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公开(公告)号：US20050179882A1
公开(公告)日：2005-08-18
申请号：US10779811
申请日：2004-02-18
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70275 , G03F7/70283 , G03F7/70291 , G03F7/70308
摘要： Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
摘要翻译： 提供了一种用于促进使用多个可单独控制的元件来调制在聚焦元件阵列的每个聚焦元件处接收的辐射强度的方法和系统，以控制在其上聚焦的基底上的区域中的辐射强度 元素引导辐射。
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52.发明申请Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method 失效光刻设备的校准方法，校准方法，计算机程序，数据存储介质，光刻设备和器件制造方法公开(公告)号：US20050018159A1
公开(公告)日：2005-01-27
申请号：US10845521
申请日：2004-05-14
申请人： Henricus Van Buel , Cheng-Qun Gui , Alex De Vries
发明人： Henricus Van Buel , Cheng-Qun Gui , Alex De Vries
IPC分类号： G03F9/00 , H01L21/027 , G03B27/68
CPC分类号： G03F9/7019 , G03F9/7003 , G03F9/7011 , G03F9/7084
摘要： In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array may then be used to accurately calculate the position of further substrates.
摘要翻译： 在补偿前后对准光学元件的失真的一种方法中，计算衬底标记的估计位置与衬底标记的实际位置之间的位移矢量。 还通过将参考基板移动固定量并且比较参考基板的背面上的点的图像移动到基板的正面上的对应点移动多远的距离来计算光学校正阵列。 然后可以使用位移矢量和光学校正阵列来精确地计算另外的衬底的位置。
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公开(公告)号：US20050007572A1
公开(公告)日：2005-01-13
申请号：US10853577
申请日：2004-05-26
申请人： Richard George , Cheng-Qun Gui , Pieter Willem Jager , Robbert Edgar Leeuwen , Jacobus Burghoom
发明人： Richard George , Cheng-Qun Gui , Pieter Willem Jager , Robbert Edgar Leeuwen , Jacobus Burghoom
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
摘要翻译： 在基板曝光期间检查基板上的对准标记以优化曝光条件的光刻设备。
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公开(公告)号：US08502954B2
公开(公告)日：2013-08-06
申请号：US12469953
申请日：2009-05-21
CPC分类号： G03F7/70875 , G03F7/705
摘要： A lithographic apparatus and method in which a system is used to emit a patterned beam. The patterned beam is projected onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.
摘要翻译： 一种光刻设备和方法，其中使用系统来发射图案化的光束。 图案化的光束被投影到支撑在基板支撑件上的基板的表面的目标部分上。 目标部分相对于衬底台具有适合于衬底表面上的期望曝光图案的预定空间特性。 测量衬底的温度，并计算衬底对测量温度的尺寸响应。 调整目标部分相对于衬底台的空间特性以补偿所计算的尺寸响应。
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公开(公告)号：US20120281192A1
公开(公告)日：2012-11-08
申请号：US12741733
申请日：2008-11-03
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
CPC分类号： G01B11/306 , G01N2021/95676 , G03F7/703 , G03F7/70783 , G03F7/7085
摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。
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公开(公告)号：US07684009B2
公开(公告)日：2010-03-23
申请号：US11647426
申请日：2006-12-29
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
摘要翻译： 一种光刻设备和方法，其中照明系统提供投影光束，图案化系统在其横截面中赋予光束图案，并且投影系统将图案化的光束投射到基板的目标部分上。 投影系统包括与衬底间隔开的透镜阵列，使得阵列中的每个透镜将图案化束的一部分聚焦到衬底上。 位移系统导致透镜阵列和基板之间的位移。 颗粒检测器检测正在接近透镜阵列的基板上的颗粒。 响应于颗粒的检测，自由工作距离控制系统增加了透镜阵列和基板之间的间隔。 当检测到的颗粒通过透镜阵列时，透镜阵列移动离开基板。 因此可以避免对透镜阵列的损坏。
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公开(公告)号：US07576834B2
公开(公告)日：2009-08-18
申请号：US12113831
申请日：2008-05-01
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.
摘要翻译： 提供光刻设备。 光刻设备包括被配置为提供辐射的辐射源，光学引擎的阵列以及支撑衬底的衬底台。 每个光学引擎包括独立可控元件的阵列，其被布置和构造为接收和图案化配置成接收图案化辐射的辐射和投影光学元件，并将图案化的辐射投射到衬底上。 衬底台布置和构造成在将衬底暴露于图案化辐射期间相对于光学发动机阵列移动。
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公开(公告)号：US07561251B2
公开(公告)日：2009-07-14
申请号：US10811070
申请日：2004-03-29
CPC分类号： G03F7/70875 , G03F7/705
摘要： A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.
摘要翻译： 一种光刻设备和方法，其中使用图案化系统以在其横截面中将投影光束赋予图案。 光束由投影系统从照明系统引导到支撑在基板支撑件上的基板的表面的目标部分上。 目标部分相对于衬底台具有适合于衬底表面上的期望曝光图案的预定空间特性。 测量衬底的温度，并计算衬底对测量温度的尺寸响应。 调整目标部分相对于衬底台的空间特性以补偿所计算的尺寸响应。
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公开(公告)号：US07477403B2
公开(公告)日：2009-01-13
申请号：US10854770
申请日：2004-05-27
申请人： Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager , Joannes Theodoor de Smit
发明人： Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager , Joannes Theodoor de Smit
CPC分类号： G03F7/70275 , G03F9/7088
摘要： An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A substrate is supported on a substrate table and a projection system is used to project the alignment beam onto a target portion of the substrate. A positioning system causes relative movement between the substrate and the projection system. An array of lenses is arranged such that each lens in the array focuses a respective portion of the alignment beam onto a respective part of the target portion. An array of detectors is arranged such that each detector in the array detects light reflected from the substrate through a respective lens in the array and provides an output representative of the intensity of light reflected to it from the substrate through the respective lens. A processor is connected to the outputs of the detectors for deriving data representing the position of the lens array relative to the substrate from the outputs of the detectors.
摘要翻译： 光学位置评估装置和方法具有照射系统，其提供对准的辐射束，并且位置数据源自对准光束的反射。 基板被支撑在基板台上，并且使用投影系统将对准光束投影到基板的目标部分上。 定位系统引起基板和投影系统之间的相对移动。 透镜阵列被布置成使得阵列中的每个透镜将对准光束的相应部分聚焦到目标部分的相应部分上。 一组检测器被布置成使得阵列中的每个检测器通过阵列中的相应透镜来检测从基板反射的光，并且通过相应的透镜提供代表从基板反射的光的强度的输出。 处理器连接到检测器的输出，用于从检测器的输出导出表示透镜阵列相对于基板的位置的数据。
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60.发明授权公开(公告)号：US07440081B2
公开(公告)日：2008-10-21
申请号：US10981729
申请日：2004-11-05
CPC分类号： G03F7/707 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system to supply a beam of radiation, a patterning system serving to impart the beam of radiation with a pattern in its cross-section, a substrate table to support a substrate, and a projection system to project the patterned beam onto a target portion of the substrate. The substrate table includes a support member having an upper support surface for supporting at least part of the target portion of the substrate on a fluid cushion. The apparatus further includes a fluid supply system arranged to supply fluid to the upper support surface so as to provide the cushion, and an actuator system arranged to act on the support member. The actuator system is controllable to provide adjustment of a topography of the upper support surface relative to a reference plane. Compensation can thus be made for substrate thickness irregularities, to achieve correct focusing of the beam onto the target surface.
摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于使辐射束在其横截面上具有图案的图案化系统，用于支撑衬底的衬底台，以及用于将图案化的射束投影的投影系统 到基板的目标部分上。 衬底台包括具有用于将衬底的目标部分的至少一部分支撑在流体衬垫上的上支撑表面的支撑构件。 该装置还包括流体供应系统，该流体供应系统布置成将流体供应到上部支撑表面以便提供缓冲垫，以及布置成作用在支撑构件上的致动器系统。 致动器系统是可控制的，以提供相对于参考平面调整上支撑表面的形貌。 因此可以对衬底厚度不规则进行补偿，以实现光束到目标表面的正确聚焦。
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