中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

62 records (took 0.035 seconds)

    Wafer Edge Inspection
    52.
    发明申请
    Wafer Edge Inspection 有权
    晶圆边缘检查

    公开(公告)号：US20090059236A1

    公开(公告)日：2009-03-05

    申请号：US11848234

    申请日：2007-08-30

    Applicant: Steven W. Meeks ,  Rusmin Kudinar

    Inventor： Steven W. Meeks ,  Rusmin Kudinar

    IPC: G01N21/55 ,  G02F1/29

    CPC classification number: G01N21/9501 ,  G01B11/065 ,  G01N21/9503 ,  G01N21/9506

    Abstract: In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target radiation onto an edge surface of a wafer, the radiation targeting assembly comprising a first expanded paraboloid or expanded ellipsoid reflector positioned adjacent the edge surface of the wafer, a reflected radiation collecting assembly that collects radiation reflected from the surface, a signal processing module to generate surface parameter data from the reflected radiation, and a defect detection module to analyze the surface parameter data to detect a defect on the surface.

    Abstract translation: 在一个实施例中，表面分析器系统包括辐射瞄准组件以将辐射瞄准晶片的边缘表​​面，所述辐射瞄准组件包括邻近所述晶片的边缘表​​面定位的第一扩展的抛物面或扩展的椭球反射器，反射的辐射收集 收集从表面反射的辐射的组件，用于从反射辐射产生表面参数数据的信号处理模块，以及用于分析表面参数数据以检测表面上的缺陷的缺陷检测模块。

    SURFACE CHARACTERISTIC ANALYSIS
    53.
    发明申请
    SURFACE CHARACTERISTIC ANALYSIS 有权
    表面特征分析

    公开(公告)号：US20080180656A1

    公开(公告)日：2008-07-31

    申请号：US11627677

    申请日：2007-01-26

    Applicant: Steven W. Meeks ,  ROMAIN SAPPEY ,  TOM CARR

    Inventor： Steven W. Meeks ,  ROMAIN SAPPEY ,  TOM CARR

    IPC: G01B11/30

    CPC classification number: G01B11/306 ,  G01N21/9501 ,  G01N21/9503

    Abstract: In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a scatterometer to identify at least one defect region on the surface and a surface profile height measuring tool to measure one or more characteristics of the surface in the defect region with a surface profile height measuring tool.

    Abstract translation: 在一个实施例中，使用单个工具测量晶片表面和晶片边缘上的缺陷的系统包括用于识别表面上的至少一个缺陷区域的散射仪和用于测量一个或多个 具有表面轮廓高度测量工具的缺陷区域中的表面特征。

    Wide spatial frequency topography and roughness measurement
    54.
    发明授权
    Wide spatial frequency topography and roughness measurement 有权
    宽空间频率地形和粗糙度测量

    公开(公告)号：US07362425B2

    公开(公告)日：2008-04-22

    申请号：US11387952

    申请日：2006-03-23

    Applicant: Steven W. Meeks ,  Mahendra Prabhu Ramachandran ,  Alireza Shahdoost Moghadam

    Inventor： Steven W. Meeks ,  Mahendra Prabhu Ramachandran ,  Alireza Shahdoost Moghadam

    IPC: G01N21/00

    CPC classification number: G01B11/303 ,  G01N21/9501

    Abstract: In one embodiment, a system to inspect a surface comprises an assembly to direct a first radiation beam onto a surface in a first plane of incidence, a first detector to generate a first signal from a portion of the radiation reflected from the first radiation beam, a first spatial filter interposed between the surface and the first detector, a first ellipsoidal mirror to collect scattered light, a second detector to generate a second signal from the scattered portion of the beam, and a processor to generate, from the first and second signals, a data set representing one or more characteristics of the surface using the first and second signals.

    Abstract translation: 在一个实施例中，用于检查表面的系统包括将第一辐射束引导到第一入射入射面中的表面的组件，第一检测器，用于从第一辐射束反射的辐射的一部分产生第一信号， 介于所述表面和所述第一检测器之间的第一空间滤光器，用于收集散射光的第一椭圆面镜，从所述光束的散射部分产生第二信号的第二检测器，以及处理器，用于从所述第一和第二信号 使用第一和第二信号表示表面的一个或多个特征的数据集。

    Detecting surface pits
    55.
    发明授权
    Detecting surface pits 有权
    检测表面凹坑

    公开(公告)号：US07295300B1

    公开(公告)日：2007-11-13

    申请号：US11237257

    申请日：2005-09-28

    Applicant: Laurie Bechtler ,  Vamsi Velidandla ,  Steven W. Meeks

    Inventor： Laurie Bechtler ,  Vamsi Velidandla ,  Steven W. Meeks

    IPC: G01N21/00

    CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N21/9503 ,  G01N2021/218

    Abstract: A system to detect pits in a surface comprises first and second radiation targeting assemblies to target a second radiation beam onto a surface, a first radiation collecting assembly that collects radiation scattered from the surface, a processor coupled to the first radiation collecting assembly, a memory module coupled to the processor and comprising logic instructions which, when executed by the processor, configure the processor to generate a first signal from radiation scattered from the first radiation beam, generate a second signal from radiation scattered from the second radiation beam, record the first signal and the second signal at an array of different positions on the surface, calculate a median value for the first signal and the second signal over the array of different positions on the surface, and use the first signal, the second signal, and the median value to detect pits in the surface.

    Abstract translation: 用于检测表面中的凹坑的系统包括将第二辐射束瞄准到表面上的第一和第二辐射瞄准组件，收集从表面散射的辐射的第一辐射收集组件，耦合到第一辐射收集组件的处理器，存储器 模块，其耦合到所述处理器并且包括逻辑指令，所述逻辑指令在被所述处理器执行时配置所述处理器以从所述第一辐射束散射的辐射生成第一信号，从所述第二辐射束散射的辐射产生第二信号， 信号和表面上不同位置的阵列上的第二信号，计算表面上不同位置阵列上的第一信号和第二信号的中值，并使用第一信号，第二信号和中值 值以检测表面中的凹坑。

    Material independent optical profilometer
    56.
    发明授权
    Material independent optical profilometer 有权
    材质独立的光学轮廓仪

    公开(公告)号：US07218391B2

    公开(公告)日：2007-05-15

    申请号：US11269336

    申请日：2005-11-07

    Applicant: Steven W. Meeks

    Inventor： Steven W. Meeks

    IPC: G01N21/00

    CPC classification number: G01B11/0616 ,  G01N21/9501

    Abstract: A material independent optical profilometer system and method for measuring at least one of either a height or a slope of an object such as a thin film disk, a silicon wafer, or a glass substrate is disclosed.

    Abstract translation: 公开了一种用于测量诸如薄膜盘，硅晶片或玻璃基板的物体的高度或斜率中的至少一个的材料无关的光学轮廓仪系统和方法。

    Method and apparatus for reading a clock track with a magneto-optical clock head using the transverse Kerr effect
    60.
    发明授权
    Method and apparatus for reading a clock track with a magneto-optical clock head using the transverse Kerr effect 失效
    使用横向克尔效应用磁光时钟头读取时钟轨道的方法和装置

    公开(公告)号：US06751044B1

    公开(公告)日：2004-06-15

    申请号：US09430614

    申请日：1999-10-29

    Applicant: Steven W. Meeks ,  Richard D. LeSage ,  David S. McMurtrey ,  Peter R. Svendsen ,  W. Craig Tomalty

    Inventor： Steven W. Meeks ,  Richard D. LeSage ,  David S. McMurtrey ,  Peter R. Svendsen ,  W. Craig Tomalty

    IPC: G11B5596

    CPC classification number: G11B5/59683

    Abstract: A magneto-optical clock head is disclosed. The magneto-optical clock head allows a longitudinally recorded clock track to be read from a disk surface from a position outside of a head-disk assembly (HDA). The clock track has sections of alternating magnetization which define transitions. Importantly, the magneto-optical clock head is used to sense the transitions using the transverse Kerr effect, as opposed to the longitudinal Kerr effect as used in one prior technique. In one embodiment, the magneto-optical clock head includes a light source for generating a p-polarized beam which is aligned in such a manner that it strikes the clock track. A reflected beam is then produced which has an intensity that varies based upon the direction of the magnetization of the sections of alternating magnetization of the clock track due to the transverse Kerr effect. A detector is provided to detect the intensity variations in the reflected beam and to ultimately generate a clock signal which is provided to transducers to allow them to appropriately write servo information onto their respective disk surfaces. A method for optically reading a clock signal stored within a clock track which is written onto a disk surface that is located within a head disk assembly of a disk drive is also provided.

    Abstract translation: 公开了一种磁光时钟头。 磁光时钟头允许从头盘组件（HDA）外部的位置从盘表面读取纵向记录的时钟轨道。 时钟轨道具有限定过渡的交变磁化区。 重要的是，磁光时钟磁头用于使用横向克尔效应来感测转变，这与先前技术中使用的纵向克尔效应相反。 在一个实施例中，磁 - 光时钟头包括用于产生以偏振时钟轨迹的方式对准的p偏振光束的光源。 然后产生具有根据横向克尔效应的基于时钟轨道的交变磁化部分的磁化方向的变化的强度的反射光束。 提供检测器以检测反射光束中的强度变化并且最终产生提供给换能器的时钟信号，以允许它们将伺服信息适当地写入其各自的盘表面。 还提供了一种用于光学读取存储在时钟轨道内的时钟信号的方法，该时钟信号被写入位于磁盘驱动器的磁头盘组件内的磁盘表面上。

Patent Agency Ranking