公开(公告)号：US07648734B2

公开(公告)日：2010-01-19

申请号：US11237906

申请日：2005-09-29

申请人： Osamu Machida ,  Makoto Kurosawa ,  Kazuo Shimizu

发明人： Osamu Machida ,  Makoto Kurosawa ,  Kazuo Shimizu

IPC分类号： B05D1/00 ,  B05B13/02

CPC分类号： B41J3/28 ,  B05B13/0431 ,  B05D1/02 ,  B05D2252/10 ,  B41J3/407 ,  B41J11/0085

摘要： To coat a solution on both surfaces continuously in such a state that an edge portion of the substrate is so constructed as to be fixed, and the substrate is attached to a substrate fixing frame having a positioning mechanism.

摘要翻译： 在两个表面上连续地涂布溶液，使得基板的边缘部分被构造成固定，并且将基板安装到具有定位机构的基板固​​定框架上。

公开(公告)号：US07566699B2

公开(公告)日：2009-07-28

申请号：US10551648

申请日：2004-03-24

申请人： Nobuhiko Fushimi ,  Shigeru Yonekubo ,  Hideyuki Muranaka ,  Hiroaki Shiohara ,  Hirotaka Teranishi ,  Kazuo Shimizu ,  Fumiaki Ito ,  Masayuki Isaji

发明人： Nobuhiko Fushimi ,  Shigeru Yonekubo ,  Hideyuki Muranaka ,  Hiroaki Shiohara ,  Hirotaka Teranishi ,  Kazuo Shimizu ,  Fumiaki Ito ,  Masayuki Isaji

IPC分类号： A01N43/04 ,  A61K31/70 ,  C07H15/00 ,  C07H17/00

CPC分类号： C07H15/203 ,  C07H17/00 ,  C07H17/02 ,  C07H17/04

摘要： The present invention provides fused heterocyclic derivatives represented by the general formula: wherein R1 represents H, halogen, OH, etc.; R2 represents H, halogen or an alkyl group; R3 and R4 represent H, OH, halogen, etc.; Q represents alkylene, etc.; ring A represents aryl or heteroaryl; and G represents or pharmaceutically acceptable salts thereof, or prodrugs thereof, which exhibit an excellent inhibitory activity in human SGLT and are useful as agents for the prevention or treatment of a disease associated with hyperglycemia such as diabetes, postprandial hyperglycemia, impaired glucose tolerance, diabetic complications or obesity, pharmaceutical compositions comprising the same, and pharmaceutical uses thereof.

摘要翻译： 本发明提供由以下通式表示的稠合杂环衍生物：其中R1表示H，卤素，OH等; R2表示H，卤素或烷基; R3和R4代表H，OH，卤素等; Q表示亚烷基等。 环A表示芳基或杂芳基; 和G表示其药学上可接受的盐或其前体药物，其在人SGLT中表现出优异的抑制活性，并且可用作预防或治疗与高血糖相关的疾病如糖尿病，餐后高血糖，葡萄糖耐量异常，糖尿病 并发症或肥胖症，包含其的药物组合物及其药物用途。

公开(公告)号：US07081044B2

公开(公告)日：2006-07-25

申请号：US10450647

申请日：2002-06-12

申请人： Shinro Ohta ,  Kazuo Shimizu

发明人： Shinro Ohta ,  Kazuo Shimizu

IPC分类号： B24B1/00 ,  B24D11/00

CPC分类号： B24B37/205 ,  H01L21/30625

摘要： A polishing pad (10) has an upper-layer pad (11) having a hole (11a) defined therein, a light-transmittable window (41) disposed in the hole (11a) for allowing light to pass therethrough, and a lower-layer pad (12) disposed below the upper-layer pad (11) and having a light passage hole (12a) defined therein which has substantially the same diameter as the hole (11a) in the upper-layer pad (11). A transparent film (13) with an adhesive agent applied to upper and lower surfaces thereof is interposed between the upper-layer pad (11) and the lower-layer pad (12). The hole (11a) defined in the upper-layer pad (11) and the light passage hole (12a) defined in the lower-layer pad (12) have substantially the same size as each other.

摘要翻译： 抛光垫（10）具有其中限定有孔（11a）的上层衬垫（11），设置在孔（11a）中以允许光通过的透光窗（41）和 下层焊盘（12），其设置在上层焊盘（11）的下方，并且具有限定在其中的光通过孔（12a），其具有与上层焊盘（11）中的孔（11a）基本相同的直径 ）。 在上层衬垫（11）和下层衬垫（12）之间插入具有施加到其上表面和下表面的粘合剂的透明膜（13）。 限定在上层衬垫（11）中限定的孔（11a）和限定在下层衬垫（12）中的光通孔（12a）具有大致相同的尺寸。

公开(公告)号：US06558229B2

公开(公告)日：2003-05-06

申请号：US09760823

申请日：2001-01-17

申请人： Norio Kimura ,  Hideji Isobe ,  Kazuo Shimizu ,  Hiroyuki Osawa

发明人： Norio Kimura ,  Hideji Isobe ,  Kazuo Shimizu ,  Hiroyuki Osawa

IPC分类号： B24B4910

CPC分类号： B24B37/013 ,  B24B49/04 ,  B24B49/10 ,  H01L21/30625

摘要： A polishing apparatus is used for polishing a substrate such as a semiconductor wafer, and has a sensor capable of continuously detecting the thickness of an electrically conductive layer. The polishing apparatus includes a polishing table having a polishing surface, and a top ring for holding and pressing the substrate against the polishing surface to polish the surface of the substrate. A sensor such as an eddy-current sensor is disposed below the polishing surface of the polishing table for measuring the thickness of a conductive layer formed on the surface of the substrate.

摘要翻译： 抛光装置用于抛光诸如半导体晶片的基板，并且具有能够连续地检测导电层的厚度的传感器。 抛光装置包括具有抛光表面的抛光台和用于将基板保持并压靠在抛光表面上以抛光基板的表面的顶环。 诸如涡电流传感器的传感器设置在抛光台的抛光表面下方，用于测量在基板表面上形成的导电层的厚度。

公开(公告)号：US06515271B1

公开(公告)日：2003-02-04

申请号：US09574380

申请日：2000-05-19

申请人： Kazuo Shimizu

发明人： Kazuo Shimizu

IPC分类号： H01L2700

CPC分类号： H04N5/23241 ,  H04N5/335

摘要： A CMOS image sensor unit with serial data transmitting function is disclosed. A CMOS sensor unit as a two-dimensional sensor constituted by a plurality of CMOS elements arranged in a regular array in the row and column directions, a clock unit for obtaining a clock signal at a predetermined oscillation frequency, a PLL circuit unit receiving the clock signal from the clock unit and a parallel-to-serial converter unit for converting parallel data read out from the CMOS sensor to serial data in synchronism to the clock signal from the PLL circuit are mounted on a single image sensor unit.

摘要翻译： 公开了具有串行数据传输功能的CMOS图像传感器单元。 作为二维传感器的CMOS传感器单元，由以行和列方向排列成规则排列的多个CMOS元件构成，用于获得预定振荡频率的时钟信号的时钟单元，接收时钟的PLL电路单元 来自时钟单元的信号和用于将从CMOS传感器读出的并行数据转换为与PLL电路的时钟信号同步的串行数据的并行到串行转换器单元安装在单个图像传感器单元上​​。

公开(公告)号：US5966153A

公开(公告)日：1999-10-12

申请号：US771912

申请日：1996-12-23

申请人： Masao Mitani ,  Kenji Yamada ,  Katsunori Kawasumi ,  Osamu Machida ,  Kazuo Shimizu

发明人： Masao Mitani ,  Kenji Yamada ,  Katsunori Kawasumi ,  Osamu Machida ,  Kazuo Shimizu

IPC分类号： B41J2/05 ,  B41J2/14 ,  B41J2/16

CPC分类号： B41J2/1635 ,  B41J2/14129 ,  B41J2/1603 ,  B41J2/1626 ,  B41J2/1631 ,  B41J2/1646 ,  B41J2202/03

摘要： An ink jet printing device including an ink channel wall defining an ink chamber; a nozzle portion formed with a nozzle connecting the ink chamber with atmosphere; and a thermal heater formed to the ink channel wall adjacent to the nozzle portion, the thermal heater including a Ta--Si--O ternary alloy thin film resistor having a composition of 64% .ltoreq.Ta.ltoreq.85%, 5%.ltoreq.Si.ltoreq.26%, and 6%.ltoreq.O.ltoreq.15% and a nickel film conductor.

摘要翻译： 一种喷墨打印装置，包括限定油墨室的油墨通道壁; 形成有将墨水室与大气连接的喷嘴的喷嘴部; 以及形成在与喷嘴部分相邻的墨水通道壁上的热加热器，该热加热器包括具有64％Ta％85％组成的Ta-Si-O三元合金薄膜电阻，5％ / =Si≤26％，6％≤0.15％和镍膜导体。

公开(公告)号：US5552030A

公开(公告)日：1996-09-03

申请号：US196062

申请日：1994-02-22

申请人： Kazuo Shimizu ,  Motonobu Onoda ,  Takeji Tsuchiya ,  Tohru Watanabe

发明人： Kazuo Shimizu ,  Motonobu Onoda ,  Takeji Tsuchiya ,  Tohru Watanabe

IPC分类号： C25D3/56 ,  C25D5/10 ,  C25D5/50 ,  H01F10/32 ,  H01F41/26 ,  H01F41/30 ,  C25D5/18 ,  C25D11/00

CPC分类号： B82Y25/00 ,  B82Y40/00 ,  C25D3/56 ,  C25D5/10 ,  C25D5/50 ,  H01F10/3204 ,  H01F41/26 ,  H01F41/309

摘要： The present invention is directed to a method of applying a magnetic thin film on a substrate by alloy electroplating in which the alloy content in the deposition is defined by an electric current density in the course of the plating operation. The magnetic thin film is superior in uniformity and formability on a complicated substrate. The method comprises the step of changing the electric current density from a low value to a high value, and vice versa at predetermined intervals during plating to laminate different alloy-content plated layers into a multilayer thin film, and improving the magnetic characteristics of the film by heat treatment.

摘要翻译： PCT No.PCT / JP93 / 01365 Sec。 371日期：1994年2月22日 102（e）日期1994年2月22日PCT提交1993年9月24日PCT公布。 公开号WO94 / 08072 日期1994年04月14日本发明涉及通过合金电镀在基板上施加磁性薄膜的方法，其中在电镀操作过程中，沉积中的合金含量由电流密度限定。 磁性薄膜在复杂的基板上的均匀性和成形性优异。 该方法包括将电流密度从低值改变为高值的步骤，反之亦然，在电镀期间以预定的间隔将不同的合金含量的镀层层压成多层薄膜，并改善薄膜的磁特性 通过热处理。

公开(公告)号：US5031125A

公开(公告)日：1991-07-09

申请号：US334200

申请日：1989-04-06

申请人： Kazuo Shimizu ,  Hiroshi Amemiya ,  Yuichi Sakamoto

发明人： Kazuo Shimizu ,  Hiroshi Amemiya ,  Yuichi Sakamoto

IPC分类号： H01J37/32 ,  H05H1/00

CPC分类号： H01J37/32935 ,  H01J37/32954 ,  H05H1/0081

摘要： Apparatus for measuring the electron temperature of plasma includes a first probe which is inserted in the plasma to detect the floating potential. Two sequentially generated pulses of distinct voltages are added to the detected floating potential and these summed voltages are then sequentially applied to the plasma via a second probe. The current in the second probe is detected and the electron temperature is then calculated from the values of the voltage pulses and the currents detected by the second probe.

摘要翻译： 用于测量等离子体的电子温度的装置包括插入等离子体中以检测浮动电位的第一探针。 将两个顺序产生的不同电压的脉冲加到检测到的浮动电位上，然后这些相加的电压经由第二探针被顺序施加到等离子体。 检测第二探针中的电流，然后根据由第二探针检测的电压脉冲和电流的值计算电子温度。

公开(公告)号：US4922205A

公开(公告)日：1990-05-01

申请号：US363157

申请日：1989-06-08

申请人： Kazuo Shimizu ,  Hiroshi Amemiya ,  Yuichi Sakamoto

发明人： Kazuo Shimizu ,  Hiroshi Amemiya ,  Yuichi Sakamoto

IPC分类号： G01N27/00 ,  G01N27/60

CPC分类号： G01N27/60

摘要： An apparatus for detecting contamination on probe surface which comprises a sweep voltage generator for generating sweep voltage which is applied to a probe or probes in plasma, a probe current detection circuit for detecting probe current which flows in accordance with the sweep voltage applied, an amplitude discriminator for comparing the probe current with a predetermined threshold and generating an output signal when the probe current becomes equal to the predetermined threshold, a first sample-hold circuit for sampling and holding the sweep voltage upon reception of the output signal from the amplitude discriminator while the sweep voltage is increasing, a second sample-hold circuit for sampling and holding the sweep voltage upon reception of the output signal from the amplitude discriminator while the sweep voltage is decreasing, and a subtracter for providing a difference between the sweep voltages holded in the first and second sample-hold circuit. Degree of the contamination on the probe surface can be evaluated from the difference.

摘要翻译： 一种用于检测探针表面污染的装置，包括用于产生施加到等离子体中的探针或探针的扫描电压的扫描电压发生器，用于检测根据施加的扫描电压流动的探针电流的探针电流检测电路，振幅 鉴别器，用于将探头电流与预定阈值进行比较，并且当探针电流变得等于预定阈值时产生输出信号;第一采样保持电路，用于在从幅度鉴别器接收到输出信号时采样和保持扫描电压，同时 扫描电压增加，第二采样保持电路，用于在扫描电压降低时从接收到来自振幅识别器的输出信号采样并保持扫描电压;以及减法器，用于提供保持在扫描电压中的扫描电压之间的差值 第一和第二采样保持电路。 可以根据差异来评估探针表面上的污染程度。

公开(公告)号：US4806269A

公开(公告)日：1989-02-21

申请号：US056818

申请日：1987-06-02

申请人： Kazuo Shimizu

发明人： Kazuo Shimizu

IPC分类号： C11B15/00 ,  C11D9/10 ,  C11D9/26 ,  C11D13/00 ,  C11D13/30 ,  C11D9/14

CPC分类号： C11D13/30 ,  C11D13/00

摘要： The substance of the present invention which contains alkali metal carbonate or alkali metal silicate, alkali metal-organic acid salt, a surface-active agent, alkali metal hydroxide and water is capable of converting waste cooking oil into soap which can be used for washing purposes. The substance contains a minimum amount of or no strong alkali substances and is therefore quite safe for home use. Thus, waste cooking oil may be recycled for useful purposes and contamination of sewage with waste cooking oil can be prevented.

摘要翻译： 含有碱金属碳酸盐或碱金属硅酸盐，碱金属 - 有机酸盐，表面活性剂，碱金属氢氧化物和水的本发明的物质能够将废蒸煮油转化成可用于洗涤目的的皂 。 该物质含有最少量的或没有强碱性物质，因此对于家庭使用来说是相当安全的。 因此，可以将废弃的烹饪油回收用于有用的目的，并且可以防止污水与废烹饪油的污染。