公开(公告)号：US20140078483A1

公开(公告)日：2014-03-20

申请号：US14079026

申请日：2013-11-13

申请人： Carl Zeiss SMT GmbH

发明人： Aurelian Dodoc ,  Wilhelm Ulrich ,  Alexander Epple

IPC分类号： G03F7/20 ,  G02B17/08

CPC分类号： G03F7/70058 ,  G02B17/06 ,  G02B17/08 ,  G02B17/0804 ,  G02B17/0892 ,  G03F7/7015 ,  G03F7/70225 ,  G03F7/70275

摘要： A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

公开(公告)号：US20140071418A1

公开(公告)日：2014-03-13

申请号：US14080743

申请日：2013-11-14

申请人： Carl Zeiss SMT GmbH

发明人： Alexander Wolf

IPC分类号： G02B17/06 ,  G03F7/20

CPC分类号： G02B17/0647 ,  G02B17/0663 ,  G02B27/0081 ,  G03F7/70058 ,  G03F7/70275

摘要： An imaging optical unit serves for imaging an object field into an image field. An imaging beam path (AS) between the object field and the image field is subdivided into a plurality of partial imaging beam paths (TAS). The imaging optical unit is embodied such that the partial imaging beam paths (TAS) run between the object field and the image field in a manner completely separated from one another and guided by optical components (M1 to M6) of the imaging optical unit, that is to say that nowhere in the beam path between the object field and the image field do the partial imaging beam paths (TAS) impinge on identical regions of beam-guiding surfaces of the imaging optical unit. This results in an imaging optical unit in which a resolution capability, particularly in the production of micro- or nanostructured semiconductor components, is increased.

摘要翻译： 成像光学单元用于将物场成像成图像场。 对象场和图像场之间的成像光束路径（AS）被细分成多个部分成像光束路径（TAS）。 成像光学单元被实现为使得部分成像光束路径（TAS）以完全彼此分离并且由成像光学单元的光学部件（M1至M6）引导的方式在物场和像场之间延伸， 要说在物场和图像场之间的光束路径中的任何地方，部分成像光束路径（TAS）都照射在成像光学单元的光束引导表面的相同区域上。 这导致成像光学单元，其中特别是在微结构或纳米结构的半导体部件的生产中的分辨能力增加。

公开(公告)号：US08670106B2

公开(公告)日：2014-03-11

申请号：US12475114

申请日：2009-05-29

申请人： Jang Fung Chen ,  Thomas Laidig

发明人： Jang Fung Chen ,  Thomas Laidig

IPC分类号： G03B27/44 ,  G03B27/34

CPC分类号： G03F7/70383 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70791

摘要： System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.

摘要翻译： 公开了在光刻制造工艺中将掩模数据图案应用于衬底的系统和方法。 在一个实施例中，该方法包括提供并行成像写入器系统，其具有布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元; 接收要写入衬底的掩模数据图案，处理掩模数据图案以形成对应于衬底的不同区域的多个分割掩模数据模式，分配一个或多个SLM成像单元以处理每个分区掩模数据模式 控制所述多个SLM成像单元并行地将多个分割的掩模数据图案写入到所述基板，控制所述多个SLM成像单元的移动以覆盖所述基板的不同区域，并且控制所述基板的移动 与多个分割的掩模数据模式的连续写入同步。

公开(公告)号：US20140055769A1

公开(公告)日：2014-02-27

申请号：US13987597

申请日：2013-08-12

申请人： Franklin Mark Schellenberg ,  Keith Edward Bennett

发明人： Franklin Mark Schellenberg ,  Keith Edward Bennett

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B6/04 ,  G02B6/10 ,  G03F7/20 ,  G03F7/2051 ,  G03F7/70 ,  G03F7/70058 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70325 ,  G03F7/70366 ,  G11B7/00

摘要： A method of performing nanolithography is disclosed, comprising use of an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light transmitted through specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to the object to be exposed. A data processing system is provided to re-interpret the layout data into a modulation pattern used to drive the multiple individual channels and the multiple exposures.

摘要翻译： 公开了一种执行纳米光刻的方法，包括使用能够进行与常规光刻工艺兼容的超分辨率光刻曝光的光学打印头。 超分辨率曝光使用通过专门设计的超分辨率孔径传输的光进行，其中“蝴蝶结”和“C孔径”是其中的例子。 这些特别设计的孔径在近场传播模式中产生小而明亮的图像。 包括这些孔的阵列的打印头保持紧靠待曝光的物体。 提供数据处理系统以将布局数据重新解释为用于驱动多个单独通道和多次曝光的调制图案。

公开(公告)号：US08654310B2

公开(公告)日：2014-02-18

申请号：US12848748

申请日：2010-08-02

申请人： Masaki Kato

发明人： Masaki Kato

IPC分类号： G03B27/42

CPC分类号： G03F7/70791 ,  G03F7/70216 ,  G03F7/70275

摘要： There is disclosed an exposure method is a method of projecting patterns (M1, M2) of a mask (M) onto a substrate to effect exposure thereof, through a plurality of projection optical units each having an enlargement magnification, and the exposure method comprises: placing the mask (M) having first pattern regions (M1) arranged discontinuously in a positional relation corresponding to the enlargement magnification, and second pattern regions (M2) provided at least in part between the first pattern regions (M1), on the object plane side of the projection optical units; projecting enlarged images of either of the first pattern regions (M1) and the second pattern regions (M2) onto the substrate disposed on the image plane side of the projection optical units to effect exposure thereof; and then projecting enlarged images of the other pattern regions onto the substrate to effect exposure thereof.

摘要翻译： 公开了曝光方法是通过多个具有放大倍数的投影光学单元将掩模（M）的图案（M1，M2）投影到基板上以进行曝光的方法，并且曝光方法包括： 将具有第一图案区域（M1）的掩模（M）放置在与放大倍率对应的位置关系中，以及至少部分地设置在第一图案区域（M1）之间的物平面上的第二图案区域（M2） 投影光学单元的一侧; 将第一图案区域（M1）和第二图案区域（M2）中的任一个的放大图像投影到设置在投影光学单元的像面侧的基板上以进行曝光; 然后将其他图案区域的放大图像投影到基板上以进行曝光。

公开(公告)号：US08634060B2

公开(公告)日：2014-01-21

申请号：US12725223

申请日：2010-03-16

申请人： Ralf Scharnweber

发明人： Ralf Scharnweber

IPC分类号： G03B27/42

CPC分类号： G03F7/70208 ,  G03F7/70275 ,  G03F7/70991

摘要： In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system (17), and a second exposure is carried out in accordance with a second set of exposure parameters on a second projection system (18) spatially separated from the first projection system (17). The projection systems are integrated in a common projection exposure installation (1). The first exposure can be carried out, for example, with an amplitude mask (6), the second exposure with a phase mask (9). The use of a number of projection systems enables multiple exposure that is performed in parallel and is therefore timesaving.

摘要翻译： 在用感光层涂覆的至少一个基底进行多次曝光的方法中，根据第一投影系统（17）上的第一组曝光参数进行第一曝光，并且根据 在与第一投影系统（17）空间分离的第二投影系统（18）上的第二组曝光参数。 投影系统集成在通用投影曝光装置（1）中。 可以例如利用幅度掩模（6）进行第一曝光，用相位掩模（9）进行第二次曝光。 使用多个投影系统可以实现并行执行的多次曝光，因此节省时间。

公开(公告)号：US20130242281A1

公开(公告)日：2013-09-19

申请号：US13890714

申请日：2013-05-09

申请人： V TECHNOLOGY CO., LTD.

发明人： Michinobu MIZUMURA

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/20 ,  G03F7/70275 ,  G03F7/70291

摘要： An exposure apparatus includes a pattern generator with light switches arrayed on a plane parallel to a surface of an object to be exposed. Each of the light switches has a switching element that is a rectangular pillar of an electro-optic crystal, and a pair of polarizers arranged on respective sides in the long axis direction of the switching element. The exposure apparatus drives the light switches individually to generate an exposure pattern having a certain bright and dark form and irradiate the object to be exposed with the pattern. Furthermore, the exposure apparatus has a plurality of microlenses provided on the light-output side of the pattern generator so that the optical axes of the microlenses are aligned to the longitudinal center axes of the switching elements, so as to project images of light-output ends of the switching elements at reduced size onto the object to be exposed.

摘要翻译： 曝光装置包括：图案发生器，其具有排列在平行于要曝光的物体的表面的平面上的光开关。 每个光开关具有作为电光晶体的矩形柱的开关元件和布置在开关元件的长轴方向的各侧的一对偏振器。 曝光装置分别驱动光开关以产生具有特定亮和暗形状的曝光图案，并用图案照射待曝光的物体。 此外，曝光装置具有设置在图案发生器的光输出侧的多个微透镜，使得微透镜的光轴与开关元件的纵向中心轴对准，以便投射光输出的图像 将开关元件的端部以减小的尺寸放置到要暴露的物体上。

公开(公告)号：US08502956B2

公开(公告)日：2013-08-06

申请号：US13105110

申请日：2011-05-11

申请人： Jian Guo ,  Weifeng Zhou ,  Xing Ming ,  Yong Chen ,  Guanghui Xiao

发明人： Jian Guo ,  Weifeng Zhou ,  Xing Ming ,  Yong Chen ,  Guanghui Xiao

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/7015 ,  G03F1/14 ,  G03F1/38 ,  G03F1/50 ,  G03F1/52 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70466

摘要： An exposure apparatus comprises: a loading stage for supporting a substrate; a mask plate parallel to the loading stage and above the loading stage, the mask plate including a light transmitting region and a light absorbing region on its lower surface, a light reflecting region being provided in the light absorbing region; a lens device provided between the mask plate and the loading stage; a first illumination light source, light from which vertically striking on the upper surface of the mask plate from above, passing through the mask plate and striking on the loading stage via the lens device; a light reflecting device provided in the lens device; and a second illumination light source, light from which being reflected onto the lower surface of the mask plate by the light reflecting device located in the lens device, the light being reflected by the light reflecting region on the lower surface of the mask plate and striking on the loading stage via the lens device.

摘要翻译： 曝光装置包括：用于支撑基板的装载台; 掩模板，其平行于所述装载台并且在所述装载台的上方，所述掩模板在其下表面上包括透光区域和光吸收区域，所述光反射区域设置在所述光吸收区域中; 设置在所述掩模板和所述装载台之间的透镜装置; 第一照明光源，从上方垂直撞击掩模板的上表面的光，穿过掩模板并经由透镜装置撞击装载台; 设置在所述透镜装置中的光反射装置; 以及第二照明光源，通过位于透镜装置中的光反射装置反射到掩模板的下表面的光，该光被掩模板的下表面上的光反射区域反射并且被击打 通过透镜装置在装载台上。

公开(公告)号：US08477403B2

公开(公告)日：2013-07-02

申请号：US13216588

申请日：2011-08-24

申请人： Timothy David Stowe ,  Douglas N. Curry ,  Patrick Y. Maeda

发明人： Timothy David Stowe ,  Douglas N. Curry ,  Patrick Y. Maeda

IPC分类号： G02B26/00

CPC分类号： G03F7/70275 ,  G02B13/08 ,  G02B26/0841 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70475

摘要： An imaging apparatus including multiple spatial light modulators, each including light modulating elements arranged in two-dimensional array disposed in a homogenous light field, multiple anamorphic optical systems, each disposed downstream from an associated spatial light modulator, a scan structure, and an image stitching controller. The light modulating elements of each spatial light modulator are individually adjustable to either pass received homogenous light portions to the anamorphic optical systems, or to block/redirect the homogenous light portions, thereby generating a two-dimensional modulated light field. Each anamorphic optical system images and focuses received modulated light field onto an associated substantially one-dimensional scan line portion on the scan structure. The image stitching controller modifies the image data sent to each spatial light modulator such that selected light modulating elements are enabled or disabled, thereby electronically stitching the scan line portions to form a seamlessly stitched scan line image.

摘要翻译： 一种包括多个空间光调制器的成像设备，每个空间光调制器包括以均匀光场布置的二维阵列布置的光调制元件，多个变形光学系统，每个设置在相关空间光调制器的下游，扫描结构和图像拼接 控制器。 每个空间光调制器的光调制元件可单独调节，以将接收到的均匀光部分传递到变形光学系统，或者阻挡/重定向均匀的光部分，从而产生二维调制光场。 每个变形光学系统将接收到的调制光场的图像和焦点映射到扫描结构上的相关联的基本上一维扫描线部分上。 图像拼接控制器修改发送到每个空间光调制器的图像数据，使得所选择的光调制元件被启用或禁用，从而电子地拼接扫描线部分以形成无缝缝合的扫描线图像。

公开(公告)号：US20130141704A1

公开(公告)日：2013-06-06

申请号：US13813130

申请日：2011-07-15

申请人： Michinobu Mizumura

发明人： Michinobu Mizumura

IPC分类号： G03F7/20

CPC分类号： G03F7/70275 ,  G02B3/0006 ,  G03F9/703 ,  G03F9/7088

摘要： A microlens exposure system includes a microlenses array and a mask fixed in place a predetermined space apart, wherein the gap between the microlens array and an exposure substrate can easily be adjusted with high precision to an aligned focal point position of the microlenses. Laser light for exposure is irradiated onto a resist film by microlenses of a microlens array. Light from a microscope passes through a hole in a Cr film of a mask, and the light is transmitted through a microlens and radiated onto the resist film. Whether or not the light transmitted through the microlens has an aligned focal point on the resist film is observed through the microscope, whereby the aligned focal point of exposure light made to converge by the microlenses on the resist film can be distinguished.

摘要翻译： 微透镜曝光系统包括微透镜阵列和固定在预定空间之间的掩模，其中微透镜阵列和曝光基板之间的间隙可以容易地以高精度调节到微透镜的对准焦点位置。 用于曝光的激光通过微透镜阵列的微透镜照射到抗蚀剂膜上。 来自显微镜的光穿过掩模的Cr膜中的孔，并且将光透过微透镜并辐射到抗蚀剂膜上。 可以通过显微镜观察透过微透镜的光线是否具有抗蚀剂膜上的对准焦点，从而可以区分通过微透镜在抗蚀剂膜上会聚的曝光光的对准焦点。