-
51.发明授权公开(公告)号：US08659741B2
公开(公告)日：2014-02-25
申请号：US12946618
申请日：2010-11-15
申请人： Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Nina Vladimirovna Dziomkina , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf , Vijay Kumar Badam
发明人： Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Nina Vladimirovna Dziomkina , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf , Vijay Kumar Badam
CPC分类号： C09J7/0217 , B32B2307/546 , B32B2307/56 , B32B2307/71 , B32B2307/73 , B32B2405/00 , C09J7/21 , C09J7/385 , G03F7/70341 , G03F7/70808 , G03F7/70916 , G03F7/7095 , Y10T428/28 , Y10T428/2843 , Y10T428/2848 , Y10T428/2852
摘要： A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
摘要翻译： 提供密封构件以防止浸入液体进入部件之间的间隙。 密封构件具有粘附到形成被密封的间隙的部件的塑料或聚合物密封部分。 密封构件被构造成减少被密封的部件之间的力耦合，特别是与时间有关的力耦合。
-
52.发明申请公开(公告)号：US20110116060A1
公开(公告)日：2011-05-19
申请号：US12946566
申请日：2010-11-15
申请人： Nina Vladimirovna Dziomkina , Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Vijay Kumar Badam , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf
发明人： Nina Vladimirovna Dziomkina , Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Vijay Kumar Badam , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf
CPC分类号： G03F7/70916 , B32B2307/71 , B32B2307/73 , B32B2405/00 , C09J7/385 , G03F7/70341 , G03F7/7095 , Y10T428/28 , Y10T428/2843 , Y10T428/2848 , Y10T428/2852
摘要： A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
摘要翻译： 提供一个构件以防止浸入液体进入部件之间的间隙或粘附到至少一个部件以提供浸入系统特征的表面。 该部件具有粘附到部件上的塑料密封部分。 塑料密封部分对于DUV辐射是不透明的。 它可能通过暴露于DUV辐射来抵抗降解。 它可能具有液体恐怖涂层或性质。
-
公开(公告)号：US07751027B2
公开(公告)日：2010-07-06
申请号：US11454129
申请日：2006-06-16
申请人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
发明人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
-
54.发明授权Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder 有权具有具有流体的热管以冷却衬底和/或衬底保持器的光刻设备和器件制造方法公开(公告)号：US09268236B2
公开(公告)日：2016-02-23
申请号：US12814242
申请日：2010-06-11
申请人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
发明人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.
摘要翻译： 一种光刻设备，其被配置为将图案化的辐射束投影到保持在基板台上的凹槽中的基板保持器上的基板的目标部分上，该设备包括：液体供应系统，其构造成至少部分地填充投影系统和 液体基体; 阻挡结构，其构造成在所述空间内基本上容纳所述液体; 以及在使用中供应有温度调节的流体并被配置为在可能发生局部冷却的位置处对基板和/或基板保持器进行热调节的热管。
-
55.发明申请FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 失效流体处理结构，平面设备和设备制造方法公开(公告)号：US20110292357A1
公开(公告)日：2011-12-01
申请号：US13098830
申请日：2011-05-02
申请人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
发明人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70 , G03F7/70341
摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板的台面或两者。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。
-
公开(公告)号：US20070268466A1
公开(公告)日：2007-11-22
申请号：US11436057
申请日：2006-05-18
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
-
公开(公告)号：US07903232B2
公开(公告)日：2011-03-08
申请号：US11402258
申请日：2006-04-12
CPC分类号： G03F7/70341
摘要： An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between those components.
摘要翻译： 浸渍式光刻曝光设备，其中浸入液体的顶涂层的pH被选择为使得液体供应系统和基底W的一部分可相对于彼此移动的相对速度最大化，而不会使 半月板在这些部件之间延伸。
-
公开(公告)号：US07804577B2
公开(公告)日：2010-09-28
申请号：US11391683
申请日：2006-03-29
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
摘要翻译： 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。
-
59.发明申请公开(公告)号：US20100214543A1
公开(公告)日：2010-08-26
申请号：US12697583
申请日：2010-02-01
申请人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
发明人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。
-
60.发明授权Fluid handling structure, a lithographic apparatus and a device manufacturing method 失效流体处理结构，光刻设备和装置制造方法公开(公告)号：US08711326B2
公开(公告)日：2014-04-29
申请号：US13098830
申请日：2011-05-02
申请人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
发明人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
CPC分类号： G03F7/70925 , G03F7/70 , G03F7/70341
摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板或两者的台。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。
-
-
-
-
-
-
-
-
-
搜索结果
122 条记录 (耗时 0.058 秒)
