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    Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate
    53.
    发明授权
    Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate 失效
    用于光学地检测成像系统的图像平面与基板表面的偏差的方法

    公开(公告)号：US07442908B2

    公开(公告)日：2008-10-28

    申请号：US11102818

    申请日：2005-04-11

    申请人： Karl-Heinz Schuster

    发明人： Karl-Heinz Schuster

    IPC分类号： G02B7/04 ,  G03B27/52

    CPC分类号： G03F9/7026 ,  G02B7/28

    摘要： A microlithographic projection illumination system has a focus-detection system for optically detecting deviations of the image plane of a projection lens from the upper surface of a substrate arranged in the vicinity of its image plane. The focus-detection system has a system for coupling in at least one measuring beam that is obliquely incident on, and to be reflected at, the substrate surface into an intermediate zone between the final optical surface of the imaging system and the substrate surface and a system for coupling out the measuring beam and detecting it following its reflection at the substrate surface. The system for coupling the measuring beam in and the system for coupling it out are configured such that the measuring beam is reflected at least once at the substrate surface and at least once at a reflecting surface of the imaging system that reflects the light employed for measurement purposes before the measuring beam enters the system for coupling it out, which allows employing the image side of the imaging system as part of the focus-detection system. The focus-detection system also operates reliably when used on ultrahigh-aperture lenses that have correspondingly short working distances.

    摘要翻译： 微光刻投影照明系统具有聚焦检测系统，用于光学地检测投影透镜的图像平面与布置在其图像平面附近的基板的上表面的偏差。 焦点检测系统具有用于耦合到至少一个测量光束的系统，所述至少一个测量光束倾斜地入射到衬底表面上并且被反射到成像系统的最终光学表面与衬底表面之间的中间区域中， 用于耦合出测量光束并在其在衬底表面处的反射之后检测它的系统。 用于耦合测量光束的系统和用于耦合测量光束的系统被配置为使得测量光束在基板表面处被反射至少一次，并且至少在反射用于测量的光的成像系统的反射表面反射一次 测量光束进入系统以将其耦合出来的目的，这允许将成像系统的像侧作为焦点检测系统的一部分。 当使用具有相应较短工作距离的超高孔径镜头时，对焦检测系统也可靠地运行。

    Image-projecting system, such as a projection objective of a microlithographic projection exposure apparatus
    54.
    发明申请
    Image-projecting system, such as a projection objective of a microlithographic projection exposure apparatus 审中-公开
    图像投影系统，例如微光刻投影曝光装置的投影物镜

    公开(公告)号：US20080182210A1

    公开(公告)日：2008-07-31

    申请号：US12027731

    申请日：2008-02-07

    申请人： Karl-Heinz Schuster

    发明人： Karl-Heinz Schuster

    IPC分类号： G03F7/00 ,  G02B3/00 ,  C01F7/02 ,  C01B33/26 ,  C01B33/24 ,  C01B21/20

    CPC分类号： G02B1/02 ,  G03F7/70341 ,  G03F7/70966

    摘要： The disclosure relates to an image-projecting system, such as a projection objective of a microlithographic projection exposure apparatus. In some embodiments, at least one optical element includes a cubic-crystalline material which at a given operating wavelength has a refractive index n that is greater than 1.6. The image-side numerical aperture NA of the image-projecting system is smaller than the refractive index n. The difference (n−NA) between the refractive index n and the numerical aperture NA of the image-projecting system is at most 0.2.

    摘要翻译： 本公开涉及一种图像投影系统，例如微光刻投影曝光装置的投影物镜。 在一些实施例中，至少一个光学元件包括在给定工作波长具有大于1.6的折射率n的立方晶体材料。 图像投影系统的像侧数值孔径NA小于折射率n。 图像投影系统的折射率n与数值孔径NA之差（n-NA）为0.2以下。

    MICROLITHOGRAPHY OPTICAL SYSTEM
    55.
    发明申请
    MICROLITHOGRAPHY OPTICAL SYSTEM 有权
    微观光学系统

    公开(公告)号：US20070195411A1

    公开(公告)日：2007-08-23

    申请号：US11614536

    申请日：2006-12-21

    申请人： Karl-Heinz Schuster

    发明人： Karl-Heinz Schuster

    IPC分类号： G02B27/28

    CPC分类号： G02B5/3083 ,  G03F7/70191 ,  G03F7/70566 ,  G03F7/70966

    摘要： The disclosure relates to an optical system, such as, for example, an illumination system or a projection lens of a microlithographic exposure system. The optical system can have an optical axis and include at least one optical element that includes an optically uniaxial material having, for an operating wavelength of the optical system, an ordinary refractive index no and an extraordinary refractive index ne. The extraordinary refractive index ne can be larger than the ordinary refractive index no. The optical element can absorb, at least for light rays of the operating wavelength entering the optical element with respect to the optical axis under an angle of incidence that lies within a certain angle region, a p-polarized component of the light rays significantly stronger than a s-polarized component of the light rays.

    摘要翻译： 本公开涉及光学系统，例如微光刻曝光系统的照明系统或投影透镜。 光学系统可以具有光轴，并且包括至少一个光学元件，其包括光学单轴材料，其对于光学系统的工作波长具有普通折射率n和非常折射率 n 。 非常折射率n e可以大于普通折射率n≠0。 光学元件至少可以吸收相对于光轴进入光学元件的工作波长的光线，其入射角位于一定角度范围内，光线的p偏振分量明显强于 光线的s偏振分量。

    Device for reducing the peak power of a pulsed laser light source
    57.
    发明授权
    Device for reducing the peak power of a pulsed laser light source 失效
    用于降低脉冲激光光源的峰值功率的装置

    公开(公告)号：US06996141B1

    公开(公告)日：2006-02-07

    申请号：US09588261

    申请日：2000-06-06

    申请人： Karl-Heinz Schuster ,  Harry Bauer ,  Eric Eva

    发明人： Karl-Heinz Schuster ,  Harry Bauer ,  Eric Eva

    IPC分类号： H01S3/13

    CPC分类号： G03F7/7055 ,  G02B27/106 ,  G02B27/144 ,  G02B27/145 ,  G03F7/2008

    摘要： In a device for reducing the peak power of a pulsed laser light source, in particular for a projection exposure system, there is arranged in the beam path (1) at least one beam splitter apparatus (3, 4) by means of which a detour line (5 or 11) is produced, via reflecting components (6, 7, 8 or 12, 13, 14) for at least one partial beam (1b) with subsequent recombination at a beam recombining element (9 or 15) with the other partial beam or beams (1b or 10b) to form a total beam.

    摘要翻译： 在用于降低脉冲激光光源的峰值功率的装置中，特别是对于投影曝光系统，在光束路径（1）中布置有至少一个分束器装置（3,4），通过该光束分离器设备绕行 通过用于至少一个部分光束（1b）的反射分量（6,7,8或12,13,14）产生线（5或11），随后在光束重组元件（9或15）处与 其他部分光束或光束（1b或10b）以形成总光束。