Shading correction apparatus, shading correction method, interpolation operation apparatus and interpolation operation method for use in shading correction apparatus and an applied apparatus thereof
    51.
    发明申请
    Shading correction apparatus, shading correction method, interpolation operation apparatus and interpolation operation method for use in shading correction apparatus and an applied apparatus thereof 审中-公开
    阴影校正装置,阴影校正方法,用于阴影校正装置中的插值运算装置和插值运算方法及其应用装置

    公开(公告)号:US20050013505A1

    公开(公告)日:2005-01-20

    申请号:US10885801

    申请日:2004-07-08

    CPC分类号: G06T5/008 G06T2207/10024

    摘要: Disclosed herein is a shading correction apparatus having a coefficient operation section for obtaining shading correction coefficients by first and second operation units for computing correction coefficient components in crossing first and second directions of an observed pixel, each operation unit including: a look-up table in which coefficient components at a plurality of reference points having different intervals corresponding to a magnitude of changing rate of the correction coefficient components with respect to distance are stored corresponding to address; a pixel distance generator for outputting a virtual pixel location by converting the reference point intervals into equal intervals; a reference point address and distance generator for outputting reference point addresses and distance between adjacent reference points and the observed pixel with using the virtual pixel location and reference point interval; and an interpolation operation section for obtaining by means of interpolation a coefficient component based on coefficient components corresponding to two reference point addresses, distances to the adjacent reference points and the reference point interval.

    摘要翻译: 本文公开了一种阴影校正装置,其具有系数运算部,用于通过第一运算部和第二运算部获得用于计算观察像素的第一和第二方向的校正系数成分的阴影校正系数,各操作部包括: 对应于地址,存储对应于校正系数分量相对于距离的变化率的幅度的不同间隔的多个参考点的系数分量; 像素距离发生器,用于通过将参考点间隔转换成相等的间隔来输出虚拟像素位置; 参考点地址和距离发生器,用于使用虚拟像素位置和参考点间隔输出参考点地址和相邻参考点与观察像素之间的距离; 以及内插运算部,其通过基于与两个参考点地址对应的系数分量,到相邻参考点的距离和参考点间隔的内插来获得系数分量。

    Semiconductor laser apparatus
    52.
    发明授权
    Semiconductor laser apparatus 失效
    半导体激光装置

    公开(公告)号:US6084895A

    公开(公告)日:2000-07-04

    申请号:US904304

    申请日:1997-07-31

    摘要: A semiconductor laser element which is composed of a compound semiconductor consisting of GaAs or the like, a silicon laser mount which is disposed beneath the semiconductor laser element so as to position the element, and on which an electrode layer as an electrode for the semiconductor laser element is formed, a heat sink which is disposed beneath the laser mount so as to dissipate, through the laser mount, the heat generated by the semiconductor laser element are mutually secured through hot contact bonding. The laser mount has a concave portion on the side opposite to its main surface on which the semiconductor layer element is secured, and the concave portion contains a heat dissipating body which is integrated thereinto and is made of copper having higher thermal conductivity than silicon.

    摘要翻译: 由由GaAs等构成的化合物半导体构成的半导体激光元件,设置在半导体激光元件下方的元件的硅激光器座,其上形成作为半导体激光器的电极的电极层 元件形成,散热器通过热接触粘合相互固定,该散热器设置在激光安装座的下面,以便通过激光器安装件散发由半导体激光元件产生的热量。 激光器安装件在其主表面的与半导体层元件固定的一侧相对的一侧具有凹部,并且凹部包含集成在其中并由具有比硅更高的导热性的铜制成的散热体。

    DISPLAY CONTROL APPARATUS AND DISPLAY CONTROL METHOD
    54.
    发明申请
    DISPLAY CONTROL APPARATUS AND DISPLAY CONTROL METHOD 审中-公开
    显示控制装置和显示控制方法

    公开(公告)号:US20120050309A1

    公开(公告)日:2012-03-01

    申请号:US13220069

    申请日:2011-08-29

    IPC分类号: G09G5/02

    CPC分类号: G09G5/377 G09G2340/10

    摘要: A display control apparatus may include: an area determination unit that determines a boundary position of a superimposition image based on transparency information; a color extension unit that extends an area of color information based on the boundary position determined by the area determination unit; a transparency conversion unit that converts information of pixels, which are to be processed as non-transparent pixels, in the transparency information based on the boundary position determined by the area determination unit; and an image superimposition unit that superimposes color information after the extension color information output by the color extension unit is filtered based on the transparency conversion information.

    摘要翻译: 显示控制装置可以包括:区域确定单元,其基于透明度信息确定叠加图像的边界位置; 颜色扩展单元,其基于由所述区域确定单元确定的边界位置来扩展颜色信息的区域; 透明度转换单元,其基于由区域确定单元确定的边界位置,在透明度信息中转换要作为非透明像素处理的像素的信息; 以及在通过颜色扩展单元输出的扩展颜色信息之后,基于透明度转换信息对颜色信息进行叠加的图像叠加单元。

    IMAGING APPARATUS
    55.
    发明申请
    IMAGING APPARATUS 有权
    成像设备

    公开(公告)号:US20100231742A1

    公开(公告)日:2010-09-16

    申请号:US12709600

    申请日:2010-02-22

    IPC分类号: H04N5/228

    摘要: An imaging apparatus includes an imaging element, an image signal transmitter, an image signal receiver, a signal processor and a control unit. The imaging element includes pixels arranged in two-dimensional array. The pixels output an imaging signal in synchronization with a first synchronizing signal. The image signal transmitter superimposes a second synchronizing signal on the imaging signal and transmits an image signal. The second synchronizing signal indicates a start position in vertical and horizontal directions in the two-dimensional array and is different from the first synchronizing signal. The image signal receiver receives the image signal from the image signal transmitter, and separates the received image signal into the imaging signal and second synchronizing signal. The signal processor processes the separated imaging signal based on the separated second synchronizing signal. The control unit receives the first synchronizing signal, and controls peripheral circuits in synchronization with the first synchronizing signal.

    摘要翻译: 成像装置包括成像元件,图像信号发送器,图像信号接收器,信号处理器和控制单元。 成像元件包括以二维阵列排列的像素。 像素与第一同步信号同步地输出成像信号。 图像信号发送器在成像信号上叠加第二同步信号并发送图像信号。 第二同步信号表示二维阵列中的垂直和水平方向的开始位置,并且与第一同步信号不同。 图像信号接收器从图像信号发送器接收图像信号,并将接收的图像信号分离成成像信号和第二同步信号。 信号处理器基于分离的第二同步信号处理分离的成像信号。 控制单元接收第一同步信号,并且与第一同步信号同步地控制外围电路。

    Electronic camera and data transmission system
    56.
    发明授权
    Electronic camera and data transmission system 有权
    电子相机和数据传输系统

    公开(公告)号:US07000044B2

    公开(公告)日:2006-02-14

    申请号:US09961925

    申请日:2001-09-24

    申请人: Akira Ueno

    发明人: Akira Ueno

    IPC分类号: G06F13/42

    CPC分类号: G06T1/60 H04N1/40 H04N5/232

    摘要: A data transmission system or an electronic camera in which data is transmitted from a first block to a second block is disclosed. A requesting means notifies from the second block, a request of receiving data from the first block at least in predetermined units thereto. A reserving means notifies, from the first block, the readiness of outputting data to the second block, in predetermined units thereto. A data outputting means outputs, from the first block, data to the second block on the basis of the notifications from the requesting means and the reserving means. Thus, it is possible to efficient and effective data transmission between two data processing blocks.

    摘要翻译: 公开了一种数据传输系统或其中数据从第一块传输到第二块的电子照相机。 请求装置从第二块通知至少以预定单位从第一块接收数据的请求。 保留装置以预定单位通知从第一块向第二块输出数据的准备状态。 数据输出装置根据来自请求装置和保留装置的通知从第一块向第二块输出数据。 因此,可以在两个数据处理块之间有效且有效的数据传输。

    Knit design system
    58.
    发明授权
    Knit design system 失效
    针织设计系统

    公开(公告)号:US06688144B2

    公开(公告)日:2004-02-10

    申请号:US10398944

    申请日:2003-04-11

    IPC分类号: D04B1578

    CPC分类号: D04B37/02 D04B1/246

    摘要: A knit design system comprising grading line directing device (24) for directing grading lines (48, 90) at locations of size changes with respect to a design (34, 86) displayed on a monitor (8); grading line setting device (28) for setting information on design modification (34, 86) with respect to the grading lines (48, 90); operating device (26) for making size changes of the design (34, 86) with reference to the grading line (48, 90) directed by the grading line directing device (24) and the modification data set by the grading line setting device (28).

    摘要翻译: 一种编织设计系统,包括:分级线路引导装置(24),用于在尺寸变化的位置处相对于显示在监视器(8)上的设计(34,86)引导分级线(48,90); 分级线设定装置(28),用于设置关于分级线(48,90)的关于设计修改(34,86)的信息; 操作装置(26),用于参照由分级线引导装置(24)指示的分级线(48,90)和由分级线设置装置(24)设置的修改数据来进行设计(34,86)的尺寸变化 28)。

    Method of etching semiconductor substrate
    59.
    发明授权
    Method of etching semiconductor substrate 失效
    蚀刻半导体衬底的方法

    公开(公告)号:US5478438A

    公开(公告)日:1995-12-26

    申请号:US175629

    申请日:1993-12-30

    CPC分类号: H01L21/308 Y10S438/942

    摘要: A method of performing anisotropic etching more than once with respect to a semiconductor substrate (1) is provided with the steps of performing first-time anisotropic etching by using a first etching mask (2) so as to form a first anisotropically etched region (4) which is hollow, forming a second etching mask (7) over the first etching mask (2), performing second-time anisotropic etching by using the second etching mask (7), and previously forming the first etching mask (2) from a material which is resistant to an etchant used for patterning the second etching mask (7) before the first-time anisotropic etching is performed. Thus, the edge portion (6) of the first etched region (4) is protected so that its configuration is excellently maintained. By way of example, either of the etching masks is composed of a dielectric material such as a silicon dioxide film, while the other etching mask is composed of a metallic material such as Au and Ti, and the second-time anisotropic etching is performed by using diluted potassium hydroxide.

    摘要翻译: 提供相对于半导体衬底(1)多次执行各向异性蚀刻的方法,具有通过使用第一蚀刻掩模(2)进行第一次各向异性蚀刻以形成第一各向异性蚀刻区域(4)的步骤 ),在第一蚀刻掩模(2)上形成第二蚀刻掩模(7),通过使用第二蚀刻掩模(7)进行第二次各向异性蚀刻,并从第一蚀刻掩模(2)预先形成第一蚀刻掩模 在进行第一次各向异性蚀刻之前,耐蚀刻用于图案化第二蚀刻掩模(7)的蚀刻剂的材料。 因此,第一蚀刻区域(4)的边缘部分(6)被保护,使得其构造被良好地保持。 作为示例,蚀刻掩模中的任一个由诸如二氧化硅膜的介电材料构成,而另一个蚀刻掩模由诸如Au和Ti的金属材料构成,并且第二次各向异性蚀刻通过 使用稀释的氢氧化钾。