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    X-ray emission spectrometer system
    52.
    发明授权
    X-ray emission spectrometer system 有权

    公开(公告)号：US10578566B2

    公开(公告)日：2020-03-03

    申请号：US16371606

    申请日：2019-04-01

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Srivatsan Seshadri ,  Sylvia Jia Yun Lewis ,  Janos Kirz

    IPC: G01N23/223 ,  G01N23/22 ,  G01N23/2209 ,  G01N23/2204

    Abstract: Systems and methods for x-ray emission spectroscopy are provided in which at least one x-ray analyzer is curved and receives and diffracts fluorescence x-rays emitted from a sample, and at least one spatially-resolving x-ray detector receives the diffracted x-rays. The at least one x-ray analyzer and the at least one spatially-resolving x-ray detector are positioned on the Rowland circle. In some configurations, the fluorescence x-rays are emitted from the same surface of the sample that is irradiated by the x-rays from an x-ray source and the system has an off-Rowland circle geometry. In some other configurations, an x-ray optical train receives the fluorescence x-rays emitted from a sample impinged by electrons within an electron microscope and focuses at least some of the received fluorescence x-rays to a focal spot.

    Detector for X-rays with high spatial and high spectral resolution
    53.
    发明授权
    Detector for X-rays with high spatial and high spectral resolution 有权

    公开(公告)号：US10295486B2

    公开(公告)日：2019-05-21

    申请号：US15240972

    申请日：2016-08-18

    Applicant: SIGRAY, INC.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Benjamin Donald Stripe

    IPC: G01N23/223 ,  G01N23/20058 ,  G01N23/04

    Abstract: An x-ray spectrometer system comprising an x-ray imaging system with at least one achromatic imaging x-ray optic and an x-ray detection system. The optical train of the imaging system is arranged so that its object focal plane partially overlaps an x-ray emitting volume of an object. An image of a portion of the object is formed with a predetermined image magnification at the x-ray detection system. The x-ray detection system has both high spatial and spectral resolution, and converts the detected x-rays to electronic signals. In some embodiments, the detector system may have a small aperture placed in the image plane, and use a silicon drift detector to collect x-rays passing through the aperture. In other embodiments, the detector system has an energy resolving pixel array x-ray detector. In other embodiments, wavelength dispersive elements may be used in either the optical train or the detector system.

    X-ray surface analysis and measurement apparatus
    56.
    发明授权
    X-ray surface analysis and measurement apparatus 有权

    公开(公告)号：US09823203B2

    公开(公告)日：2017-11-21

    申请号：US15060477

    申请日：2016-03-03

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

    IPC: G01N23/205 ,  H01J35/08 ,  G21K1/06

    CPC classification number: G01N23/205 ,  G21K1/062 ,  H01J35/08 ,  H01J2235/086

    Abstract: Systems for x-ray diffraction/scattering measurements having greater x-ray flux and x-ray flux density are disclosed. These are useful for applications such as material structural analysis and crystallography. The higher flux is achieved by using designs for x-ray targets comprising a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density, and used to illuminate materials for the analysis based on their scattering/diffractive effects.

    X-ray surface analysis and measurement apparatus
    57.
    发明授权
    X-ray surface analysis and measurement apparatus 有权
    X射线表面分析和测量仪器

    公开(公告)号：US09594036B2

    公开(公告)日：2017-03-14

    申请号：US14634834

    申请日：2015-03-01

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

    IPC: H01J35/08 ,  G01N23/223 ,  G01B15/02 ,  G01N23/207 ,  G21K1/06 ,  H01J35/14 ,  G01N23/06

    CPC classification number: G01N23/223 ,  G01B15/02 ,  G01N23/085 ,  G01N23/2076 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

    Abstract: This disclosure presents systems for total reflection x-ray fluorescence measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection and/or for total-reflection fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.

    Abstract translation: 本公开提供了具有x射线通量和x射线通量密度比现有x射线技术大几个数量级的全反射x射线荧光测量的系统。 因此，这些可用于诸如微量元素检测和/或全反射荧光分析的应用。 较高的亮度部分地通过使用x射线靶的设计来实现，所述X射线靶包括与具有高导热性的衬底紧密热接触制造的一个或多个选定的x射线产生材料的多个微结构。 这允许用更高电子密度或更高能量电子轰击靶，这导致更大的x射线亮度和因此更大的x射线通量。 然后，高亮度/高通量源可以耦合到x射线反射光学系统，其可将高通量x射线聚焦到可以小至1微米的点，导致高通量密度。

    X-ray illuminators with high flux and high flux density
    58.
    发明授权
    X-ray illuminators with high flux and high flux density 有权

    公开(公告)号：US09449781B2

    公开(公告)日：2016-09-20

    申请号：US14544191

    申请日：2014-12-08

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

    IPC: G21K1/06 ,  H01J35/08 ,  G01N23/223

    CPC classification number: H01J35/08 ,  G01N23/223 ,  G21K1/06 ,  H01J2235/081 ,  H01J2235/086

    Abstract: This disclosure presents systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density.

    X-ray sources using linear accumulation
    59.
    发明授权
    X-ray sources using linear accumulation 有权
    X射线源使用线性积分

    公开(公告)号：US09390881B2

    公开(公告)日：2016-07-12

    申请号：US14490672

    申请日：2014-09-19

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

    IPC: G21K1/06 ,  H01J35/08

    CPC classification number: H01J35/08 ,  G21K1/06 ,  H01J2235/081 ,  H01J2235/086

    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness.Some embodiments of the invention comprise x-ray optical elements placed between sub-sources of x-rays. These x-ray optical elements may form images of one or more x-ray sub-sources in alignment with other x-ray sub-sources, and may enhance the linear accumulation that can be achieved.

    Abstract translation: 公开了用于高亮度x射线产生的紧凑源。 通过彼此对准的多个区域的电子束轰击实现较高的亮度，以实现x射线的线性积累。 这可以通过对齐离散x射线子源或通过使用包含与具有高导热性的基底紧密热接触制造的x射线产生材料的微结构的x射线靶来实现。 这样可以更有效地将热量从X射线产生材料中拉出，并且进而允许以更高的电子密度和/或更高能量的电子轰击x射线产生材料，导致更大的x射线亮度。 本发明的一些实施例包括放置在x射线的子源之间的x射线光学元件。 这些X射线光学元件可以形成与其他x射线子源对准的一个或多个x射线子源的图像，并且可以增强可以实现的线性累积。

    Microfocus x-ray source for generating high flux low energy x-rays
    60.
    发明授权
    Microfocus x-ray source for generating high flux low energy x-rays 有权

    公开(公告)号：US12278080B2

    公开(公告)日：2025-04-15

    申请号：US18152973

    申请日：2023-01-11

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Janos Kirz

    IPC: H01J35/16 ,  H01J35/08 ,  H01J35/14 ,  H01J35/18

    Abstract: An x-ray source includes an x-ray transmissive window having an x-ray transmittance greater than or equal to 20% for at least some x-rays having an x-ray energy less than 1 keV. The x-ray source further includes an electron source configured to generate at least one electron beam and an anode assembly configured to generate x-rays in response to electron bombardment by at least some of the electrons of the at least one electron beam from the electron source. The x-ray source further includes at least one x-ray optic is configured to receive at least some of the x-rays from the anode assembly and to direct at least some of the received x-rays to the window to form an x-ray beam.

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