SEMICONDUCTOR LAYER STRUCTURE WITH OVER LATTICE
    53.
    发明申请
    SEMICONDUCTOR LAYER STRUCTURE WITH OVER LATTICE 有权
    半导体层结构与超导体

    公开(公告)号:US20080054252A1

    公开(公告)日:2008-03-06

    申请号:US11780516

    申请日:2007-07-20

    IPC分类号: H01L29/06

    摘要: The semiconductor layer structure includes an active layer (6) and a superlattice (9) composed of stacked layers (9a, 9b) of III-V compound semiconductors of a first (a) and at least one second type (b). Adjacent layers of different types in the superlattice (9) differ in composition with respect to at least one element. The layers (9a, 9b) have predefined layer thicknesses, such that the layer thicknesses of layers (9a) of the first type (a) and of the layers (9b) of the second type (b) increase from layer to layer with increasing distance from an active layer (6). An increasing layer thickness within the layers of the first and the second type (a, b) is suitable for adapting the electrical, optical and epitaxial properties of the superlattice (9) to given requirements in the best possible manner.

    摘要翻译: 半导体层结构包括由第一(a)和至少一个第二类型(b)的III-V族化合物半导体的堆叠层(9a,9b)组成的有源层(6)和超晶格(9)。 超晶格(9)中不同类型的相邻层相对于至少一个元素的组成不同。 层(9a,9b)具有预定的层厚度,使得第一类型(a)的层(9a)和第二类型(b)的层(9b)的层的厚度从层 以增加距离有源层(6)的距离。 在第一和第二类型(a,b)的层内增加的层厚度适合于以最佳可能方式使超晶格(9)的电,光学和外延特性适应给定的要求。

    Metal clad ridge waveguide (“MCRW”) laser semiconductor structure with doped semiconductor substrate
    55.
    发明授权
    Metal clad ridge waveguide (“MCRW”) laser semiconductor structure with doped semiconductor substrate 失效
    具有掺杂半导体衬底的金属包脊波导(“MCRW”)激光半导体结构

    公开(公告)号:US06339233B1

    公开(公告)日:2002-01-15

    申请号:US08940600

    申请日:1997-09-30

    申请人: Alfred Lell

    发明人: Alfred Lell

    IPC分类号: H01L310328

    摘要: A semiconductor device comprises an electrically conductive III-V semiconductor substrate which has mutually opposite first and second main surfaces. At least one pn junction, reverse biased during operation of the semiconductor device, is disposed above the first main surface. At least one functional semiconductor structure is disposed above the at least one pn junction. The functional semiconductor structure is electrically insulated from the second main surface of the III-V semiconductor substrate.

    摘要翻译: 半导体器件包括具有相互相对的第一和第二主表面的导电III-V半导体衬底。 在半导体器件的操作期间被反向偏置的至少一个pn结设置在第一主表面之上。 至少一个功能性半导体结构设置在至少一个pn结上方。 功能半导体结构与III-V半导体衬底的第二主表面电绝缘。

    AlAs oxide insulating layer between a conductive III-V substrate and an
optoelectronic semiconductor device and method of manufacturing thereof
    56.
    发明授权
    AlAs oxide insulating layer between a conductive III-V substrate and an optoelectronic semiconductor device and method of manufacturing thereof 有权
    导电III-V基片与光电半导体器件之间的AlAs氧化物绝缘层及其制造方法

    公开(公告)号:US6081000A

    公开(公告)日:2000-06-27

    申请号:US68573

    申请日:1998-09-14

    申请人: Alfred Lell

    发明人: Alfred Lell

    IPC分类号: H01L27/06 H01L33/00

    CPC分类号: H01L27/0605

    摘要: An optoelectronic semiconductor device, whereby at least one functional semiconductor structure is arranged on a II-V semiconductor substrate. Inventively, an electrically conductive III-V semiconductor substrate is provided that exhibits a charge carrier concentration of more than 1*10.sup.15 cm.sup.-3. At least one electrically insulating oxide layer is provided between the functional semiconductor structure and the III-V semiconductor substrate.

    摘要翻译: PCT No.PCT / DE97 / 02038 Sec。 371日期:1998年9月14日 102(e)1998年9月14日PCT PCT 1997年9月11日PCT公布。 公开号WO98 / 13864 日期:1998年4月2日在II-V半导体基板上配置有至少一个功能半导体结构的光电子半导体装置。 本发明提供一种导电III-V族半导体衬底,其表现出大于1×1015cm-3的电荷载流子浓度。 在功能半导体结构和III-V半导体衬底之间设置至少一个电绝缘氧化物层。