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    Positive photoresist composition
    51.
    发明授权
    Positive photoresist composition 失效
    正光致抗蚀剂组合物

    公开(公告)号：US06387590B1

    公开(公告)日：2002-05-14

    申请号：US09671177

    申请日：2000-09-28

    申请人： Kazuyoshi Mizutani ,  Shoichiro Yasunami

    发明人： Kazuyoshi Mizutani ,  Shoichiro Yasunami

    IPC分类号： G03F7004

    CPC分类号： G03F7/0757 ,  G03F7/0392

    摘要： Disclosed is a positive photoresist composition comprising a polysiloxane containing as a copolymerization component at least a structural unit represented by the following formula (I): wherein L represents a single bond or an arylene group, A′ represents an aromacyclic or alicyclic structure which may have a substituent, and n represents an integer of 1 to 6.

    摘要翻译： 公开了一种正型光致抗蚀剂组合物，其包含至少由下式（I）表示的结构单元作为共聚成分的聚硅氧烷：其中L表示单键或亚芳基，A'表示可具有的单环或脂环结构 取代基，n表示1〜6的整数。

    Positive photoresist composition
    52.
    发明授权
    Positive photoresist composition 失效
    正光致抗蚀剂组合物

    公开(公告)号：US06346363B2

    公开(公告)日：2002-02-12

    申请号：US09729178

    申请日：2000-12-05

    申请人： Kazuyoshi Mizutani ,  Shoichiro Yasunami

    发明人： Kazuyoshi Mizutani ,  Shoichiro Yasunami

    IPC分类号： G03F7004

    CPC分类号： G03F7/0757 ,  G03F7/0045

    摘要： A positive type photoresist composition comprising an alkali-soluble or acid-decomposable polysiloxane containing repeating structural units represented by formula (I): wherein L represents at least one divalent connecting group selected from the group consisting of —A—NHCO—, —A—NHCOO— and —A—NHCONH—, wherein A represents a single bond, an alkylene group or an arylene group; X represents a single bond or a divalent connecting group; and Z represents either a group represented by or a group represented by wherein Y represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, an atomic group represented by Y may be straight-chain, branched or cyclic, R represents a hydrogen atom or an acid-decomposable group, l represents an integer of from 1 to 3, and m also represents an integer of from 1 to 3.

    摘要翻译： 一种正型光致抗蚀剂组合物，其包含含有由式（I）表示的重复结构单元的碱溶性或酸可分解聚硅氧烷：其中L表示至少一个选自-A-NHCO-，-A- NHCOO-和-A-NHCONH-，其中A表示单键，亚烷基或亚芳基; X表示单键或二价连接基团; Z表示由Y代表氢原子，烷基，芳基或芳烷基表示的基团，由Y表示的原子团可以是直链，支链或环状的，R表示氢原子 原子或酸可分解基团，l表示1〜3的整数，m也表示1〜3的整数。

    Negative-working image recording material
    53.
    发明授权
    Negative-working image recording material 失效
    负工作图像记录材料

    公开(公告)号：US6132935A

    公开(公告)日：2000-10-17

    申请号：US691371

    申请日：1996-08-02

    申请人： Fumikazu Kobayashi ,  Kazuyoshi Mizutani ,  Keitaro Aoshima

    发明人： Fumikazu Kobayashi ,  Kazuyoshi Mizutani ,  Keitaro Aoshima

    IPC分类号： B41C1/10 ,  B41M5/36 ,  G03C1/73

    CPC分类号： B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145 ,  Y10S430/146

    摘要： A negative-working image recording material is disclosed, which comprises a substance which absorbs light to generate heat, a water-insoluble and aqueous alkali-soluble resin, and a phenol derivative having in its molecule from 4 to 8 benzene rings, at least one phenolic hydroxyl group and at least two groups represented by the following general formula (I):--CH.sub.2 OR.sup.1 (I)wherein R.sup.1 represents a hydrogen atom, an alkyl group or an acyl group. The negative-working image recording material can perform recording independent of the emission wavelength of the exposing light source, particularly with light in the range of from near infrared to infrared (heat irradiation).

    摘要翻译： 公开了一种负性图像记录材料，其包括吸收光以产生热的物质，水不溶性和碱溶性水溶性树脂，以及分子中具有4至8个苯环的苯酚衍生物，至少一种 酚羟基和由以下通式（I）表示的至少两个基团：-CH 2 OR 1（I）其中R 1表示氢原子，烷基或酰基。 负工作图像记录材料可以独立于曝光光源的发射波长执行记录，特别是在近红外到红外（热照射）的范围内的光。

    Positive working photosensitive lithographic printing plate utilizing phenol derivative compound containing photosensitive composition
    54.
    发明授权
    Positive working photosensitive lithographic printing plate utilizing phenol derivative compound containing photosensitive composition 失效
    使用含有感光性组合物的苯酚衍生物的正性感光性平版印刷版

    公开(公告)号：US5460917A

    公开(公告)日：1995-10-24

    申请号：US296425

    申请日：1994-08-26

    申请人： Fumikazu Kobayashi ,  Kazuyoshi Mizutani ,  Akira Nagashima

    发明人： Fumikazu Kobayashi ,  Kazuyoshi Mizutani ,  Akira Nagashima

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/039 ,  G03F7/023

    CPC分类号： G03F7/0226

    摘要： A positive working photosensitive lithographic printing plate comprising a support having thereon a photosensitive layer comprising a positive photosensitive composition, wherein the positive photosensitive composition comprises a mixture of (a) a phenol derivative, (b) a water-soluble and aqueous alkali-soluble resin, and (c) o-quinonediazide or a mixture of a compound capable of forming an acid on exposure and a compound having at least one C--O--C group which is decomposable with an acid, and wherein the phenol derivative is a mixture of a compound represented by the following formula (I) and a compound represented by the following formula (II): ##STR1## wherein X.sup.1, X.sup.2, X.sup.3, X.sup.4, X.sup.5 and X.sup.6 are the same or different and each represents --CH.sub.2 OH or a hydrogen atom, provided that at least three of them are each --CH.sub.2 OH; ##STR2## wherein Y.sup.1, Y.sup.2, Y.sup.3, Y.sup.4, Y.sup.5 and Y.sup.6 are the same or different and each represents --CH.sub.2 OCH.sub.3, --CH.sub.2 OH or a hydrogen atom, provided that at least three of them are each --CH.sub.2 OCH.sub.3 or --CH.sub.2 OH, and at least one of the three is --CH.sub.2 OCH.sub.3.

    摘要翻译： 一种正性感光性平版印刷版，其特征在于，具有包含正性感光性组合物的感光层的支持体，其中，所述正性感光性组合物包含（a）苯酚衍生物，（b）水溶性和水溶性碱溶性树脂 ，和（c）邻醌二叠氮化合物或能够在暴露时形成酸的化合物与具有至少一个可与酸分解的COC基团的化合物的混合物，并且其中所述酚衍生物是由 下式（I）表示的化合物和下式（II）表示的化合物：其中X 1，X 2，X 3，X 4，X 5和X 6相同或不同，各自表示-CH 2 OH或氢原子 条件是它们中的至少三个各自为-CH 2 OH; 其中Y 1，Y 2，Y 3，Y 4，Y 5和Y 6相同或不同，各自表示-CH 2 OCH 3，-CH 2 OH或氢原子，条件是它们中至少有三个为-CH 2 OCH 3或-CH 2 OH ，三个中的至少一个是-CH 2 OCH 3。

    Siloxane polymers and positive working light-sensitive compositions comprising the same
    56.
    发明授权
    Siloxane polymers and positive working light-sensitive compositions comprising the same 失效
    硅氧烷聚合物和包含其的正性工作光敏组合物

    公开(公告)号：US5276124A

    公开(公告)日：1994-01-04

    申请号：US3465

    申请日：1993-01-12

    申请人： Toshiaki Aoai ,  Kazuyoshi Mizutani

    发明人： Toshiaki Aoai ,  Kazuyoshi Mizutani

    IPC分类号： C08G77/22 ,  C08G77/382 ,  G03F7/075 ,  C08G77/14

    CPC分类号： C08G77/22 ,  C08G77/382 ,  G03F7/0757

    摘要： A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or acetylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.

    摘要翻译： 一种新型硅氧烷聚合物，其具有至少1mol％的衍生自式（I）或（II）的二烯化合物与式（III），（IV）的烯烃或乙炔化合物之间的环状加热产物的结构单元，或 （Ⅴ）：（*化学结构*）（I）（*化学结构*）（II）（*化学结构*）（III）（*化学结构*）（Ⅳ）（*化学结构*） 包含硅氧烷聚合物的正性工作感光组合物。

    Positive resist composition and pattern forming method using the same
    59.
    发明授权
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07625690B2

    公开(公告)日：2009-12-01

    申请号：US11717618

    申请日：2007-03-14

    申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

    发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same
    60.
    发明授权
    Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same 有权
    用于电子束，EUV光或X射线的正性抗蚀剂组合物，以及使用其的图案形成方法

    公开(公告)号：US07344821B2

    公开(公告)日：2008-03-18

    申请号：US11090864

    申请日：2005-03-28

    申请人： Kazuyoshi Mizutani

    发明人： Kazuyoshi Mizutani

    IPC分类号： G03F7/039 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/167 ,  Y10S430/168

    摘要： A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment with one of an actinic ray and radiation; and (B) a resin that increases a solubility of the resin (B) in an alkaline developer by an action of an acid, wherein the resin (B) comprises a repeating unit having an alicyclic group connected with a fluorine-substituted alcohol residue; and a pattern formation method using the composition.

    摘要翻译： 一种用于电子束，EUV光或X射线的正性抗蚀剂组合物，所述正性抗蚀剂组合物包含：（A）至少一种在通过光化学射线和辐射之一处理后产生酸的化合物; 和（B）通过酸作用增加树脂（B）在碱性显影剂中的溶解度的树脂，其中树脂（B）包含具有与氟取代的醇残基相连的脂环基的重复单元; 以及使用该组合物的图案形成方法。