公开(公告)号：US07138629B2

公开(公告)日：2006-11-21

申请号：US10754623

申请日：2004-01-12

申请人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G21K7/00 ,  G21N23/99 ,  H01J37/28 ,  G01N23/225

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

摘要翻译： 提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。 用于检查基板的表面的检查装置产生从电子束源25.1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。 当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。 产生电子束，使照度不均匀为10％以下。 由检测器25.11检测从样品W发射的电子。

公开(公告)号：US20060118719A1

公开(公告)日：2006-06-08

申请号：US11290688

申请日：2005-12-01

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： G21K7/00

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

公开(公告)号：US07569838B2

公开(公告)日：2009-08-04

申请号：US12068484

申请日：2008-02-07

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： H01J37/00 ,  H01J37/30

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

公开(公告)号：US07351969B2

公开(公告)日：2008-04-01

申请号：US11290688

申请日：2005-12-01

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： G21K7/00

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

摘要翻译： 图像投影型的电子束检查系统包括用于将从电子枪发射的电子束成形为矩形构造的一次电子光学系统，并将成形的电子束施加到要检查的样品表面。 二次电子光学系统收敛从样品发射的二次电子。 检测器通过荧光屏将会聚的二次电子转换成光学图像，并将图像聚焦到线传感器。 一个控制器控制线传感器的电荷转移时间，该线传感器在行传感器中设置的每对相邻像素行之间与用于移动样本的平台的移动速度相关联地传送拾取线图像。

公开(公告)号：US06992290B2

公开(公告)日：2006-01-31

申请号：US09985317

申请日：2001-11-02

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

公开(公告)号：US20080173814A1

公开(公告)日：2008-07-24

申请号：US12068484

申请日：2008-02-07

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： G01N23/00 ,  G21K5/04

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

公开(公告)号：US20090014649A1

公开(公告)日：2009-01-15

申请号：US11909409

申请日：2006-03-22

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toru Kaga ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Tsutomu Karimata

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toru Kaga ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Tsutomu Karimata

IPC分类号： G01N23/00

CPC分类号： H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/2446 ,  H01J2237/28

摘要： Secondary electrons emitted from a sample (W) by an electron beam irradiation is deflected by a beam separator (77), and is deflected again in a perpendicular direction by an aberration correction electrostatic deflector (711) to form a magnified image on the principal plane of an auxiliary lens (712). The secondary electron beam diverged from the auxiliary lens (712) passes through axial chromatic aberration correction lenses (714-717) and images on a principal plane of an auxiliary lens (718) for a magnifying lens (719). The magnified image is formed in a position spaced apart from the optical axis. Therefore, when the secondary electron beam diverged from the auxiliary lens (712) is incident on the axial chromatic aberration correction lenses without any change, large abaxial aberration occurs. To avoid it, the auxiliary lens (712) is used to form the image of an NA aperture (724) in substantially a middle (723) in the light axis direction of the axial chromatic aberration correction lenses (714-717).

摘要翻译： 通过电子束照射从样品（W）发射的二次电子被光束分离器（77）偏转，并通过像差校正静电偏转器（711）在垂直方向上再次偏转，以在主平面上形成放大图像 的辅助透镜（712）。 从辅助透镜（712）发散的二次电子束通过轴向色差校正透镜（714-717）和用于放大透镜（719）的辅助透镜（718）的主平面上的图像。 放大图像形成在与光轴间隔开的位置。 因此，当从辅助透镜（712）发散的二次电子束没有任何变化地入射到轴向色像差校正透镜时，发生大的背轴像差。 为了避免这种情况，辅助透镜（712）用于在轴向色像差校正透镜（714-717）的光轴方向上形成基本上中间（723）中的NA孔径（724）的图像。

公开(公告)号：US20100213370A1

公开(公告)日：2010-08-26

申请号：US11884367

申请日：2006-02-17

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa

IPC分类号： H01J37/26 ,  H01J37/141 ,  H01J37/147 ,  G01N23/22 ,  H01J37/06

CPC分类号： H01J37/244 ,  G01N23/225 ,  G02F2001/136254 ,  H01J37/226 ,  H01J2237/15 ,  H01J2237/2482 ,  H01J2237/2817 ,  H01L27/146 ,  H01L27/14601

摘要： The present invention provides an electron beam apparatus which can capture images at high speeds even using an area sensor which senses a small number of frames per second, by deflecting a primary electron beam by a deflector to irradiate each of sub-visual fields which are formed by dividing an evaluation area on a sample surface, and detecting secondary electrons containing information on the sample surface in each of the sub-visual fields by a detecting device. For this purpose, the detecting device 26 of the electron beam apparatus comprises a plurality of unit detectors 24-1 each including an area sensor CCD 1 (˜CCD 14), a bundle of optical fibers 25 having one end coupled to a detection plane of the area sensor, an FOP coated on the other end of the bundle of optical fibers and formed with a scintillator, on which a secondary electron beam emitted from the sub-visual fields are focused. An electromagnetic deflector deflects the secondary electron beam emitted from the sub-visual fields each time the electron beam is irradiated to a next sub-visual field to move the secondary electron beams over the surfaces of the FOPs of the unit detectors. Since image information can be fetched from each unit detector during exposure of the other unit detectors, images can be captured at high speeds.

摘要翻译： 本发明提供了一种电子束装置，其即使使用通过偏转器偏转一次电子束来照射形成的每个子视场，也可以高速捕获图像，甚至使用每秒感测少量帧数的区域传感器 通过划分样品表面上的评估区域，并且通过检测装置检测在每个子视野中包含样品表面上的信息的二次电子。 为此，电子束装置的检测装置26包括多个单元检测器24-1，每个单元检测器24-1包括区域传感器CCD 1（〜CCD 14），一束光纤25，其一端耦合到检测平面 区域传感器，涂覆在光纤束的另一端并形成有闪烁体的FOP，其上从副视野发射的二次电子束聚焦。 每当电子束照射到下一个副视野时，电磁偏转器偏转从副视野发射的二次电子束，以将二次电子束移动到单位检测器的FOP的表面上。 由于在其他单元检测器的曝光期间可以从每个单元检测器获取图像信息，因此可以高速捕获图像。

公开(公告)号：US20090212213A1

公开(公告)日：2009-08-27

申请号：US11817763

申请日：2006-03-03

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Hirosi Sobukawa ,  Toru Kaga

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Hirosi Sobukawa ,  Toru Kaga

IPC分类号： G01N23/00 ,  A61N5/00 ,  H01J1/50

CPC分类号： G01N23/2251 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/057

摘要： A sample is evaluated at a high throughput by reducing axial chromatic aberration and increasing the transmittance of secondary electrons. Electron beams emitted from an electron gun 1 are irradiated onto a sample 7 through a primary electro-optical system, and electrons consequently emitted from the sample are detected by a detector 12 through a secondary electro-optical system. A Wien filter 8 comprising a multi-pole lens for correcting axial chromatic aberration is disposed between a magnification lens 10 in the secondary electro-optical system and a beam separator 5 for separating a primary electron beam and a secondary electron beam, for correcting axial chromatic aberration caused by an objective lens 14 which comprises an electromagnetic lens having a magnetic gap defined on a sample side.

摘要翻译： 通过减少轴向色差并增加二次电子的透射率，以高产量来评估样品。 从电子枪1发射的电子束通过初级电光系统照射到样品7上，由检测器12通过次级电光学系统检测从样品发射的电子。 包括用于校正轴向色差的多极透镜的维恩滤波器8设置在二次电光学系统中的放大透镜10和用于分离一次电子束和二次电子束的光束分离器5之间，用于校正轴向色度 由物镜14引起的像差包括具有限定在样品侧的磁隙的电磁透镜。

公开(公告)号：US09390886B2

公开(公告)日：2016-07-12

申请号：US11884367

申请日：2006-02-17

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa

IPC分类号： G01N23/00 ,  H01J37/244 ,  G01N23/225 ,  H01J37/22 ,  G02F1/1362 ,  H01L27/146

CPC分类号： H01J37/244 ,  G01N23/225 ,  G02F2001/136254 ,  H01J37/226 ,  H01J2237/15 ,  H01J2237/2482 ,  H01J2237/2817 ,  H01L27/146 ,  H01L27/14601

摘要： An electron beam apparatus for capturing images by deflecting a primary electron beam by a deflector to irradiate each of sub-visual fields which are formed by dividing an evaluation area on a sample surface, and detecting secondary electrons containing information on the sample surface in each of the sub-visual fields by a detecting device. The detecting device includes a plurality of unit detectors each including an area sensor, a bundle of optical fibers having one end coupled to a detection plane of the area sensor, and an FOP coated on the other end of the bundle of optical fibers and formed with a scintillator, on which a secondary electron beam emitted from the respective sub-visual field is focused. An electromagnetic deflector deflects the secondary electron beam each time the electron beam is irradiated to the next sub-visual field to move the secondary electron beams over the surfaces of the FOPs.

摘要翻译： 一种电子束装置，用于通过偏转器偏转一次电子束以照射通过划分样品表面上的评估区域而形成的每个副视野并且检测在每个样本表面上包含样品表面上的信息的二次电子来捕获图像 通过检测装置的子视野。 检测装置包括多个单元检测器，每个单元检测器包括一个区域传感器，一束光纤，其一端连接到该区域传感器的检测平面，并且一个FOP涂覆在该光纤束的另一端上，并形成有 闪烁体，其上从相应的子视野发射的二次电子束聚焦。 每当电子束照射到下一个子视场时，电磁偏转器偏转二次电子束，以将二次电子束移动到FOP的表面上。