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    Objective lens, electron beam system and method of inspecting defect
    57.
    发明授权
    Objective lens, electron beam system and method of inspecting defect 有权
    物镜，电子束系统和检测缺陷的方法

    公开(公告)号：US07420164B2

    公开(公告)日：2008-09-02

    申请号：US11136668

    申请日：2005-05-25

    申请人： Mamoru Nakasuji ,  Tohru Satake ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

    发明人： Mamoru Nakasuji ,  Tohru Satake ,  Hirosi Sobukawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

    IPC分类号： H01J1/50

    CPC分类号： H01J37/141 ,  H01J2237/1534 ,  H01J2237/28

    摘要： An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of a secondary electron beam of an image projecting optical system can be improved and which can be compact in size. The surface of the sample S is divided into plural stripe regions which in turn are divided into rectangle-shaped main fields. The main field is further divided into plural square-shaped subfields. The irradiation with the electron beams and the formation of a two-dimensional image are repeated in a unit of the subfields. A magnetic gap formed by the inner and outer magnetic poles of the objective lens is formed on the side of the sample, and an outer side surface and an inner side surface of each of the inner magnetic pole and the outer magnetic pole, respectively, forming the magnetic gap have each part of a conical shape with a convex having an angle of 45° or greater with respect to the optical axis.

    摘要翻译： 可以提高电子束系统或使用其中以高电流密度照射电子束并且可以提高图像投影光学系统的二次电子束的透射率的电子束系统的装置的方法，并且哪些 可以紧凑的尺寸。 样品S的表面被分成多个条纹区域，其又分成矩形主场。 主场进一步分为多个方形子场。 以子场为单位重复照射电子束和形成二维图像。 在物体侧形成由物镜的内，外磁极形成的磁隙，分别形成内磁极和外磁极的外侧面和内侧面，形成 磁隙具有相对于光轴具有45°或更大角度的凸起的圆锥形状的每一部分。

    Electron beam apparatus
    60.
    发明授权
    Electron beam apparatus 有权
    电子束装置

    公开(公告)号：US07176459B2

    公开(公告)日：2007-02-13

    申请号：US10999124

    申请日：2004-11-30

    申请人： Kenji Watanabe ,  Tohru Satake ,  Mamoru Nakasuji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Nobuharu Noji ,  Keiichi Tohyama ,  Masahiro Hatakeyama

    发明人： Kenji Watanabe ,  Tohru Satake ,  Mamoru Nakasuji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Nobuharu Noji ,  Keiichi Tohyama ,  Masahiro Hatakeyama

    IPC分类号： H01J37/28 ,  G01N23/225

    CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J2237/24435

    摘要： An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an X-Y-θ stage through an electrostatic lens, an objective lens and the like, secondary electrons or reflected electrons are emitted from the sample. The primary electron beam is incident at an incident angle set at approximately 35° or more by controlling a deflector. Electrons emitted from the sample is guided in the vertical direction, and focused on a detector. The detector is made up of an MCP, a fluorescent plate, a relay lens, and a TDI (or CCD). An electric signal from the TDI is supplied to a personal computer for image processing to generate a two-dimensional image of the sample.

    摘要翻译： 提供一种用于以高通量和高S / N比来评估样品的电子束装置。 当从电子枪发射的电子束通过静电透镜，物镜等照射到放置在X-Y-θ台上的样品时，从样品发射二次电子或反射电子。 通过控制偏转器，一次电子束入射角约为35°以上的入射角。 从样品发射的电子在垂直方向上被引导，并聚焦在检测器上。 检测器由MCP，荧光板，中继透镜和TDI（或CCD）组成。 来自TDI的电信号被提供给用于图像处理的个人计算机以产生样本的二维图像。