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99 条记录 (耗时 0.05 秒)

    Calcium salt protective coating and method of forming
    52.
    发明授权
    Calcium salt protective coating and method of forming 失效
    钙盐保护涂层及成型方法

    公开(公告)号：US06582836B2

    公开(公告)日：2003-06-24

    申请号：US10002596

    申请日：2001-10-19

    申请人： Thomas E. Wood ,  Michael L. Austin

    发明人： Thomas E. Wood ,  Michael L. Austin

    IPC分类号： B32B900

    CPC分类号： C09D1/12 ,  A01F25/16 ,  A23K30/00 ,  Y02A40/55 ,  Y10S71/901 ,  Y10S71/903 ,  Y10T428/29 ,  Y10T428/2982 ,  Y10T428/2991 ,  Y10T428/31996 ,  Y10T428/4935 ,  Y10T428/662

    摘要： A calcium salt protective coating formed in situ by combining fatty acids with lime, also the associated method of forming the protective coating in situ. The fatty acids are preferably vegetable fatty acids such as from soapstock byproduct skimmings produced during the manufacture of vegetable oil. Experimental testing has shown that the protective coating is substantially impervious to moisture. The protective coating is a suitable covering for hay bales, silage, coal piles, and road salt piles. Further experimental testing has shown that the present invention is also suited to environmental soil bioremediation (“landfarming”) using microbes, in which the fatty acid ingredient, in addition to being used in formation of a protective coating that inhibits introduction of oxygen into the soil being treated, is also used as a carbon source for the microbial activity.

    摘要翻译： 通过将脂肪酸与石灰结合在一起形成的钙盐保护涂层，也是原位形成保护涂层的相关方法。 脂肪酸优选为植物脂肪酸，例如在制造植物油期间产生的皂屑副产物脱脂。 实验测试表明，保护涂层基本上不透湿。 保护涂层是干草捆，青贮饲料，煤堆和路盐堆的合适覆盖物。 进一步的实验测试表明，本发明也适用于使用微生物的环境土壤生物修复（“陆地耕作”），其中脂肪酸成分除了用于形成抑制氧进入土壤的保护性涂层外 被用作微生物活性的碳源。

    Method of planarizing the upper surface of a semiconductor wafer
    53.
    发明授权
    Method of planarizing the upper surface of a semiconductor wafer 失效
    平面化半导体晶片的上表面的方法

    公开(公告)号：US06194317B1

    公开(公告)日：2001-02-27

    申请号：US09091932

    申请日：1998-06-24

    申请人： David A. Kaisaki ,  Heather K. Kranz ,  Thomas E. Wood ,  L. Charles Hardy

    发明人： David A. Kaisaki ,  Heather K. Kranz ,  Thomas E. Wood ,  L. Charles Hardy

    IPC分类号： H01L21302

    CPC分类号： B24B21/04 ,  B24B7/228 ,  H01L21/3212

    摘要： This invention pertains to a method of modifying or refining a surface of a wafer suited for semiconductor fabrication. This method may be used to modify a wafer having an unmodified, exposed surface comprised of a layer of a second material deployed over at least one discrete feature of a first material attached to the wafer. A first step of this method comprises contacting and relatively moving the exposed surface of the wafer with respect to an abrasive article, wherein the abrasive article comprises an exposed surface of a plurality of three-dimensional abrasive composites comprising a plurality of abrasive particles fixed and dispersed in a binder and maintaining contact to effect removal of the second material. In a second step, the contact and relative motion are continued until an exposed surface of the wafer has at least one area of exposed first material and at least one area of exposed second material.

    摘要翻译： 本发明涉及一种修改或精制适合半导体制造的晶片表面的方法。 该方法可以用于修改具有未修饰的暴露表面的晶片，该表面包括由连接到晶片的第一材料的至少一个离散特征部分的第二材料层。 该方法的第一步包括相对于磨料制品接触和相对移动晶片的暴露表面，其中磨料制品包括多个固定和分散的多个磨料颗粒的多个三维磨料复合材料的暴露表面 在粘合剂中并保持接触以实现第二材料的去除。 在第二步骤中，接触和相对运动继续进行，直到晶片的暴露表面具有暴露的第一材料的至少一个区域和暴露的第二材料的至少一个区域。

    Alpha phase seeding of transition alumina using chromium oxide-based nucleating agents
    55.
    发明授权
    Alpha phase seeding of transition alumina using chromium oxide-based nucleating agents 失效
    使用氧化铬基成核剂对过渡氧化铝的α相接种

    公开(公告)号：US5219806A

    公开(公告)日：1993-06-15

    申请号：US552489

    申请日：1990-07-16

    申请人： Thomas E. Wood

    发明人： Thomas E. Wood

    IPC分类号： C04B35/111 ,  C04B35/622 ,  C09K3/14

    CPC分类号： C09K3/1418 ,  C04B35/1115 ,  C04B35/62231

    摘要： This invention provides an improved alpha alumina-based ceramic and a method to make the same. The improvement consists of the addition of a chromium-based nucleating agent. Particularly useful embodiments of the improved alpha alumina-based ceramic include abrasive particles and fibers.

    摘要翻译： 本发明提供一种改进的α氧化铝基陶瓷及其制造方法。 改进之处在于添加铬基成核剂。 改进的α氧化铝基陶瓷的特别有用的实施方案包括研磨颗粒和纤维。

    Sol gel-derived ceramic bubbles
    56.
    发明授权
    Sol gel-derived ceramic bubbles 失效
    SOL凝胶陶瓷泡沫

    公开(公告)号：US5077241A

    公开(公告)日：1991-12-31

    申请号：US272526

    申请日：1988-11-17

    申请人： Kyung H. Moh ,  Harold G. Sowman ,  Thomas E. Wood

    发明人： Kyung H. Moh ,  Harold G. Sowman ,  Thomas E. Wood

    IPC分类号： A61K9/52 ,  B01J2/06 ,  B01J2/08 ,  B01J13/02 ,  C04B35/626 ,  C04B38/00

    CPC分类号： C04B38/009 ,  B01J2/06 ,  B01J2/08

    摘要： Discrete, free-flowing, ceramic microbubbles consist essentially of at least one of a non-oxide component and an oxide component having diameters in the range of 1 to 300 micrometers and each having a wall thickness of less than 10 percent of the diameter of the bubble. In the process of the invention, a sol precursor and a suitable liquid, referred to as a bloating agent, when added to a bubble promoting medium under proper conditions, provide green gelled microbubbles which after firing are ceramic microbubbles having wall thicknesses less than 10 percent of the diameter of the bubbles. The microbubbles are non-vitreous, sol-gel derived, fine microstructured, uniform, hollow, smooth, and are either essentially all oxide or non-oxide or combinations of both.

    Multilevel interconnect transfer process
    59.
    发明授权
    Multilevel interconnect transfer process 失效
    多层互连传输过程

    公开(公告)号：US4743568A

    公开(公告)日：1988-05-10

    申请号：US77476

    申请日：1987-07-24

    申请人： Thomas E. Wood

    发明人： Thomas E. Wood

    IPC分类号： H01L21/68 ,  H01L21/768 ,  H01L23/522 ,  H01L23/538 ,  H01L21/283 ,  H01L21/316

    CPC分类号： H01L21/6835 ,  H01L21/76897 ,  H01L23/522 ,  H01L23/5389 ,  H01L2221/68345 ,  H01L2924/0002 ,  Y10S148/135

    摘要： A method for processing multilevel interconnect lines separately from the multichip module on which they are to be employed. An oxide layer (16) is grown on a silicon wafer (14) and followed by a polyimide layer (18). Then a metal layer (20) is deposited and patterned. This is followed by another polyimide layer (24) having vias and another patterned metal layer (28). The vias allow for connections to be made between metal layers. Many polyimides and metal layers may be processed to allow for the desired number of levels of interconnect lines. After a last polyimide layer (32) is deposited, the oxide layer is etched to separate the multilevel interconnect line transfer (34) from the silicon wafer. After the processing of the multilevel interconnect lines, the multilevel interconnect line transfer is adhered to the multichip module in a predetermined relationship and electrical connections are made between them. In an alternative embodiment, a boron nitride layer (46) is bonded on a surface of silicon wafer (14). Stabilizing ring (44) is bonded on a second surface of the silicon wafer. Exposed regions of the wafer are etched away. The processing of multilevel interconnect line transfer (34) occurs on boron nitride layer (46) in the same manner as previously described.

    Three-dimensional solar cell having increased efficiency
    60.
    发明授权
    Three-dimensional solar cell having increased efficiency 有权
    具有提高效率的三维太阳能电池

    公开(公告)号：US08790947B2

    公开(公告)日：2014-07-29

    申请号：US13272285

    申请日：2011-10-13

    申请人： Colby G. Rampley ,  Frank T. Laver ,  Thomas E. Wood

    发明人： Colby G. Rampley ,  Frank T. Laver ,  Thomas E. Wood

    IPC分类号： H01L31/0216 ,  H01L31/18

    CPC分类号： H01L31/035281 ,  H01L31/02363 ,  H01L31/073 ,  H01L31/1836 ,  Y02E10/543

    摘要： A nano-scale tower structure array having increased surface area on each tower for gathering incident light is provided for use in three-dimensional solar cells. Embodiments enhance surface roughness of each tower structure to increase the surface area available for light gathering. Enhanced roughness can be provided by manipulating passivation layer etching parameters used during a formation process of the nano-scale tower structures, in order to affect surface roughness of a photoresist layer used for the etch. Manipulable etching parameters can include power, gas pressure, and etching compound chemistry.

    摘要翻译： 提供用于三维太阳能电池的纳米级塔架结构阵列，其具有用于收集入射光的每个塔上具有增加的表面积。 实施例增强了每个塔结构的表面粗糙度，以增加可用于聚光的表面积。 可以通过操纵在纳米级塔结构的形成过程中使用的钝化层蚀刻参数来提供增强的粗糙度，以便影响用于蚀刻的光致抗蚀剂层的表面粗糙度。 可操作的蚀刻参数可以包括功率，气体压力和蚀刻化合物化学。