公开(公告)号：US20100097591A1

公开(公告)日：2010-04-22

申请号：US12588389

申请日：2009-10-14

Applicant: Eul Tae Kim ,  Sang Don Jang ,  Hi Kuk Lee ,  Sang Hyun Park ,  Dong Seok Baek

Inventor： Eul Tae Kim ,  Sang Don Jang ,  Hi Kuk Lee ,  Sang Hyun Park ,  Dong Seok Baek

IPC: G03B27/42 ,  G01B11/00

CPC classification number: G03F7/70791 ,  G03F7/70725

Abstract: An exposure apparatus may include: a stage configured to move a substrate; an optical unit configured to generate and project a plurality of laser beams; and a control unit configured to measure straightness of the stage by controlling the projection of the laser beams to an exposed surface of the substrate while moving the stage. A method to measure straightness of a stage in an exposure apparatus may include: placing a substrate on the stage; moving the stage and substrate; generating a plurality of laser beams; projecting the laser beams to the substrate on the stage; and measuring the straightness of the stage by projecting the laser beams to an exposed surface of the substrate.

Abstract translation: 曝光装置可以包括：被配置为移动衬底的台; 配置成产生并投影多个激光束的光学单元; 以及控制单元，被配置为通过在移动所述平台的同时控制所述激光束到所述基板的暴露表面的投影来测量所述平台的平直度。 测量曝光装置中的平台度的方法可以包括：将基板放置在平台上; 移动舞台和衬底; 产生多个激光束; 将激光束投射到载物台上的基板上; 并且通过将激光束投射到基板的暴露表面来测量平台的平直度。

公开(公告)号：US07638253B2

公开(公告)日：2009-12-29

申请号：US12082436

申请日：2008-04-11

Applicant: Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

Inventor： Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

IPC: G03F7/004 ,  G03F7/023 ,  G03F7/30

CPC classification number: G03F7/0382 ,  H01L21/312 ,  H01L27/1214 ,  H01L27/1288

Abstract: In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat unit represented by the following Chemical Formula 2, about 0.5 to about 10 parts by weight of a photo-acid generator, about 1 to about 20 parts by weight of a cross-linker and about 10 to about 200 parts by weight of a solvent. The photoresist composition may improve the heat resistance and adhesion ability of a photoresist pattern. wherein R1 and R2 independently represent an alkyl group having 1 to 5 carbon atoms, and n and m independently represent a natural number.

Abstract translation: 在一个实例中，光致抗蚀剂组合物包括约1至约70重量份的第一粘合剂树脂，其包含由以下化学式1表示的重复单元，约1至约70重量份的第二粘合剂树脂，其包含重复单元 由以下化学式2表示，约0.5至约10重量份的光酸产生剂，约1至约20重量份的交联剂和约10至约200重量份的溶剂。 光致抗蚀剂组合物可以提高光致抗蚀剂图案的耐热性和粘附能力。 其中R1和R2独立地表示具有1至5个碳原子的烷基，n和m独立地表示自然数。

公开(公告)号：US20090176337A1

公开(公告)日：2009-07-09

申请号：US12345169

申请日：2008-12-29

Applicant: Hoon KANG ,  Jae-Sung KIM ,  Yang-Ho JUNG ,  Hi-Kuk LEE ,  Yasuhiro KAMEYAMA ,  Yuuji MIZUHO ,  Jong-Cheol KIM ,  Se-Jin CHOI

Inventor： Hoon KANG ,  Jae-Sung KIM ,  Yang-Ho JUNG ,  Hi-Kuk LEE ,  Yasuhiro KAMEYAMA ,  Yuuji MIZUHO ,  Jong-Cheol KIM ,  Se-Jin CHOI

IPC: H01L21/336 ,  G03F7/004

CPC classification number: H01L27/1288 ,  G03F7/0007 ,  G03F7/027 ,  G03F7/033 ,  H01L27/1214 ,  Y10S430/111

Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.

Abstract translation: 负性光致抗蚀剂组合物和阵列基板的制造方法。 负性光致抗蚀剂组合物包括含有乙烯不饱和键的乙烯不饱和化合物和光聚合引发剂的光固化性组合物，包含通过热交联的碱溶性树脂和有机溶剂的热固性组合物。 负性光致抗蚀剂组合物提高了稳定性，光敏性，进行显影操作后的可剥离性，并且降低了残留物以提高有机绝缘层的可靠性。 此外，负性光致抗蚀剂组合物提高了有机绝缘层的透射率，并且减少了颜色坐标的变化，从而提高了显示装置的显示质量。

公开(公告)号：US20090135347A1

公开(公告)日：2009-05-28

申请号：US12184842

申请日：2008-08-01

Applicant: Woo-Seok Jeon ,  Jang-Soo Kim ,  Young-Wook Lee ,  Jung-In Park ,  Hi-Kuk Lee ,  Shi-Yul Kim ,  Jin-Seuk Kim ,  Jae-Hyoung Youn ,  Ki-Won Kim ,  Su-Hyoung Kang

Inventor： Woo-Seok Jeon ,  Jang-Soo Kim ,  Young-Wook Lee ,  Jung-In Park ,  Hi-Kuk Lee ,  Shi-Yul Kim ,  Jin-Seuk Kim ,  Jae-Hyoung Youn ,  Ki-Won Kim ,  Su-Hyoung Kang

IPC: G02F1/1335 ,  G03F7/20 ,  B05D5/06

CPC classification number: G02F1/13439 ,  G02F1/133514

Abstract: A manufacturing method of a display device, wherein the manufacturing method for an embodiment includes: forming color filters in a plurality of pixel regions; forming a conductive layer on the color filters; and separating the conductive layer in each of the pixel regions through a photolithography process and forming a pixel electrode; wherein a groove is formed between the adjacent color filters having different colors at boundaries between the pixel regions; and wherein the photolithography process uses a negative photoresist material.

Abstract translation: 一种显示装置的制造方法，其中，实施例的制造方法包括：在多个像素区域中形成滤色器; 在滤色片上形成导电层; 以及通过光刻工艺分离每个像素区域中的导电层并形成像素电极; 其中在所述像素区域之间的边界处在相邻的具有不同颜色的滤色器之间形成凹槽; 并且其中所述光刻工艺使用负性光致抗蚀剂材料。

公开(公告)号：US20080254634A1

公开(公告)日：2008-10-16

申请号：US12082436

申请日：2008-04-11

Applicant: Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

Inventor： Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

IPC: H01L21/311 ,  G03F7/004

CPC classification number: G03F7/0382 ,  H01L21/312 ,  H01L27/1214 ,  H01L27/1288

Abstract: In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat unit represented by the following Chemical Formula 2, about 0.5 to about 10 parts by weight of a photo-acid generator, about 1 to about 20 parts by weight of a cross-linker and about 10 to about 200 parts by weight of a solvent. The photoresist composition may improve the heat resistance and adhesion ability of a photoresist pattern. wherein R1 and R2 independently represent an alkyl group having 1 to 5 carbon atoms, and n and m independently represent a natural number.

Abstract translation: 在一个实例中，光致抗蚀剂组合物包括约1至约70重量份的第一粘合剂树脂，其包含由以下化学式1表示的重复单元，约1至约70重量份的第二粘合剂树脂，其包含重复单元 由以下化学式2表示，约0.5至约10重量份的光酸产生剂，约1至约20重量份的交联剂和约10至约200重量份的溶剂。 光致抗蚀剂组合物可以提高光致抗蚀剂图案的耐热性和粘附能力。 其中R 1和R 2独立地表示具有1至5个碳原子的烷基，n和m独立地表示自然数。

公开(公告)号：US20080199788A1

公开(公告)日：2008-08-21

申请号：US12105918

申请日：2008-04-18

Applicant: Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

Inventor： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

IPC: G03F1/14

CPC classification number: H01L27/1288 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/14692

Abstract: A photo mask is provided. The mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface. The flat photoresist film reduces processing cost and enhances the reliability of the panel manufacturing process.

Abstract translation: 提供照片面具。 掩模包括：透射区域和半透明区域，其中半透明区域包括阻挡光的多个遮光部分，并且其中遮光部分具有阻挡不同量的光的多个区域。 通过使用这种类型的光掩模，即使在不平坦表面的顶部也可沉积基本平坦的光致抗蚀剂层。 平坦的光致抗蚀剂膜降低了加工成本并提高了面板制造工艺的可靠性。

公开(公告)号：US07338737B2

公开(公告)日：2008-03-04

申请号：US11302727

申请日：2005-12-13

Applicant: Hi-Kuk Lee ,  Yuko Yako ,  Dong-Ki Lee ,  Kyu-Young Kim

Inventor： Hi-Kuk Lee ,  Yuko Yako ,  Dong-Ki Lee ,  Kyu-Young Kim

IPC: G03F7/023 ,  G03F7/30

CPC classification number: G03F7/0226 ,  C03C17/28 ,  C03C17/30 ,  C03C17/32 ,  G03F7/0048 ,  G03F7/2024

Abstract: A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl group including one to five carbon atoms, an ethyl 3-ethoxy propionate, an alkyl acetate that includes an alkyl group including three to eight carbon atoms, and an alkyl lactate that includes an alkyl group including one to six carbon atoms. The composition may be used to make high-quality display panels with uniformly-coated insulating layers.

Abstract translation: 光敏树脂组合物包括碱溶性树脂，醌二叠氮化物，表面活性剂和溶剂。 溶剂包括包含1至5个碳原子的烷基的二甘醇二烷基醚，3-乙氧基丙酸乙酯，包括3至8个碳原子的烷基的烷基乙酸酯和包括烷基的烷基酯 包括1至6个碳原子的基团。 该组合物可用于制备具有均匀涂覆的绝缘层的高质量显示面板。

公开(公告)号：US20070048662A1

公开(公告)日：2007-03-01

申请号：US11508079

申请日：2006-08-22

Applicant: Jeong-Min Park ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Byung-Uk Kim

Inventor： Jeong-Min Park ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Byung-Uk Kim

IPC: G03C1/00

CPC classification number: G03F7/0382 ,  G03F7/105 ,  H01L21/32139 ,  H01L29/66765 ,  H01L29/78669 ,  Y10S430/106 ,  Y10S430/114

Abstract: A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about 20% by weight of a cross-linker, about 0.1 to about 5% by weight of a dye and about 10 to about 80% by weight of a solvent. The photoresist composition may be applied to, for example, a method of manufacturing a TFT substrate.

Abstract translation: 光致抗蚀剂组合物包括约10至约70重量％的包含酚类聚合物的粘合剂树脂，约0.5至约10重量％的光酸产生剂，约1至约20重量％的交联剂， 接头，约0.1至约5重量％的染料和约10至约80重量％的溶剂。 光致抗蚀剂组合物可以应用于例如制造TFT基板的方法。

公开(公告)号：US20060160279A1

公开(公告)日：2006-07-20

申请号：US11313150

申请日：2005-12-20

Applicant: Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

Inventor： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

IPC: H01L21/84 ,  H01L27/148

CPC classification number: H01L27/1288 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/14692

Abstract: A photo mask is provided. The mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface. The flat photorseist film reduces processing cost and enhances the reliability of the panel manufacturing process.

Abstract translation: 提供照片面具。 掩模包括：透射区域和半透明区域，其中半透明区域包括阻挡光的多个遮光部分，并且其中遮光部分具有阻挡不同量的光的多个区域。 通过使用这种类型的光掩模，即使在不平坦表面的顶部也可沉积基本平坦的光致抗蚀剂层。 扁平光子膜降低了加工成本，提高了面板制造工艺的可靠性。

公开(公告)号：US08847223B2

公开(公告)日：2014-09-30

申请号：US13407423

申请日：2012-02-28

Applicant: Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

Inventor： Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

IPC: H01L29/04 ,  G03F7/20 ,  H01L27/12

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  H01L27/1288

Abstract: A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions.

Abstract translation: 在其上设置有感光层的基板上形成感光图案的方法可以包括在第一方向上移动基板和一组微镜中的至少一个，所述微镜组设置在基板上方并且 排列为阵列，所述阵列具有沿第二方向延伸的第一边缘，所述第二方向相对于所述第一方向成锐角。 该方法还可以包括根据微镜相对于感光层的位置选择性地打开该组微镜的一个或多个微镜，从而在感光层上照射一个或多个光束。 由点光束曝光的感光层被显影以形成具有沿与第一和第二方向交叉的第三方向延伸的边缘部分的感光图案。