C08G59/62 ,  H01L23/29 ,  H05K1/03 ,  C07C39/15 ,  C08G8/02 ,  C08G61/02 ,  C08L61/16 ,  C08K3/04 ,  C08K7/18 ,  H05K1/09 ,  C09D163/00 ,  C08L65/00

CPC分类号： C08G8/02 ,  C07C39/15 ,  C08G59/621 ,  C08G61/02 ,  C08K3/04 ,  C08K7/18 ,  C08L61/16 ,  C08L65/00 ,  C08L91/06 ,  C09D163/00 ,  H01L23/295 ,  H01L2924/0002 ,  H05K1/0366 ,  H05K1/09 ,  H01L2924/00

摘要： There are provided a compound containing a phenolic hydroxyl group, which exhibits excellent heat resistance and excellent flame retardancy in terms of a cured product thereof, a phenolic resin including the same, a curable composition and a cured product thereof, a semiconductor sealing material, and a printed circuit board. The phenolic resin contains a binuclear compound (X) represented by the following Structural Formula (I), and a trinuclear compound (Y) represented by the following Structural Formula (II) as essential components: wherein each of j and k is 1 or 2, and at least one of j and k is 2; wherein each of l, m and n is 1 or 2, and at least one of l, m, and n is 2.

公开(公告)号：US20160365242A1

公开(公告)日：2016-12-15

申请号：US15178597

申请日：2016-06-10

申请人： SK Innovation Co., Ltd. ,  SK Global Chemical Co., Ltd.

发明人： Min Ho Jung ,  Jeong Eop Choi ,  Hye Ryoung Lee

IPC分类号： H01L21/02 ,  G03F7/11 ,  H01L21/027 ,  C08G8/02 ,  C09D161/16

CPC分类号： H01L21/02118 ,  C08G8/02 ,  C08G61/12 ,  C08G65/4012 ,  C08G65/48 ,  C08G2150/00 ,  C08G2261/135 ,  C08G2261/334 ,  C08G2261/3424 ,  C08G2261/344 ,  C08G2261/76 ,  C08G2650/40 ,  C08K5/3445 ,  C09D161/16 ,  C09D171/00 ,  G03F7/094 ,  G03F7/11 ,  H01L21/02282 ,  H01L21/02345 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/31138

摘要： Provided are a polymer for an underlayer film, used in semiconductor and display manufacturing processes, an underlayer film composition for semiconductor and display manufacturing processes, containing the same, and a method for forming an underlayer film for semiconductor and display manufacturing processes using the underlayer film composition. The polymer according to the present invention is a polymer including a repeating unit represented by the following Chemical Formula 1: in Chemical Formula 1, Ar, R1 to R6, L, and R′ and R″ are the same as those in the detailed description of the present invention.

摘要翻译： 在化学式1中，Ar，R 1至R 6，L和R'和R“与本发明的详细说明中相同。

公开(公告)号：US20150344418A1

公开(公告)日：2015-12-03

申请号：US14822423

申请日：2015-08-10

申请人： Solvay Advanced Polymers, LLC

发明人： Chantal Louis ,  William Gandy ,  Edward Ryan ,  Geoffrey Scott Underwood ,  Kong Yi

IPC分类号： C07C315/06

CPC分类号： C08G65/4012 ,  C01D7/00 ,  C07C45/78 ,  C07C315/06 ,  C08G8/02 ,  C08G65/4087 ,  C08G65/4093 ,  C08G75/23 ,  C08G2261/3444

摘要： The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the recovery of the diphenyl sulfone.

摘要翻译： 二苯砜中某些杂质的存在对其中产生的聚（芳基醚酮）的性质具有有害影响，包括颜色，熔体稳定性，分子量，结晶度等中的一种或多种，​​并且这里识别那些杂质并提供方法 用于回收二苯砜。

公开(公告)号：US09175136B2

公开(公告)日：2015-11-03

申请号：US13125537

申请日：2009-10-23

申请人： Chantal Louis

发明人： Chantal Louis

IPC分类号： C08G65/40 ,  C07C315/06 ,  C08G8/02 ,  C08G75/23

CPC分类号： C08G65/4012 ,  C01D7/00 ,  C07C45/78 ,  C07C315/06 ,  C08G8/02 ,  C08G65/4087 ,  C08G65/4093 ,  C08G75/23 ,  C08G2261/3444

摘要： Sodium carbonate (Na2CO3) having a certain particle size distribution and its use in preparing poly(aryl ether ketone)s, especially PEEK. Poly(aryl ether ketone)s made using the described sodium carbonate. A method for providing a sodium carbonate having a certain particle size distribution, which is especially well suited for the preparation of poly(aryl ether ketone)s.

摘要翻译： 具有一定粒度分布的碳酸钠（Na 2 CO 3）及其在制备聚（芳基醚酮），特别是PEEK中的用途。 使用所述碳酸钠制备的聚（芳基醚酮）。 提供具有一定粒度分布的碳酸钠的方法，其特别适用于制备聚（芳基醚酮）。

公开(公告)号：US20150309403A1

公开(公告)日：2015-10-29

申请号：US14264766

申请日：2014-04-29

申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

发明人： M. Dalil RAHMAN ,  Takanori KUDO ,  Alberto D. DIOSES ,  Douglas MCKENZIE ,  Clement ANYADIEGWU ,  Munirathna PADMANABAN ,  Salem K. Mullen

IPC分类号： G03F1/46 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/091 ,  C08G8/02 ,  C08G61/123 ,  C08G61/125 ,  C08G2261/3142 ,  C08G2261/3242 ,  C09D161/04 ,  G03F1/46 ,  G03F7/0752 ,  G03F7/094 ,  G03F7/168

摘要： The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least repeat (B) unit having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.

摘要翻译： 本发明涉及一种新颖的吸收抗反射涂料组合物，其包含新颖的可交联聚合物，其包含至少一种具有结构（1）的重复单元（A），至少具有结构（2）的重复（B）单元，以及至少一个重复单元 具有结构（3）的单元（C），其中D是直接键合键或C（R1）（R2）亚甲基部分，其中R1和R2独立地为H，C1-C8烷基，C3-C24环烷基或C6-C24芳基; Ari，Ari​​i，Ari​​ii和Ariv独立地是苯基和萘基，R3和R4独立地是氢或C1-C8烷基; 且R 5和R 6独立地为氢或C 1 -C 8烷基; 和溶剂。 本发明还涉及使用新型抗反射涂料组合物形成图像的方法。

公开(公告)号：US20150183918A1

公开(公告)日：2015-07-02

申请号：US14415950

申请日：2013-07-18

申请人： Arkema France

发明人： Guillaume Le ,  Julien Jouanneau ,  Jérome Amstutz

IPC分类号： C08G8/02 ,  B29C67/00

CPC分类号： C08G8/02 ,  B29C64/153 ,  B29K2061/00 ,  B29K2261/00 ,  B29K2461/00 ,  B29K2661/00 ,  B29K2861/00 ,  C08G61/127 ,  C08G2261/3442 ,  C08G2261/45

摘要： The invention relates to a process for synthesizing polyaryl ether ketones with low contents of residual materials, whether they are residual monomers or solvents of the synthetic process.

摘要翻译： 本发明涉及一种合成低残留物质的聚芳醚酮的方法，无论是残留单体还是合成方法的溶剂。

公开(公告)号：US08952121B2

公开(公告)日：2015-02-10

申请号：US13489515

申请日：2012-06-06

申请人： Jyri Paulasaari

发明人： Jyri Paulasaari

IPC分类号： C08G8/02

CPC分类号： C08G8/02 ,  C08G2261/3142 ,  C08K5/0025 ,  C08K5/14 ,  C08K5/29 ,  G03F7/038 ,  Y10T428/24479 ,  C08L65/00

摘要： A novel novolac prepared by acid catalyzed condensation between biphenols or bisphenofluorenes and fluorenone is presented. The polymers exhibit excellent oxidative thermal stability and high carbon content, suitable for dielectric, etch stop applications as spin-on material.

摘要翻译： 提出了通过双酚或双酚芴和芴酮之间的酸催化缩合制备的新型酚醛清漆。 聚合物表现出优异的氧化热稳定性和高碳含量，适用于电介质，蚀刻停止应用作为旋涂材料。

公开(公告)号：US20140221595A1

公开(公告)日：2014-08-07

申请号：US14246901

申请日：2014-04-07

申请人： SOLVAY ADVANCED POLYMERS, LLC

发明人： Chantal Louis ,  William Gandy ,  Edward Ryan ,  Geoffrey Scott Underwood ,  Kong Yi

IPC分类号： C07C315/06 ,  C08G8/02

CPC分类号： C08G65/4012 ,  C01D7/00 ,  C07C45/78 ,  C07C315/06 ,  C08G8/02 ,  C08G65/4087 ,  C08G65/4093 ,  C08G75/23 ,  C08G2261/3444

摘要： The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the recovery of the diphenyl sulfone.

摘要翻译： 二苯砜中某些杂质的存在对其中产生的聚（芳基醚酮）的性质具有有害影响，包括颜色，熔体稳定性，分子量，结晶度等中的一种或多种，​​并且这里识别那些杂质并提供方法 用于回收二苯砜。