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公开(公告)号:US20060063361A1
公开(公告)日:2006-03-23
申请号:US10513397
申请日:2003-05-07
Applicant: Satyendra Kumar , Devendra Kumar
Inventor: Satyendra Kumar , Devendra Kumar
CPC classification number: H01L21/2236 , H01J37/32339 , H01J37/32412 , H05B6/806
Abstract: Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various doping processes. In one embodiment, a substrate (250) can be doped by forming a plasma (610) in a cavity (285) by subjecting a gas to an amount of electromagnetic radiation in the presence of a plasma catalyst (240) and adding at least one dopant material to the plasma. The material is then allowed to penetrate into the substrate. Various active and passive catalysts are provided.
Abstract translation: 提供了用于点燃,调制和维持用于各种掺杂过程的等离子体的方法和装置。 在一个实施例中,可以通过在等离子体催化剂(240)的存在下使气体经受一定量的电磁辐射而在空腔(285)中形成等离子体(610)来掺杂衬底(250),并且添加至少一个 掺杂剂材料。 然后使材料渗入基材。 提供了各种主动和被动催化剂。
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公开(公告)号:US20060062930A1
公开(公告)日:2006-03-23
申请号:US10513394
申请日:2003-05-07
Applicant: Devendra Kumar , Satyendra Kumar , Michael Dougherty
Inventor: Devendra Kumar , Satyendra Kumar , Michael Dougherty
CPC classification number: C23C8/36 , H05H1/46 , H05H2001/4607
Abstract: A system and method of carburizing a surface region of an object includes subjecting a gas to electromagnetic radiation, generated from a radiation source (52), in the presence of a plasma catalyst (70) to initiate a plasma containing carbon. The method also includes exposing the surface region of the object to the plasma for a period of time sufficient to transfer at least some of the carbon from the plasma to the object through the first surface region.
Abstract translation: 对物体的表面区域进行渗碳的系统和方法包括在等离子体催化剂(70)的存在下使气体受到从辐射源(52)产生的电磁辐射,以启动含有碳的等离子体。 该方法还包括将物体的表面区域暴露于等离子体足以将至少一些碳从等离子体转移到物体通过第一表面区域的时间段内。
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公开(公告)号:US20050061446A1
公开(公告)日:2005-03-24
申请号:US10971180
申请日:2004-10-21
Applicant: Devendra Kumar , Satyendra Kumar
Inventor: Devendra Kumar , Satyendra Kumar
IPC: B01J7/00 , A62D3/00 , B01D53/86 , B01D53/92 , B01J19/08 , B01J19/12 , B01J37/34 , B22F3/105 , C01B3/02 , C21D1/06 , C21D1/09 , C21D1/38 , C22B4/00 , F01N3/08 , F01N3/10 , F01N3/20 , F01N3/24 , F01N3/28 , F01N3/30 , F01N9/00 , F01N13/10 , F27B17/00 , F27D3/12 , F27D11/08 , F27D11/12 , G21K5/00 , H01J37/32 , H01M8/06 , H05B6/68 , H05B6/78 , H05B6/80 , H05H1/24 , H05H1/46 , G09G3/10
CPC classification number: H05B6/68 , B01D53/92 , B01D2258/01 , B01D2259/818 , B01J19/088 , B01J19/126 , B01J2219/00063 , B01J2219/00193 , B01J2219/002 , B01J2219/00213 , B01J2219/0024 , B01J2219/0892 , B01J2219/0894 , B01J2219/1269 , B82Y10/00 , B82Y30/00 , C22B4/005 , F01N3/202 , F01N3/206 , F01N13/10 , F01N2240/28 , F01N2610/08 , H01J37/32009 , H01J37/32192 , H01J37/32302 , H01J37/32366 , H01J2237/0206 , H01J2237/33 , H01J2237/336 , H01J2237/338 , H05B6/6402 , H05B6/806 , H05B2206/044 , H05H1/46 , H05H2001/4607 , H05H2001/4652 , Y02B40/143 , Y02T10/26
Abstract: Methods and apparatus for plasma-assisted joining of one or more parts together are provided. The joining process may include, for example, placing at least first and second joining areas in proximity to one another in a cavity, forming a plasma in the cavity by subjecting a gas to electromagnetic radiation in the presence of a plasma catalyst, and sustaining the plasma at least until the first and second joining areas are joined. Plasma catalysts, and methods and apparatus for igniting, modulating, and sustaining a joining plasma, are provided. Additional cavity shapes, and methods and apparatus for selective plasma-joining, are also provided.
Abstract translation: 提供了将一个或多个部件等离子体辅助接合在一起的方法和装置。 接合过程可以包括例如在空腔中至少彼此靠近地设置第一和第二接合区域,通过在等离子体催化剂的存在下对气体进行电磁辐射,从而在空腔中形成等离子体,并维持 等离子体至少直到第一和第二接合区域被接合。 提供等离子体催化剂,以及用于点燃,调节和维持接合等离子体的方法和装置。 还提供了额外的腔体形状,以及用于选择性等离子体接合的方法和装置。
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公开(公告)号:US06454877B1
公开(公告)日:2002-09-24
申请号:US09582607
申请日:2000-06-28
Applicant: Devendra Kumar , Satyendra Kumar , Michael L. Dougherty
Inventor: Devendra Kumar , Satyendra Kumar , Michael L. Dougherty
IPC: B23K2614
Abstract: A method and apparatus are provided for treating the surface of a metal body through phase transformation, ion implantation, and/or diffusion and to form new phases of metallic materials. The method and apparatus have been shown to be particularly useful to improve the hardness and corrosion resistance of ferrous and non-ferrous metals. Generally, the method comprises irradiating a portion of the metal body (18) with a laser (12), and directing a stream of gas (22) onto the same portion of the metal body simultaneously with and preferably for a duration after the laser is turned off. Preferably, the laser (12) is a carbon dioxide laser operated in a pulsed mode to control heating of the metal (18). The gas (22) is preferably carbon dioxide to quickly cool the metal when the laser is off, and to provide carbon atoms for deposition onto the body. The entire process may be carried out in an environment at atmospheric pressure, obviating the need for a vacuum chamber or pressure controlled furnace or similar apparatus. After treatment, the hardness and corrosion resistance of at least a ferrous body are dramatically increased. Advantageously, both sides of a thin metal body, such as a metal tube, may be simultaneously treated. Further, a new, highly oxygenated, hard and extremely corrosion resistant metal phase may be created.
Abstract translation: 提供一种通过相变,离子注入和/或扩散来处理金属体表面并形成金属材料的新相的方法和装置。 已经显示该方法和装置对于提高黑色金属和有色金属的硬度和耐腐蚀性是特别有用的。 通常,该方法包括用激光器(12)照射金属体(18)的一部分,并且在激光器之后的持续时间内同时优选地将气流(22)引导到金属体的相同部分上 关掉。 优选地,激光器(12)是以脉冲模式操作以控制金属(18)的加热的二氧化碳激光器。 气体(22)优选为二氧化碳,以在激光关闭时快速冷却金属,并提供碳原子用于沉积到体上。 整个过程可以在大气压的环境中进行,从而避免了对真空室或压力控制炉或类似装置的需要。 处理后,至少铁质的硬度和耐腐蚀性显着提高。 有利地,可以同时处理诸如金属管的薄金属体的两侧。 此外,可以产生新的,高氧化的,硬的和极耐腐蚀的金属相。
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公开(公告)号:US06423947B1
公开(公告)日:2002-07-23
申请号:US09896525
申请日:2001-06-29
Applicant: Jeffrey D. Womack , Vuong P. Nguyen , Devendra Kumar , Jack S. Kasahara , Sokol Ibrani
Inventor: Jeffrey D. Womack , Vuong P. Nguyen , Devendra Kumar , Jack S. Kasahara , Sokol Ibrani
IPC: H05B514
Abstract: A processing chamber and methods for employing this processing chamber to thermally treat wafer-like objects. The chamber comprises a double walled shell, a pedestal style heater, internal passages for the transport of cooling gases and removal of exhaust gases, independently variable gas introduction patterns, and a movable door for sealing the chamber. The chamber is designed to permit in situ cooling of wafer-like objects and to provide means for precise optimization of this cooling. The methods provide for the processing of the wafer-like object in an environment where the temperature, rate of change of the temperature, composition of gases and the relative timings of changes to these variables may be controlled to achieve the desired material properties in the wafer-like object or in films contained on this wafer-like object.
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公开(公告)号:US4550177A
公开(公告)日:1985-10-29
申请号:US599126
申请日:1984-04-11
Applicant: Devendra Kumar , George M. Fohlen , John A. Parker
Inventor: Devendra Kumar , George M. Fohlen , John A. Parker
IPC: C07F9/6593 , C08G73/12 , C07F9/65
CPC classification number: C08G73/128 , C07F9/65815 , Y10T428/315
Abstract: 4-Aminophenoxy cyclotriphosphazenes are reacted with maleic anhydride to produce maleamic acids which are converted to the maleimides. The maleimides are polymerized. By selection of starting materials (e.g. hexakis amino or trisaminophenoxy-trisphenoxy-cyclotriphosphazenes), selection of molar proportions of reactants, use of mixtures of anhydrides and use of dianhydrides as bridging groups a variety of maleimides and polymers are produced. The polymers have high limiting oxygen indices, high char yields and other useful heat and fire resistant properties making them useful as, for example, impregnants of fabrics.
Abstract translation: 4-氨基苯氧基环三磷腈与马来酸酐反应产生马来酰亚胺酸,转化成马来酰亚胺。 马来酰亚胺被聚合。 通过选择起始材料(例如六氨基或三氨基苯氧基 - 三苯氧基 - 环三磷腈),选择反应物的摩尔比例,使用酸酐的混合物和使用二酸酐作为桥连基团,制备各种马来酰亚胺和聚合物。 聚合物具有高限制氧指数,高焦炭产率和其它有用的耐热和耐火性质,使得它们可用作例如织物浸渍剂。
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