公开(公告)号：US07183566B2

公开(公告)日：2007-02-27

申请号：US10848583

申请日：2004-05-19

申请人： Johannes Jacobus Matheus Baselmans ,  Arno Jan Bleeker

发明人： Johannes Jacobus Matheus Baselmans ,  Arno Jan Bleeker

IPC分类号： G01N21/86 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70516 ,  G03F7/70291 ,  G03F7/70591

摘要： To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.

摘要翻译： 为了校准具有可编程图案形成装置的光刻设备，使用具有比对应于可编程图案形成装置的单个像素的点的尺寸大的检测器元件的诸如CCD，CMOS传感器或光电二极管阵列的传感器。 像素被单独或分组选择性地激活。

公开(公告)号：US07173687B2

公开(公告)日：2007-02-06

申请号：US11273436

申请日：2005-11-15

申请人： Arno Jan Bleeker ,  Jozef Petrus Henricus Benschop

发明人： Arno Jan Bleeker ,  Jozef Petrus Henricus Benschop

IPC分类号： G03B27/54 ,  G03B27/42 ,  B41J2/47

CPC分类号： G03F7/70358 ,  G03F7/70041 ,  G03F7/70425

摘要： Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.

摘要翻译： 用于在辐射脉冲期间补偿光刻设备中的衬底的运动的装置和方法包括提供光学结构，其配置成与衬底同步地移动入射到衬底上的图案化的投影光束。

公开(公告)号：US07023525B2

公开(公告)日：2006-04-04

申请号：US10883791

申请日：2004-07-06

申请人： Arno Jan Bleeker ,  Pieter Willem Herman De Jager ,  Jason Douglas Hintersteiner ,  Borgert Kruizinga ,  Matthew Eugene McCarthy ,  Mark Oskotsky ,  Lev Ryzhikov ,  Lev Sakin ,  Stanislav Smirnov ,  Bart Snijders ,  Karel Diederick Van Der Mast ,  Huibert Visser

发明人： Arno Jan Bleeker ,  Pieter Willem Herman De Jager ,  Jason Douglas Hintersteiner ,  Borgert Kruizinga ,  Matthew Eugene McCarthy ,  Mark Oskotsky ,  Lev Ryzhikov ,  Lev Sakin ,  Stanislav Smirnov ,  Bart Snijders ,  Karel Diederick Van Der Mast ,  Huibert Visser

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/32 ,  G03B27/52

CPC分类号： G03F7/70283 ,  G03F7/70291

摘要： An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.

公开(公告)号：US06778257B2

公开(公告)日：2004-08-17

申请号：US10200577

申请日：2002-07-23

申请人： Arno Jan Bleeker ,  Pieter Willem Herman De Jager ,  Jason Douglas Hintersteiner ,  Borgert Kruizinga ,  Matthew Eugene McCarthy ,  Mark Oskotsky ,  Lev Ryzhikov ,  Lev Sakin ,  Stanislav Smirnov ,  Bart Snijders ,  Karel Diederick Van Der Mast ,  Huibert Visser

发明人： Arno Jan Bleeker ,  Pieter Willem Herman De Jager ,  Jason Douglas Hintersteiner ,  Borgert Kruizinga ,  Matthew Eugene McCarthy ,  Mark Oskotsky ,  Lev Ryzhikov ,  Lev Sakin ,  Stanislav Smirnov ,  Bart Snijders ,  Karel Diederick Van Der Mast ,  Huibert Visser

IPC分类号： G03B2754

CPC分类号： G03F7/70283 ,  G03F7/70291

摘要： An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.

公开(公告)号：US20140211189A1

公开(公告)日：2014-07-31

申请号：US14165334

申请日：2014-01-27

申请人： Dries SMEETS ,  Arno Jan Bleeker ,  Chris Lee ,  Pieter Willem Herman De Jager ,  Heine Melle Mulder ,  Rudy Jan Maria Pellens

发明人： Dries SMEETS ,  Arno Jan Bleeker ,  Chris Lee ,  Pieter Willem Herman De Jager ,  Heine Melle Mulder ,  Rudy Jan Maria Pellens

IPC分类号： G03F7/20 ,  G02F1/01

CPC分类号： G03F7/70191 ,  G03F7/70291

摘要： A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.

摘要翻译： 公开了一种用于光刻设备的辐射调制器，光刻设备，调制用于光刻的辐射的方法，以及器件制造方法。 用于光刻设备的辐射调制器可以具有支持波长小于450nm的辐射的多个波导， 以及调制部，被配置为单独地调制在每个波导中传播的辐射，以便提供调制的多个输出光束。

公开(公告)号：US08792085B2

公开(公告)日：2014-07-29

申请号：US12856106

申请日：2010-08-13

申请人： Michiel Puyt ,  Arno Jan Bleeker ,  Rene Theodorus Petrus Compen ,  Rudolf Hartmut Fischer

发明人： Michiel Puyt ,  Arno Jan Bleeker ,  Rene Theodorus Petrus Compen ,  Rudolf Hartmut Fischer

IPC分类号： G03B27/58 ,  G03F7/20 ,  H01L21/687

CPC分类号： G03F7/707 ,  G03F7/70708 ,  H01L21/6875 ,  H01L21/68757

摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。

公开(公告)号：US20130162996A1

公开(公告)日：2013-06-27

申请号：US13533110

申请日：2012-06-26

申请人： Alexander STRAAIJER ,  Arno Jan BLEEKER

发明人： Alexander STRAAIJER ,  Arno Jan BLEEKER

IPC分类号： G03F7/20

CPC分类号： G03F7/70633

摘要： An inspection method reflects radiation with a known polarization beam off a periodic structure, such as a grating. The reflected radiation beam is split into first and second orthogonally polarized sub-beams. The phase of the first sub-beams is shifted with respect to the second sub-beam. A first image resultant from the first sub-beam and a second image resultant from the second sub-beam are simultaneously detected. A difference in intensity values is used to derived from the detected first and second images together to determine an overlay error in the periodic structure.

摘要翻译： 检查方法将具有已知偏振光束的辐射反射离开诸如光栅的周期性结构。 反射的辐射束被分成第一和第二正交极化子光束。 第一子光束的相位相对于第二子光束移动。 同时检测从第一子光束得到的第一图像和从第二子光束得到的第二图像。 使用强度值的差异从检测到的第一和第二图像导出，以确定周期性结构中的覆盖误差。

公开(公告)号：US07965380B2

公开(公告)日：2011-06-21

申请号：US11703823

申请日：2007-02-08

申请人： Arno Jan Bleeker ,  Kars Zeger Troost

发明人： Arno Jan Bleeker ,  Kars Zeger Troost

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70516 ,  G03F7/70291 ,  G03F7/70425

摘要： Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.

摘要翻译： 使用独立可控元件的阵列的平版印刷设备，其中通过单独可控元件的阵列图案化的辐射束的强度的一部分被转移到图像传感器，以验证所生成的图像的质量。

公开(公告)号：US20110007314A1

公开(公告)日：2011-01-13

申请号：US12805852

申请日：2010-08-20

申请人： Arie Jeffrey Maria Den Boef ,  Arno Jan Bleeker ,  Youri Johannes Laurentius Maria Van Dommelen ,  Mircea Dusa ,  Antoine Gaston Marie Kiers ,  Paul Frank Luehrmann ,  Henricus Petrus Maria Pellemans ,  Maurits Van der Schaar ,  Cedric Desire Grouwstra ,  Markus Gerardus Martinus Van Kraaij

发明人： Arie Jeffrey Maria Den Boef ,  Arno Jan Bleeker ,  Youri Johannes Laurentius Maria Van Dommelen ,  Mircea Dusa ,  Antoine Gaston Marie Kiers ,  Paul Frank Luehrmann ,  Henricus Petrus Maria Pellemans ,  Maurits Van der Schaar ,  Cedric Desire Grouwstra ,  Markus Gerardus Martinus Van Kraaij

IPC分类号： G01J3/28

CPC分类号： G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

公开(公告)号：US07859647B2

公开(公告)日：2010-12-28

申请号：US12020947

申请日：2008-01-28

申请人： Arno Jan Bleeker ,  Johannes Jacobus Matheus Baselmans ,  Marce Mathijs Theodore Marie Dierichs ,  Stanislav Smirnov ,  Christian Wagner ,  Lev Ryzhikov ,  Kars Zeger Troost

发明人： Arno Jan Bleeker ,  Johannes Jacobus Matheus Baselmans ,  Marce Mathijs Theodore Marie Dierichs ,  Stanislav Smirnov ,  Christian Wagner ,  Lev Ryzhikov ,  Kars Zeger Troost

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/702 ,  G03F7/70291

摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.

摘要翻译： 系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。 可单独控制的元件可以改变辐射束的远心性。 将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。 或者，独立可控元件可以改变辐射束的光轴。