Display substrate and method of manufacturing the display substrate
    52.
    发明授权
    Display substrate and method of manufacturing the display substrate 有权
    显示基板和制造显示基板的方法

    公开(公告)号:US08735890B2

    公开(公告)日:2014-05-27

    申请号:US13328658

    申请日:2011-12-16

    IPC分类号: H01L29/786

    CPC分类号: H01L27/1225 H01L27/1288

    摘要: In a display substrate and a method of manufacturing the display substrate, the display substrate includes a data line, a channel pattern, an insulating pattern and a pixel electrode. The data line extends in a direction on a base substrate. The channel pattern is disposed in a separate region between an input electrode connected to the data line and an output electrode spaced apart from the input electrode. The channel pattern makes contact with the input electrode and the output electrode on the input and output electrodes. The insulating pattern is spaced apart from the channel pattern on the base substrate and includes a contact hole exposing the output electrode. The pixel electrode is formed on the insulating pattern to make contact with the output electrode through the contact hole. Thus, a damage of the oxide semiconductor layer may be minimized and a manufacturing process may be simplified.

    摘要翻译: 在显示基板和显示基板的制造方法中,显示基板包括数据线,通道图案,绝缘图案和像素电极。 数据线沿着基底基板上的方向延伸。 通道图案设置在与数据线连接的输入电极和与输入电极间隔开的输出电极之间的分离区域中。 通道图案与输入电极和输出电极上的输出电极接触。 绝缘图案与基底基板上的沟道图案间隔开,并且包括暴露输出电极的接触孔。 像素电极形成在绝缘图案上,以通过接触孔与输出电极接触。 因此,可以使氧化物半导体层的损伤最小化,并且可以简化制造工艺。

    THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF
    54.
    发明申请
    THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF 有权
    薄膜晶体管阵列及其制造方法

    公开(公告)号:US20130214299A1

    公开(公告)日:2013-08-22

    申请号:US13618308

    申请日:2012-09-14

    IPC分类号: H01L29/786 H01L21/336

    摘要: A thin film transistor array panel and a manufacturing method thereof according to an exemplary embodiment of the present invention form a contact hole in a second passivation layer formed of an organic insulator, protect a side of the contact hole by covering with a protection member formed of the same layer as the first field generating electrode and formed of a transparent conductive material, and etch the first passivation layer below the second passivation layer using the protection member as a mask. Therefore, it is possible to prevent the second passivation layer formed of an organic insulator from being overetched while etching the insulating layer below the second passivation layer so that the contact hole is prevented from being made excessively wide.

    摘要翻译: 根据本发明的示例性实施例的薄膜晶体管阵列面板及其制造方法在由有机绝缘体形成的第二钝化层中形成接触孔,通过用由保护构件形成的保护构件覆盖来保护接触孔的一侧 与第一场产生电极相同的层并由透明导电材料形成,并且使用保护构件作为掩模,将第二钝化层下面的第一钝化层蚀刻。 因此,可以防止由有机绝缘体形成的第二钝化层在蚀刻第二钝化层下方的绝缘层的同时进行过蚀刻,从而防止接触孔过宽。

    Thin film transistor substrate, display device having the same and method of manufacturing the display device
    55.
    发明授权
    Thin film transistor substrate, display device having the same and method of manufacturing the display device 有权
    薄膜晶体管基板,具有相同的显示装置和制造显示装置的方法

    公开(公告)号:US08409916B2

    公开(公告)日:2013-04-02

    申请号:US13233399

    申请日:2011-09-15

    IPC分类号: H01L21/00 H01L21/16

    CPC分类号: H01L29/7869 H01L27/1225

    摘要: A thin film transistor substrate includes an insulating plate; a gate electrode disposed on the insulating plate; a semiconductor layer comprising a metal oxide, wherein the metal oxide has oxygen defects of less than or equal to 3%, and wherein the metal oxide comprises about 0.01 mole/cm3 to about 0.3 mole/cm3 of a 3d transition metal; a gate insulating layer disposed between the gate electrode and the semiconductor layer; and a source electrode and a drain electrode disposed on the semiconductor layer. Also described is a display substrate. The metal oxide has oxygen defects of less than or equal to 3%, and is doped with about 0.01 mole/cm3 to about 0.3 mole/cm3 of 3d transition metal. The metal oxide comprises indium oxide or titanium oxide. The 3d transition metal includes at least one 3d transition metal selected from the group consisting of chromium, cobalt, nickel, iron, manganese, and mixtures thereof.

    摘要翻译: 薄膜晶体管基板包括绝缘板; 设置在绝缘板上的栅电极; 包含金属氧化物的半导体层,其中所述金属氧化物具有小于或等于3%的氧缺陷,并且其中所述金属氧化物包含约0.01mol / cm 3至约0.3mol / cm 3的3d过渡金属; 设置在所述栅极电极和所述半导体层之间的栅极绝缘层; 以及设置在半导体层上的源电极和漏电极。 还描述了显示基板。 金属氧化物具有小于或等于3%的氧缺陷,并且掺杂有约0.01摩尔/ cm3至约0.3摩尔/ cm3的3d过渡金属。 金属氧化物包括氧化铟或二氧化钛。 3d过渡金属包括选自铬,钴,镍,铁,锰及其混合物中的至少一种3d过渡金属。

    Photonic sensor, method of manufacturing same, color filter substrate having same, and display device having the color filter substrate
    57.
    发明授权
    Photonic sensor, method of manufacturing same, color filter substrate having same, and display device having the color filter substrate 有权
    光电传感器,其制造方法,具有该滤光器基板的滤色器基板以及具有滤色器基板的显示装置

    公开(公告)号:US08253896B2

    公开(公告)日:2012-08-28

    申请号:US12898250

    申请日:2010-10-05

    IPC分类号: G02F1/1335

    摘要: A photonic sensor includes a first electrode layer, a second electrode layer, a third electrode layer, a first photon absorption layer, a second photon absorption layer, a third photon absorption layer and a charge blocking layer. The first photon absorption layer includes a dispersion of first nanoparticles, and is configured to transduce a first colored light into corresponding electric charge. The second photon absorption layer includes a dispersion of second nanoparticles, and is configured to transduce a second colored light into corresponding electric charge according to light intensity. The third photon absorption layer includes a dispersion of third nanoparticles, and is configured to transduce a third colored light into corresponding electric charge according to light intensity. The charge blocking layer is formed between the first and second photon absorption layers to block flow of electric charge between the first and second photon absorption layers.

    摘要翻译: 光子传感器包括第一电极层,第二电极层,第三电极层,第一光子吸收层,第二光子吸收层,第三光子吸收层和电荷阻挡层。 第一光子吸收层包括第一纳米颗粒的分散体,并且被配置为将第一有色光转换成相应的电荷。 第二光子吸收层包括第二纳米颗粒的分散体,并且被配置为根据光强度将第二有色光转换成相应的电荷。 第三光子吸收层包括第三纳米颗粒的分散体,并且被配置为根据光强度将第三有色光转换成相应的电荷。 电荷阻挡层形成在第一和第二光子吸收层之间以阻止第一和第二光子吸收层之间的电荷流动。

    Thin-film transistor, substrate and display device each having the thin-film transistor, and method of manufacturing the thin-film transistor
    58.
    发明授权
    Thin-film transistor, substrate and display device each having the thin-film transistor, and method of manufacturing the thin-film transistor 有权
    薄膜晶体管,各自具有薄膜晶体管的基板和显示装置以及制造薄膜晶体管的方法

    公开(公告)号:US08189131B2

    公开(公告)日:2012-05-29

    申请号:US12188956

    申请日:2008-08-08

    IPC分类号: G02F1/136

    摘要: A thin-film transistor (TFT) includes a gate electrode, a semiconductor pattern, a source electrode, and a drain electrode. The semiconductor pattern includes an active layer being overlapped with the gate electrode and a low band gap portion having a lower energy band gap than the active layer. The source and drain electrodes are spaced apart from each other to be overlapped with the semiconductor pattern. Therefore, the semiconductor pattern includes a low band gap portion having a lower energy band gap than the active layer, so that electron mobility may be increased in a channel formed along the low band gap portion so that electric characteristics of the TFT may be enhanced.

    摘要翻译: 薄膜晶体管(TFT)包括栅电极,半导体图案,源电极和漏电极。 半导体图案包括与栅电极重叠的有源层和具有比有源层更低的能带隙的低带隙部分。 源极和漏极彼此间隔开以与半导体图案重叠。 因此,半导体图案包括具有比有源层低的能带隙的低带隙部分,使得沿着低带隙部分形成的沟道中的电子迁移率可能增加,从而可以提高TFT的电特性。

    Thin-film transistor display panel and method of fabricating the same
    59.
    发明授权
    Thin-film transistor display panel and method of fabricating the same 有权
    薄膜晶体管显示面板及其制造方法

    公开(公告)号:US08022411B2

    公开(公告)日:2011-09-20

    申请号:US12499009

    申请日:2009-07-07

    IPC分类号: H01L51/52

    摘要: Provided are a thin-film transistor (TFT) display panel having improved electrical properties that can be fabricated time-effectively and a method of fabricating the TFT display panel. The TFT display panel includes: gate wirings which are formed on an insulating substrate; oxide active layer patterns which are formed on the gate wirings; data wirings which are formed on the oxide active layer patterns to cross the gate wirings; a passivation layer which is formed on the oxide active layer patterns and the data wirings and is made of silicon nitride (SiNx); and a pixel electrode which is formed on the passivation layer.

    摘要翻译: 提供了一种薄膜晶体管(TFT)显示面板,其具有可以有效制造的改进的电气特性,以及制造TFT显示面板的方法。 TFT显示面板包括:形成在绝缘基板上的栅极布线; 形成在栅极布线上的氧化物有源层图案; 形成在氧化物有源层图案上以跨过栅极布线的数据布线; 形成在氧化物有源层图案和数据布线上并由氮化硅(SiNx)制成的钝化层; 以及形成在钝化层上的像素电极。